会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Vertical cavity surface emitting laser having continuous grading
    • 具有连续分级的垂直腔表面发射激光
    • US5530715A
    • 1996-06-25
    • US346559
    • 1994-11-29
    • Chan-Long ShiehMichael S. LebbyHsing-Chung LeePiotr Grodzinski
    • Chan-Long ShiehMichael S. LebbyHsing-Chung LeePiotr Grodzinski
    • H01S5/00H01S5/183H01S3/08
    • H01S5/183B82Y20/00H01S5/3054H01S5/3215H01S5/34313
    • A first stack of distributed Bragg mirrors having alternating layers of aluminum gallium arsenide differing in concentrations of an aluminum are disposed on a surface of a substrate with a first plurality of continuous gradient layers positioned between the alternating layers of differing aluminum concentrations to dynamically move the aluminum concentration from one of the alternating layer to another alternating layers. A first cladding region is disposed on the first stack of distributed Bragg mirrors. An active region is disposed on the first cladding region with a second cladding region being dispose on the active region. A second stack of distributed Bragg mirrors having alternating layers of aluminum gallium arsenide differing concentrations of aluminum are disposed on the second cladding region with a second plurality of continuous gradient layers being positioned between the alternating layers of differing aluminum concentrations to dynamically change the aluminum concentration from one of the altering layers to another alternating layers.
    • 具有不同于铝浓度的铝砷化镓的交替层的分布布拉格反射镜的第一堆叠被布置在基板的表面上,其中第一多个连续梯度层位于不同铝浓度的交替层之间以动态地移动铝 从交替层之一到另一个交替层的浓度。 第一包层区域布置在分布布拉格反射镜的第一堆叠上。 有源区设置在第一包层区上,第二包层区设置在有源区上。 具有不同浓度的铝的交替铝砷化镓层的第二层布拉格反射镜布置在第二覆层区域上,第二多个连续梯度层位于不同铝浓度的交替层之间以动态地将铝浓度从 另一个交替层的改变层之一。
    • 8. 发明申请
    • LASER ANNEALING OF METAL OXIDE SEMICONDUCTOR ON TEMPERATURE SENSITIVE SUBSTRATE FORMATIONS
    • 金属氧化物半导体在温度敏感基板上的激光退火
    • US20110062431A1
    • 2011-03-17
    • US12874145
    • 2010-09-01
    • Chan-Long ShiehHsing-Chung Lee
    • Chan-Long ShiehHsing-Chung Lee
    • H01L29/786H01L21/34
    • H01L21/268H01L29/66969H01L29/78603H01L29/78693
    • A method of annealing a metal oxide on a temperature sensitive substrate formation includes the steps of providing a temperature sensitive substrate formation and forming a spacer layer on a surface of the substrate formation. A metal oxide semiconductor device is formed on the spacer layer, the device includes at least a layer of amorphous metal oxide semiconductor material, an interface of the amorphous metal oxide layer with a dielectric layer, and a gate metal layer adjacent the layer of amorphous metal oxide semiconductor material and the interface. The method then includes the step of at least partially annealing the layer of metal oxide semiconductor material by heating the adjacent gate metal layer with pulses of infra red radiation to improve the mobility and operating stability of the amorphous metal oxide semiconductor material while retaining at least the amorphous metal oxide semiconductor material adjacent the gate metal layer amorphous.
    • 在温度敏感的基板形成上退火金属氧化物的方法包括以下步骤:在基板结构的表面上形成温度敏感的基板并形成间隔层。 金属氧化物半导体器件形成在间隔层上,该器件至少包括一层非晶金属氧化物半导体材料,非晶金属氧化物层与电介质层的界面,以及与非晶金属层相邻的栅极金属层 氧化物半导体材料和界面。 该方法然后包括通过用红外辐射脉冲加热相邻栅极金属层来至少部分地退火金属氧化物半导体材料层的步骤,以提高非晶金属氧化物半导体材料的迁移率和操作稳定性,同时至少保留 非晶态金属氧化物半导体材料与栅极金属层相邻无定形。