专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08746975B2 Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography 有权
标题翻译：用于EUV光刻的放电收集器的热管理系统，组件和方法
公开(公告)号：US08746975B2
公开(公告)日：2014-06-10
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Gordon Yue , Daniel Stearns , Richard A. Levesque , Giuseppe Valsecchi
IPC分类号： H01J35/02 , H01J35/16 , G21K1/06
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

2. 发明申请

US20140152967A1 Source-collector module wth GIC mirror and LPP EUV light source 审中-公开
标题翻译：源极收集器模块，GIC镜和LPP EUV光源
公开(公告)号：US20140152967A1
公开(公告)日：2014-06-05
申请号：US13691804
申请日：2012-12-02
申请人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G21K5/04 , G03F7/20
CPC分类号： G03F7/70033 , G03F7/2004 , G21K1/067 , G21K2201/064
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译：一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

3. 发明授权

US09057962B2 Source-collector module with GIC mirror and LPP EUV light source 有权
标题翻译：源集电极模块采用GIC镜和LPP EUV光源
公开(公告)号：US09057962B2
公开(公告)日：2015-06-16
申请号：US13691804
申请日：2012-12-02
申请人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： G03F7/20 , G21K1/06
CPC分类号： G03F7/70033 , G03F7/2004 , G21K1/067 , G21K2201/064
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译：一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

4. 发明授权

US08686381B2 Source-collector module with GIC mirror and tin vapor LPP target system 有权
标题翻译：源收集器模块采用GIC镜和锡蒸汽LPP目标系统
公开(公告)号：US08686381B2
公开(公告)日：2014-04-01
申请号：US12803461
申请日：2010-06-28
申请人： Richard Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： H05G2/00
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G03F7/70175 , H05G2/005
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束从目标部的Sn蒸气源照射Sn蒸气。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。可以使用辐射收集增强装置来增加提供给中间聚焦的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

5. 发明授权

US08594277B2 Grazing incidence collector optical systems for EUV and X-ray applications 有权
标题翻译：用于EUV和X射线应用的掠入射收集器光学系统
公开(公告)号：US08594277B2
公开(公告)日：2013-11-26
申请号：US12735525
申请日：2009-01-28
申请人： Fabio Zocchi , Pietro Binda , Enrico Benedetti
发明人： Fabio Zocchi , Pietro Binda , Enrico Benedetti
IPC分类号： G21K1/06
CPC分类号： G03F7/70166 , G21K1/06 , G21K2201/064
摘要： A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.
摘要翻译：公开了一种用于EUV和X射线应用的收集器光学系统，其中所述系统包括以嵌套配置布置的关于光轴对称的多个反射镜。反射镜具有第一和第二反射表面，其提供来自辐射源的辐射的连续掠入射反射。第一和第二反射表面具有补偿辐射的远场强度分布中的高空间频率变化的校正形状。

6. 发明申请

US20120212719A1 THERMAL MANAGEMENT SYSTEMS, ASSEMBLIES AND METHODS FOR GRAZING INCIDENCE COLLECTORS FOR EUV LITHOGRAPHY 有权
标题翻译：热管理系统，组装和方法，用于对EUV LITHOGRAPHY进行收集
公开(公告)号：US20120212719A1
公开(公告)日：2012-08-23
申请号：US13355725
申请日：2012-01-23
申请人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Daniel Stearns , Richard A. Levesque , Gordon Yue , Giuseppe Valsecchi
发明人： Giovanni Bianucci , Fabio Zocchi , Robert Banham , Marco Pedrali , Boris Grek , Natale Ceglio , Dean Shough , Daniel Stearns , Richard A. Levesque , Gordon Yue , Giuseppe Valsecchi
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G02B5/09 , G02B5/10 , G02B7/1815 , G03F7/70033 , G03F7/70166 , G03F7/70891
摘要： Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.
摘要翻译：公开了用于EUV光刻应用的用于热管理掠入射收集器（GIC）的系统，组件和方法。 GIC热管理组件包括与夹套接合以形成密封室的GIC镜壳。开放式电池，传热（OCHT）材料设置在金属室内，并与GIC反射镜外壳和护套热和机械结合。当GIC热管理组件用于被配置为从EUV辐射源接收和形成收集的EUV辐射的GIC镜系统中时，冷却剂以方位角对称的方式通过输入和输出增压室之间的OCHT材料流动，以实现冷却。

7. 发明申请

US20110318694A1 Source-collector module with GIC mirror and tin vapor LPP target system 有权
标题翻译：源收集器模块采用GIC镜和锡蒸汽LPP目标系统
公开(公告)号：US20110318694A1
公开(公告)日：2011-12-29
申请号：US12803461
申请日：2010-06-28
申请人： Richard Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： H05G2/00 , G03F7/20 , G03B27/70
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G03F7/70175 , H05G2/005
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束从目标部的Sn蒸气源照射Sn蒸气。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。可以使用辐射收集增强装置来增加提供给中间聚焦的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

8. 发明授权

US08258485B2 Source-collector module with GIC mirror and xenon liquid EUV LPP target system 有权
标题翻译：源收集器模块采用GIC镜和氙液EUV LPP目标系统
公开(公告)号：US08258485B2
公开(公告)日：2012-09-04
申请号：US12807165
申请日：2010-08-30
申请人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
发明人： Richard A. Levesque , Natale M. Ceglio , Giovanni Nocerino , Fabio Zocchi
IPC分类号： H01J37/20
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G21K2201/06 , G21K2201/064 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/006 , H05G2/008
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译：用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束照射目标部分中的氙液体。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。还公开了利用SOCOMO的EUV光刻系统。

9. 发明申请

US20110043779A1 GRAZING INCIDENCE COLLECTOR OPTICAL SYSTEMS FOR EUV AND X-RAY APPLICATIONS 有权
标题翻译：用于EUV和X射线应用的光栅收集器光学系统
公开(公告)号：US20110043779A1
公开(公告)日：2011-02-24
申请号：US12735525
申请日：2009-01-28
申请人： Fabio Zocchi , Pietro Binda , Enrico Benedetti
发明人： Fabio Zocchi , Pietro Binda , Enrico Benedetti
IPC分类号： G03F7/20 , G21K1/00 , G02B17/04
CPC分类号： G03F7/70166 , G21K1/06 , G21K2201/064
摘要： A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.
摘要翻译：公开了一种用于EUV和X射线应用的收集器光学系统，其中所述系统包括以嵌套配置布置的关于光轴对称的多个反射镜。反射镜具有第一和第二反射表面，其提供来自辐射源的辐射的连续掠入射反射。第一和第二反射表面具有补偿辐射的远场强度分布中的高空间频率变化的校正形状。

10. 发明授权

US08411815B2 Grazing incidence collector for laser produced plasma sources 有权
标题翻译：用于激光产生等离子体源的掠入射收集器
公开(公告)号：US08411815B2
公开(公告)日：2013-04-02
申请号：US12734829
申请日：2009-01-28
申请人： Ian Wallhead , Fabio Zocchi
发明人： Ian Wallhead , Fabio Zocchi
IPC分类号： H05G2/00 , G21K5/00
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/064 , G21K2201/065 , G21K2201/067 , H05G2/003
摘要： Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.
摘要翻译：公开了用于极紫外（EUV）和X射线辐射源的掠入射收集器（GIC），例如激光产生的等离子体（LPP）源。还公开了包括GIC和LPP源的源收集器系统。激光束沿着收集器轴线引导到燃料靶以形成LPP源，并且收集器被布置成收集辐射并将其反射到中间焦点。收集器可以包括一个或多个掠入射镜，并且这些反射镜可以被电铸。使用如本文所公开的源极 - 收集器系统的光刻系统。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式