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1. 发明授权

US06340552B1 Photosensitive composition containing a dissolution inhibitor and an acid releasing compound 失效
标题翻译：含有溶解抑制剂和释放酸的化合物的光敏组合物
公开(公告)号：US06340552B1
公开(公告)日：2002-01-22
申请号：US08247356
申请日：1994-05-23
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03C1492
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO— or —SO3—; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种组; X表示

2. 发明授权

US06306553B1 Photosensitive composition and method of forming a pattern using the same 失效
标题翻译：光敏组合物和使用其形成图案的方法
公开(公告)号：US06306553B1
公开(公告)日：2001-10-23
申请号：US08473963
申请日：1995-06-07
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03C176
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO− or —SO3−; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C═O or —SO2—; Y represents a divalent organic group; R1 and R2 can be bonded together, forming a ring; and at least one of R1, R2, and Y has a substituent which is decomposed by an acid.
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种组; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

3. 发明授权

US5332648A Potosensitive composition and method of forming a pattern using the same 失效
标题翻译：波纹组合物和使用其形成图案的方法
公开(公告)号：US5332648A
公开(公告)日：1994-07-26
申请号：US813694
申请日：1991-12-27
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , H01L21/30 , G03C1/73
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms --COO.sup.- or --SO.sub.3.sup.- ; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150.degree. C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. ##STR1## where R.sub.1 and R.sub.2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C.dbd.O or --SO.sub.2 --; Y represents a divalent organic group; R.sub.1 and R.sub.2 can be bonded together, forming a ring; and at least one of R.sub.1, R.sub.2, and Y has a substituent which is decomposed by an acid.
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可形成精细的抗蚀剂图案。（1）其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

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