专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4747608A Wafer chuck 失效
标题翻译：晶圆卡盘
公开(公告)号：US4747608A
公开(公告)日：1988-05-31
申请号：US792584
申请日：1985-10-29
申请人： Mitsuya Sato , Nobuyoshi Deguchi , Shunzo Imai
发明人： Mitsuya Sato , Nobuyoshi Deguchi , Shunzo Imai
IPC分类号： H01L21/683 , B23B31/00
CPC分类号： H01L21/6838 , Y10T279/11 , Y10T279/3481
摘要： A wafer chuck for releasably holding a wafer, includes a base member having an upper surface for carrying and holding thereon the wafer, a lift mechanism operative on the wafer when it rests on the base member to move the wafer relative to the base member in a direction away from the base member, the lift mechanism having an operative member extending substantially in a direction to a radially inward position from a radially outward position of the base member, the operative member having an end portion movable, relative to the base member, between a first position at which it is retracted from the upper surface of the base member and a second position at which it is protrudent from the upper surface of the base member so as to engage with the wafer to move the same relative to the base member, and driving means for moving, relative to the base member, the end portion of the operative member between the first and second positions.
摘要翻译：用于可释放地保持晶片的晶片卡盘包括具有用于承载和保持其上的晶片的上表面的基座构件;当晶片搁置在基座构件上时，其在晶片上操作以在晶片上相对于基座构件移动的升降机构方向远离基座构件，提升机构具有一个可操作构件，其基本上沿着从基座构件的径向向外位置向径向向内位置的方向延伸，该操作构件具有可相对于底座构件在相对于底座构件之间移动的端部从基部构件的上表面缩回的第一位置和从基部构件的上表面突出的第二位置，以便与晶片接合以使其相对于基座构件移动，以及驱动装置，用于相对于基座构件在第一和第二位置之间移动操作构件的端部。

2. 发明授权

US06638672B2 Exposure apparatus, coating/developing apparatus, method of transferring a substrate, method of producing a device, semiconductor production factory, and method of maintaining an exposure apparatus 失效
标题翻译：曝光装置，涂布/显影装置，转印基板的方法，制造装置的方法，半导体生产工厂和维持曝光装置的方法
公开(公告)号：US06638672B2
公开(公告)日：2003-10-28
申请号：US09864256
申请日：2001-05-25
申请人： Nobuyoshi Deguchi
发明人： Nobuyoshi Deguchi
IPC分类号： G03C500
CPC分类号： H01L21/67126 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70908 , G03F7/70933 , G03F7/70991
摘要： A photolithographic apparatus in which a light source exposes a substrate for patterning includes an enclosure having a controllable internal ambient for transferring the substrate in and out of the apparatus, a gate valve through which the substrate is transferred into or out of the enclosure, and a gas ejection unit for ejecting a gas into a region in close proximity to the gate valve, and in a direction substantially perpendicular to the direction of movement of the substrate as it is transferred into or out of the enclosure. A gas curtain is formed by the gas ejected by the gas ejection unit, such that an opening of the gate valve is shielded by the gas curtain, thereby suppressing intrusion or leakage of an ambient gas which can occur when the substrate is transferred in or out of the apparatus.
摘要翻译：其中光源曝光用于图案化的基板的光刻设备包括：具有可控的内部环境的外壳，用于将基板输入和输出设备;栅极阀，通过该闸阀将基板传送到外壳中，以及气体喷射单元，用于将气体喷射到靠近闸阀的区域中，并且在基板沿着被传送到外壳中时基本上垂直于基板的移动方向的方向。通过由气体喷射单元喷射的气体形成气幕，使得闸阀的开口被气幕屏蔽，从而抑制当基板被输入或移出时可能发生的环境气体的入侵或泄漏的装置。

3. 发明授权

US06856404B2 Scanning exposure method and apparatus, and device manufacturing method using the same 失效
标题翻译：扫描曝光方法和装置以及使用其的装置制造方法
公开(公告)号：US06856404B2
公开(公告)日：2005-02-15
申请号：US09323034
申请日：1999-06-01
申请人： Kazunori Iwamoto , Nobuyoshi Deguchi
发明人： Kazunori Iwamoto , Nobuyoshi Deguchi
IPC分类号： G03F7/20 , H01L21/027 , G01B9/02
CPC分类号： G03F7/70358 , G03F7/70725 , G03F7/70775
摘要： A scan type exposure for transferring a pattern onto a substrate by scan exposure. The apparatus includes a stage for moving the substrate in a Y direction corresponding to a scan direction, and in an X direction intersecting the scan direction, an alignment scope for performing measurement for alignment of the substrate, at a position spaced, in the Y direction, from a position where the exposure of the substrate is to be carried out, an X measuring device for performing yaw measurement of said stage by use of an X reflection surface provided on said stage along the Y direction, a Y measuring device for performing yaw measurement of the stage by use of a Y reflection surface provided on the stage along the X direction, and a controller being operable to select yaw measurement information of the X measuring device for an alignment operation including the alignment measurement using the alignment scope, and being operable to select yaw measurement information of the Y measuring device for the scan exposure.
摘要翻译：用于通过扫描曝光将图案转印到基板上的扫描型曝光。该装置包括：用于在与扫描方向对应的Y方向上移动基板的台，并且在与扫描方向相交的X方向上，用于在Y方向上间隔开的位置处进行用于对准基板的测量的对准范围从要进行基板的曝光的位置，用于通过使用沿着Y方向设置在所述台上的X反射面来进行所述平台的偏航测量的X测量装置，用于执行偏航的Y测量装置通过使用沿X方向设置在舞台上的Y反射面来测量舞台，以及控制器，用于选择X测量装置的偏航测量信息，以进行包括使用对准范围的对准测量的对准操作，并且可操作地选择用于扫描曝光的Y测量装置的偏航测量信息。

4. 发明授权

US06608666B2 Reference plate, exposure apparatus, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method 失效
标题翻译：参考板，曝光装置，装置制造系统，装置制造方法，半导体制造厂和曝光装置的维修方法
公开(公告)号：US06608666B2
公开(公告)日：2003-08-19
申请号：US09881804
申请日：2001-06-18
申请人： Nobuyoshi Deguchi , Tetsuya Mori
发明人： Nobuyoshi Deguchi , Tetsuya Mori
IPC分类号： G03B2742
CPC分类号： G03F7/70216 , G03F9/7015 , G03F9/7076
摘要： A reference plate used with an exposure apparatus that emits an exposure beam to irradiate a reference mark pattern with observation light, to detect the reflected light, and to obtain a position of the reference mark pattern. A respective reference plate is fixed on a mask stage and a wafer stage of the exposure apparatus for exposing a wafer on the wafer stage to a mask pattern on the mask stage, and a surface of the reference mark pattern, which is an observation light irradiation surface side of the exposure apparatus, is not directly exposed to the surrounding atmosphere.
摘要翻译：与曝光装置一起使用的参考板，该曝光装置发射曝光光束，用观察光照射参考标记图案，以检测反射光，并获得参考标记图案的位置。将各参考板固定在曝光装置的掩模台和晶片台上，用于将晶片台上的晶片暴露于掩模台上的掩模图案，以及作为观察光照射的参考标记图案的表面曝光装置的表面侧不会直接暴露在周围的大气中。

5. 发明授权

US06493062B2 Driving apparatus and exposure apparatus 有权
标题翻译：驱动装置和曝光装置
公开(公告)号：US06493062B2
公开(公告)日：2002-12-10
申请号：US09286447
申请日：1999-04-06
申请人： Yukio Tokuda , Nobuyoshi Deguchi , Shigeyuki Uzawa , Yukio Takabayashi , Hiromichi Hara
发明人： Yukio Tokuda , Nobuyoshi Deguchi , Shigeyuki Uzawa , Yukio Takabayashi , Hiromichi Hara
IPC分类号： G03B2742
CPC分类号： F16F15/02 , G03B27/42 , G03F7/70725 , G03F7/709
摘要： A driving apparatus for moving an object has a stage which moves the object mounted thereon, a base member supporting the stage, a reaction force reception structure for receiving a reaction force generated upon driving the stage, a damp member for damping transmission of vibration with a predetermined frequency range from the reaction force reception structure to a floor and an actuator for generating a force between the base member and the reaction force reception structure.
摘要翻译：用于移动物体的驱动装置具有使安装在其上的物体移动的台阶，支撑台的基座部件，用于接收在驱动台架时产生的反作用力的反作用力接收结构，用于阻止振动传播的阻尼部件从反作用力接收结构到地面的预定频率范围和用于在基部构件和反作用力接收结构之间产生力的致动器。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式