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1. 发明申请

US20070160103A1 Gas discharge laser light source beam delivery unit 审中-公开
标题翻译：气体放电激光光源射束单元
公开(公告)号：US20070160103A1
公开(公告)日：2007-07-12
申请号：US11715082
申请日：2007-03-06
申请人： Palash Das , Khurshid Ahmed , Gregory Francis , Holger Glatzel , Alexei Lukashev , Jeremy Tyler , R. Webb
发明人： Palash Das , Khurshid Ahmed , Gregory Francis , Holger Glatzel , Alexei Lukashev , Jeremy Tyler , R. Webb
IPC分类号： H01S3/22
CPC分类号： B23K26/12 , B23K26/128 , B23K26/705 , G01J1/04 , G01J1/0418 , G01J1/4257 , G01J2001/0285 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery path from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable beam redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery path. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
摘要翻译：公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光束脉冲束传送从气体放电激光器的输出到使用包含在输出激光脉冲光束中的光的工作装置的输入的路径; 可操作地连接到射束输送罩的清洗机构; 壳体内的原位光束参数监视和调节机构，包括可伸缩光束重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在可调节地安装在外壳内的外壳内的光束衰减器单元，用于定位在光束输送路径内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。可以提供外部运动学对准工具。公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

2. 发明授权

US07190707B2 Gas discharge laser light source beam delivery unit 有权
标题翻译：气体放电激光光源射束单元
公开(公告)号：US07190707B2
公开(公告)日：2007-03-13
申请号：US10739961
申请日：2003-12-17
申请人： Palash P. Das , Khurshid Ahmed , Gregory Francis , Holger Glatzel , Alexei Lukashev , Jeremy Tyler , R. Kyle Webb
发明人： Palash P. Das , Khurshid Ahmed , Gregory Francis , Holger Glatzel , Alexei Lukashev , Jeremy Tyler , R. Kyle Webb
IPC分类号： H01S3/22
CPC分类号： B23K26/12 , B23K26/128 , B23K26/705 , G01J1/04 , G01J1/0418 , G01J1/4257 , G01J2001/0285 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/0943 , H01S3/097 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser light pulse beam delivery pat from an output of a gas discharge laser to an input of a working apparatus employing the light contained in the output laser light pulse beam; a purge mechanism operatively connected to the beam delivery enclosure; an in-situ beam parameter monitor and adjustment mechanism within the enclosure, comprising a retractable bean redirecting optic; a beam analysis mechanism external to the enclosure; and, a retraction mechanism within the enclosure and operable from outside the enclosure and operative to move the retractable beam redirecting optic from a retracted position out of the beam path to an operative position in the beam path. The BDU may also include a beam attenuator unit contained within the enclosure adjustably mounted within the enclosure for positioning within the beam delivery pat. The BDU may have at least two enclosure isolation mechanisms comprising a first enclosure isolation mechanism on a first side of the enclosure from the at least one optic module and a second enclosure isolation mechanism on a second side of the enclosure from the at least one optic module, each respective enclosure isolation mechanism comprising a flapper valve having a metal to metal seating mechanism and a locking pin assembly. A precision offset ratchet driver operative to manipulate actuator mechanisms in difficult to reach locations may be provided. An external kinematic alignment tool may be provided. A method of contamination control for a BDU is disclosed comprising selection of allowable materials and fabrication processes.
摘要翻译：公开了一种束传递单元和从DUV和较小波长的准分子或分子氟气体放电激光系统的激光光源传送激光束的方法，其可以包括：限定输出激光光脉冲束传送从气体放电激光器的输出拍摄到使用包含在输出激光脉冲光束中的光的工作装置的输入; 可操作地连接到射束输送罩的清洗机构; 外壳内的原位波束参数监视和调节机构，包括可伸缩的豆重定向光学元件; 外壳外部的光束分析机构; 以及在所述外壳内的收缩机构，并且可从所述外壳的外部操作，并且可操作地将所述可伸缩的束重定向光学器件从缩回位置移出所述光束路径到所述光束路径中的操作位置。 BDU还可以包括容纳在外壳内的光束衰减器单元，其可调节地安装在外壳内用于定位在光束输送光点内。 BDU可以具有至少两个机壳隔离机构，该机构包括位于外壳的第一侧面上的至少一个光学模块的第一外壳隔离机构和位于外壳的第二侧的第二外壳隔离机构，所述第二外壳隔离机构与所述至少一个光学模块每个相应的外壳隔离机构包括具有金属对金属安置机构和锁销组件的挡板阀。可以提供操作来操作难以到达位置的致动器机构的精密偏移棘轮驱动器。可以提供外部运动学对准工具。公开了一种用于BDU的污染控制方法，包括选择允许的材料和制造工艺。

3. 发明授权

US07139301B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US07139301B2
公开(公告)日：2006-11-21
申请号：US10701280
申请日：2003-11-03
申请人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
发明人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
IPC分类号： H01S3/22
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

4. 发明授权

US06671294B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US06671294B2
公开(公告)日：2003-12-30
申请号：US09918773
申请日：2001-07-27
申请人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
发明人： Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , Palash P. Das , Richard L. Sandstrom , John M. Algots , Khurshid Ahmed
IPC分类号： H01S310
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

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