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    • 4. 发明授权
    • Permanent organosilicon compounds, their preparation and use
    • 永久性有机硅化合物,其制备和用途
    • US5998562A
    • 1999-12-07
    • US888934
    • 1997-07-07
    • Guenter MahrJochen DauthBernward DeubzerMonika OttPetra GratzlHans Lautenschlager
    • Guenter MahrJochen DauthBernward DeubzerMonika OttPetra GratzlHans Lautenschlager
    • C14C11/00C07F7/10C07F7/18C08G77/10C08G77/26C08G77/388C08G77/54D06M15/643C08G77/08
    • C08G77/388C08G77/54Y10S8/01
    • The present invention relates to triazine-containing organosilicon compounds having units of the formulaA.sub.a R.sub.b X.sub.c SiO.sub.(4-a-b-c)/2 (I),whereR is identical or different and denotes a hydrogen atom or a monovalent substituted or unsubstituted hydrocarbon radical, having 1 to 26 carbon atoms, preferably 1 to 18 per radical,X is identical or different and is a halogen atom, a chlorine atom or a radical of the formula --OR.sup.1, where R.sup.1 denotes an alkyl radical, having 1 to 18 carbon atoms, preferably 1 to 8 per radical and which may be substituted by an ether oxygen atom,a is 0 or 1, preferably 0.01-0.5b is 0, 1, 2 or 3, preferably 0.5-3.0c is 0, 1, 2 or 3, preferably 0.0-2.0 and the sum a+b+c.ltoreq.4, preferably 0.1-3.5, andA is a radical of the formula ##STR1## where R.sup.2 is an unbranched or branched, optionally substituted alkylene radical, having 1 to 18, preferably 1 to 12, carbon atoms,Y is identical or different and denotes a hydrogen atom or an unbranched or branched alkyl radical, having 1 to 12, preferably 1 to 8, carbon atoms or denotes a radical of the formula --OR.sup.1, where R.sup.1 has the meaning given above, andZ is identical or different and denotes X, --NR.sub.2, --(O)CR or --SR, where X and R have the meanings given above with the proviso that at least one radical A containing at least one halogen atom, preferably a chlorine atom, is present per polymer molecule.
    • 本发明涉及具有式AaRbXcSiO(4-abc)/ 2(I)单元的含三嗪的有机硅化合物,其中R相同或不同,表示氢原子或一价取代或未取代的烃基,其具有1至 26个碳原子,优选1至18个基团,X相同或不同,为卤素原子,氯原子或式-OR1基团,其中R1表示具有1至18个碳原子的烷基,优选1 至8个,并且可被醚氧原子取代,a为0或1,优选为0.01-0.5b为0,1,2或3,优选0.5-3.0c为0,1,2或3,优选为 总和a + b + c 4,优选0.1-3.5,A是下式的基团,其中R 2是无支链或支链的任选取代的亚烷基,其具有1至18,优选1至 12,碳原子,Y相同或不同,表示氢原子或无支链或支链烷基,具有1至12个, 优选为1〜8个碳原子,或表示式-OR1的基团,其中R1具有上述含义,Z相同或不同,表示X,-NR2, - (O)CR或-SR,其中X和 R具有上述含义,条件是每个聚合物分子存在至少一个含有至少一个卤素原子,优选氯原子的基团A.
    • 5. 发明授权
    • Thermoplastic silicone block copolymers, the production thereof and the use of the same
    • 热塑性硅酮嵌段共聚物,其生产方法及其用途
    • US06824881B2
    • 2004-11-30
    • US10451594
    • 2003-06-23
    • Hans LautenschlagerJochen DauthWolfgang KellerTheo MayerKurt Stark
    • Hans LautenschlagerJochen DauthWolfgang KellerTheo MayerKurt Stark
    • B32B2732
    • C08G77/52C08G77/38C08G77/442C09D183/10Y10T428/31663Y10T428/31855
    • Thermoplastic silicon block copolymers containing (A) a hard segment polymer constituent prepared from styrene, methylmethacrylate, butylacrylate, acrylonitrile, vinyl monomers, or mixtures therefore, and (B) a soft segment polymer constituent of general formula (I) G-[(SiR2O)mSiR2—X—]n(SiR2O)mSiR2-G wherein R is an optionally halogenated monovalent C1-18 hydrocarbon radical and X is a specific aryl group-containing, silicon bonded radical, and each G may be a radical (A)-Z-(Si) or Z′-(Si) wherein -Z- represents an aryl group-containing bivalent radical and Z′- represents a monovalent aryl group-containing radical, provided that there is, at most, one radical G and one radical Z′- in formula (I). In formula (I), m represents a whole number between 1 and 1000 and n represents 0 or a whole number between 1 and 20, provided that when n does not equal 0, 4≦n·m≦1000.
    • 含有(A)由苯乙烯,甲基丙烯酸甲酯,丙烯酸丁酯,丙烯腈,乙烯基单体或其混合物制备的硬链段聚合物组分的热塑性硅嵌段共聚物,和(B)通式(I)的软链段聚合物组分G - [(SiR 2 O )mSiR 2 -X-n(SiR 2 O)m SiR 2 -G其中R是任选卤代的一价C 1-18烃基,X是特定的含芳基的硅键合基团,并且每个G可以是基团(A) - Z-(Si)或Z' - (Si)其中-Z-表示含芳基的二价基团,Z'表示含单价芳基的基团,条件是至多存在一个基团G和一个 式(I)中的基团Z'-。 在式(I)中,m表示1与1000之间的整数,n表示0或1至20之间的整数,条件是当n不等于0时,4 <= n.m <= 1000。
    • 9. 发明授权
    • Radiation-curing or heat-curing organosiloxane compositions containing
(methyl) styrene groups
    • 含有(甲基)苯乙烯基团的辐射固化或热固化有机硅氧烷组合物
    • US6068929A
    • 2000-05-30
    • US72211
    • 1998-05-04
    • Jochen DauthJosef WolfersederBernward Deubzer
    • Jochen DauthJosef WolfersederBernward Deubzer
    • C08F299/08C08F290/14C08G77/38C08G77/46C08G77/50C08L83/07C09D155/00C09D183/07C09D183/12C09D183/14C08F283/12B32B27/00
    • C09D183/12C08G77/46C08G77/50C09D183/14
    • Novel organosiloxane compositions which contain (methyl)styrene groups and can be prepared on the basis ofA) oligomeric or polymeric organosilicon compounds comprising at least one unit of the formulaGR.sub.c SiO.sub.(4-c-1)/2 (I)or at least one unit of the formula (I) and at least one unit of the formulaO.sub.(4-c-1)/2) R.sub.c Si--G.sup.1 --R.sub.c SiO.sub.(4-c-1)/2(II)B) monomeric alkenyloxy compounds, maleates, fumarates, maleimides, (meth)acrylates, (methyl)styrenes, acrylamides, itaconic esters and/or oligomeric or polymeric organosilicon compounds containing on average more than one alkenyloxy, maleate, fumarate, maleimide or (meth)acrylate group, where R are identical or different hydrocarbon radicals which may be halogenated or unhalogenated or a radical of the formula--R.sup.1 --[OCH.sub.2 CH.sub.2 ].sub.o --[OCH(CH.sub.3)CH.sub.2 ].sub.p --[O(CH.sub.2).sub.4 ].sub.q --OR.sup.2,whereR.sup.1 is a linear or branched alkylene radical,R.sup.2 is a hydrogen atom, an alkyl radical or a radical of the formula --CO--R.sup.3, where R.sup.3 is an alkyl radical,G is a radical of the formula (IV) --R.sup.4 -(phenyl) which is substituted by [--Y.sub.(5-d) ] and (--R.sup.5.sub.d), with the proviso that at least one radical R.sup.5 is present andG.sup.1 is a radical of the formula (V) --(phenyl)-(R.sup.4).sub.d -- which is substituted by [--Y.sub.4-d ], whereR.sup.4 is a linear or branched, substituted or unsubstituted alkylene radical,R.sup.5 is a vinyl radical or isopropenyl radical,Y can be identical or different and each Y is a hydrogen atom or is as defined for R, or is a radical of the formula --OR.sup.6, whereR.sup.6 is a C.sub.1-8 alkyl radical optionally interrupted by an ether oxygen atom, andc is 0, 1 or 2, on average from 0.0 to 2.0,d is 1, 2 or 3,o is 0 or an integer from 1 to 100,p is 0 or an integer from 1 to 100, andq is 0 or an integer from 1 to 100, with the proviso that the sum o+p+q is >0.
    • 含有(甲基)苯乙烯基团的新型有机硅氧烷组合物并且可以基于A)包含至少一种式GRcO(4-c-1)/ 2(I)单元的低聚或聚合有机硅化合物或至少一个单元 (4-c-1)/ 2)RcSi-G1-RcSiO(4-c-1)/ 2(II)B)单体链烯氧基化合物,马来酸酯,富马酸酯的至少一个单元 ,马来酰亚胺,(甲基)丙烯酸酯,(甲基)苯乙烯,丙烯酰胺,衣康酸酯和/或低聚或聚合的有机硅化合物,其平均含有多于一个烯氧基,马来酸酯,富马酸酯,马来酰亚胺或(甲基)丙烯酸酯基团,其中R相同或 可以被卤化或未卤化的不同烃基或式-R1- [OCH2CH2] o- [OCH(CH3)CH2]对 - [O(CH2)4] q-OR2的基团,其中R1是直链或支链 亚烷基,R2是氢原子,烷基或式-CO-R3的基团,其中R3是烷基,G是式(IV)-R4-(苯基) h被[-Y(5-d)]和(-R5d)取代,条件是存在至少一个基团R 5,并且G 1是式(Ⅴ) - (苯基) - (R 4)d - 被[-Y4-d]取代,其中R4是直链或支链的取代或未取代的亚烷基,R5是乙烯基或异丙烯基,Y可以相同或不同,并且每个Y是氢原子或是 如R所定义,或者是式-OR 6的基团,其中R 6是任选被醚氧原子中断的C 1-8烷基,c是0,1或2,平均为0.0至2.0,d为 1,2或3,o为0或1〜100的整数,p为0或1〜100的整数,q为0或1〜100的整数,条件是+ o + p + q是> 0。
    • 10. 发明授权
    • Hydrophilic permanent organosilicon compounds
    • 亲水性永久性有机硅化合物
    • US6043362A
    • 2000-03-28
    • US888557
    • 1997-07-07
    • Jochen DauthGuenter MahrBernward DeubzerPetra GratzlHans-Juergen Lautenschlager
    • Jochen DauthGuenter MahrBernward DeubzerPetra GratzlHans-Juergen Lautenschlager
    • C07F7/10C07F7/18C08G77/10C08G77/26C08G77/388C08G77/46D06M13/02D06M13/148D06M13/322D06M13/35D06M13/355D06M13/358D06M13/364D06M13/50D06M13/51D06M13/513C07D47/00
    • C08G77/388C08G77/26C08G77/46
    • The invention relates to oxyalkylene-group-containing organosilicon compounds having units of the formula ##STR1## where R is identical or different, and denotes a monovalent halogenated or nonhalogenated hydrocarbon radical, X is identical or different and is a chlorine atom or a radical of the formula --OR.sup.1, where R.sup.1 denotes an alkyl radical which can be substituted by an ether oxygen atom,a is 0 or 1,b is 0, 1, 2 or 3,c is 0, 1, 2 or 3 and the total a+b+c.ltoreq.4 andA is a radical of the formula ##STR2## where R.sup.2 signifies an unbranched or branched substituted or unsubstituted divalent hydrocarbon radical, which may or may not contain ether, amine, sulfide, ester, amide, carbonate, urea and urethane groups, B is identical or different, and denotes X, --NR.sub.2.sup.1, --O--C(.dbd.O)--R.sup.1, --SR.sup.1 or a radical of the formula--NR.sup.3 R.sup.2 [O--CH(CH.sub.3)--CH.sub.2 ].sub.d [OCH.sub.2 CH.sub.2 ].sub.e [O(CH.sub.2).sub.4 ].sub.f OR.sup.4 (III),where X, R.sup.1 and R.sup.2 have the meanings given for these above, R.sup.3 is identical or different and is a hydrogen atom or has the meaning of R, R.sup.4 has the meaning of R.sup.3 or signifies a radical of the formula--C(.dbd.O)--R, --R.sup.2 NR.sub.2.sup.3, --NR.sup.3 R.sup.2 --, --R.sup.2 NR.sub.2.sup.3 H.sup.+ X.sup.-,d, e and f are an integer from 0 to 200, with the proviso that the sum d+e+f.gtoreq.1 and B contains at least one radical of the formula (III) per polymer molecule.
    • 本发明涉及具有下式的单元的含氧化烯基的有机硅化合物,其中R相同或不同,表示一价卤代或非卤代烃基,X相同或不同,为氯原子或式 - OR1,其中R1表示可被醚氧原子取代的烷基,a为0或1,b为0,1,2或3,c为0,1,2或3,总计a + b + C 4和A是下式的基团,其中R 2表示无支链或支链的取代或未取代的二价烃基,其可以含有或不含有醚,胺,硫醚,酯,酰胺,碳酸酯,脲和氨基甲酸酯基团, B表示相同或不同的表示X,-NR 21,-OC(= O)-R 1,-SR 1或-NR 3 R 2基团的基团[O-CH(CH 3)-CH 2] d [OCH 2 CH 2] CH 2)4] fOR 4(III),其中X,R 1和R 2具有上述含义,R 3相同或不同,为氢原子或具有R的含义,R 4具有平均 或表示式-C(= O)-R,-R2NR23,-NR3R2-,-R2NR23H + X,D,e和f的基团为0至200的整数,条件是 总和d + e + f> / = 1,B包含每个聚合物分子中至少一个式(III)的基团。