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1. 发明申请

US20090168036A1 EXPOSURE APPARATUS, STRUCTURE, METHOD FOR SETTING UP APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置，结构，设置方法和装置制造方法
公开(公告)号：US20090168036A1
公开(公告)日：2009-07-02
申请号：US12341412
申请日：2008-12-22
申请人： Hiromichi Hara , Yasuyo Kawabata
发明人： Hiromichi Hara , Yasuyo Kawabata
IPC分类号： G03B27/42
CPC分类号： G03F7/70833 , G03F7/709 , G03F7/7095
摘要： An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
摘要翻译：本发明的曝光装置被配置为经由投影透镜系统110将原稿上的图案曝光到晶片上。曝光装置包括设置支脚105，压板103,107和109，其上至少一个光罩被配置为保持原稿的投影光学系统110，被配置为保持晶片的晶片台装置102和配置成测量原始台或晶片台的位置的干涉仪被安装，隔振支撑机构 105，其设置在压板103,107,109与设置支柱105之间，并且被构造成减少振动;以及填充构件122，其通过硬化硬化型液体113而形成，硬化型液体113填充在设置腿105和设定板 101。

2. 发明授权

US07227617B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07227617B2
公开(公告)日：2007-06-05
申请号：US11190898
申请日：2005-07-28
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03B27/42 , G03B27/54 , G03B27/58 , G03B27/32
CPC分类号： G03B27/42 , G03F7/70841 , G03F7/709
摘要： An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
摘要翻译：一种包括用于将基板暴露于能量图案的曝光系统的设备，具有包括能够彼此分离的第一和第二单元的外壁的真空室和由所述第一单元支撑的第一防振安装座，并用于支持曝光系统的第一组成元件。第一防振支架设置在真空室的外部。该装置还包括由第二单元支撑的用于支撑曝光系统的第二构成元件的第二防振安装座。

3. 发明授权

US06623907B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06623907B2
公开(公告)日：2003-09-23
申请号：US09774714
申请日：2001-02-01
申请人： Jun Numata , Aki Suzuki , Hiromichi Hara , Norihiro Natsume , Kiyoshi Murata , Masafumi Yamamoto , Akimasa Soyano , Toru Kajita , Tsutomu Shimokawa
发明人： Jun Numata , Aki Suzuki , Hiromichi Hara , Norihiro Natsume , Kiyoshi Murata , Masafumi Yamamoto , Akimasa Soyano , Toru Kajita , Tsutomu Shimokawa
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/111 , Y10S430/128
摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.
摘要翻译：一种正色辐射敏感性树脂组合物，其包含：（A）具有至少一个氨基的低分子量化合物，其中所述氮原子具有与其键合的至少一个氢原子，并且至少一个氢原子被叔丁氧基羰基，（B）光酸产生剂和（C-1）不溶于或几乎不溶于碱的树脂，其被酸解离基团保护并且当酸解离基解离时变得可溶于碱，或（C -2）碱溶性树脂和碱溶性控制剂。还公开了包含低分子量化合物（A），光酸产生剂（B），碱溶性树脂（D）和能够与碱溶性树脂交联的化合物的负色辐射敏感性树脂组合物在酸（E）的存在下。该组合物可用作化学放大抗蚀剂，其有效地响应各种辐射，表现出优异的灵敏度和分辨率，即使图案是隔离线图案，也以高精度和稳定的方式形成精细图案。

4. 发明授权

US08780329B2 Exposure apparatus, structure, method for setting up apparatus, and device manufacturing method having filling member formed by hardening liquid to support setting leg 有权
标题翻译：用于设置装置的曝光装置，结构，方法以及具有通过硬化液体形成的填充构件以支撑设置腿的装置制造方法
公开(公告)号：US08780329B2
公开(公告)日：2014-07-15
申请号：US12341412
申请日：2008-12-22
申请人： Hiromichi Hara , Yasuyo Kawabata
发明人： Hiromichi Hara , Yasuyo Kawabata
IPC分类号： G03B27/32 , G03F7/20
CPC分类号： G03F7/70833 , G03F7/709 , G03F7/7095
摘要： An exposure apparatus of the present invention is configured to expose a pattern on an original onto a wafer via a projection lens system 110. The exposure apparatus includes a setting leg 105, platens 103, 107, and 109 on which at least one of a reticle stage apparatus 108 configured to hold the original, the projection optical system 110, a wafer stage apparatus 102 configured to hold the wafer, and an interferometer configured to measure a position of the original stage or the wafer stage is mounted, a vibration isolation support mechanism 105 which is provided between the platens 103, 107, and 109 and the setting leg 105 and configured to reduce a vibration, and a filling member 122 formed by hardening a hardening type liquid 113 which is filled between the setting leg 105 and a setting floor 101.
摘要翻译：本发明的曝光装置被配置为经由投影透镜系统110将原稿上的图案曝光到晶片上。曝光装置包括设置支脚105，压板103,107和109，其上至少一个光罩被配置为保持原稿的投影光学系统110，被配置为保持晶片的晶片台装置102和配置成测量原始台或晶片台的位置的干涉仪被安装，隔振支撑机构 105，其设置在压板103,107,109与设置支柱105之间，并且被构造成减少振动;以及填充构件122，其通过硬化硬化型液体113而形成，硬化型液体113填充在设置腿105和设定板 101。

5. 发明申请

US20090195767A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090195767A1
公开(公告)日：2009-08-06
申请号：US12361296
申请日：2009-01-28
申请人： Masatomi Yoshida , Hiromichi Hara
发明人： Masatomi Yoshida , Hiromichi Hara
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70833 , G03F7/709
摘要： An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the support and configured to support the structure, and a stopper accommodated in an internal space of the gas spring so as to prevent the structure from moving relative to the support in excess of an allowable level.
摘要翻译：曝光装置包括被配置为将原稿的图案投影到基板上的部件，被配置为支撑部件的结构，被配置为支撑结构的支撑件，位于结构和支撑件之间并被配置为支撑所述结构和容纳在所述气弹簧的内部空间中的止动件，以防止所述结构相对于所述支撑件移动超过允许水平。

6. 发明申请

US20070160356A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070160356A1
公开(公告)日：2007-07-12
申请号：US11688370
申请日：2007-03-20
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03B17/00
CPC分类号： G03B27/42 , G03F7/70841 , G03F7/709
摘要： An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
摘要翻译：一种包括用于将基板暴露于能量图案的曝光系统的设备，具有包括能够彼此分离的第一和第二单元的外壁的真空室和由所述第一单元支撑的第一防振安装座，并用于支持曝光系统的第一组成元件。第一防振支架设置在真空室的外部。该装置还包括由第二单元支撑的用于支撑曝光系统的第二构成元件的第二防振安装座。

7. 发明授权

US6048659A Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US6048659A
公开(公告)日：2000-04-11
申请号：US165096
申请日：1998-10-02
申请人： Masaaki Inoue , Katsumi Inomata , Hiromichi Hara , Yoshiji Yumoto
发明人： Masaaki Inoue , Katsumi Inomata , Hiromichi Hara , Yoshiji Yumoto
IPC分类号： G03F7/004 , G03F7/022 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0048 , G03F7/022
摘要： A radiation-sensitive resin composition including (1) an alkali-soluble resin, (2) a quinonediazide compound and (3) a mixed solvent including a monoketone having 7 to 14 carbon atoms and an alkoxypropionic acid alkyl ester is provided. The composition can be coated in a uniform thickness in a small coating weight. The composition has a high sensitivity and a high resolution, and also enables formation of resist patterns having a superior pattern shape with less pattern defects. Thus, it is suitable as a positive resist.
摘要翻译：提供了包含（1）碱溶性树脂，（2）醌二叠氮化合物和（3）含有7-14个碳原子的单酮和烷氧基丙酸烷基酯的混合溶剂的辐射敏感性树脂组合物。组合物可以以小的涂层重量以均匀的厚度涂覆。该组合物具有高灵敏度和高分辨率，并且还能够形成具有较少图案缺陷的优异图案形状的抗蚀剂图案。因此，它适合作为正性抗蚀剂。

8. 发明授权

US07821617B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07821617B2
公开(公告)日：2010-10-26
申请号：US11688370
申请日：2007-03-20
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03B27/42 , G03B27/54 , G03B27/58 , G03B27/32
CPC分类号： G03B27/42 , G03F7/70841 , G03F7/709
摘要： An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.
摘要翻译：一种包括用于将基板暴露于能量图案的曝光系统的设备，具有包括能够彼此分离的第一和第二单元的外壁的真空室和由所述第一单元支撑的第一防振安装座，并用于支持曝光系统的第一组成元件。第一防振支架设置在真空室的外部。该装置还包括由第二单元支撑的用于支撑曝光系统的第二构成元件的第二防振安装座。

9. 发明申请

US20100079736A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20100079736A1
公开(公告)日：2010-04-01
申请号：US12571003
申请日：2009-09-30
申请人： Hiroyuki Wada , Hiromichi Hara
发明人： Hiroyuki Wada , Hiromichi Hara
IPC分类号： G03B27/42
CPC分类号： H01L21/68 , G03F7/70833 , G03F7/7085 , G03F7/709 , H01L21/67259
摘要： An apparatus that exposes a pattern of an original onto a plate through a projection optical system. The apparatus includes a reference base that holds the projection optical system, a supporting unit configured to elastically support the reference base, a base structure that holds the supporting unit on an installation floor, a detection unit configured to detect a relative position between the base structure and the reference base, and an adjustment unit, which is disposed at the installation floor of the base structure, configured to adjust an attitude of the base structure based on the results detected by the detection unit.
摘要翻译：一种通过投影光学系统将原稿图案曝光在印版上的装置。该装置包括：保持投影光学系统的参考基座;被配置为弹性地支撑参考基座的支撑单元，将支撑单元保持在安装地板上的基座结构;检测单元，被配置为检测基座结构和基准基座以及设置在基础结构的安装地板处的调整单元，其构造成基于由检测单元检测到的结果来调整基础结构的姿态。

10. 发明授权

US06914663B2 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US06914663B2
公开(公告)日：2005-07-05
申请号：US10661972
申请日：2003-09-15
申请人： Hiromichi Hara
发明人： Hiromichi Hara
IPC分类号： G03B27/42 , G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/709 , G03B27/42 , G03F7/70933
摘要： An exposure apparatus has an optical system and transfers a pattern of a mask to a substrate via the optical system. The apparatus includes a structure, a partition wall which defines a space including an optical path of the optical system, and an elastic seal member which couples the structure and the partition wall to seal the space. The elastic seal member is arranged so that a hollow cylinder is compressed in a direction of an axis of the hollow cylinder. The hollow cylinder, in an uncompressed state, includes a member undulated in a cross section perpendicular to the axis and a shape of the uncompressed-state hollow cylinder in the cross section being substantially uniform along the axis.
摘要翻译：曝光装置具有光学系统，并通过光学系统将掩模图案传送到基板。该装置包括一个结构，一个限定了包括该光学系统的光路的空间的分隔壁，以及一个弹性密封件，它们连接该结构和该分隔壁以密封该空间。弹性密封构件被布置成使得中空圆柱体在中空圆柱体的轴线的方向上被压缩。处于未压缩状态的中空圆柱体包括在垂直于轴线的横截面中起伏的构件，并且横截面中的未压缩状态的中空圆柱体的形状沿轴线基本均匀。

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