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1. 发明授权

US5719004A Positive photoresist composition containing a 2,4-dinitro-1-naphthol 失效
标题翻译：含有2,4-二硝基-1-萘酚的正性光致抗蚀剂组合物
公开(公告)号：US5719004A
公开(公告)日：1998-02-17
申请号：US695157
申请日：1996-08-07
申请人： Ping-Hung Lu , Ralph R. Dammel , Elaine G. Kokinda , Sunit S. Dixit
发明人： Ping-Hung Lu , Ralph R. Dammel , Elaine G. Kokinda , Sunit S. Dixit
IPC分类号： G03F7/004 , G03F7/022 , G03F7/023 , G03F7/09 , G03F7/32 , G03F7/38 , G03F7/40 , H01L21/027
CPC分类号： G03F7/091 , G03F7/0226
摘要： A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0.5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.
摘要翻译：含有形成酚醛清漆树脂，醌二叠氮化物光活性化合物，溶剂和2,4-二硝基-1-萘酚染料的光敏正性光致抗蚀剂组合物，其中染料以大于0.5重量％的水平存在的光致抗蚀剂组合物。染料降低了反射基板上的抗蚀剂图案的线宽变化，而不显着降低光敏组合物的光刻性能。

2. 发明授权

US5652297A Aqueous antireflective coatings for photoresist compositions 失效
标题翻译：用于光致抗蚀剂组合物的水性抗反射涂层
公开(公告)号：US5652297A
公开(公告)日：1997-07-29
申请号：US699001
申请日：1996-08-16
申请人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna , Shuji Ding
发明人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna , Shuji Ding
IPC分类号： C08F8/00 , C08F20/60 , G03F7/09 , C08F8/30 , C08F226/00 , G03G13/06
CPC分类号： G03F7/091 , C08F20/60 , C08F8/30 , C08F2800/10 , C08F2800/20 , C08F2810/20
摘要： The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and water, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm, at least one unit containing a crosslinking group and at least one unit derived from a hydrophilic vinyl monomer or a vinyl monomer capable of becoming hydrophilic.
摘要翻译：本发明涉及一种新颖的水性抗反射涂层溶液及其在光刻中的应用。抗反射涂层溶液包含新的聚合物和水，其中抗反射涂层的新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元，至少一个含有交联基团和至少一个衍生自亲水性乙烯基单体或能够变成亲水性的乙烯基单体的单元。

3. 发明授权

US5994430A Antireflective coating compositions for photoresist compositions and use thereof 失效
标题翻译：用于光致抗蚀剂组合物的抗反射涂料组合物及其用途
公开(公告)号：US5994430A
公开(公告)日：1999-11-30
申请号：US841750
申请日：1997-04-30
申请人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
发明人： Shuji Ding , Ping-Hung Lu , Dinesh N. Khanna , Jianhui Shan , Dana L. Durham , Ralph R. Dammel , M. Dalil Rahman
IPC分类号： G03F7/11 , C08F8/30 , C08F212/14 , C08L25/18 , C09B69/10 , G03F7/09 , H01L21/027 , C08K5/00
CPC分类号： C09B69/106 , G03F7/091
摘要： The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
摘要翻译：本发明涉及一种抗反射涂料组合物，其包含溶剂组合物中的新型聚合物。本发明还包括在光刻中使用抗反射涂料组合物的方法。抗反射涂料组合物包含新型聚合物和溶剂组合物，其中抗反射涂层的新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香族官能团的单元。溶剂可以是有机的，优选地是低毒性的溶剂，或者它可以是水，其可另外含有其它与水可混溶的有机溶剂。

4. 发明授权

US5733714A Antireflective coating for photoresist compositions 失效
标题翻译：用于光致抗蚀剂组合物的抗反射涂层
公开(公告)号：US5733714A
公开(公告)日：1998-03-31
申请号：US724109
申请日：1996-09-30
申请人： Iain McCulloch , Ralph R. Dammel , Anthony J. Corso , Shuji Ding , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna
发明人： Iain McCulloch , Ralph R. Dammel , Anthony J. Corso , Shuji Ding , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna
IPC分类号： G03F7/004 , C08F16/26 , C08F18/04 , C08F20/30 , C08F20/58 , C08F26/06 , G03C1/835 , G03F7/09 , G03F7/11 , H01L21/027 , G03C5/00 , C03F8/30
CPC分类号： G03C1/835 , G03F7/091 , Y10S430/151
摘要： The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
摘要翻译：本发明涉及一种新颖的抗反射涂层溶液及其在光刻中的应用。抗反射涂层溶液包括新型聚合物和有机溶剂或有机溶剂的混合物，其中新型聚合物包含含有吸收约180nm至约450nm的染料的单元和含有交联基团的单元。

5. 发明授权

US5652317A Antireflective coatings for photoresist compositions 失效
标题翻译：用于光致抗蚀剂组合物的抗反射涂层
公开(公告)号：US5652317A
公开(公告)日：1997-07-29
申请号：US698742
申请日：1996-08-16
申请人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu
发明人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu
IPC分类号： G03F7/11 , C08F8/00 , C08F8/30 , C08F20/60 , C08F220/54 , C08L33/26 , C09D133/24 , C09D133/26 , G03F7/09 , G03F7/32 , H01L21/027 , C08F226/00 , G03G13/06
CPC分类号： G03F7/091 , C08F20/60 , C09D133/26
摘要： The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
摘要翻译：本发明涉及一种新颖的抗反射涂层溶液及其在光刻中的应用。抗反射涂层溶液包括新型聚合物和有机溶剂或有机溶剂的混合物，其中新型聚合物包含含有吸收约180nm至约450nm的染料的单元和含有交联基团的单元。

6. 发明授权

US5476750A Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists 失效
标题翻译：原料中的金属离子还原，并使用路易斯碱控制用于阳性光致抗蚀剂中的酚醛清漆树脂的分子量
公开(公告)号：US5476750A
公开(公告)日：1995-12-19
申请号：US999500
申请日：1992-12-29
申请人： M. Dalil Rahman , Ping-Hung Lu , Daniel P. Aubin , Ralph R. Dammel , Dana L. Durham
发明人： M. Dalil Rahman , Ping-Hung Lu , Daniel P. Aubin , Ralph R. Dammel , Dana L. Durham
IPC分类号： C08G8/00 , C08G8/08 , G03F7/023 , G03F7/00 , C02F1/42 , C08G8/04 , G03C1/72
CPC分类号： C08G8/08 , G03F7/0236
摘要： The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions and a substantially consistent molecular weight. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
摘要翻译：本发明提供了生产具有非常低水平的金属离子和基本上一致的分子量的水不溶性的碱溶性酚醛清漆树脂的方法。还提供了用于由这种酚醛清漆树脂制造光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。

7. 发明授权

US06576394B1 Negative-acting chemically amplified photoresist composition 有权
标题翻译：负性化学放大光致抗蚀剂组合物
公开(公告)号：US06576394B1
公开(公告)日：2003-06-10
申请号：US09596098
申请日：2000-06-16
申请人： Pingyong Xu , Ping-Hung Lu , Ralph R. Dammel
发明人： Pingyong Xu , Ping-Hung Lu , Ralph R. Dammel
IPC分类号： G03C1492
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/106 , Y10S430/122
摘要： A chemically-amplified, negative-acting, radiation-sensitive photoresist composition that is developable in an alkaline medium, the photoresist comprising: a) a phenolic film-forming polymeric binder resin having ring bonded hydroxyl groups; b) a photoacid generator that forms an acid upon exposure to radiation, in an amount sufficient to initiate crosslinking of the film-forming binder resin; c) a crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises an etherified aminoplast polymer or oligomer; d) a second crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises either 1) a hydroxy substituted- or 2) a hydroxy C1-C4 alkyl substituted-C1-C12 alkyl phenol, wherein the total amount of the crosslinking agents from steps c) and d) is an effective crosslinking amount; and e) a photoresist solvent, and a process for producing a microelectronic device utilizing such a photoresist composition.
摘要翻译：一种可在碱性介质中显影的化学放大的，负性的，辐射敏感的光致抗蚀剂组合物，光致抗蚀剂包括：a）具有环键羟基的酚醛膜形成聚合物粘合剂树脂; b）形成暴露于辐射后的酸，其量足以引发成膜粘合剂树脂的交联; c）在暴露于通过暴露于辐射产生的步骤b）的酸暴露于酸后形成碳鎓离子的交联剂，其包含醚化的氨基塑料聚合物或低聚物; d）第二交联剂，其暴露于通过暴露于辐射产生的步骤b）的酸形成碳鎓离子，并且其包括1）羟基取代的或2）羟基C 1 -C 4 烷基取代的C 1 -C 12烷基苯酚，其中来自步骤c）和d）的交联剂的总量是有效的交联量; ande）光致抗蚀剂溶剂，以及利用这种光致抗蚀剂组合物制造微电子器件的方法。

8. 发明授权

US06800415B2 Negative-acting aqueous photoresist composition 有权
标题翻译：负性水性光致抗蚀剂组合物
公开(公告)号：US06800415B2
公开(公告)日：2004-10-05
申请号：US09966958
申请日：2001-09-28
申请人： Ping-Hung Lu , Mark O. Neisser , Ralph R. Dammel , Hengpeng Wu
发明人： Ping-Hung Lu , Mark O. Neisser , Ralph R. Dammel , Hengpeng Wu
IPC分类号： G03C173
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/128
摘要： The invention relates to a novel negative, aqueous photoresist composition comprising a polyvinylacetal polymer, a water-soluble photoactive compound and a crosslinking agent. The water-soluble photoactive compound is preferably a sulfonium salt. The invention also relates to forming a negative image from the novel photoresist composition.
摘要翻译：本发明涉及包含聚乙烯醇缩醛聚合物，水溶性光敏化合物和交联剂的新型负性水性光致抗蚀剂组合物。水溶性光活性化合物优选为锍盐。本发明还涉及从新型光致抗蚀剂组合物形成负像。

9. 发明授权

US5981145A Light absorbing polymers 失效
标题翻译：吸光聚合物
公开(公告)号：US5981145A
公开(公告)日：1999-11-09
申请号：US846986
申请日：1997-04-30
申请人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
发明人： Shuji Ding , Dinesh N. Khanna , Ping-Hung Lu , Jianhui Shan , Ralph R. Dammel , Dana L. Durham , M. Dalil Rahman , Iain McCulloch
IPC分类号： G03F7/11 , C08F8/00 , C08F8/30 , G03F7/09 , H01L21/027
CPC分类号： G03F7/091 , C08F8/00 , C08F8/30 , C08F12/24 , C08F212/14 , C08F2810/20
摘要： The present invention relates to a novel polymer suitable for use as an antireflective coating or as an additive in photoresist for absorption of reflected light. The novel polymer comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The polymer is soluble in organic solvents, preferrably solvents of low toxicity, or it may be soluble in water, which may additionally contain other water miscible organic solvents.
摘要翻译：本发明涉及一种适合用作抗反射涂层的新型聚合物或作为用于吸收反射光的光刻胶中的添加剂。该新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元和至少一个不含芳香官能团的单元。聚合物可溶于有机溶剂中，优选低毒性溶剂，或者它可溶于水，其可另外含有其它与水可混溶的有机溶剂。

10. 发明申请

US20100092895A1 SILICON-BASED ANTIREFLECTIVE COATING COMPOSITIONS 失效
标题翻译：硅基抗反射涂料组合物
公开(公告)号：US20100092895A1
公开(公告)日：2010-04-15
申请号：US12449735
申请日：2008-02-25
申请人： Ruzhi Zhang , Wookyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neissor , Ralph R. Dammel , Ari Karkkainen
发明人： Ruzhi Zhang , Wookyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neissor , Ralph R. Dammel , Ari Karkkainen
IPC分类号： G03F7/20 , C08G77/04 , C08G77/38
CPC分类号： C08G77/045 , C09D183/04 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3124
摘要： A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40° C. as measured by GPC is provided.
摘要翻译：包含具有至少一个Si-OH基团和至少一个Si-OR基团的硅氧烷聚合物的聚合物，其中R是任选具有反应性官能团的缩合稳定基团，其中所述硅氧烷聚合物在置于溶剂中时具有重量提供了通过GPC测量的在40℃下老化1周后的平均分子量增加小于或等于50％。

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