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1. 发明授权

US5332648A Potosensitive composition and method of forming a pattern using the same 失效
标题翻译：波纹组合物和使用其形成图案的方法
公开(公告)号：US5332648A
公开(公告)日：1994-07-26
申请号：US813694
申请日：1991-12-27
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , H01L21/30 , G03C1/73
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms --COO.sup.- or --SO.sub.3.sup.- ; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150.degree. C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. ##STR1## where R.sub.1 and R.sub.2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C.dbd.O or --SO.sub.2 --; Y represents a divalent organic group; R.sub.1 and R.sub.2 can be bonded together, forming a ring; and at least one of R.sub.1, R.sub.2, and Y has a substituent which is decomposed by an acid.
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可形成精细的抗蚀剂图案。（1）其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

2. 发明授权

US06340552B1 Photosensitive composition containing a dissolution inhibitor and an acid releasing compound 失效
标题翻译：含有溶解抑制剂和释放酸的化合物的光敏组合物
公开(公告)号：US06340552B1
公开(公告)日：2002-01-22
申请号：US08247356
申请日：1994-05-23
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03C1492
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO— or —SO3—; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种组; X表示

3. 发明授权

US06306553B1 Photosensitive composition and method of forming a pattern using the same 失效
标题翻译：光敏组合物和使用其形成图案的方法
公开(公告)号：US06306553B1
公开(公告)日：2001-10-23
申请号：US08473963
申请日：1995-06-07
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03C176
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO− or —SO3−; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C═O or —SO2—; Y represents a divalent organic group; R1 and R2 can be bonded together, forming a ring; and at least one of R1, R2, and Y has a substituent which is decomposed by an acid.
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种组; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

4. 发明授权

US5348838A Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group 失效
标题翻译：包含碱溶性粘合剂和具有磺酰基的光致酸发生剂的光敏组合物
公开(公告)号：US5348838A
公开(公告)日：1994-09-20
申请号：US921692
申请日：1992-07-30
申请人： Toru Ushirogouchi , Naoko Kihara , Osamu Sasaki , Tsukasa Tada , Takuya Naito , Satoshi Saito
发明人： Toru Ushirogouchi , Naoko Kihara , Osamu Sasaki , Tsukasa Tada , Takuya Naito , Satoshi Saito
IPC分类号： C08G8/28 , C08K5/41 , G03F7/004 , G03C1/492
CPC分类号： C08G8/28 , C08K5/41 , G03F7/0045 , Y10S430/11
摘要： A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.
摘要翻译：感光性组合物包含碱溶性树脂，具有可被酸分解的取代基的化合物，在分解取代基时产生碱溶性基团，或具有能够使碱溶性交联的取代基的化合物（1）表示的曝光时产生酸的化合物：其中R11表示一价有机基团或一价有机基团，其中在引入选自卤素原子，硝基和氰基中的至少一个，R 12，R 13和R 14各自独立地表示氢，卤素原子，硝基，氰基，一价有机基基团或其中引入选自卤素原子，硝基和氰基中的至少一种的一价有机基团。

5. 发明授权

US5372914A Pattern forming method 失效
标题翻译：图案形成方法
公开(公告)号：US5372914A
公开(公告)日：1994-12-13
申请号：US36254
申请日：1993-03-24
申请人： Takuya Naito , Osamu Sasaki , Tsukasa Tada , Naoko Kihara , Toru Ushirogouchi , Satoshi Saito , Takashi Jonai , Hirokazu Niki
发明人： Takuya Naito , Osamu Sasaki , Tsukasa Tada , Naoko Kihara , Toru Ushirogouchi , Satoshi Saito , Takashi Jonai , Hirokazu Niki
IPC分类号： G03F7/004 , G03F7/09 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/094 , Y10S430/122
摘要： On a substrate a protective layer is formed which can suppress the diffusion of a contaminant from the substrate. On the protective layer, thus formed, a resin layer is formed. The resin layer comprises a photosensitive composition containing a compound which has a substituent group capable of being decomposed or cross-linked in the presence of an acid, and a compound which can generate an acid when exposed to light. The resin layer is pattern-exposed to light and then baked at a predetermined temperature. The resin layer is developed, whereby the exposed portions of the resin layer are removed or left, thus forming a pattern comprising lines and spaces each having a predetermined width. Each of the lines of the pattern has a cross-section having neither sloped profile nor undercut profile, and the pattern therefore has an improved resolution.
摘要翻译：在基板上形成保护层，其可以抑制污染物从基板的扩散。在形成的保护层上形成树脂层。树脂层包含含有在酸存在下具有能够分解或交联的取代基的化合物的光敏组合物和在暴露于光时可产生酸的化合物。将树脂层图案曝光，然后在预定温度下烘烤。树脂层被显影，由此树脂层的暴露部分被去除或留下，从而形成包括具有预定宽度的线和间隔的图案。图案的每条线具有既不具有倾斜轮廓也不具有底切轮廓的横截面，因此，该花纹具有改进的分辨率。

6. 发明授权

US06280897B1 Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts 失效
标题翻译：光敏组合物，使用其形成图案的方法，以及电子部件的制造方法
公开(公告)号：US06280897B1
公开(公告)日：2001-08-28
申请号：US08997623
申请日：1997-12-23
申请人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
发明人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
IPC分类号： G03F7004
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by — (CH2)m—(m is an integer of 3 to 9), and R14 is a hydrophilic group.
摘要翻译：一种感光性组合物，其含有具有下述通式（1A）表示的重复链段的聚合物和能够通过照射光化辐射而产生酸的化合物。其中，R 11为氢原子，脂肪族烃基，烷氧基基团，卤素原子或氰基，R 12是脂族烃基或环状烯烃，R 13是（a）具有2〜12个碳原子的直链烯烃，环状烯烃或杂环基中的任一种和（ b）由 - （CH 2）m - （m为3〜9的整数）表示的烃基，R 14为亲水性基团。

7. 发明授权

US5853952A Color developing organic material, color developing resin composition and colored thin film pattern 失效
标题翻译：显色有机材料，彩色显影树脂组合物和着色薄膜图案
公开(公告)号：US5853952A
公开(公告)日：1998-12-29
申请号：US705265
申请日：1996-08-29
申请人： Toru Ushirogouchi , Makoto Nakase , Akira Yoshizumi , Naoko Kihara , Takuya Naito , Naomi Shida , Koji Asakawa
发明人： Toru Ushirogouchi , Makoto Nakase , Akira Yoshizumi , Naoko Kihara , Takuya Naito , Naomi Shida , Koji Asakawa
IPC分类号： C08G12/06 , C08G73/00 , G02B5/22 , G03F7/00 , G03F7/004 , G03F7/105 , G03C1/73
CPC分类号： C08G12/06 , G03F7/0007 , G03F7/0045 , G03F7/105 , G02B5/22 , Y10S430/163
摘要： There is disclosed a color developing resin composition comprising a base polymer, a dialdehyde represented by the general formula OHC--R.sup.1' --CHO, a diamine represented by the general formula H.sub.2 N--R.sup.2' --NH.sub.2 (at least one of R.sup.1' and R.sup.2' is an aromatic group), a compound which produces an acid by light irradiating and a resin which is crosslinked with the acid.
摘要翻译：公开了一种显色树脂组合物，其包含基础聚合物，由通式OHC-R1'-CHO表示的二醛，由通式H2N-R2'-NH2表示的二胺（R1'和R2'中的至少一个）是芳族基团），通过光照射产生酸的化合物和与酸交联的树脂。

8. 发明授权

US06168897A Method of forming patterns 失效
标题翻译：形成图案的方法
公开(公告)号：US06168897A
公开(公告)日：2001-01-02
申请号：US09277744
申请日：1999-03-29
申请人： Toru Ushirogouchi , Makoto Nakase , Takuya Naito , Koji Asakawa
发明人： Toru Ushirogouchi , Makoto Nakase , Takuya Naito , Koji Asakawa
IPC分类号： G03F700
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/09 , G03F7/091 , G03F7/2004 , G03F7/2006
摘要： Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the light-sensitive layer with a light having a wavelength range shorter than the maximum wavelength in the third absorption band from the long-wave side in the absorption spectrum of the aromatic compound and longer than the maximum wavelength in the fourth absorption band from the same, thereby to cause a photochemical reaction in the light-sensitive layer, and a step of developing the exposed light-sensitive layer, optionally after heat-treating the layer, so as to selectively remove the exposed area of the layer or leave the area as it is. The method gives a pattern having a high resolving power and an excellent dry-etching resistance.
摘要翻译：公开了一种在基板上形成图案的方法，包括在基板上形成含有芳族化合物的感光层的步骤，使用波长范围短于在芳族化合物的吸收光谱中的长波侧的第三吸收带中的最大波长比第四吸收带中的最大波长长，从而在感光层中引起光化学反应，任选地在热处理该层之后，显影出曝光的感光层的步骤，以选择性地去除该层的曝光区域，或者直接离开该区域。该方法给出了具有高分辨能力和优异的耐干蚀刻性的图案。

9. 发明授权

US6060207A Photosensitive material 失效
标题翻译：感光材料
公开(公告)号：US6060207A
公开(公告)日：2000-05-09
申请号：US499974
申请日：1995-07-10
申请人： Naomi Shida , Toru Ushirogouchi , Takuya Naito , Makoto Nakase
发明人： Naomi Shida , Toru Ushirogouchi , Takuya Naito , Makoto Nakase
IPC分类号： G03F7/004 , G03F7/039 , G03F7/008
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111 , Y10S430/115 , Y10S430/122
摘要： A photosensitive material which is very low in absorption of a light source of short wavelength and excellent in dry etch resistance. This photosensitive material comprises a compound having a terpenoid skeleton. Preferably, the compound having a terpenoid skeleton is a compound having a monovalent menthyl group or menthyl derivative group which can be represented by the general formula (1). ##STR1## wherein R is a hydrogen atom or a monovalent hydrocarbon group, R.sup.1 may be the same with or different from each other and individually represents a hydrogen atom, a halogen atom, a hydrocarbon group, a hydroxyl group, an alkoxyl group, an amino group, an alkoxy group, an amino group, an imide group, an amide group, or a sulfonyl group, a carboxyl group, a carbonyl group, or a sulfonamide group, and a pair of neighboring R.sup.1 may be connected together to form a closed ring.
摘要翻译：一种感光材料，其对短波长的光源的吸收非常低，并且具有优异的耐干蚀刻性。该感光材料包含具有萜类骨架的化合物。优选具有萜类骨架的化合物是具有可以由通式（1）表示的一价薄荷基或薄荷基衍生物基团的化合物。其中R为氢原子或一价烃基，R 1可以相同或不同，分别表示氢原子，卤素原子，烃基，羟基，烷氧基，氨基，烷氧基，氨基，酰亚胺基，酰胺基或磺酰基，羧基，羰基或磺酰胺基，并且一对相邻的R 1可以连接在一起形成封闭环。

10. 发明授权

US5928841A Method of photoetching at 180 to 220 失效
标题翻译：在180至220NM下光刻的方法
公开(公告)号：US5928841A
公开(公告)日：1999-07-27
申请号：US462546
申请日：1995-06-05
申请人： Toru Ushirogouchi , Makoto Nakase , Takuya Naito , Koji Asakawa
发明人： Toru Ushirogouchi , Makoto Nakase , Takuya Naito , Koji Asakawa
IPC分类号： G03F7/004 , G03F7/039 , G03F7/09 , G03F7/20 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/09 , G03F7/091 , G03F7/2006 , G03F7/2004
摘要： Disclosed is a method of forming a pattern on a substrate, comprising a step of forming a light-sensitive layer containing an aromatic compound on a substrate, a step of patternwise exposing the light-sensitive layer with a light having a wavelength range shorter than the maximum wavelength; in the third absorption band from the long-wave side in the absorption spectrum of the aromatic compound and longer than the maximum wavelength in the fourth absorption band from the same, thereby to cause a photochemical reaction in the light-sensitive layer, and a step of developing the exposed light-sensitive layer, optionally after heat-treating the layer, so as to selectively remove the exposed area of the layer or leave the area as it is. The method gives a pattern having a high resolving power and an excellent dry-etching resistance.
摘要翻译：公开了一种在基板上形成图案的方法，包括在基板上形成含有芳族化合物的感光层的步骤，使用波长范围短于最大波长; 在芳香族化合物的吸收光谱中的长波侧的第三吸收带中，比来自该芳香族化合物的第四吸收带的最大波长长，从而在感光层中产生光化学反应，显影曝光的感光层，任选地在热处理该层之后，以选择性地去除该层的暴露区域，或者直接离开该区域。该方法给出了具有高分辨能力和优异的耐干蚀刻性的图案。

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