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    • 1. 发明授权
    • Gas discharge laser light source beam delivery unit
    • 气体放电激光光源射束单元
    • US07190707B2
    • 2007-03-13
    • US10739961
    • 2003-12-17
    • Palash P. DasKhurshid AhmedGregory FrancisHolger GlatzelAlexei LukashevJeremy TylerR. Kyle Webb
    • Palash P. DasKhurshid AhmedGregory FrancisHolger GlatzelAlexei LukashevJeremy TylerR. Kyle Webb
    • H01S3/22
    • B23K26/12B23K26/128B23K26/705G01J1/04G01J1/0418G01J1/4257G01J2001/0285G03F7/70025G03F7/70041G03F7/7055G03F7/70575G03F7/70933H01S3/005H01S3/0057H01S3/0071H01S3/02H01S3/03H01S3/036H01S3/038H01S3/0385H01S3/0404H01S3/041H01S3/08004H01S3/08009H01S3/0943H01S3/097H01S3/09705H01S3/0971H01S3/0975H01S3/104H01S3/105H01S3/1305H01S3/134H01S3/139H01S3/22H01S3/2207H01S3/223H01S3/225H01S3/2251H01S3/2256H01S3/2258H01S3/2333H01S3/2366
    • A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery pat. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
    • 公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法,其可以包括:限定输出激光光脉冲束传送 从气体放电激光器的输出拍摄到使用包含在输出激光脉冲光束中的光的工作装置的输入; 可操作地连接到射束输送罩的清洗机构; 外壳内的原位波束参数监视和调节机构,包括可伸缩的豆重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构,并且可从所述外壳的外部操作,并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在外壳内的光束衰减器单元,其可调节地安装在外壳内用于定位在光束输送光点内。 BDU可以具有至少两个机壳隔离机构,该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构,所述第二外壳隔离机构与所述至少一个光学模块 每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。 可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。 可以提供外部运动学对准工具。 公开了一种用于BDU的污染控制方法,包括选择允许的材料和制造工艺。
    • 2. 发明申请
    • Gas discharge laser light source beam delivery unit
    • 气体放电激光光源射束单元
    • US20070160103A1
    • 2007-07-12
    • US11715082
    • 2007-03-06
    • Palash DasKhurshid AhmedGregory FrancisHolger GlatzelAlexei LukashevJeremy TylerR. Webb
    • Palash DasKhurshid AhmedGregory FrancisHolger GlatzelAlexei LukashevJeremy TylerR. Webb
    • H01S3/22
    • B23K26/12B23K26/128B23K26/705G01J1/04G01J1/0418G01J1/4257G01J2001/0285G03F7/70025G03F7/70041G03F7/7055G03F7/70575G03F7/70933H01S3/005H01S3/0057H01S3/0071H01S3/02H01S3/03H01S3/036H01S3/038H01S3/0385H01S3/0404H01S3/041H01S3/08004H01S3/08009H01S3/0943H01S3/097H01S3/09705H01S3/0971H01S3/0975H01S3/104H01S3/105H01S3/1305H01S3/134H01S3/139H01S3/22H01S3/2207H01S3/223H01S3/225H01S3/2251H01S3/2256H01S3/2258H01S3/2333H01S3/2366
    • A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
    • 公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法,其可以包括:限定输出激光束脉冲束传送 从气体放电激光器的输出到使用包含在输出激光脉冲光束中的光的工作装置的输入的路径; 可操作地连接到射束输送罩的清洗机构; 壳体内的原位光束参数监视和调节机构,包括可伸缩光束重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构,并且可从所述外壳的外部操作,并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在可调节地安装在外壳内的外壳内的光束衰减器单元,用于定位在光束输送路径内。 BDU可以具有至少两个机壳隔离机构,该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构,所述第二外壳隔离机构与所述至少一个光学模块 每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。 可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。 可以提供外部运动学对准工具。 公开了一种用于BDU的污染控制方法,包括选择允许的材料和制造工艺。
    • 3. 发明授权
    • Skin treatment system with time modulated laser pulses
    • 具有时间调制激光脉冲的皮肤处理系统
    • US08932278B2
    • 2015-01-13
    • US13199415
    • 2011-08-29
    • Nikolai TankovichAlexei Lukashev
    • Nikolai TankovichAlexei Lukashev
    • A61B18/20H01S3/113H01S3/067H01S3/16A61B18/00A61B18/22
    • A61B18/203A61B18/20A61B18/22A61B2018/00029A61B2018/00452A61B2018/00458A61B2018/2035A61B2018/208H01S3/0675H01S3/113H01S3/1608
    • A laser skin treatment process and system. The system includes features for producing a first laser beam of long pulse duration and a second laser beam of short pulse duration and a skin cooler for cooling the surface of a region of skin. The system is designed to utilize the first laser beam for heating a volume of skin tissue below the cooled surface region to a temperature to produce skin tissue modification but below skin tissue damage threshold. This volume of skin tissue is called a “thermal cavity”. The second laser beam is divided into a plurality of separate laser beams that are directed through separate optical fibers and via separate paths through skin tissue to a single tiny volume of skin tissue within the thermal cavity to produce in that tiny volume mechanical damage. This tiny volume is called an energy droplet. Thus tiny regions of tissue are damaged while minimizing or preventing any significant damage to adjacent tissue.
    • 激光皮肤治疗过程和系统。 该系统包括用于产生长脉冲持续时间的第一激光束和短脉冲持续时间的第二激光束以及用于冷却皮肤区域的表面的皮肤冷却器的特征。 该系统被设计为利用第一激光束将一定体积的冷却表面区域下方的皮肤组织加热至产生皮肤组织修饰但低于皮肤组织损伤阈值的温度。 这个体积的皮肤组织被称为“热腔”。 第二激光束被分成多个单独的激光束,其被引导通过分开的光纤并且经由穿过皮肤组织的单独路径到达热腔内的单个微小体积的皮肤组织以产生微小体积的机械损伤。 这个微小的体积被称为能量液滴。 因此,在最小化或防止对相邻组织的任何显着损伤的同时损坏组织的微小区域。
    • 8. 发明申请
    • Skin treatement system with time modulated laser pulses
    • 具有时间调制激光脉冲的皮肤处理系统
    • US20110313408A1
    • 2011-12-22
    • US13199415
    • 2011-08-29
    • Nikolai TankovichAlexei Lukashev
    • Nikolai TankovichAlexei Lukashev
    • A61B18/22A61B18/20
    • A61B18/203A61B18/20A61B18/22A61B2018/00029A61B2018/00452A61B2018/00458A61B2018/2035A61B2018/208H01S3/0675H01S3/113H01S3/1608
    • A laser skin treatment process and system. The system includes features for producing a first laser beam of long pulse duration and a second laser beam of short pulse duration and a skin cooler for cooling the surface of a region of skin. The system is designed to utilize the first laser beam for heating a volume of skin tissue below the cooled surface region to a temperature to produce skin tissue modification but below skin tissue damage threshold. This volume of skin tissue is called a “thermal cavity”. The second laser beam is divided into a plurality of separate laser beams that are directed through separate optical fibers and via separate paths through skin tissue to a single tiny volume of skin tissue within the thermal cavity to produce in that tiny volume mechanical damage. This tiny volume is called an energy droplet. Thus tiny regions of tissue are damaged while minimizing or preventing any significant damage to adjacent tissue.
    • 激光皮肤治疗过程和系统。 该系统包括用于产生长脉冲持续时间的第一激光束和短脉冲持续时间的第二激光束以及用于冷却皮肤区域的表面的皮肤冷却器的特征。 该系统被设计为利用第一激光束将一定体积的冷却表面区域下方的皮肤组织加热至产生皮肤组织修饰但低于皮肤组织损伤阈值的温度。 这个体积的皮肤组织被称为“热腔”。 第二激光束被分成多个单独的激光束,其被引导通过分开的光纤并且经由穿过皮肤组织的单独路径到达热腔内的单个微小体积的皮肤组织以产生微小体积的机械损伤。 这个微小的体积被称为能量液滴。 因此,在最小化或防止对相邻组织的任何显着损伤的同时损坏组织的微小区域。
    • 10. 发明申请
    • Method and apparatus for stabilizing optical dielectric coatings
    • 用于稳定光学介电涂层的方法和装置
    • US20050008789A1
    • 2005-01-13
    • US10608521
    • 2003-06-26
    • Robert RafacAlexei LukashevWeiman Zhang Kevin
    • Robert RafacAlexei LukashevWeiman Zhang Kevin
    • B05D3/06G02B1/10B05D3/00
    • G02B1/10B05D3/065
    • A method for stabilizing a multi-layered dielectric reflectivity coating subject to compaction/densification upon exposure to DUV or shorter wavelength light, is disclosed which may comprise: applying the reflectivity coating to a reflective surface forming a coating bulk on the surface; exposing the coating bulk to a pretreatment of a sufficient amount of DUV radiation to induce sufficient densification in enough of the coating bulk to inhibit subsequent densification during continued exposure to DUV or shorter wavelength radiation. The method may also comprise the pretreatment radiation exposure amounting to energy of at least the equivalent of about 2 Bp at 9 mJ per pulse. The method may also comprise the pretreatment radiation exposure amounting the energy being delivered in at about 3 KHz pulse repetition rate. The method may also comprise the pretreatment radiation exposure amounts to energy of at least the equivalent of 15-18 mJ per pulse delivered over about 700 M-1 B pulses, i.e., about 4 days at 3 Khz or 2-3 days at 4 Khz pulse rates.
    • 公开了一种用于在暴露于DUV或更短波长的光时进行压实/致密化的多层电介质反射率涂层的稳定化方法,其可以包括:将反射性涂层施加到在表面上形成涂层体积的反射表面; 将涂层体积暴露于足够量的DUV辐射的预处理以在足够的涂层体积下诱导足够的致密化,以在持续暴露于DUV或较短波长辐射期间抑制随后的致密化。 该方法还可以包括在9mJ /脉冲下达到至少等于约2Bp的能量的预处理辐射暴露。 该方法还可以包括预处理辐射照射量,以大约3KHz的脉冲重复频率输送能量。 该方法还可以包括预处理辐射暴露量等于在约700M-1B脉冲上递送的每脉冲至少相当于15-18mJ的能量,即在3KHz下约4天,在4KHz下2-3天 脉搏率。