专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5257132A Broadband diffractive lens or imaging element 失效
$Broadband diffractive lens or imaging element$
标题翻译：宽带衍射透镜或成像元件
公开(公告)号：US5257132A
公开(公告)日：1993-10-26
申请号：US683592
申请日：1991-04-09
申请人： Natale M. Ceglio , Andrew M. Hawryluk , Richard A. London , Lynn G. Seppala
发明人： Natale M. Ceglio , Andrew M. Hawryluk , Richard A. London , Lynn G. Seppala
IPC分类号： G02B5/18
CPC分类号： G02B5/1876 , G02B5/188
摘要： A broadband diffractive lens or imaging element produces a sharp focus and/or a high resolution image with broad bandwidth illuminating radiation. The diffractive lens is sectored or segmented into regions, each of which focuses or images a distinct narrowband of radiation but all of which have a common focal length. Alternatively, a serial stack of minus filters, each with a diffraction pattern which focuses or images a distinct narrowband of radiation but all of which have a common focal length, is used. The two approaches can be combined. Multifocal broadband diffractive elements can also be formed. Thin film embodiments are described.
摘要翻译：宽带衍射透镜或成像元件产生具有宽带宽照明辐射的清晰焦点和/或高分辨率图像。衍射透镜被分割或分割成各个区域，每个区域聚焦或成像不同的辐射窄带，但都具有共同的焦距。或者，使用负滤波器的串联堆叠，每个具有聚焦或图像不同的辐射窄带的衍射图案，但都具有共同的焦距。这两种方法可以组合。也可以形成多焦点宽带衍射元件。描述薄膜实施例。

2. 发明授权

US5071207A Broadband diffractive lens or imaging element 失效
$Broadband diffractive lens or imaging element$
标题翻译：宽带衍射透镜或成像元件
公开(公告)号：US5071207A
公开(公告)日：1991-12-10
申请号：US587699
申请日：1990-09-25
申请人： Natale M. Ceglio , Andrew M. Hawryluk , Richard A. London , Lynn G. Seppala
发明人： Natale M. Ceglio , Andrew M. Hawryluk , Richard A. London , Lynn G. Seppala
IPC分类号： G02B5/18
CPC分类号： G02B5/1876 , G02B5/188
摘要： A broadband diffractive lens or imaging element produces a sharp focus and/or a high resolution image with broad bandwidth illuminating radiation. The diffractive lens is sectored or segmented into regions, each of which focuses or images a distinct narrowband of radiation but all of which have a common focal length. Alternatively, a serial stack of minus filters, each with a diffraction pattern which focuses or images a distinct narrowband of radiation but all of which have a common focal length, is used. The two approaches can be combined. Multifocal broadband diffractive elements can also be formed.
摘要翻译：宽带衍射透镜或成像元件产生具有宽带宽照明辐射的清晰焦点和/或高分辨率图像。衍射透镜被分割或分割成各个区域，每个区域聚焦或成像不同的辐射窄带，但都具有共同的焦距。或者，使用负滤波器的串联堆叠，每个具有聚焦或图像不同的辐射窄带的衍射图案，但都具有共同的焦距。这两种方法可以组合。也可以形成多焦点宽带衍射元件。

3. 发明授权

US6002553A Giant magnetoresistive sensor 失效
标题翻译：巨型磁阻传感器
公开(公告)号：US6002553A
公开(公告)日：1999-12-14
申请号：US202991
申请日：1994-02-28
申请人： Daniel G. Stearns , Stephen P. Vernon , Natale M. Ceglio , Andrew M. Hawryluk
发明人： Daniel G. Stearns , Stephen P. Vernon , Natale M. Ceglio , Andrew M. Hawryluk
IPC分类号： G01R33/09 , G11B5/09 , G11B5/39 , H01F10/32
CPC分类号： B82Y25/00 , B82Y10/00 , G01R33/093 , G11B5/3903 , H01F10/325 , H01F10/3281 , G11B2005/3996 , G11B5/09
摘要： A magnetoresistive sensor element with a three-dimensional micro-architecture is capable of significantly improved sensitivity and highly localized measurement of magnetic fields. The sensor is formed of a multilayer film of alternately magnetic and nonmagnetic materials. The sensor is optimally operated in a current perpendicular to plane mode. The sensor is useful in magnetic read/write heads, for high density magnetic information storage and retrieval.
摘要翻译：具有三维微架构的磁阻传感器元件能够显着改善磁场的灵敏度和高度局部化的测量。传感器由交替磁性和非磁性材料的多层膜形成。传感器在垂直于平面模式的电流中最佳运行。该传感器可用于磁读/写磁头，用于高密度磁信息存储和检索。

4. 发明授权

US5176970A Virtually distortion-free imaging system for large field, high resolution lithography 失效
标题翻译：几何无失真的成像系统，用于大场，高分辨率光刻
公开(公告)号：US5176970A
公开(公告)日：1993-01-05
申请号：US597968
申请日：1990-10-12
申请人： Andrew M. Hawryluk , Natale M. Ceglio
发明人： Andrew M. Hawryluk , Natale M. Ceglio
IPC分类号： G03F7/20
CPC分类号： G03F7/70208 , G03F7/2002 , G03F7/70233 , G03F7/70275 , G03F7/70433
摘要： Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.
摘要翻译：使用包含大的场失真或场曲率的成像系统执行几乎无失真的大场高分辨率成像。通过光学系统在一个方向上对掩模版进行成像，以形成编码掩模。然后将编码的掩模通过成像系统成像回到位于掩模版位置的晶片上。

5. 发明授权

US5178974A Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams 失效
标题翻译：几何无畸变的成像系统，用于使用电子，离子或其他粒子束的大场，高分辨率光刻
公开(公告)号：US5178974A
公开(公告)日：1993-01-12
申请号：US683011
申请日：1991-04-10
申请人： Andrew M. Hawryluk , Natale M. Ceglio
发明人： Andrew M. Hawryluk , Natale M. Ceglio
IPC分类号： G03F7/20
CPC分类号： G03F7/70208 , G03F7/2002 , G03F7/70233 , G03F7/70275 , G03F7/70433
摘要： Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.
摘要翻译：使用包含大的场失真或场曲率的成像系统执行几乎无失真的大场高分辨率成像。通过光学系统在一个方向上对掩模版进行成像，以形成编码掩模。然后将编码的掩模通过成像系统成像回到位于掩模版位置的晶片上。可以使用粒子束，包括电子，离子和中性粒子，以及电磁辐射。

6. 发明授权

US4870648A X-ray beamsplitter 失效
标题翻译： X射线分光镜
公开(公告)号：US4870648A
公开(公告)日：1989-09-26
申请号：US82468
申请日：1987-08-07
申请人： Natale M. Ceglio , Daniel S. Stearns , Andrew M. Hawryluk , Troy W. Barbee, Jr.
发明人： Natale M. Ceglio , Daniel S. Stearns , Andrew M. Hawryluk , Troy W. Barbee, Jr.
IPC分类号： G21K1/06 , H01S4/00 , H01S5/028
CPC分类号： B82Y10/00 , G21K1/062 , H01S4/00 , H01S5/028 , G21K2201/061 , G21K2201/067
摘要： An x-ray beamsplitter which splits an x-ray beam into two coherent parts by reflecting and transmitting some fraction of an incident beam has applications for x-ray interferometry, x-ray holography, x-ray beam manipulation, and x-ray laser cavity output couplers. The beamsplitter is formed of a wavelength selective multilayer thin film supported by a very thin x-ray transparent membrane. The beamsplitter resonantly transmits and reflects x-rays through thin film interference effects. A thin film is formed of 5-50 pairs of alternate Mo/Si layers with a period of 20-250 A. The support membrane is 10-200 nm of silicon nitride or boron nitride. The multilayer/support membrane structure is formed across a window in a substrate by first forming the structure on a solid substrate and then forming a window in the substrate to leave a free-standing structure over the window.
摘要翻译：通过反射和透射入射光束的一部分将X射线束分成两个相干部分的x射线分束器具有x射线干涉测量，x射线全息术，x射线束操纵和x射线激光器的应用腔输出耦合器。分束器由非常薄的x射线透明膜支撑的波长选择性多层薄膜形成。分束器通过薄膜干涉效应共振透射和反射x射线。薄膜由5-50对间隔20〜250A的Mo / Si层组成。支撑膜为氮化硅或氮化硼的10-200nm。多层/支撑膜结构通过首先在固体基底上形成结构，然后在基底中形成窗口以在窗口上留下独立的结构，跨越基底中的窗口形成。

7. 发明授权

US08330131B2 Source-collector module with GIC mirror and LPP EUV light source 有权
标题翻译：源集电极模块采用GIC镜和LPP EUV光源
公开(公告)号：US08330131B2
公开(公告)日：2012-12-11
申请号：US12803075
申请日：2010-06-18
申请人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G21K5/04 , G03B27/42
CPC分类号： G03F7/70941 , B82Y10/00 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G21K2201/061 , H05G2/005
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译：一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

8. 发明授权

US08258485B2 Source-collector module with GIC mirror and xenon liquid EUV LPP target system 有权
标题翻译：源收集器模块采用GIC镜和氙液EUV LPP目标系统
公开(公告)号：US08258485B2
公开(公告)日：2012-09-04
申请号：US12807165
申请日：2010-08-30
申请人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： H01J37/20
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G21K2201/06 , G21K2201/064 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/006 , H05G2/008
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束照射目标部分中的氙液体。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

9. 发明授权

US06770862B1 Scalable wafer inspection 有权
标题翻译：可扩展晶圆检查
公开(公告)号：US06770862B1
公开(公告)日：2004-08-03
申请号：US10628627
申请日：2003-07-28
申请人： Dragos Maciuca , Natale M. Ceglio
发明人： Dragos Maciuca , Natale M. Ceglio
IPC分类号： H01L2700
CPC分类号： G01N21/956 , G01N21/9501
摘要： An imaging system for detecting defects on a substrate. Sensor module ports are disposed on an imaging platform. Sensor modules are removably connected to the sensor module ports, and are adapted to sense swaths on the surface of the substrate. Each of the sensor modules includes a time domain integration sensor, optics, an analog controller, and a digital controller. The time domain integration sensor optically senses the swath. The optics focus light from the swath on the time domain integration sensor. The analog controller receives signals from the time domain integration sensor and provides data signals. The digital controller receives the data signals, integrates the data signals into an image of the swath, and provides the image as digital signals to the sensor module port. A master controller receives the digital signals, composites them into a single image of a desired portion of the surface of the substrate, and detects defects within the image. A stage moves the substrate under the sensor modules under the control of the master controller, until the desired portion of the surface of the substrate has been imaged.
摘要翻译：一种用于检测衬底上的缺陷的成像系统。传感器模块端口设置在成像平台上。传感器模块可拆卸地连接到传感器模块端口，并且适于感测衬底表面上的条纹。每个传感器模块包括时域积分传感器，光学器件，模拟控制器和数字控制器。时域积分传感器光学感测条纹。光学器件将来自条纹的光线聚焦在时域集成传感器上。模拟控制器从时域积分传感器接收信号并提供数据信号。数字控制器接收数据信号，将数据信号整合成幅的图像，并将图像作为数字信号提供给传感器模块端口。主控制器接收数字信号，将它们复合到衬底表面的所需部分的单个图像中，并且检测图像内的缺陷。在主控制器的控制下，台架将传感器模块下方的基板移动，直到基片表面的所需部分成像。

10. 发明授权

US09057962B2 Source-collector module with GIC mirror and LPP EUV light source 有权
标题翻译：源集电极模块采用GIC镜和LPP EUV光源
公开(公告)号：US09057962B2
公开(公告)日：2015-06-16
申请号：US13691804
申请日：2012-12-02
申请人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/70033 , G03F7/2004 , G21K1/067 , G21K2201/064
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译：一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式