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1. 发明授权

US06835532B2 Organic anti-reflective coating composition and method for forming photoresist patterns using the same 失效
标题翻译：有机抗反射涂料组合物及其形成方法
公开(公告)号：US06835532B2
公开(公告)日：2004-12-28
申请号：US10357876
申请日：2003-02-04
申请人： Jae-chang Jung
发明人： Jae-chang Jung
IPC分类号： G03C1492
CPC分类号： G03F7/091 , Y10S430/106
摘要： An organic anti-reflective coating composition and a method for forming photoresist patterns using the same are disclosed which can prevent reflection of the lower film layer or substrate and reduce standing waves caused by light and variation of in the thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, with respect to a microfine pattern-forming process using photoresists for a photolithography by using ArF with 193 nm wavelength among processes for manufacturing semiconductor device. More particularly, an organic anti-reflective coating composition and a method for forming photoresist patterns using the same are disclosed which can obtain perpendicular photoresist patterns and thus inhibit breakdown and/or collapse of the patterns by comprising an acid-diffusion inhibitor.
摘要翻译：公开了一种有机抗反射涂层组合物和使用其形成光致抗蚀剂图案的方法，其可以防止下膜层或基板的反射，并减少由光引起的驻波和光致抗蚀剂本身的厚度的变化，相对于使用光致抗蚀剂进行光刻的微细图案形成方法，通过在制造半导体器件的工艺中使用193nm波长的ArF，增加光致抗蚀剂图案的均匀性。更具体地，公开了一种有机抗反射涂料组合物和使用其形成光致抗蚀剂图案的方法，其可以获得垂直的光致抗蚀剂图案，从而通过包含酸扩散抑制剂来抑制图案的破坏和/或塌陷。

2. 发明授权

US06576394B1 Negative-acting chemically amplified photoresist composition 有权
标题翻译：负性化学放大光致抗蚀剂组合物
公开(公告)号：US06576394B1
公开(公告)日：2003-06-10
申请号：US09596098
申请日：2000-06-16
申请人： Pingyong Xu , Ping-Hung Lu , Ralph R. Dammel
发明人： Pingyong Xu , Ping-Hung Lu , Ralph R. Dammel
IPC分类号： G03C1492
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/106 , Y10S430/122
摘要： A chemically-amplified, negative-acting, radiation-sensitive photoresist composition that is developable in an alkaline medium, the photoresist comprising: a) a phenolic film-forming polymeric binder resin having ring bonded hydroxyl groups; b) a photoacid generator that forms an acid upon exposure to radiation, in an amount sufficient to initiate crosslinking of the film-forming binder resin; c) a crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises an etherified aminoplast polymer or oligomer; d) a second crosslinking agent that forms a carbonium ion upon exposure to the acid from step b) generated by exposure to radiation, and which comprises either 1) a hydroxy substituted- or 2) a hydroxy C1-C4 alkyl substituted-C1-C12 alkyl phenol, wherein the total amount of the crosslinking agents from steps c) and d) is an effective crosslinking amount; and e) a photoresist solvent, and a process for producing a microelectronic device utilizing such a photoresist composition.
摘要翻译：一种可在碱性介质中显影的化学放大的，负性的，辐射敏感的光致抗蚀剂组合物，光致抗蚀剂包括：a）具有环键羟基的酚醛膜形成聚合物粘合剂树脂; b）形成暴露于辐射后的酸，其量足以引发成膜粘合剂树脂的交联; c）在暴露于通过暴露于辐射产生的步骤b）的酸暴露于酸后形成碳鎓离子的交联剂，其包含醚化的氨基塑料聚合物或低聚物; d）第二交联剂，其暴露于通过暴露于辐射产生的步骤b）的酸形成碳鎓离子，并且其包括1）羟基取代的或2）羟基C 1 -C 4 烷基取代的C 1 -C 12烷基苯酚，其中来自步骤c）和d）的交联剂的总量是有效的交联量; ande）光致抗蚀剂溶剂，以及利用这种光致抗蚀剂组合物制造微电子器件的方法。

3. 发明授权

US06506534B1 Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices 有权
标题翻译：负电阻组合物，形成抗蚀剂图案的方法和用于生产电子器件的方法
公开(公告)号：US06506534B1
公开(公告)日：2003-01-14
申请号：US09654433
申请日：2000-09-01
申请人： Koji Nozaki , Takahisa Namiki , Ei Yano , Junichi Kon , Miwa Kozawa
发明人： Koji Nozaki , Takahisa Namiki , Ei Yano , Junichi Kon , Miwa Kozawa
IPC分类号： G03C1492
CPC分类号： H01L21/0274 , G03F7/0045 , G03F7/038 , H01L21/02118 , H01L21/02282 , H01L21/28123 , H01L21/312 , Y10S430/106 , Y10S430/111 , Y10S430/128
摘要： The negative resist composition comprises (1) a film-forming polymer which is itself soluble in basic aqueous solutions, and contains a first monomer unit with an alkali-soluble group in the molecule and a second monomer unit with an alcohol structure on the side chain which is capable of reacting with the alkali-soluble group, and (2) a photo acid generator which, when decomposed by absorption of imaage-forming radiation, is capable of generating an acid that can induce reaction between the alcohol structure of the second monomer unit and the alkali-soluble group of the first monomer unit, or protect the alkali-soluble group of the first monomer unit. The resist composition can form intricate negative resist patterns with practical sensitivity and no swelling.
摘要翻译：负性抗蚀剂组合物包含（1）本身可溶于碱性水溶液的成膜聚合物，并且在分子中含有具有碱溶性基团的第一单体单元和在侧链上具有醇结构的第二单体单元其能够与碱溶性基团反应，和（2）光产酸剂，当通过吸收成形辐射分解时，能够产生可引起第二单体的醇结构之间的反应的酸单元和第一单体单元的碱溶性基团，或保护第一单体单元的碱溶性基团。抗蚀剂组合物可以形成具有实际灵敏度和无溶胀的复杂的抗蚀剂图案。

4. 发明授权

US06391512B1 Image forming material and image forming method 失效
标题翻译：成像材料及成像方法
公开(公告)号：US06391512B1
公开(公告)日：2002-05-21
申请号：US08723457
申请日：1996-10-15
申请人： Katsura Hirai , Tatsuichi Maehashi
发明人： Katsura Hirai , Tatsuichi Maehashi
IPC分类号： G03C1492
CPC分类号： B41M5/368 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/0045 , G03F7/039 , Y10S430/127 , Y10S430/145
摘要： An image forming material comprises a support and provided thereon, a light sensitive layer containing a compound capable of generating an acid on irradiation of an active light, a compound having a chemical bond capable of being decomposed by an acid and an infrared absorber.
摘要翻译：图像形成材料包括支撑体，设置有包含能够在活性光照射下产生酸的化合物的光敏层，具有能够被酸分解的化学键的化合物和红外线吸收剂。

5. 发明授权

US06280903B1 Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US06280903B1
公开(公告)日：2001-08-28
申请号：US09618142
申请日：2000-07-17
申请人： Yool Kang , Sang-Jun Choi , Dong-Won Jung , Chun-Geun Park , Young-Bum Koh
发明人： Yool Kang , Sang-Jun Choi , Dong-Won Jung , Chun-Geun Park , Young-Bum Koh
IPC分类号： G03C1492
CPC分类号： G03F7/039 , G03F7/0045
摘要： Copolymers and terpolymers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof. R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; M and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.
摘要翻译：共聚物和三元共聚物用于化学增强抗蚀剂。三元共聚物具有下式：其中R 3选自氢和C 1至C 10脂族烃，其中所述脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基。 R 4选自氢和C 1至C 10脂族烃，其中所述脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基; R5选自氢和甲基; R6选自叔丁基和四氢吡喃基; M和n分别是整数; 并且其中n /（m + n）为约0.1至约0.5。

6. 发明授权

US06265135B1 Positive-working electron beam or X-ray resist composition 有权
标题翻译：正电子束或X射线抗蚀剂组成
公开(公告)号：US06265135B1
公开(公告)日：2001-07-24
申请号：US09419905
申请日：1999-10-18
申请人： Kunihiko Kodama , Toshiaki Aoai , Kazuya Uenishi
发明人： Kunihiko Kodama , Toshiaki Aoai , Kazuya Uenishi
IPC分类号： G03C1492
CPC分类号： G03F7/0392 , C08F12/22 , G03F7/0045 , Y10S430/143 , Y10S430/167
摘要： A positive-working electron beam or X-ray resist composition comprising: (a) a compound capable of generating an acid by irradiation of an electron beam or X-ray; (b) a resin containing a group which is decomposable by action of an acid to increase solubility in an alkali developing solution or (e) a resin insoluble in water and soluble in the alkali developing solution; and (c) a fluorine and/or silicon surfactant, the compound capable of generating an acid by irradiation of an electron beam or X-ray being a compound which generates benzenesulfonic acid, naphthalenesulfonic acid or anthracenesulfonic acid which is substituted by at least one fluorine atom and/or at least one group containing a fluorine atom.
摘要翻译：一种正电子束或X射线抗蚀剂组合物，其包含：（a）能够通过电子束或X射线的照射产生酸的化合物;（b）含有可通过酸以增加在碱性显影溶液中的溶解度，或（e）不溶于水并可溶于碱性显影液的树脂; 和（c）氟和/或硅表面活性剂，能够通过电子束的照射产生酸的化合物或者X射线是产生被至少一个氟取代的苯磺酸，萘磺酸或蒽磺酸的化合物原子和/或至少一个含有氟原子的基团。

7. 发明授权

US06824955B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06824955B2
公开(公告)日：2004-11-30
申请号：US10328007
申请日：2002-12-26
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Michitaka Ootani , Haruhiko Komoriya
IPC分类号： G03C1492
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist composition comprising a copolymer of an acrylic ester monomer containing fluorine at &agr;-position with a norbornene derivative containing oxygen or sulfur within the norbornene ring as a base resin is sensitive to high-nergy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.
摘要翻译：包含α位上含氟的丙烯酸酯单体与在降冰片烯环内含有氧或硫的降冰片烯衍生物作为基础树脂的共聚物的抗蚀剂组合物对于200nm以下的高能量辐射敏感，具有优异的灵敏度，透明度和干蚀刻电阻，适用于光刻微处理。

8. 发明授权

US06703182B1 Unsaturated oxime derivatives and the use thereof as latent acids 有权
标题翻译：不饱和肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06703182B1
公开(公告)日：2004-03-09
申请号：US09763016
申请日：2001-02-15
申请人： Jean-Luc Birbaum , Toshikage Asakura , Hitoshi Yamato
发明人： Jean-Luc Birbaum , Toshikage Asakura , Hitoshi Yamato
IPC分类号： G03C1492
CPC分类号： C09D11/38 , B33Y70/00 , C07C309/66 , C07C309/73 , C07C381/00 , C09D11/03 , C09D11/101 , G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： Compounds of formulae I, II or III wherein m is zero or 1; n is 1, 2 or 3; R1 inter alia is unsubstituted or substituted phenyl, or naphthyl, anthracyl, phenanthryl, a heteroaryl radical, or C2-C12alkenyl; R′1 inter alia is vinylene, phenylene, naphthylene, diphenylene or oxydiphenylene; R2 inter alia is CN, C1-C4haloalkyl, C2-C6alkoxycarbonyl, phenoxycarbonyl, or benzoyl; R3 inter alia is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl, camphorylsulfonyl, or phenylsulfonyl; R′3 inter alia is C2-C12alkylenedisulfonyl, phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, C1-C8alkyl, C1-C6alkoxy, C1-C4haloalkyl, CN, NO2, C2-C6alkanoyl, benzoyl, phenyl, —S-phenyl, OR6, SR9, NR7R8, C2-C6alkoxycarbonyl or phenoxycarbonyl; R6 inter alia is hydrogen, phenyl or C1-C12alkyl; R7 and R8 inter alia are hydrogen or C1-C12alkyl; R9 inter alia is C1-C12 alkyl; R10, R11 and R12 inter alia are C1-C6alkyl or phenyl; upon irradiation react as acid generating compounds and thus are suitable in photoresist applications.
摘要翻译：其中m为式I，II或III的化合物为0或1; n为1,2或3; R 1特别是未取代或取代的苯基，或萘基，蒽基，菲基，杂芳基或C 2 -C 12烯基; 尤其是亚乙烯基，亚苯基，亚萘基，二亚苯基或氧联二苯基; R2特别是CN，C 1 -C 4卤代烷基，C 2 -C 6烷氧基羰基，苯氧基羰基或苯甲酰基; R3特别是C 1 -C 18烷基磺酰基，苯基-C 1 -C 3烷基磺酰基，樟脑磺酰基或苯基磺酰基; R'3特别是C 2 -C 12亚烷基二磺酰基，亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基; R4和R5特别是氢，卤素，C1-C8烷基，C1-C6烷氧基，C1-C4卤代烷基，CN，NO2，C2-C6烷酰基，苯甲酰基，苯基，-S-苯基，OR6，SR9，NR7R8，C2-C6烷氧基羰基或苯氧基羰基 ; R6尤其是氢，苯基或C 1 -C 12烷基; R 7和R 8尤其是氢或C 1 -C 12烷基; R9尤其是C1-C12烷基; R 10，R 11和R 12特别是C 1 -C 6烷基或苯基; 在照射时作为产生酸的化合物反应，因此适用于光刻胶应用。

9. 发明授权

US06537723B1 Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same 失效
标题翻译：用于制造光波导的光敏组合物，其制造方法和使用该光波导的聚合物光波导图案形成方法
公开(公告)号：US06537723B1
公开(公告)日：2003-03-25
申请号：US09409078
申请日：1999-09-30
申请人： Seiji Toyoda , Saburo Imamura , Satoru Tomaru , Takashi Kurihara , Koji Enbutsu , Shoichi Hayashida , Tohru Maruno
发明人： Seiji Toyoda , Saburo Imamura , Satoru Tomaru , Takashi Kurihara , Koji Enbutsu , Shoichi Hayashida , Tohru Maruno
IPC分类号： G03C1492
CPC分类号： G03F7/0757 , G03F7/038 , Y10S430/106 , Y10S430/115 , Y10S430/117
摘要： A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer represented by the following formula (1), wherein X denotes hydrogen, deuterium, halogen, an alkyl group or an alkoxy group; m is an integer from 1 to 5; x and y represent the proportion of respective units, and neither x nor y is 0; and R1 denotes a methyl, ethyl, or isopropyl group; a production method thereof, and a polymer optical waveguide pattern formation method using the same.
摘要翻译：一种由有机低聚物，聚合引发剂和交联剂组成的光波导用感光性组合物，所述有机低聚物为下述式（1）表示的硅氧烷低聚物，其中，X表示氢，氘，卤素，烷基或烷氧基 m为1〜5的整数; x和y表示各单元的比例，x和y都不为0; R1表示甲基，乙基或异丙基; 其制备方法，以及使用该方法的聚合物光波导图案形成方法。

10. 发明授权

US06492091B2 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06492091B2
公开(公告)日：2002-12-10
申请号：US09921691
申请日：2001-08-06
申请人： Kunihiko Kodama , Toshiaki Aoai
发明人： Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03C1492
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111 , Y10S430/115 , Y10S430/122
摘要： A positive photosensitive composition comprises: (A) a compound generating an acid upon irradiation with one of an actinic ray and radiation; (B) a resin containing a monocyclic or polycyclic alicyclic hydrocarbon structure and increasing the solubility to an alkali developer by the action of an acid; and (C) an onium salt of carboxylic acid.
摘要翻译：正型感光性组合物包含：（A）在光化学射线和辐射中的一种照射时产生酸的化合物; （B）含有单环或多环脂环烃结构并通过酸作用增加对碱显影剂的溶解度的树脂; 和（C）羧酸的鎓盐。

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