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1. 发明授权

US08258485B2 Source-collector module with GIC mirror and xenon liquid EUV LPP target system 有权
标题翻译：源收集器模块采用GIC镜和氙液EUV LPP目标系统
公开(公告)号：US08258485B2
公开(公告)日：2012-09-04
申请号：US12807165
申请日：2010-08-30
申请人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： H01J37/20
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G21K2201/06 , G21K2201/064 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/006 , H05G2/008
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束照射目标部分中的氙液体。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

2. 发明授权

US08330131B2 Source-collector module with GIC mirror and LPP EUV light source 有权
标题翻译：源集电极模块采用GIC镜和LPP EUV光源
公开(公告)号：US08330131B2
公开(公告)日：2012-12-11
申请号：US12803075
申请日：2010-06-18
申请人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G21K5/04 , G03B27/42
CPC分类号： G03F7/70941 , B82Y10/00 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G21K2201/061 , H05G2/005
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译：一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

3. 发明授权

US09057962B2 Source-collector module with GIC mirror and LPP EUV light source 有权
标题翻译：源集电极模块采用GIC镜和LPP EUV光源
公开(公告)号：US09057962B2
公开(公告)日：2015-06-16
申请号：US13691804
申请日：2012-12-02
申请人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/70033 , G03F7/2004 , G21K1/067 , G21K2201/064
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译：一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

4. 发明授权

US08686381B2 Source-collector module with GIC mirror and tin vapor LPP target system 有权
标题翻译：源收集器模块采用GIC镜和锡蒸汽LPP目标系统
公开(公告)号：US08686381B2
公开(公告)日：2014-04-01
申请号：US12803461
申请日：2010-06-28
申请人： Richard Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： H05G2/00
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G03F7/70175 , H05G2/005
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束从目标部的Sn蒸气源照射Sn蒸气。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。可以使用辐射收集增强装置来增加提供给中间聚焦的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

5. 发明申请

US20110318694A1 Source-collector module with GIC mirror and tin vapor LPP target system 有权
标题翻译：源收集器模块采用GIC镜和锡蒸汽LPP目标系统
公开(公告)号：US20110318694A1
公开(公告)日：2011-12-29
申请号：US12803461
申请日：2010-06-28
申请人： Richard Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： H05G2/00 , G03F7/20 , G03B27/70
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G03F7/70175 , H05G2/005
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束从目标部的Sn蒸气源照射Sn蒸气。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。可以使用辐射收集增强装置来增加提供给中间聚焦的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

6. 发明申请

US20140152967A1 Source-collector module wth GIC mirror and LPP EUV light source 审中-公开
标题翻译：源极收集器模块，GIC镜和LPP EUV光源
公开(公告)号：US20140152967A1
公开(公告)日：2014-06-05
申请号：US13691804
申请日：2012-12-02
申请人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G21K5/04 , G03F7/20
CPC分类号： G03F7/70033 , G03F7/2004 , G21K1/067 , G21K2201/064
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译：一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

7. 发明授权

US08344339B2 Source-collector module with GIC mirror and tin rod EUV LPP target system 有权
标题翻译：源收集器模块采用GIC镜和锡杆EUV LPP目标系统
公开(公告)号：US08344339B2
公开(公告)日：2013-01-01
申请号：US12807166
申请日：2010-08-30
申请人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： H01J37/20
CPC分类号： G02B19/0095 , B82Y10/00 , G02B19/0028 , G02B19/0047 , G03F7/70033 , G03F7/70166 , G21K1/06 , G21K1/062 , G21K1/067 , H05G2/005 , H05G2/008
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a rotating Sn rod in the target portion to generate the EUV radiation. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束照射目标部分中的旋转Sn棒以产生EUV辐射。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

8. 发明申请

US20120050707A1 Source-collector module with GIC mirror and tin wire EUV LPP target system 审中-公开
标题翻译：源集电器模块采用GIC镜和锡线EUV LPP目标系统
公开(公告)号：US20120050707A1
公开(公告)日：2012-03-01
申请号：US12807170
申请日：2010-08-30
申请人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G03B27/52 , H05G2/00
CPC分类号： G02B5/085 , G02B5/0891 , G02B19/0028 , G02B19/0095 , G03F7/70033 , G03F7/70166 , G21K1/06 , H05G2/005 , H05G2/008
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a Sn wire provided by the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束照射由目标部提供的Sn线。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

9. 发明申请

US20120050706A1 Source-collector module with GIC mirror and xenon ice EUV LPP target system 审中-公开
标题翻译：源收集器模块采用GIC镜和氙冰EUV LPP目标系统
公开(公告)号：US20120050706A1
公开(公告)日：2012-03-01
申请号：US12807167
申请日：2010-08-30
申请人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G03B27/52 , H05G2/00
CPC分类号： G21K1/067 , B82Y10/00 , G02B5/0891 , G03F7/70033 , G03F7/70166 , G21K2201/061 , G21K2201/064 , G21K2201/067 , H05G2/006 , H05G2/008
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon ice provided by the target portion to an irradiation location. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束将由目标部分提供的氙冰照射到照射位置。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

10. 发明申请

US20120050704A1 Source-collector module with GIC mirror and xenon liquid EUV LPP target system 有权
公开(公告)号：US20120050704A1
公开(公告)日：2012-03-01
申请号：US12807165
申请日：2010-08-30
申请人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G03B27/42 , H05G2/00
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G21K2201/06 , G21K2201/064 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/006 , H05G2/008
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

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