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1. 发明申请

US20080058984A1 GENERALIZED KINEMATICS SYSTEM 有权
标题翻译：通用动力系统
公开(公告)号：US20080058984A1
公开(公告)日：2008-03-06
申请号：US11833971
申请日：2007-08-03
申请人： Paul Gray , Jiang Lu , Kishore Lankalapalli
发明人： Paul Gray , Jiang Lu , Kishore Lankalapalli
IPC分类号： G05B19/18
CPC分类号： G05B19/4069 , G05B19/4086 , G05B2219/34202 , G05B2219/35346 , G05B2219/36252 , G05B2219/36276
摘要： The present disclosure includes a generalized kinematics library which may be used to control the motion of a machine tool system and to process data for other applications, such as simulation graphics. Methods are disclosed to interpolate the movement of various axes of a machine tool system through a machine singularity point.
摘要翻译：本公开包括广义运动学库，其可以用于控制机床系统的运动并处理诸如模拟图形之类的其他应用的数据。公开了通过机器奇异点来插入机床系统的各个轴的运动的方法。

2. 发明授权

US08725283B2 Generalized kinematics system 有权
标题翻译：广义运动学系统
公开(公告)号：US08725283B2
公开(公告)日：2014-05-13
申请号：US11833971
申请日：2007-08-03
申请人： Paul J. Gray , Jiang Lu , Kishore Lankalapalli
发明人： Paul J. Gray , Jiang Lu , Kishore Lankalapalli
IPC分类号： G06F19/00 , G06G7/58
CPC分类号： G05B19/4069 , G05B19/4086 , G05B2219/34202 , G05B2219/35346 , G05B2219/36252 , G05B2219/36276
摘要： The present disclosure includes a generalized kinematics library which may be used to control the motion of a machine tool system and to process data for other applications, such as simulation graphics. Methods are disclosed to interpolate the movement of various axes of a machine tool system through a machine singularity point.
摘要翻译：本公开包括广义运动学库，其可以用于控制机床系统的运动并处理诸如模拟图形之类的其他应用的数据。公开了通过机器奇异点来插入机床系统的各个轴的运动的方法。

3. 发明申请

US20100062149A1 METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS 审中-公开
标题翻译：在原子层沉积过程中调节沉积速率的方法
公开(公告)号：US20100062149A1
公开(公告)日：2010-03-11
申请号：US12465471
申请日：2009-05-13
申请人： Paul Ma , Joseph F. Aubuchon , Jiang Lu , Mei Chang
发明人： Paul Ma , Joseph F. Aubuchon , Jiang Lu , Mei Chang
IPC分类号： B05D5/12
CPC分类号： H01L21/76841 , C23C16/45534 , C23C16/52
摘要： Embodiments of the invention provide methods for depositing a material on a substrate within a processing chamber during a vapor deposition process, such as an atomic layer deposition (ALD) process. In one embodiment, a method is provided which includes sequentially exposing the substrate to a first precursor gas and at least a second precursor gas while depositing a material on the substrate during the ALD process, and continuously or periodically exposing the substrate to a treatment gas prior to and/or during the ALD process. The deposition rate of the material being deposited may be controlled by varying the amount of treatment gas exposed to the substrate. In one example, tantalum nitride is deposited on the substrate and the alkylamino metal precursor gas contains a tantalum precursor, such as pentakis(dimethylamino) tantalum (PDMAT), the second precursor gas contains a nitrogen precursor, such as ammonia, and the treatment gas contains dimethylamine (DMA).
摘要翻译：本发明的实施例提供了在诸如原子层沉积（ALD）工艺的气相沉积工艺期间将材料沉积在处理室内的衬底上的方法。在一个实施例中，提供了一种方法，其包括在ALD工艺期间将衬底沉积到衬底上的同时将衬底依次暴露于第一前体气体和至少第二前体气体，并且连续地或周期地将衬底暴露于处理气体之前到和/或在ALD过程期间。可以通过改变暴露于衬底的处理气体的量来控制被沉积的材料的沉积速率。在一个实例中，氮化钽沉积在衬底上，并且烷基氨基金属前体气体包含钽前体，例如五（二甲基氨基）钽（PDMAT）），第二前体气体含有氮前体如氨，并且处理气体含有二甲胺（DMA）。

4. 发明授权

US09418890B2 Method for tuning a deposition rate during an atomic layer deposition process 有权
标题翻译：在原子层沉积过程中调整沉积速率的方法
公开(公告)号：US09418890B2
公开(公告)日：2016-08-16
申请号：US14279260
申请日：2014-05-15
申请人： Paul Ma , Joseph F. Aubuchon , Jiang Lu , Mei Chang
发明人： Paul Ma , Joseph F. Aubuchon , Jiang Lu , Mei Chang
IPC分类号： H01L21/768 , C23C16/455 , C23C16/52
CPC分类号： H01L21/76841 , C23C16/45534 , C23C16/52
摘要： Embodiments of the invention provide methods for depositing a material on a substrate within a processing chamber during a vapor deposition process, such as an atomic layer deposition (ALD) process. In one embodiment, a method is provided which includes sequentially exposing the substrate to a first precursor gas and at least a second precursor gas while depositing a material on the substrate during the ALD process, and continuously or periodically exposing the substrate to a treatment gas prior to and/or during the ALD process. The deposition rate of the material being deposited may be controlled by varying the amount of treatment gas exposed to the substrate. In one example, tantalum nitride is deposited on the substrate and the alkylamino metal precursor gas contains a tantalum precursor, such as pentakis(dimethylamino) tantalum (PDMAT), the second precursor gas contains a nitrogen precursor, such as ammonia, and the treatment gas contains dimethylamine (DMA).
摘要翻译：本发明的实施例提供了在诸如原子层沉积（ALD）工艺的气相沉积工艺期间将材料沉积在处理室内的衬底上的方法。在一个实施例中，提供了一种方法，其包括在ALD工艺期间将衬底沉积到衬底上的同时将衬底依次暴露于第一前体气体和至少第二前体气体，并且连续地或周期地将衬底暴露于处理气体之前到和/或在ALD过程期间。可以通过改变暴露于衬底的处理气体的量来控制被沉积的材料的沉积速率。在一个实例中，氮化钽沉积在衬底上，并且烷基氨基金属前体气体包含钽前体，例如五（二甲基氨基）钽（PDMAT）），第二前体气体含有氮前体如氨，并且处理气体含有二甲胺（DMA）。

5. 发明授权

US09051641B2 Cobalt deposition on barrier surfaces 有权
标题翻译：阻挡表面上的钴沉积
公开(公告)号：US09051641B2
公开(公告)日：2015-06-09
申请号：US12201976
申请日：2008-08-29
申请人： Jiang Lu , Hyoung-Chan Ha , Paul Ma , Seshadri Ganguli , Joseph F. Aubuchon , Sang Ho Yu , Murali K. Narasimhan
发明人： Jiang Lu , Hyoung-Chan Ha , Paul Ma , Seshadri Ganguli , Joseph F. Aubuchon , Sang Ho Yu , Murali K. Narasimhan
IPC分类号： B05D5/12 , C23C16/16 , C23C16/18 , C23C16/42 , C23C16/56 , H01L21/285 , H01L21/768
CPC分类号： H01L21/76871 , C23C16/16 , C23C16/18 , C23C16/42 , C23C16/56 , H01L21/28556 , H01L21/28562 , H01L21/28568 , H01L21/76846 , H01L21/76862 , H01L21/76864 , H01L21/76873
摘要： Embodiments of the invention provide processes for depositing a cobalt layer on a barrier layer and subsequently depositing a conductive material, such as copper or a copper alloy, thereon. In one embodiment, a method for depositing materials on a substrate surface is provided which includes forming a barrier layer on a substrate, exposing the substrate to dicobalt hexacarbonyl butylacetylene (CCTBA) and hydrogen to form a cobalt layer on the barrier layer during a vapor deposition process (e.g., CVD or ALD), and depositing a conductive material over the cobalt layer. In some examples, the barrier layer and/or the cobalt layer may be exposed to a gas or a reagent during a treatment process, such as a thermal process, an in situ plasma process, or a remote plasma process.
摘要翻译：本发明的实施方案提供了在阻挡层上沉积钴层并随后在其上沉积诸如铜或铜合金的导电材料的方法。在一个实施例中，提供了一种在衬底表面上沉积材料的方法，其包括在衬底上形成阻挡层，将衬底暴露于六羰基丁基乙炔二钴（CCTBA）和氢，以在气相沉积期间在阻挡层上形成钴层工艺（例如，CVD或ALD），以及在钴层上沉积导电材料。在一些实例中，阻挡层和/或钴层可以在诸如热处理，原位等离子体处理或远程等离子体处理的处理过程中暴露于气体或试剂。

6. 发明授权

US07290723B1 Aerosol splitter for ELSD 失效
标题翻译： ELSD气溶胶分离器
公开(公告)号：US07290723B1
公开(公告)日：2007-11-06
申请号：US10784497
申请日：2004-02-23
申请人： Jiang Lu , Samuel Frederick Azlein
发明人： Jiang Lu , Samuel Frederick Azlein
IPC分类号： B05B1/24 , B05B7/16 , B05B1/26 , B05B1/00 , A62C31/02
CPC分类号： G01N30/84 , G01N30/74 , G01N2030/847 , G01N2030/8494 , G01N21/47
摘要： The present invention is directed to a device for splitting a propelled aerosol cloud. The device utilizes a curved spray chamber and a thermal technique to divert any desired portion of the aerosol to waste. The remainder of the aerosol is made available to an ELSD or similar instrument for analysis.
摘要翻译：本发明涉及一种用于分离推进气溶胶云的装置。该装置使用弯曲的喷雾室和热技术将任何所需部分的气溶胶转移到废物中。气溶胶的其余部分可用于ELSD或类似仪器进行分析。

7. 发明授权

US10106081B2 Laser guided parking assistance device 有权
公开(公告)号：US10106081B2
公开(公告)日：2018-10-23
申请号：US15216987
申请日：2016-07-22
申请人： Jiang Lu , Fangqin Liu
发明人： Jiang Lu , Fangqin Liu
IPC分类号： B60Q9/00 , G05D1/02 , H05B33/08
摘要： A laser guided parking assistance device and methods of operation are disclosed. An example laser guided parking assistance device includes a tilt switch to detect a vertical orientation of a horizontal orientation. The laser guided parking assistance device also includes a laser to emit a laser light beam in response to the tilt switch detecting the horizontal orientation. In an example, a laser guided parking assistance device is configured as a circuit including a battery power source, a laser diode connected in series with the battery power source, and a first tilt switch connected between the battery power source and the laser diode. The tilt switch opens in a vertical position to cut electrical power from the battery power source to the laser diode. The first tilt switch closes in a horizontal position to connect electrical power from the battery power source to the laser diode.

8. 植物专利

US20100242143P1 Muscadine grape plant named 'Majesty' 有权
标题翻译：麝香葡萄植物“陛下”
公开(公告)号：US20100242143P1
公开(公告)日：2010-09-23
申请号：US12082850
申请日：2008-04-15
申请人： Jiang Lu , Zhong-bo Ren , Xia Xu
发明人： Jiang Lu , Zhong-bo Ren , Xia Xu
IPC分类号： A01H5/00
CPC分类号： A01H6/88 , A01H5/08
摘要： A new and distinct cultivar of the muscadine grape plant, Vitis rotundifolia Michx., which has exceptionally good flavor, firm flesh texture with relatively thin skin, and a larger berry than the current grapes that are produced commercially. The vines of this cultivar are vigorous, productive and disease resistant.
摘要翻译：麝香葡萄植物Vitis rotundifolia Michx的新鲜而独特的品种，具有非常好的风味，坚实的肉质质地，皮肤相对薄，以及比目前商业生产的葡萄更大的浆果。这种栽培品种的葡萄藤是有活力，有生产力和抗病性的。

9. 发明申请

US20170140646A1 IN-VEHICLE GARAGE DOOR MONITOR 审中-公开
公开(公告)号：US20170140646A1
公开(公告)日：2017-05-18
申请号：US15340738
申请日：2016-11-01
申请人： Jiang Lu , Fangqin Liu
发明人： Jiang Lu , Fangqin Liu
IPC分类号： G08G1/0962
CPC分类号： G08B21/18 , E05F15/77
摘要： An in-vehicle garage door monitoring system. An example monitoring system includes a sensor mounted near a garage door to determine a status of the garage door. The example monitoring system also includes a transmitter mounted near the garage door and communicatively coupled with the sensor, the transmitter issuing a signal corresponding to the status of the garage door. The example monitoring system also includes a receiver at the vehicle to receive the signal from the transmitter, the receiver issuing at least one notification to an occupant of the vehicle indicating the status of the garage door.

10. 发明申请

US20170021767A1 LASER GUIDED PARKING ASSISTANCE DEVICE 审中-公开
标题翻译：激光导向停车辅助装置
公开(公告)号：US20170021767A1
公开(公告)日：2017-01-26
申请号：US15216987
申请日：2016-07-22
申请人： Jiang Lu , Fangqin Liu
发明人： Jiang Lu , Fangqin Liu
IPC分类号： B60Q9/00 , F21S9/03 , F21V23/04 , G05D1/02 , H05B37/02
CPC分类号： B60Q9/004 , B62D15/027 , G05D1/024 , H05B33/0806 , H05B33/0842
摘要： A laser guided parking assistance device and methods of operation are disclosed. An example laser guided parking assistance device includes a tilt switch to detect a vertical orientation of a horizontal orientation. The laser guided parking assistance device also includes a laser to emit a laser light beam in response to the tilt switch detecting the horizontal orientation. In an example, a laser guided parking assistance device is configured as a circuit including a battery power source, a laser diode connected in series with the battery power source, and a first tilt switch connected between the battery power source and the laser diode. The tilt switch opens in a vertical position to cut electrical power from the battery power source to the laser diode The first tilt switch closes in a horizontal position to connect electrical power from the battery power source to the laser diode.
摘要翻译：公开了一种激光引导停车辅助装置和操作方法。示例性激光引导停车辅助装置包括用于检测水平取向的垂直取向的倾斜开关。激光引导停车辅助装置还包括激光器，响应于倾斜开关检测水平方向而发射激光束。在一个示例中，激光引导停车辅助装置被配置为包括电池电源，与电池电源串联的激光二极管和连接在电池电源和激光二极管之间的第一倾斜开关的电路。倾斜开关处于垂直位置，以将电力从电池电源切割到激光二极管。第一倾斜开关处于水平位置，以将来自电池电源的电力连接到激光二极管。

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