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    • 3. 发明授权
    • Ultra dark polymer
    • 超暗聚合物
    • US07601486B2
    • 2009-10-13
    • US11304042
    • 2005-12-15
    • Jason Michael Neidrich
    • Jason Michael Neidrich
    • G03C1/825G03C1/835G02B26/00B05D3/04B05D3/02
    • G02B1/111G02B26/0833Y10S430/151Y10S430/162Y10S438/952Y10S438/964
    • A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the dark polymer material in an ash chamber. The dark polymer material, preferably a black matrix resin or a polyimide black matrix resin, when ashed in an oxygen rich atmosphere for a short period of time, forms a surface that is capable of absorbing light as well as randomly refracting light it does not absorb. A protective cap layer may be formed on top of the ashed dark polymer material to provide protection for the dark polymer material.
    • 一种用于在集成电路上产生抗反射涂层的方法和材料。 优选的实施方案包括在反射表面上施加深色聚合物材料,固化黑色聚合物材料,以及粗糙化深色聚合物材料的顶表面。 粗化可以通过在灰室中灰化黑色聚合物材料来实现。 黑色聚合物材料,优选黑色矩阵树脂或聚酰亚胺黑色矩阵树脂,当在富氧气氛中短时间灰化时,形成能够吸收光的表面以及不吸收光的随机折射光 。 可以在灰色深色聚合物材料的顶部上形成保护盖层,以保护黑色聚合物材料。