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1. 发明授权

US6002553A Giant magnetoresistive sensor 失效
标题翻译：巨型磁阻传感器
公开(公告)号：US6002553A
公开(公告)日：1999-12-14
申请号：US202991
申请日：1994-02-28
申请人： Daniel G. Stearns , Stephen P. Vernon , Natale M. Ceglio , Andrew M. Hawryluk
发明人： Daniel G. Stearns , Stephen P. Vernon , Natale M. Ceglio , Andrew M. Hawryluk
IPC分类号： G01R33/09 , G11B5/09 , G11B5/39 , H01F10/32
CPC分类号： B82Y25/00 , B82Y10/00 , G01R33/093 , G11B5/3903 , H01F10/325 , H01F10/3281 , G11B2005/3996 , G11B5/09
摘要： A magnetoresistive sensor element with a three-dimensional micro-architecture is capable of significantly improved sensitivity and highly localized measurement of magnetic fields. The sensor is formed of a multilayer film of alternately magnetic and nonmagnetic materials. The sensor is optimally operated in a current perpendicular to plane mode. The sensor is useful in magnetic read/write heads, for high density magnetic information storage and retrieval.
摘要翻译：具有三维微架构的磁阻传感器元件能够显着改善磁场的灵敏度和高度局部化的测量。传感器由交替磁性和非磁性材料的多层膜形成。传感器在垂直于平面模式的电流中最佳运行。该传感器可用于磁读/写磁头，用于高密度磁信息存储和检索。

2. 发明授权

US5257132A Broadband diffractive lens or imaging element 失效
$Broadband diffractive lens or imaging element$
标题翻译：宽带衍射透镜或成像元件
公开(公告)号：US5257132A
公开(公告)日：1993-10-26
申请号：US683592
申请日：1991-04-09
申请人： Natale M. Ceglio , Andrew M. Hawryluk , Richard A. London , Lynn G. Seppala
发明人： Natale M. Ceglio , Andrew M. Hawryluk , Richard A. London , Lynn G. Seppala
IPC分类号： G02B5/18
CPC分类号： G02B5/1876 , G02B5/188
摘要： A broadband diffractive lens or imaging element produces a sharp focus and/or a high resolution image with broad bandwidth illuminating radiation. The diffractive lens is sectored or segmented into regions, each of which focuses or images a distinct narrowband of radiation but all of which have a common focal length. Alternatively, a serial stack of minus filters, each with a diffraction pattern which focuses or images a distinct narrowband of radiation but all of which have a common focal length, is used. The two approaches can be combined. Multifocal broadband diffractive elements can also be formed. Thin film embodiments are described.
摘要翻译：宽带衍射透镜或成像元件产生具有宽带宽照明辐射的清晰焦点和/或高分辨率图像。衍射透镜被分割或分割成各个区域，每个区域聚焦或成像不同的辐射窄带，但都具有共同的焦距。或者，使用负滤波器的串联堆叠，每个具有聚焦或图像不同的辐射窄带的衍射图案，但都具有共同的焦距。这两种方法可以组合。也可以形成多焦点宽带衍射元件。描述薄膜实施例。

3. 发明授权

US5071207A Broadband diffractive lens or imaging element 失效
$Broadband diffractive lens or imaging element$
标题翻译：宽带衍射透镜或成像元件
公开(公告)号：US5071207A
公开(公告)日：1991-12-10
申请号：US587699
申请日：1990-09-25
申请人： Natale M. Ceglio , Andrew M. Hawryluk , Richard A. London , Lynn G. Seppala
发明人： Natale M. Ceglio , Andrew M. Hawryluk , Richard A. London , Lynn G. Seppala
IPC分类号： G02B5/18
CPC分类号： G02B5/1876 , G02B5/188
摘要： A broadband diffractive lens or imaging element produces a sharp focus and/or a high resolution image with broad bandwidth illuminating radiation. The diffractive lens is sectored or segmented into regions, each of which focuses or images a distinct narrowband of radiation but all of which have a common focal length. Alternatively, a serial stack of minus filters, each with a diffraction pattern which focuses or images a distinct narrowband of radiation but all of which have a common focal length, is used. The two approaches can be combined. Multifocal broadband diffractive elements can also be formed.
摘要翻译：宽带衍射透镜或成像元件产生具有宽带宽照明辐射的清晰焦点和/或高分辨率图像。衍射透镜被分割或分割成各个区域，每个区域聚焦或成像不同的辐射窄带，但都具有共同的焦距。或者，使用负滤波器的串联堆叠，每个具有聚焦或图像不同的辐射窄带的衍射图案，但都具有共同的焦距。这两种方法可以组合。也可以形成多焦点宽带衍射元件。

4. 发明授权

US5178974A Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams 失效
标题翻译：几何无畸变的成像系统，用于使用电子，离子或其他粒子束的大场，高分辨率光刻
公开(公告)号：US5178974A
公开(公告)日：1993-01-12
申请号：US683011
申请日：1991-04-10
申请人： Andrew M. Hawryluk , Natale M. Ceglio
发明人： Andrew M. Hawryluk , Natale M. Ceglio
IPC分类号： G03F7/20
CPC分类号： G03F7/70208 , G03F7/2002 , G03F7/70233 , G03F7/70275 , G03F7/70433
摘要： Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.
摘要翻译：使用包含大的场失真或场曲率的成像系统执行几乎无失真的大场高分辨率成像。通过光学系统在一个方向上对掩模版进行成像，以形成编码掩模。然后将编码的掩模通过成像系统成像回到位于掩模版位置的晶片上。可以使用粒子束，包括电子，离子和中性粒子，以及电磁辐射。

5. 发明授权

US4870648A X-ray beamsplitter 失效
标题翻译： X射线分光镜
公开(公告)号：US4870648A
公开(公告)日：1989-09-26
申请号：US82468
申请日：1987-08-07
申请人： Natale M. Ceglio , Daniel S. Stearns , Andrew M. Hawryluk , Troy W. Barbee, Jr.
发明人： Natale M. Ceglio , Daniel S. Stearns , Andrew M. Hawryluk , Troy W. Barbee, Jr.
IPC分类号： G21K1/06 , H01S4/00 , H01S5/028
CPC分类号： B82Y10/00 , G21K1/062 , H01S4/00 , H01S5/028 , G21K2201/061 , G21K2201/067
摘要： An x-ray beamsplitter which splits an x-ray beam into two coherent parts by reflecting and transmitting some fraction of an incident beam has applications for x-ray interferometry, x-ray holography, x-ray beam manipulation, and x-ray laser cavity output couplers. The beamsplitter is formed of a wavelength selective multilayer thin film supported by a very thin x-ray transparent membrane. The beamsplitter resonantly transmits and reflects x-rays through thin film interference effects. A thin film is formed of 5-50 pairs of alternate Mo/Si layers with a period of 20-250 A. The support membrane is 10-200 nm of silicon nitride or boron nitride. The multilayer/support membrane structure is formed across a window in a substrate by first forming the structure on a solid substrate and then forming a window in the substrate to leave a free-standing structure over the window.
摘要翻译：通过反射和透射入射光束的一部分将X射线束分成两个相干部分的x射线分束器具有x射线干涉测量，x射线全息术，x射线束操纵和x射线激光器的应用腔输出耦合器。分束器由非常薄的x射线透明膜支撑的波长选择性多层薄膜形成。分束器通过薄膜干涉效应共振透射和反射x射线。薄膜由5-50对间隔20〜250A的Mo / Si层组成。支撑膜为氮化硅或氮化硼的10-200nm。多层/支撑膜结构通过首先在固体基底上形成结构，然后在基底中形成窗口以在窗口上留下独立的结构，跨越基底中的窗口形成。

6. 发明授权

US5176970A Virtually distortion-free imaging system for large field, high resolution lithography 失效
标题翻译：几何无失真的成像系统，用于大场，高分辨率光刻
公开(公告)号：US5176970A
公开(公告)日：1993-01-05
申请号：US597968
申请日：1990-10-12
申请人： Andrew M. Hawryluk , Natale M. Ceglio
发明人： Andrew M. Hawryluk , Natale M. Ceglio
IPC分类号： G03F7/20
CPC分类号： G03F7/70208 , G03F7/2002 , G03F7/70233 , G03F7/70275 , G03F7/70433
摘要： Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.
摘要翻译：使用包含大的场失真或场曲率的成像系统执行几乎无失真的大场高分辨率成像。通过光学系统在一个方向上对掩模版进行成像，以形成编码掩模。然后将编码的掩模通过成像系统成像回到位于掩模版位置的晶片上。

7. 发明授权

US08845163B2 LED-based photolithographic illuminator with high collection efficiency 有权
标题翻译：基于LED的光刻照明器，收集效率高
公开(公告)号：US08845163B2
公开(公告)日：2014-09-30
申请号：US13588750
申请日：2012-08-17
申请人： David G. Stites , Andrew M. Hawryluk
发明人： David G. Stites , Andrew M. Hawryluk
IPC分类号： F21V5/04
CPC分类号： G03F7/201 , G03F7/70391 , H01L25/0753 , H01L33/642 , H01L2924/0002 , H01L2924/00
摘要： An LED-based photolithographic illuminator with high collection efficiency is disclosed. The illuminator utilizes an array of LEDs, wherein each LED has an LED die and a heat sink. The LED dies are imaged onto the input end of a homogenizer rod to substantially cover the input end without inclusion of the non-light-emitting heat sink sections of the LED. A microlens array is used to image the LED dies. The collection efficiency of the illuminator is better than 50% and the illumination uniformity at the output end of the light homogenizer is within +/−2%.
摘要翻译：公开了一种具有高收集效率的基于LED的光刻照明器。照明器利用一系列LED，其中每个LED具有LED管芯和散热器。将LED管芯成像到均质棒的输入端上，以基本上覆盖输入端，而不包括LED的非发光散热片部分。使用微透镜阵列对LED管芯进行成像。照明器的收集效率优于50％，光均质器输出端的照明均匀度在+/- 2％以内。

8. 发明授权

US08823921B2 Programmable illuminator for a photolithography system 有权
标题翻译：用于光刻系统的可编程照明器
公开(公告)号：US08823921B2
公开(公告)日：2014-09-02
申请号：US13199112
申请日：2011-08-19
申请人： Borislav Zlatanov , Andrew M. Hawryluk
发明人： Borislav Zlatanov , Andrew M. Hawryluk
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70066 , G02B26/0833 , G03F7/70558
摘要： A programmable illuminator for a photolithography system includes a light source, a first optical system having a light uniformizing element, a programmable micro-mirror device, and a second optical system that forms an illumination field that illuminates a reticle. The programmable micro-mirror device can be configured to perform shutter and edge-exposure-blocking functions that have previously required relatively large mechanical devices. Methods of improving illumination field uniformity using the programmable illuminator are also disclosed.
摘要翻译：用于光刻系统的可编程照明器包括光源，具有光均化元件的第一光学系统，可编程微镜器件以及形成照明光栅的照明场的第二光学系统。可编程微镜装置可以被配置为执行先前需要相对大的机械装置的快门和边缘曝光阻挡功能。还公开了使用可编程照明器改善照明场均匀性的方法。

9. 发明授权

US08796151B2 Systems for and methods of laser-enhanced plasma processing of semiconductor materials 有权
标题翻译：半导体材料激光等离子体加工的系统和方法
公开(公告)号：US08796151B2
公开(公告)日：2014-08-05
申请号：US13438865
申请日：2012-04-04
申请人： Andrew M. Hawryluk , Arthur W. Zafiropoulo
发明人： Andrew M. Hawryluk , Arthur W. Zafiropoulo
IPC分类号： H01L21/302
CPC分类号： H01J37/32339 , H01J37/32082 , H01L21/02046 , H01L21/268 , H01L21/3065 , H01L21/67115
摘要： Systems for and methods of laser-enhanced plasma processing of semiconductor materials are disclosed. The method includes supporting a semiconductor material in a processing chamber interior and subjecting the semiconductor material to a plasma process. The method also includes simultaneously heating the wafer surface with a laser beam through a window in the processing chamber to increase the reaction rate of the plasma process. Other methods include performing laser heating of the semiconductor material before or after the plasma process but while the semiconductor material resides in the same chamber interior.
摘要翻译：公开了半导体材料的激光增强等离子体处理的系统和方法。该方法包括将半导体材料支撑在处理室内部并对半导体材料进行等离子体处理。该方法还包括通过处理室中的窗口同时用激光束加热晶片表面以增加等离子体处理的反应速率。其他方法包括在等离子体处理之前或之后对半导体材料进行激光加热，但半导体材料位于相同的室内。

10. 发明申请

US20140057457A1 Non-melt thin-wafer laser thermal annealing methods 有权
标题翻译：非熔化薄晶片激光热退火方法
公开(公告)号：US20140057457A1
公开(公告)日：2014-02-27
申请号：US13595873
申请日：2012-08-27
申请人： Yun Wang , Andrew M. Hawryluk , Xiaoru Wang , Xiaohua Shen
发明人： Yun Wang , Andrew M. Hawryluk , Xiaoru Wang , Xiaohua Shen
IPC分类号： H01L21/268 , H01L21/02
CPC分类号： H01L21/268 , H01L21/02107 , H01L21/28518 , H01L27/14634 , H01L27/1469
摘要： Methods of annealing a thin semiconductor wafer are disclosed. The methods allow for high-temperature annealing of one side of a thin semiconductor wafer without damaging or overheating heat-sensitive electronic device features that are either on the other side of the wafer or embedded within the wafer. The annealing is performed at a temperature below the melting point of the wafer so that no significant dopant redistribution occurs during the annealing process. The methods can be applied to activating dopants or to forming ohmic contacts.
摘要翻译：公开了薄半导体晶片的退火方法。该方法允许薄半导体晶片的一侧进行高温退火，而不会损坏或过热晶片另一侧或嵌入晶片内的热敏电子器件特征。在低于晶片的熔点的温度下进行退火，使得在退火过程中不会发生显着的掺杂剂再分布。该方法可用于活化掺杂剂或形成欧姆接触。

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