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1. 发明申请

US20120292506A1 SAMPLE OBSERVATION METHOD USING ELECTRON BEAMS AND ELECTRON MICROSCOPE 审中-公开
标题翻译：使用电子束和电子显微镜的样品观察方法
公开(公告)号：US20120292506A1
公开(公告)日：2012-11-22
申请号：US13508774
申请日：2010-11-08
申请人： Natsuki Tsuno , Hiroshi Makino , Makoto Suzuki , Yusuke Ominami
发明人： Natsuki Tsuno , Hiroshi Makino , Makoto Suzuki , Yusuke Ominami
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J2237/0048 , H01J2237/206 , H01J2237/24564
摘要： A disclosed method for observing the structure and characteristics of a specimen by an electron microscope realizes high-density charge accumulation on a specimen and improves the quality of voltage contrast images. For structural observation of a specimen and evaluation of its electrical characteristic using an electron beam, charging the specimen is performed. In this charging process, high-density charge accumulation on the specimen is achieved by irradiating the specimen with an electron beam set to have injection energy that falls within an injection energy band for which high charging efficiency is attained during electron beam irradiation and changing irradiation energy, while maintaining the injection energy.
摘要翻译：通过电子显微镜观察样品的结构和特性的公开方法实现了样品上的高密度电荷累积，并提高了电压对比度图像的质量。对于样品的结构观察和使用电子束评估其电特性，对样品进行充电。在该充电过程中，通过用电子束照射样品来实现样品上的高密度电荷积累，该电子束设定为具有落入在电子束照射期间获得高充电效率的注入能带内的注入能量并且改变照射能量同时保持注射能量。

2. 发明申请

US20110278452A1 PATTERN CHECK DEVICE AND PATTERN CHECK METHOD 有权
标题翻译：图案检查装置和图案检查方法
公开(公告)号：US20110278452A1
公开(公告)日：2011-11-17
申请号：US13129201
申请日：2009-10-15
申请人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
发明人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
IPC分类号： H01J37/26 , H01J37/285
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/0048 , H01J2237/2008 , H01J2237/24564 , H01J2237/2817 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.
摘要翻译：提供了一种图案检查装置，包括：电荷形成装置，其通过从不同于电子源（I）的第二电子源（20）产生电子束，在基板（7）的表面上形成电荷，电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。还提供了使用图案检查装置的图案检查方法。因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。然后，检查结果反馈给操作。这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

3. 发明授权

US08421008B2 Pattern check device and pattern check method 有权
标题翻译：图案检查装置和图案检查方法
公开(公告)号：US08421008B2
公开(公告)日：2013-04-16
申请号：US13129201
申请日：2009-10-15
申请人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
发明人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
IPC分类号： H01J37/26 , H01J37/304 , G01N23/00
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/0048 , H01J2237/2008 , H01J2237/24564 , H01J2237/2817 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (1) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.
摘要翻译：提供了一种图案检查装置，其包括：电荷形成装置，其通过从不同于电子源的电子源（1）产生来自第二电子源（20）的电子束，从而在基板（7）的表面上形成电荷，电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。还提供了使用图案检查装置的图案检查方法。因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。然后，检查结果反馈给操作。这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

4. 发明申请

US20140151553A1 CHARGED PARTICLE BEAM DEVICE, METHOD FOR ADJUSTING CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR INSPECTING OR OBSERVING SAMPLE 有权
标题翻译：充电颗粒光束装置，用于调整充电颗粒光束装置的方法，以及用于检查或观察样品的方法
公开(公告)号：US20140151553A1
公开(公告)日：2014-06-05
申请号：US14235892
申请日：2012-07-04
申请人： Yusuke Ominami , Tomohisa Ohtaki , Sukehiro Ito
发明人： Yusuke Ominami , Tomohisa Ohtaki , Sukehiro Ito
IPC分类号： H01J37/06
CPC分类号： H01J37/18 , H01J37/06 , H01J37/244 , H01J37/28 , H01J2237/164 , H01J2237/166 , H01J2237/18 , H01J2237/202 , H01J2237/2445 , H01J2237/2608
摘要： A charged particle beam device capable of observing a sample in an air atmosphere or gas atmosphere has a thin film for separating the atmospheric pressure space from the decompressed space. A vacuum evacuation pump evacuates a first housing; and a detector detects a charged particle beam (obtained by irradiation of the sample) in the first housing. A thin film is provided to separate the inside of the first housing and the inside of a second housing at least along part of the interface between the first and second housings. An opening part is formed in the thin film so that its opening area on a charged particle irradiation unit's side is larger than its opening area on the sample side; and the thin film which covers the sample side of the opening part transmits or allows through the primary charged particle beam and the charged particle beam.
摘要翻译：能够在空气气氛或气体气氛中观察样品的带电粒子束装置具有用于将压缩空间与减压空间分离的薄膜。真空排气泵抽出第一壳体; 并且检测器检测在第一壳体中的带电粒子束（通过样品的照射获得）。提供薄膜以至少沿着第一和第二壳体之间的界面的一部分分离第一壳体的内部和第二壳体的内部。在薄膜中形成开口部，使得带电粒子照射单元侧的开口面积大于样品侧的开口面积; 并且覆盖开口部的样品侧的薄膜透过或允许通过初级带电粒子束和带电粒子束。

5. 发明授权

US09165741B2 Charged particle beam device, method for adjusting charged particle beam device, and method for inspecting or observing sample 有权
标题翻译：带电粒子束装置，调整带电粒子束装置的方法以及检测或观察样品的方法
公开(公告)号：US09165741B2
公开(公告)日：2015-10-20
申请号：US14235892
申请日：2012-07-04
申请人： Yusuke Ominami , Tomohisa Ohtaki , Sukehiro Ito
发明人： Yusuke Ominami , Tomohisa Ohtaki , Sukehiro Ito
IPC分类号： H01J37/06 , H01J37/18 , H01J37/28
CPC分类号： H01J37/18 , H01J37/06 , H01J37/244 , H01J37/28 , H01J2237/164 , H01J2237/166 , H01J2237/18 , H01J2237/202 , H01J2237/2445 , H01J2237/2608
摘要： A charged particle beam device capable of observing a sample in an air atmosphere or gas atmosphere has a thin film for separating the atmospheric pressure space from the decompressed space. A vacuum evacuation pump evacuates a first housing; and a detector detects a charged particle beam (obtained by irradiation of the sample) in the first housing. A thin film is provided to separate the inside of the first housing and the inside of a second housing at least along part of the interface between the first and second housings. An opening part is formed in the thin film so that its opening area on a charged particle irradiation unit's side is larger than its opening area on the sample side; and the thin film which covers the sample side of the opening part transmits or allows through the primary charged particle beam and the charged particle beam.
摘要翻译：能够在空气气氛或气体气氛中观察样品的带电粒子束装置具有用于将压缩空间与减压空间分离的薄膜。真空排气泵抽出第一壳体; 并且检测器检测在第一壳体中的带电粒子束（通过样品的照射获得）。提供薄膜以至少沿着第一和第二壳体之间的界面的一部分分离第一壳体的内部和第二壳体的内部。在薄膜中形成开口部，使得带电粒子照射单元侧的开口面积大于样品侧的开口面积; 并且覆盖开口部的样品侧的薄膜透过或允许通过初级带电粒子束和带电粒子束。

6. 发明授权

US08710439B2 Charged particle beam apparatus 有权
公开(公告)号：US08710439B2
公开(公告)日：2014-04-29
申请号：US14111174
申请日：2012-03-02
申请人： Yusuke Ominami , Sukehiro Ito , Tomohisa Ohtaki
发明人： Yusuke Ominami , Sukehiro Ito , Tomohisa Ohtaki
IPC分类号： H01J37/28 , H01J37/20 , G01N13/10
CPC分类号： H01J37/18 , H01J37/16 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/16 , H01J2237/164 , H01J2237/1825 , H01J2237/2007 , H01J2237/2608
摘要： Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.

7. 发明授权

US08658987B2 Circuit-pattern inspection device 有权
标题翻译：电路图案检查装置
公开(公告)号：US08658987B2
公开(公告)日：2014-02-25
申请号：US13577719
申请日：2011-02-21
申请人： Takuma Yamamoto , Takashi Hiroi , Yusuke Ominami
发明人： Takuma Yamamoto , Takashi Hiroi , Yusuke Ominami
IPC分类号： G01N23/225
CPC分类号： H01J37/28 , H01J2237/2811 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Provided is a circuit-pattern inspection device which enables efficient inspection of a semiconductor wafer by selectively inspecting areas on the semiconductor wafer, such as boundaries between patterns thereon, where defects are likely to occur during the step of producing the semiconductor wafer while changing the beam scanning direction for each area. Two-dimensional beam-deflection control is employed for inspection operations in a continuous-stage-movement-type circuit-pattern inspection device in which only one-dimensional scanning has been employed conventionally. That is, by employing a combination of an electron-beam-deflection control in a first direction parallel to the stage-movement direction and an electron-beam-deflection control in a second direction intersecting the stage-movement direction, it is possible to obtain an image of any desired area for inspection that is set within a swath. The amplitude of deflection signals for the electron-beam-deflection and the rise and fall timings of the signals are suitably controlled according to inspection conditions.
摘要翻译：提供一种电路图案检查装置，其能够通过选择性地检查半导体晶片上的区域，例如在其上的图案之间的边界上的区域，从而有效地检查半导体晶片，其中在制造半导体晶片的步骤期间可能会发生缺陷，同时改变光束每个区域的扫描方向。在通常仅采用一维扫描的连续级移动型电路图案检查装置中，进行二维光束偏转控制。也就是说，通过在平行于载物台移动方向的第一方向上的电子束偏转控制和与载物台移动方向相交的第二方向上的电子束偏转控制的组合，可以获得任何所需的检查区域的图像，其设置在条纹内。根据检查条件适当地控制电子束偏转的偏转信号的幅度和信号的上升和下降定时。

8. 发明授权

US08086021B2 Appearance inspection apparatus with scanning electron microscope and image data processing method using scanning electron microscope 有权
标题翻译：具有扫描电子显微镜的外观检查装置和使用扫描电子显微镜的图像数据处理方法
公开(公告)号：US08086021B2
公开(公告)日：2011-12-27
申请号：US12367695
申请日：2009-02-09
申请人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
发明人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/244 , H01J2237/221 , H01J2237/24495 , H01J2237/2485 , H01J2237/2817
摘要： The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.
摘要翻译：本发明提供了一种外观检查装置，其允许用户优先考虑缺陷检测性能或吞吐量。外观检查装置允许用户选择数字图像信号的频率或数字图像信号的频率与采样率的比率。此外，允许用户选择吞吐量提高或S / N改善以优先化。

9. 发明申请

US20080308725A1 SEMICONDUCTOR DEVICE INSPECTION APPARATUS 失效
标题翻译：半导体器件检测装置
公开(公告)号：US20080308725A1
公开(公告)日：2008-12-18
申请号：US12132361
申请日：2008-06-03
申请人： Yusuke Ominami , Yasuhiro Gunji , Yoshiyuki Shichida
发明人： Yusuke Ominami , Yasuhiro Gunji , Yoshiyuki Shichida
IPC分类号： G01N23/00
CPC分类号： G01R31/307
摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.
摘要翻译：具有噪声减除功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器，装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

10. 发明授权

US09543111B2 Charged particle beam device 有权
标题翻译：带电粒子束装置
公开(公告)号：US09543111B2
公开(公告)日：2017-01-10
申请号：US13982805
申请日：2011-11-02
申请人： Yusuke Ominami , Sukehiro Ito , Masami Katsuyama
发明人： Yusuke Ominami , Sukehiro Ito , Masami Katsuyama
IPC分类号： H01J37/28 , H01J37/16 , H01J37/18 , H01J37/26
CPC分类号： H01J37/16 , H01J37/18 , H01J37/261 , H01J37/28 , H01J2237/164 , H01J2237/2608 , H01J2237/2811
摘要： Provided is a charged particle beam device or charged particle microscope permitting observation of even a large-sized specimen in the air atmosphere or a gaseous atmosphere.A charged particle beam device that adopts a thin film which partitions a vacuum atmosphere and the air atmosphere (or gaseous atmosphere) includes a charged particle optical lens barrel in which a charged particle optical system is stored, a housing in which a route along which a primary charged particle beam emitted from the charged particle optical lens barrel reaches the thin film is sustained in the vacuum atmosphere, and a mechanism that bears the charged particle optical lens barrel and first housing against a device installation surface. As the bearing mechanism, a housing having an opening through which a large-sized specimen is carried in or a mechanism having a shape other than the shape of the housing, such as, a post is adopted.
摘要翻译：采用分隔真空气氛的薄膜和空气气氛（或气体气氛）的带电粒子束装置包括其中存储带电粒子光学系统的带电粒子光学镜筒，其中沿着从带电粒子光学透镜镜筒发射的到达薄膜的初级带电粒子束在真空气氛中被维持，并且使得带电粒子光学镜片镜筒和第一壳体抵抗装置安装表面的机构。作为轴承机构，采用具有大尺寸样本的开口的壳体或具有除壳体的形状以外的形状的机构，例如柱。

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