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    • 3. 发明授权
    • Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
    • 具有脉冲能量和指向控制的主振荡器/功率放大器准分子激光系统
    • US07158553B2
    • 2007-01-02
    • US10776404
    • 2004-02-11
    • Sergei V. GovorkovAlexander O. WiessnerRainer PaetzelIgor Bragin
    • Sergei V. GovorkovAlexander O. WiessnerRainer PaetzelIgor Bragin
    • H01S3/22
    • H01S3/2366H01S3/10H01S3/225H01S3/2333
    • Pulse parameters of a gas discharge laser system can be optimized and controlled for precision applications such as microlithography. Important laser pulse parameters typically vary in the beginning of a pulse burst, and the directionality of the output beam typically varies throughout the burst. In order to improve the performance of the laser system, the variation at the beginning of a pulse burst can be eliminated by extending the pulse pattern and shuttering the output during periods of significant parameter variation. A fast shutter such as an acousto-optical modulator can be used to prevent output during the burst transition processes. Elements such as acousto-optical cells also can be used in combination with a fast position sensor to steer the direction of the output beam, in order to adjust for variations in the direction of the beam between pulses in a burst.
    • 可以优化和控制气体放电激光系统的脉冲参数,用于精密应用,如微光刻。 重要的激光脉冲参数通常在脉冲脉冲串的开始时变化,并且输出光束的方向性通常在整个脉冲串中变化。 为了提高激光系统的性能,可以通过在显着的参数变化期间延长脉冲模式并对输出进行快门来消除脉冲脉冲串开始时的变化。 诸如声光调制器之类的快门可用于在突发转换过程期间防止输出。 诸如声光单元的元件也可以与快速位置传感器组合使用以控制输出光束的方向,以便调整在脉冲串中的脉冲之间的波束方向上的变化。
    • 8. 发明授权
    • Excimer or molecular fluorine laser with several discharge chambers
    • 具有多个放电室的准分子或分子氟激光
    • US06987790B2
    • 2006-01-17
    • US10776137
    • 2004-02-11
    • Sergei V. GovorkovRainer PaetzelIgor BraginRainer DesorAndreas TargsdorfAndriy Knysh
    • Sergei V. GovorkovRainer PaetzelIgor BraginRainer DesorAndreas TargsdorfAndriy Knysh
    • H01S3/22H01S3/223H01S3/097
    • H01S3/225H01S3/09713H01S3/2366
    • Precise timing control can be obtained for a gas discharge laser, such as an excimer or molecular fluorine laser, using a timed trigger ionization. Instead of using a standard approach to control the timing of the emission or amplification of an optical pulse using the discharge of the main electrodes, the timing of which can only be controlled to within about 10 ns, a trigger ionization pulse applied subsequent to the charging of the main electrodes can be used to control the timing of the discharge, thereby decreasing the timing variations to about 1 ns. Since ionization of the laser gas can consume relatively small amounts of energy, such a circuit can be based on a fast, high-voltage, solid state switch that is virtually free of jitter. Trigger ionization also can be used to synchronize the timing of dual chambers in a MOPA configuration. In one such approach, ionization trigger can include at least a portion of the optical pulse from the oscillator in a MOPA configuration.
    • 使用定时触发电离可以为气体放电激光器(例如准分子激光或分子氟激光)获得准确的时序控制。 代替使用标准方法来控制使用主电极的放电的光脉冲的发射或放大的定时,其定时只能被控制在约10ns内,在充电之后施加的触发电离脉冲 的主电极可以用于控制放电的定时,从而将定时变化减小到大约1ns。 由于激光气体的离子化可以消耗相对少量的能量,所以这种电路可以基于实际上没有抖动的快速,高电压的固态开关。 触发电离也可用于同步MOPA配置中双室的时序。 在一种这样的方法中,电离触发可以包括来自MOPA配置中的来自振荡器的光脉冲的至少一部分。
    • 10. 发明授权
    • Excimer or molecular fluorine laser system with precision timing
    • 准分子或分子氟激光系统具有精确时序
    • US07308013B2
    • 2007-12-11
    • US10699763
    • 2003-11-03
    • Dirk BastingSergei GovorkovRainer PaetzelIgor BraginAndreas Targsdorf
    • Dirk BastingSergei GovorkovRainer PaetzelIgor BraginAndreas Targsdorf
    • H01S3/22
    • H01S3/225H01S3/073H01S3/09702H01S3/09713H01S3/2258
    • A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
    • 主振荡器(MO) - 功率放大器(PA)配置(MOPA)可以有利地用于微光刻应用的准分子激光系统,其中半导体制造商需要40W或更高的功率,以支持先进的吞吐量要求 光刻扫描仪系统。 可以使用公共脉冲发生器来精确地控制MO和PA的放电室中的放电定时以驱动各个室。 放电的时间进一步可以通过室内预电离的定时或通过控制脉冲发生器的最终压缩级中的复位电流来控制。 公共脉冲发生器或单独的脉冲发生器电路也可以使用反馈回路在时间上有效地控制,通过在每个单独的放电室中控制预电离来实现精确定时。 另一个系统提供对腔室中的放电脉冲的时间延迟抖动的实时补偿。