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1. 发明授权

US08086021B2 Appearance inspection apparatus with scanning electron microscope and image data processing method using scanning electron microscope 有权
标题翻译：具有扫描电子显微镜的外观检查装置和使用扫描电子显微镜的图像数据处理方法
公开(公告)号：US08086021B2
公开(公告)日：2011-12-27
申请号：US12367695
申请日：2009-02-09
申请人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
发明人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/244 , H01J2237/221 , H01J2237/24495 , H01J2237/2485 , H01J2237/2817
摘要： The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.
摘要翻译：本发明提供了一种外观检查装置，其允许用户优先考虑缺陷检测性能或吞吐量。外观检查装置允许用户选择数字图像信号的频率或数字图像信号的频率与采样率的比率。此外，允许用户选择吞吐量提高或S / N改善以优先化。

2. 发明授权

US08086022B2 Electron beam inspection system and an image generation method for an electron beam inspection system 失效
标题翻译：电子束检查系统和电子束检查系统的图像生成方法
公开(公告)号：US08086022B2
公开(公告)日：2011-12-27
申请号：US12179272
申请日：2008-07-24
申请人： Hiroshi Miyai , Yusuke Ominami , Yasuhiro Gunji
发明人： Hiroshi Miyai , Yusuke Ominami , Yasuhiro Gunji
IPC分类号： G06K9/00 , G06K9/40 , G01N23/00
CPC分类号： G01N23/225 , H01J37/222 , H01J37/28 , H01J2237/24495 , H01J2237/2487 , H01J2237/2817
摘要： An inspection system uses a scanning electron microscope that detects a high-precision electron beam image, and at the same time removes restrictions for a low sampling rate. A sampled signal is obtained by sampling an analog brightness signal generated by a secondary electron detector at a predetermined sampling rate, and contiguous digital values contained in the sampled signal are added on an N by N digital value basis to generate a digital brightness signal whose frequency is equal to 1/N of the sampling frequency. Each, digital value contained in the digital brightness signal is divided by N to generate a digital signal made of digital values having a number of bits equal to that of the sampled signal and to generate an image signal in which each digital value of the digital signal forms one pixel data.
摘要翻译：检查系统使用检测高精度电子束图像的扫描电子显微镜，同时消除对低采样率的限制。通过以预定的采样率对由二次电子检测器产生的模拟亮度信号进行采样来获得采样信号，并且以N×N数值为基础相加在采样信号中包含的连续数字值，以产生数字亮度信号，其频率等于采样频率的1 / N。将包含在数字亮度信号中的每个数字值除以N，以产生由具有与采样信号的位数相等的位数的数字值构成的数字信号，并产生其中数字信号的每个数字值形成一个像素数据。

3. 发明申请

US20090208092A1 APPERANCE INSPECTION APPARATUS WITH SCANNING ELECTRON MICROSCOPE AND IMAGE DATA PROCESSING METHOD USING SCANNING ELECTRON MICROSCOPE 有权
标题翻译：使用扫描电子显微镜扫描电子显微镜和图像数据处理方法的检查装置
公开(公告)号：US20090208092A1
公开(公告)日：2009-08-20
申请号：US12367695
申请日：2009-02-09
申请人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
发明人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/244 , H01J2237/221 , H01J2237/24495 , H01J2237/2485 , H01J2237/2817
摘要： The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.
摘要翻译：本发明提供了一种外观检查装置，其允许用户优先考虑缺陷检测性能或吞吐量。外观检查装置允许用户选择数字图像信号的频率或数字图像信号的频率与采样率的比率。此外，允许用户选择吞吐量提高或S / N改善以优先化。

4. 发明申请

US20120091339A1 CHARGED-PARTICLE MICROSCOPE DEVICE, AND METHOD OF CONTROLLING CHARGED-PARTICLE BEAMS 审中-公开
标题翻译：充电颗粒显微镜装置和控制带电粒子的方法
公开(公告)号：US20120091339A1
公开(公告)日：2012-04-19
申请号：US13378561
申请日：2010-06-15
申请人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
发明人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/24564 , H01J2237/24592
摘要： A charged-particle microscope device and a method of controlling charged-particle beams are provided, which are capable of signal detection at the time when the charged state of an observation sample or a defect portion becomes optimum. Charge accumulation-waiting time T from an initial irradiation with an electron beam 21 for enhancing charge accumulation on an observation sample 100 until a next irradiation with the electron beam 21 for sample observation is set depending on the state of the observation sample 100 or a defect portion 112 generated on the observation sample 100. The irradiation with the electron beam 21 for enhancing charge accumulation and the irradiation with the electron beam 21 for sample observation are performed on the observation sample 100 on the basis of the charge accumulation-waiting time T.
摘要翻译：提供带电粒子显微镜装置和控制带电粒子束的方法，其能够在观察样品或缺陷部分的充电状态变为最佳时进行信号检测。根据观察样品100的状态或缺陷来设定用于增强观察样品100上的电荷累积的电子束21的电荷累积等待时间T，直到下一次照射用于样本观察的电子束21为止在观察样本100上产生的电子束21的照射。基于电荷累积等待时间T，对观察样品100进行用于增强电荷积聚的电子束21的照射和用于样本观察的电子束21的照射。

5. 发明申请

US20110278452A1 PATTERN CHECK DEVICE AND PATTERN CHECK METHOD 有权
标题翻译：图案检查装置和图案检查方法
公开(公告)号：US20110278452A1
公开(公告)日：2011-11-17
申请号：US13129201
申请日：2009-10-15
申请人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
发明人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
IPC分类号： H01J37/26 , H01J37/285
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/0048 , H01J2237/2008 , H01J2237/24564 , H01J2237/2817 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.
摘要翻译：提供了一种图案检查装置，包括：电荷形成装置，其通过从不同于电子源（I）的第二电子源（20）产生电子束，在基板（7）的表面上形成电荷，电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。还提供了使用图案检查装置的图案检查方法。因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。然后，检查结果反馈给操作。这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

6. 发明授权

US08421008B2 Pattern check device and pattern check method 有权
标题翻译：图案检查装置和图案检查方法
公开(公告)号：US08421008B2
公开(公告)日：2013-04-16
申请号：US13129201
申请日：2009-10-15
申请人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
发明人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
IPC分类号： H01J37/26 , H01J37/304 , G01N23/00
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/0048 , H01J2237/2008 , H01J2237/24564 , H01J2237/2817 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (1) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.
摘要翻译：提供了一种图案检查装置，其包括：电荷形成装置，其通过从不同于电子源的电子源（1）产生来自第二电子源（20）的电子束，从而在基板（7）的表面上形成电荷，电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。还提供了使用图案检查装置的图案检查方法。因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。然后，检查结果反馈给操作。这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

7. 发明申请

US20090123059A1 INSPECTION APPARATUS AND INSPECTION METHOD USING ELECTRON BEAM 有权
标题翻译：使用电子束的检查装置和检查方法
公开(公告)号：US20090123059A1
公开(公告)日：2009-05-14
申请号：US12348586
申请日：2009-01-05
申请人： Yasuhiro GUNJI , Hiroshi Miyai , Shigeya Tanaka
发明人： Yasuhiro GUNJI , Hiroshi Miyai , Shigeya Tanaka
IPC分类号： G06K9/00 , G01N23/00
CPC分类号： G01N23/203 , G01N23/2251 , G01N2223/3302 , H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed.
摘要翻译：公开了使用扫描电子显微镜的目视检查装置和方法。在样品上重复扫描电子束，并且由从样品或反射电子产生的二次电子产生检查和参考图像。根据检查图像与参考图像之间的差分图像，确定缺陷。可以改变沿电子束的重复扫描方向产生的图像中的像素数。

8. 发明授权

US07999565B2 Inspection apparatus and inspection method using electron beam 有权
标题翻译：使用电子束的检查装置和检查方法
公开(公告)号：US07999565B2
公开(公告)日：2011-08-16
申请号：US12348586
申请日：2009-01-05
申请人： Yasuhiro Gunji , Hiroshi Miyai , Shigeya Tanaka
发明人： Yasuhiro Gunji , Hiroshi Miyai , Shigeya Tanaka
IPC分类号： G01R31/305
CPC分类号： G01N23/203 , G01N23/2251 , G01N2223/3302 , H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed.
摘要翻译：公开了使用扫描电子显微镜的目视检查装置和方法。在样品上重复扫描电子束，并且由从样品或反射电子产生的二次电子产生检查和参考图像。根据检查图像与参考图像之间的差分图像，确定缺陷。可以改变沿电子束的重复扫描方向产生的图像中的像素数。

9. 发明申请

US20110163230A1 CHARGED PARTICLE BEAM DEVICE 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20110163230A1
公开(公告)日：2011-07-07
申请号：US13061031
申请日：2009-08-28
申请人： Takashi Hiroi , Yasuhiro Gunji , Hiroshi Miyai , Masaaki Nojiri
发明人： Takashi Hiroi , Yasuhiro Gunji , Hiroshi Miyai , Masaaki Nojiri
IPC分类号： G01N23/04
CPC分类号： H01J37/28 , H01J37/20 , H01J37/265 , H01J2237/20285 , H01J2237/2817
摘要： There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format.
摘要翻译：提供了一种使用带电粒子束的衬底检查装置，并且能够比以前更快地提取缺陷候选物。基板检查装置的结构使得具有电路图案的基板被初级带电粒子束照射，基板以恒定速度或增加或降低的速度移动，监视由运动产生的位置，根据基板的坐标来控制与初级带电粒子束的照射位置，以低于移动速度的速度捕获基板上的部分区域中的图像，基于捕获的图像和检测到的缺陷候选以地图格式显示。

10. 发明授权

US08421010B2 Charged particle beam device for scanning a sample using a charged particle beam to inspect the sample 有权
标题翻译：带电粒子束装置，用于使用带电粒子束扫描样品以检查样品
公开(公告)号：US08421010B2
公开(公告)日：2013-04-16
申请号：US13061031
申请日：2009-08-28
申请人： Takashi Hiroi , Yasuhiro Gunji , Hiroshi Miyai , Masaaki Nojiri
发明人： Takashi Hiroi , Yasuhiro Gunji , Hiroshi Miyai , Masaaki Nojiri
IPC分类号： A61N5/00 , G21K5/04
CPC分类号： H01J37/28 , H01J37/20 , H01J37/265 , H01J2237/20285 , H01J2237/2817
摘要： There is provided a substrate inspection device which uses a charged particle beam and is capable of more quickly extracting a defect candidate than ever before. The configuration of the substrate inspection device is such that a substrate having a circuit pattern is irradiated with a primary charged particle beam, the substrate is moved at a constant speed or at an increasing or a decreasing speed, a position resulting from the movement is monitored, the position of irradiation with the primary charged particle beam is controlled according to the coordinates of the substrate, an image in a partial region on the substrate is captured at a speed lower than the velocity of the movement, a defect candidate is detected based on the captured image, and the detected defect candidate is displayed in a map format.
摘要翻译：提供了一种使用带电粒子束的衬底检查装置，并且能够比以前更快地提取缺陷候选物。基板检查装置的结构使得具有电路图案的基板被初级带电粒子束照射，基板以恒定速度或增加或降低的速度移动，监视由运动产生的位置，根据基板的坐标来控制与初级带电粒子束的照射位置，以低于移动速度的速度捕获基板上的部分区域中的图像，基于捕获的图像和检测到的缺陷候选以地图格式显示。

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