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1. 发明申请

US20230088313A1 SYSTEM AND APPARATUS FOR GAS DISTRIBUTION 有权
公开(公告)号：US20230088313A1
公开(公告)日：2023-03-23
申请号：US17948674
申请日：2022-09-20
申请人： ASM IP Holding, B.V.
发明人： Herbert Terhorst , Dinkar Nandwana , Eric Shero , Allen D'Ambra , Jessica Akemi Cimada da Silva , Daner Abdula
IPC分类号： B05B1/00 , B05B1/18
摘要： A gas distribution system having a first plurality of apertures to supply a gas source to a reaction chamber and a second plurality of apertures surrounding the first plurality of apertures and configured to remove the gas from the reaction chamber. In one embodiment, the second plurality of apertures may gradually increase in diameter as the distance from a main exhaust channel increases. Alternatively, or in addition, the angle spacing between adjacent apertures may gradually decrease as the distance from the main exhaust channel increases.

2. 发明申请

US20230041364A1 NOISE SUPPRESSION SYSTEM 有权
公开(公告)号：US20230041364A1
公开(公告)日：2023-02-09
申请号：US17962646
申请日：2022-10-10
申请人： Figure, Inc.
发明人： Leonard McCreary , Chris Holtzclaw , Jonathon McDaniels
IPC分类号： B05B1/00 , G10K11/16
摘要： Disclosed is a noise suppressor for use inside a nozzle and adjacent a nozzle liner. The suppressor can include an inlet with a cross-sectional area larger than that of the nozzle liner outlet. The suppressor can also have an entrance length with a diverging cross-sectional area, and an exit length extending from the entrance length. By incorporating this geometry, the noise suppressor reduces noise and improves performance of the apparatus in which the suppressor is used.

3. 发明授权

US11529658B2 Fluid pump having self-cleaning air inlet structure 有权
公开(公告)号：US11529658B2
公开(公告)日：2022-12-20
申请号：US16434803
申请日：2019-06-07
申请人： Q.E.D. Environmental Systems, Inc.
发明人： John F. Schaupp , Donald Lee Schultz , Matthew Thomas McKeown
IPC分类号： F04B53/16 , F04B9/12 , B08B5/02 , B05B1/00
摘要： A pneumatically driven fluid pump apparatus is disclosed which includes a pump casing having an inner wall, a pump cap secured at a first end of the pump casing, and a liquid discharge tube in communication with the pump cap and extending at least partially within an interior area of the pump casing toward a second end of the pump casing, and where fluid is admitted into the pump casing at the second end. The pump cap has an airflow inlet for receiving a pressurized airflow from an external pressurized air source, which helps displace liquid collecting within the pump casing upwardly through the liquid discharge tube. A flow channeling subsystem is in communication with the airflow inlet and directs the pressurized airflow towards the inner wall of the pump casing to create a swirling airflow within the pump casing that extends along at least portions of the inner wall. The swirling airflow entrains fluid within the pump causing the fluid to move in a circumferential swirling fashion toward the second end of the pump casing, which helps to clean the inner wall of the pump casing.

4. 发明授权

US11508558B2 Thermal repeatability and in-situ showerhead temperature monitoring 有权
公开(公告)号：US11508558B2
公开(公告)日：2022-11-22
申请号：US16834814
申请日：2020-03-30
申请人： Applied Materials, Inc.
发明人： Timothy Joseph Franklin , Steven E. Babayan , Philip Allan Kraus
IPC分类号： H01J37/32 , B05B1/00 , B05B1/18 , B05B12/10 , H01L21/67
摘要： Embodiments described herein generally related to a substrate processing apparatus, and more specifically to an improved showerhead assembly for a substrate processing apparatus. The showerhead assembly includes a chill plate, a gas plate, and a gas distribution plate having a top surface and a bottom surface. A plurality of protruded features contacts the top surface of the gas distribution plate. A fastener and an energy storage structure is provided on the protruded features. The energy storage structure is compressed by the fastener and axially loads at least one of the protruded features to compress the chill plate, the gas plate and the gas distribution plate.

5. 发明授权

US11479957B2 Medicine delivery, wash, clean and air dry system 有权
公开(公告)号：US11479957B2
公开(公告)日：2022-10-25
申请号：US15588640
申请日：2017-05-06
申请人： Bemis Manufacturing Company
发明人： Brian Schwab , Shao-Yu Peng
IPC分类号： E03D9/08 , B05B15/70 , B05B1/00 , A61M3/02 , B05B15/656 , A47K10/48 , A47K13/24 , A61M3/06
摘要： The present disclosure provides a toilet seat assembly for delivering medicine, washing, cleaning, and drying a perineal region of a user. The toilet seat assembly includes a spraying nozzle assembly having one or more retractable spray nozzle units for delivering a liquid product, a drying nozzle assembly having one or more retractable drying nozzle units for drying the region, and a medicine delivery assembly for delivering a medicinal product to the region, the medicine delivery assembly having a medicine delivery nozzle connected to a medicine storage element containing the medicinal product.

6. 发明授权

US11476130B2 Substrate processing apparatus, substrate processing method, and storage medium 有权
公开(公告)号：US11476130B2
公开(公告)日：2022-10-18
申请号：US16805898
申请日：2020-03-02
申请人： Tokyo Electron Limited
发明人： Kotaro Tsurusaki , Koji Yamashita , Kazuya Koyama , Kouzou Kanagawa
IPC分类号： H01L21/67 , H01L21/687 , B05B1/00 , B05B13/02
摘要： A substrate processing apparatus includes a liquid processing tank, a movement mechanism, an ejector, and a controller. The liquid processing tank stores a processing liquid. The movement mechanism moves a plurality of substrates immersed in the liquid processing tank to a position above the liquid surface of the processing liquid. The ejector ejects a vapor of an organic solvent toward portions of the plurality of substrates that are exposed from the liquid surface. The controller changes an ejection flow rate of the vapor ejected by the ejector as the plurality of substrates are moved up.

7. 发明授权

US11465595B2 Automotive image sensor surface washing and drying system and method 有权
公开(公告)号：US11465595B2
公开(公告)日：2022-10-11
申请号：US16234748
申请日：2018-12-28
申请人： DLHBOWLES, INC.
发明人： Chunling Zhao , Shridhar Gopalan
IPC分类号： B60S1/56 , G02B27/00 , B05B1/00 , B05B1/04 , B08B5/02 , B60S1/52 , B60S1/54
摘要： The present disclosure relates to automated or remotely controlled methods and apparatuses for cleaning and drying soiled external 2-D or 3-D image sensor surfaces such as objective lenses on Light Detection and Ranging (“LIDAR”) sensors when mounted in a configuration that is exposed to dirty environments.

8. 发明授权

US11420217B2 Showerhead for ALD precursor delivery 有权
公开(公告)号：US11420217B2
公开(公告)日：2022-08-23
申请号：US16721724
申请日：2019-12-19
申请人： APPLIED MATERIALS, INC.
发明人： Muhannad Mustafa , Muhammad M. Rasheed
IPC分类号： C23C16/40 , B05B1/18 , B05B1/00 , C23C16/455 , C23C16/458 , H01L21/687
摘要： Embodiments of showerheads for use in a process chamber are provided herein. In some embodiments, a showerhead includes a first spiral channel extending from a central region to a peripheral region of the showerhead; a second spiral channel extending from a central region to a peripheral region of the showerhead, wherein the second spiral channel is interleaved with the first spiral channel and fluidly independent from the first spiral channel; a plurality of first channels extending from the first spiral channel to a plurality of first gas distribution holes on a lower surface of the showerhead, wherein each first channel is a singular channel extending at an angle; and a plurality of second channels extending from the second spiral channel to a plurality of second gas distribution holes on the lower surface of the showerhead, wherein each second channel is a singular channel extending at an angle.

9. 发明授权

US11415889B2 Chemical supply structure and a developing apparatus having the same 有权
公开(公告)号：US11415889B2
公开(公告)日：2022-08-16
申请号：US16445969
申请日：2019-06-19
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Jong-Keun Oh , Kyoung-Noh Kim , Man-Kyu Kang , Byung-Gook Kim
IPC分类号： G03G15/10 , G03F7/30 , B05B1/00 , B05C5/00 , H01L21/67 , B41J2/16 , G03F7/20 , G03F7/00 , G03F7/32 , B05B1/28 , B05C5/02 , B05C11/10 , H01L21/687
摘要： A chemical supply structure includes a bar-shaped body having a plurality of chemical reservoirs in which a plurality of chemicals is individually stored such that the body partially crosses an underlying substrate, a bar-shaped nozzle protruded from a bottom surface of the body and injecting injection chemicals onto the substrate, a plurality of the chemicals being mixed into the injection chemicals, and a hydrophobic unit arranged on the bottom surface of the body and on a side surface of the nozzle such that a mixed solution mixed with the injection chemicals is prevented from adhering to the bottom surface and the side surface by controlling a contact angle of the mixed solution with respect to the bottom surface and the side surface.

10. 发明申请

US20220205101A1 GAS SHOWERHEAD WITH CONTROLLABLE AIRFLOW DISTRIBUTION 有权
公开(公告)号：US20220205101A1
公开(公告)日：2022-06-30
申请号：US17564387
申请日：2021-12-29
申请人： Piotech Inc.
发明人： Zhenjie Liu , Xue Liu , Zhi Chai , Guangjie Qi
IPC分类号： C23C16/455 , B05B1/16 , B05B1/00
摘要： Provided is a gas showerhead with controllable airflow distribution, disposed in a cavity of a thin film deposition device and including: a first-layer panel, having a plurality of first gas supply holes distributed according to a first rule; and a second-layer panel, seated on the first-layer panel and having a plurality of second gas supply holes distributed according to a second rule. The first rule is different from the second rule, and one of the first-layer panel and the second-layer panel is capable of rotating at least by a specific angle relative to the other, so that the two panels have a first position and a second position that are different relative to each other. At the first position, none of the first gas supply holes is covered by the second-layer panel; and at the second position, a portion of the first gas supply holes are aligned with the corresponding second gas supply holes, and the other portion of the first gas supply holes are covered by the second-layer panel. The gas showerhead can adjust the airflow distribution and the airflow rate, which helps to meet the spraying requirements of different thin film deposition processes, and improves the uniformity of a deposited thin film.

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