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    • 2. 发明授权
    • Radiation-curing or heat-curing organosiloxane compositions containing
(methyl) styrene groups
    • 含有(甲基)苯乙烯基团的辐射固化或热固化有机硅氧烷组合物
    • US6068929A
    • 2000-05-30
    • US72211
    • 1998-05-04
    • Jochen DauthJosef WolfersederBernward Deubzer
    • Jochen DauthJosef WolfersederBernward Deubzer
    • C08F299/08C08F290/14C08G77/38C08G77/46C08G77/50C08L83/07C09D155/00C09D183/07C09D183/12C09D183/14C08F283/12B32B27/00
    • C09D183/12C08G77/46C08G77/50C09D183/14
    • Novel organosiloxane compositions which contain (methyl)styrene groups and can be prepared on the basis ofA) oligomeric or polymeric organosilicon compounds comprising at least one unit of the formulaGR.sub.c SiO.sub.(4-c-1)/2 (I)or at least one unit of the formula (I) and at least one unit of the formulaO.sub.(4-c-1)/2) R.sub.c Si--G.sup.1 --R.sub.c SiO.sub.(4-c-1)/2(II)B) monomeric alkenyloxy compounds, maleates, fumarates, maleimides, (meth)acrylates, (methyl)styrenes, acrylamides, itaconic esters and/or oligomeric or polymeric organosilicon compounds containing on average more than one alkenyloxy, maleate, fumarate, maleimide or (meth)acrylate group, where R are identical or different hydrocarbon radicals which may be halogenated or unhalogenated or a radical of the formula--R.sup.1 --[OCH.sub.2 CH.sub.2 ].sub.o --[OCH(CH.sub.3)CH.sub.2 ].sub.p --[O(CH.sub.2).sub.4 ].sub.q --OR.sup.2,whereR.sup.1 is a linear or branched alkylene radical,R.sup.2 is a hydrogen atom, an alkyl radical or a radical of the formula --CO--R.sup.3, where R.sup.3 is an alkyl radical,G is a radical of the formula (IV) --R.sup.4 -(phenyl) which is substituted by [--Y.sub.(5-d) ] and (--R.sup.5.sub.d), with the proviso that at least one radical R.sup.5 is present andG.sup.1 is a radical of the formula (V) --(phenyl)-(R.sup.4).sub.d -- which is substituted by [--Y.sub.4-d ], whereR.sup.4 is a linear or branched, substituted or unsubstituted alkylene radical,R.sup.5 is a vinyl radical or isopropenyl radical,Y can be identical or different and each Y is a hydrogen atom or is as defined for R, or is a radical of the formula --OR.sup.6, whereR.sup.6 is a C.sub.1-8 alkyl radical optionally interrupted by an ether oxygen atom, andc is 0, 1 or 2, on average from 0.0 to 2.0,d is 1, 2 or 3,o is 0 or an integer from 1 to 100,p is 0 or an integer from 1 to 100, andq is 0 or an integer from 1 to 100, with the proviso that the sum o+p+q is >0.
    • 含有(甲基)苯乙烯基团的新型有机硅氧烷组合物并且可以基于A)包含至少一种式GRcO(4-c-1)/ 2(I)单元的低聚或聚合有机硅化合物或至少一个单元 (4-c-1)/ 2)RcSi-G1-RcSiO(4-c-1)/ 2(II)B)单体链烯氧基化合物,马来酸酯,富马酸酯的至少一个单元 ,马来酰亚胺,(甲基)丙烯酸酯,(甲基)苯乙烯,丙烯酰胺,衣康酸酯和/或低聚或聚合的有机硅化合物,其平均含有多于一个烯氧基,马来酸酯,富马酸酯,马来酰亚胺或(甲基)丙烯酸酯基团,其中R相同或 可以被卤化或未卤化的不同烃基或式-R1- [OCH2CH2] o- [OCH(CH3)CH2]对 - [O(CH2)4] q-OR2的基团,其中R1是直链或支链 亚烷基,R2是氢原子,烷基或式-CO-R3的基团,其中R3是烷基,G是式(IV)-R4-(苯基) h被[-Y(5-d)]和(-R5d)取代,条件是存在至少一个基团R 5,并且G 1是式(Ⅴ) - (苯基) - (R 4)d - 被[-Y4-d]取代,其中R4是直链或支链的取代或未取代的亚烷基,R5是乙烯基或异丙烯基,Y可以相同或不同,并且每个Y是氢原子或是 如R所定义,或者是式-OR 6的基团,其中R 6是任选被醚氧原子中断的C 1-8烷基,c是0,1或2,平均为0.0至2.0,d为 1,2或3,o为0或1〜100的整数,p为0或1〜100的整数,q为0或1〜100的整数,条件是+ o + p + q是> 0。
    • 3. 发明授权
    • Process for preparing organosilicon compounds containing (meth)acryloxy
groups
    • 制备含有(甲基)丙烯酰氧基的有机硅化合物的方法
    • US5869726A
    • 1999-02-09
    • US931723
    • 1997-09-16
    • Jochen DauthBernward DeubzerPetra GratzlJosef Wolferseder
    • Jochen DauthBernward DeubzerPetra GratzlJosef Wolferseder
    • C08G77/12C08G77/20C08G77/38C09D183/06C09D183/07C07F7/08
    • C09D183/06C08G77/38
    • A novel process for preparing organosilicon compounds containing (meth)acxyloxy groups is described, in which alkoxylated alk-2-yne 1,4-di(meth)acrylates (1) of the formula ##STR1## where R.sup.2 is a hydrogen atom or a methyl radical,R.sup.3 is a linear or branched alkylene radical having from 1 to 6 carbon atoms per radical andR.sub.4 is a linear or branched alkylene radical having from 1 to 6 carbon atoms per radical, andz is an integer from 1 to 12,are reacted with organosilicon compounds (2) comprising units of the formula ##STR2## where R is an identical or different monovalent, optionally halogenated hydrocarbon radical having from 1 to 18 carbon atoms per radical, ande is 0 or 1, on average from 0.01 to 1.0,f is 0, 1, 2 or 3, on average from 0.0 to 3.0, andhaving at least one Si-bonded hydrogen atom per molecule in the presence of catalysts (3) which promote the addition Si-bonded hydrogen onto aliphatic multiple bonds and also in the presence of polymerization inhibitors (4), where alkoxylated alk-2-yne 1,4-di(meth)acrylates (1) are used in amounts of from 1.01 to 1.5 mole per gram atom of Si-bonded hydrogen in organosilicon compound (2).
    • 描述了制备含有(甲基)丙氧基的有机硅化合物的新方法,其中式(II)的烷氧基​​化烷基-2-炔基1,4-二(甲基)丙烯酸酯(1)其中R2是氢 原子或甲基,R3是每个基团具有1至6个碳原子的直链或支链亚烷基,R4是每个基团具有1至6个碳原子的直链或支链亚烷基,z是1至 12与包含式(III)的单元的有机硅化合物(2)反应,其中R是相对或不同的每个基团具有1至18个碳原子的单价,任选卤代烃基,e是0或1 平均为0.01〜1.0,f为0,1,2或3,平均为0.0〜3.0,在催化剂(3)的存在下,每分子具有至少一个Si键合的氢原子,促进Si的添加 键合的氢键到脂族多重键上,并且在聚合抑制剂的存在下(4), 其中烷氧基化的烷基-2-炔1,4-二(甲基)丙烯酸酯(1)的用量为有机硅化合物(2)中每克原子的Si键合氢的1.01至1.5摩尔。
    • 4. 发明授权
    • Organosilicon compounds having fluorescent groups, their preparation and
use
    • 具有荧光基团的有机硅化合物,其制备和用途
    • US6160149A
    • 2000-12-12
    • US150888
    • 1998-09-10
    • Jochen DauthBernward DeubzerJosef Wolferseder
    • Jochen DauthBernward DeubzerJosef Wolferseder
    • G01N21/91C07F7/08C07F7/10C07F7/18C08F299/08C08G77/20C08G77/38C08G77/388C08G77/392C08J3/24C08L83/07C09B69/10C09D5/00C09D5/22C09D183/07C09D183/08C09K11/00C09K11/06
    • C08G77/388C08G77/392C09D183/08
    • The invention describes novel organosilicon compounds having fluorescent groups, containing units of the formula ##EQU1## where R is an identical or different, a monovalent, optionally substituted hydrocarbon radical having from 1 to 18 carbon atom(s) per radical, which may be interrupted by one or more oxygen atom(s),X is identical or different, and is a chlorine atom or a radical of the formula OR.sup.1,whereR.sup.1 is a hydrogen atom, or an alkyl radical having from 1 to 8 carbon atom(s) per radical which may be substituted by an ether oxygen atom,E is an organic radical having one or more (meth)acrylate groups,A is a radical of the formula--R.sup.2 [--NR.sup.3 --L].sub.x or --R.sup.2 [--S--L].sub.x(II),whereR.sup.2 is a divalent or trivalent, optionally substituted hydrocarbon radical having from 2 to 50 carbon atoms per radical, which is substituted by one or more groups of the formulae ##STR1## x is 1 or 2, R.sup.3 is as defined for R.sup.1 or is a radical of the formula --C(.dbd.O)--R.sup.1, andL is a fluorescent, organic radical,a is 0, 1 or 2, b is 0, 1, 2 or 3, c is 0, 1, 2 or 3, d is 0, 1 or 2 and the sum a+b+c+d.ltoreq.4,with the proviso that at least one radical A is present per molecule.
    • 本发明描述了具有荧光基团的新型有机硅化合物,其含有下式的单元,其中R是相同或不同的,每个基团具有1至18个碳原子的单价任选取代的烃基,其可被一个或多个 更多的氧原子,X是相同或不同的,并且是氯原子或式OR1的基团,其中R1是氢原子或每个基团具有1至8个碳原子的烷基,其中 可以被醚氧原子取代,E是具有一个或多个(甲基)丙烯酸酯基团的有机基团,A是式-R 2 [-NR 3 -L] x或-R 2 [-SL] x(II ),其中R 2是每个基团具有2至50个碳原子的二价或三价任选取代的烃基,其被一个或多个式x所代表的基团取代为1或2,R 3如对R 1所定义或是 式-C(= O)-R1的基团,L是荧光的有机基团,a是0,1或2,b是0,1或2, 2或3,c是0,1,2或3,d是0,1或2,并且和a + b + c + d 4,条件是每个分子存在至少一个基团A.
    • 8. 发明授权
    • Permanent organosilicon compounds, their preparation and use
    • 永久性有机硅化合物,其制备和用途
    • US5998562A
    • 1999-12-07
    • US888934
    • 1997-07-07
    • Guenter MahrJochen DauthBernward DeubzerMonika OttPetra GratzlHans Lautenschlager
    • Guenter MahrJochen DauthBernward DeubzerMonika OttPetra GratzlHans Lautenschlager
    • C14C11/00C07F7/10C07F7/18C08G77/10C08G77/26C08G77/388C08G77/54D06M15/643C08G77/08
    • C08G77/388C08G77/54Y10S8/01
    • The present invention relates to triazine-containing organosilicon compounds having units of the formulaA.sub.a R.sub.b X.sub.c SiO.sub.(4-a-b-c)/2 (I),whereR is identical or different and denotes a hydrogen atom or a monovalent substituted or unsubstituted hydrocarbon radical, having 1 to 26 carbon atoms, preferably 1 to 18 per radical,X is identical or different and is a halogen atom, a chlorine atom or a radical of the formula --OR.sup.1, where R.sup.1 denotes an alkyl radical, having 1 to 18 carbon atoms, preferably 1 to 8 per radical and which may be substituted by an ether oxygen atom,a is 0 or 1, preferably 0.01-0.5b is 0, 1, 2 or 3, preferably 0.5-3.0c is 0, 1, 2 or 3, preferably 0.0-2.0 and the sum a+b+c.ltoreq.4, preferably 0.1-3.5, andA is a radical of the formula ##STR1## where R.sup.2 is an unbranched or branched, optionally substituted alkylene radical, having 1 to 18, preferably 1 to 12, carbon atoms,Y is identical or different and denotes a hydrogen atom or an unbranched or branched alkyl radical, having 1 to 12, preferably 1 to 8, carbon atoms or denotes a radical of the formula --OR.sup.1, where R.sup.1 has the meaning given above, andZ is identical or different and denotes X, --NR.sub.2, --(O)CR or --SR, where X and R have the meanings given above with the proviso that at least one radical A containing at least one halogen atom, preferably a chlorine atom, is present per polymer molecule.
    • 本发明涉及具有式AaRbXcSiO(4-abc)/ 2(I)单元的含三嗪的有机硅化合物,其中R相同或不同,表示氢原子或一价取代或未取代的烃基,其具有1至 26个碳原子,优选1至18个基团,X相同或不同,为卤素原子,氯原子或式-OR1基团,其中R1表示具有1至18个碳原子的烷基,优选1 至8个,并且可被醚氧原子取代,a为0或1,优选为0.01-0.5b为0,1,2或3,优选0.5-3.0c为0,1,2或3,优选为 总和a + b + c 4,优选0.1-3.5,A是下式的基团,其中R 2是无支链或支链的任选取代的亚烷基,其具有1至18,优选1至 12,碳原子,Y相同或不同,表示氢原子或无支链或支链烷基,具有1至12个, 优选为1〜8个碳原子,或表示式-OR1的基团,其中R1具有上述含义,Z相同或不同,表示X,-NR2, - (O)CR或-SR,其中X和 R具有上述含义,条件是每个聚合物分子存在至少一个含有至少一个卤素原子,优选氯原子的基团A.