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1. 发明授权

US5777744A Exposure state detecting system and exposure apparatus using the same 失效
标题翻译：曝光状态检测系统及使用其的曝光装置
公开(公告)号：US5777744A
公开(公告)日：1998-07-07
申请号：US648417
申请日：1996-05-15
申请人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki , Seiji Takeuchi
发明人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki , Seiji Takeuchi
IPC分类号： G03F7/20 , G01B11/00
CPC分类号： G03F7/70558 , G03F7/70641 , G03F7/70675
摘要： A state-of-formation detecting system for detecting a state of formation of a periodic pattern formed, through exposure light, upon an object with a photosensitive material applied thereto, includes a light projecting device for projecting input light onto the periodic pattern, and a determining device for receiving signal light from the periodic pattern and for detecting a change in the input light, to determine the state of formation of the periodic pattern on the basis of the change in the input light.
摘要翻译：一种用于检测通过曝光光形成的周期性图案的形成状态的状态检测系统，包括用于将输入光投射到周期性图案上的投光装置，以及确定装置，用于接收来自周期性图案的信号光并用于检测输入光的变化，以基于输入光的变化确定周期性图案的形成状态。

2. 发明授权

US5834767A Surface position detecting system and projection exposure apparatus using the same 失效
标题翻译：表面位置检测系统和使用其的投影曝光装置
公开(公告)号：US5834767A
公开(公告)日：1998-11-10
申请号：US790798
申请日：1997-01-30
申请人： Masanobu Hasegawa , Minoru Yoshii , Kyoichi Miyazaki
发明人： Masanobu Hasegawa , Minoru Yoshii , Kyoichi Miyazaki
IPC分类号： G01B11/00 , G01B11/26 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7026
摘要： A detecting system for detecting a surface position of an object, includes a light source, a first grating having a light collecting function, wherein the first grating is illuminated with light from the light source, a second grating having a light collecting function, a first optical system for imaging the first grating onto the object in a direction oblique to the surface of the object, a second optical system for re-imaging the image of the first grating, on the surface of the object, onto the second grating, wherein a moire fringe is produced by the second grating and the re-imaged image of the first grating, and a photodetector for detecting a position of a converged point of convergent light as produced by the moire fringe, wherein the surface position information of the object is determined on the basis of information related to the converged point position as detected by the photodetector.
摘要翻译：一种用于检测物体的表面位置的检测系统，包括光源，具有聚光功能的第一光栅，其中第一光栅被来自光源的光照射，具有光收集功能的第二光栅，第一光栅光学系统，用于将物体上的第一光栅成像到物体表面上的方向上;第二光学系统，用于将物体表面上的第一光栅的图像重新成像到第二光栅上，其中，莫尔条纹由第二光栅和第一光栅的再成像图像产生，以及光电检测器，用于检测由莫尔条纹产生的会聚光的会聚点的位置，其中确定物体的表面位置信息基于与由光检测器检测到的会聚点位置有关的信息。

3. 发明授权

US5969820A Surface position detecting system and exposure apparatus using the same 失效
标题翻译：表面位置检测系统及使用其的曝光装置
公开(公告)号：US5969820A
公开(公告)日：1999-10-19
申请号：US873748
申请日：1997-06-12
申请人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki
发明人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7026
摘要： A surface position detecting system for detecting a position of a surface of an object disposed opposed to an exposure system, with respect to a direction of an optical system of the exposure system, includes an irradiation device for projecting light to the surface of the object, obliquely with respect to the optical axis of the exposure system, a detecting device for detecting light from the surface of the object irradiated with light from the irradiation device, the detecting device detecting a position of the surface of the object with respect to the optical axis direction of the exposure system, and a light quantity adjusting device provided in at least least one of the irradiation device and the detecting device, for controlling the quantity of light passage.
摘要翻译：用于检测与曝光系统相对设置的物体的表面相对于曝光系统的光学系统的方向的位置的表面位置检测系统包括：用于将光投射到物体的表面的照射装置，相对于曝光系统的光轴倾斜的检测装置，用于检测来自被照射装置的光的物体的表面的光的检测装置，检测装置检测物体相对于光轴的表面的位置曝光系统的方向，以及设置在照射装置和检测装置的至少一个中的光量调节装置，用于控制光通过量。

4. 发明授权

US6124601A Position sensor having a reflective projecting system and device fabrication method using the sensor 失效
标题翻译：具有反射投影系统的位置传感器和使用传感器的装置制造方法
公开(公告)号：US6124601A
公开(公告)日：2000-09-26
申请号：US766755
申请日：1996-12-13
申请人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki
发明人： Minoru Yoshii , Masanobu Hasegawa , Kyoichi Miyazaki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01N21/86
CPC分类号： G03F9/7026
摘要： A position detecting apparatus for detecting the position of a substrate in an interval direction in which the substrate is spaced by an interval form a pattern-printing projection optical system for printing pattern on the substrate includes first and second luminous flux projecting and receiving systems and a detector. The first luminous flux projecting system projects a first luminous flux to the substrate form a direction oblique to the interval direction. The first luminous flux receiving system receives a first luminous flux after the first luminous flux is reflected form the substrate. The second luminous flux projecting system projects a second luminous flux to a reflection member secured to the bottom end of the pattern-printing projection optical system. The second luminous flux receiving system receives the second luminous flux after the second luminous flux is reflected by the reflection member. The detection detects the position of the substrate in the interval direction by detecting the position at which the first luminous flux receiving system receives the first luminous flux and by detecting the position at which the second luminous flux receiving system receives the second luminous flux.
摘要翻译：一种位置检测装置，用于在衬底间隔开的间隔方向上检测衬底的位置，形成用于在衬底上印刷图案的图案印刷投影光学系统，包括第一和第二光束投射和接收系统，以及探测器。第一光通量投影系统将第一光束投射到基板，形成与间隔方向相反的方向。第一光束接收系统在从基板反射第一光通量之后接收第一光通量。第二光通量投影系统将第二光束投射到固定到图案印刷投影光学系统的底端的反射构件。第二光束接收系统在第二光束被反射构件反射之后接收第二光束。该检测通过检测第一光束接收系统接收到第一光通量的位置，并且通过检测第二光束接收系统接收到第二光束的位置来检测基板在间隔方向上的位置。

5. 发明授权

US5750294A Best focus determining method 失效
标题翻译：最佳焦点确定方法
公开(公告)号：US5750294A
公开(公告)日：1998-05-12
申请号：US685464
申请日：1996-07-24
申请人： Masanobu Hasegawa , Minoru Yoshii , Seiji Takeuchi
发明人： Masanobu Hasegawa , Minoru Yoshii , Seiji Takeuchi
IPC分类号： G03B27/72 , G03F7/20 , G03F7/207 , G03F7/22 , G03F9/00 , G03F9/02 , H01L21/027
CPC分类号： G03F7/70558 , G03F7/70241 , G03F7/70591 , G03F7/70641
摘要： Disclosed is a method of determining a best focus position or best exposure amount of a projection lens in an arrangement wherein a reticle is placed on a plane perpendicular to an optical axis of the projection lens, wherein a pattern having periodicity in a predetermined direction is provided on a surface of the reticle, wherein the pattern is transferred to a photosensitive substrate by the projection lens to form a printed pattern thereon. The method includes providing the pattern by using a plurality of zigzag openings of a constant line width, extending in a direction perpendicular to the predetermined direction and being arrayed with a constant periodicity along that direction, transferring the pattern to the photosensitive substrate sequentially with different focus positions to form plural printed patterns thereon, imaging the printed patterns upon an image pickup surface of photoelectrically converting means; calculating, from an imagewise signal produced by the photoelectrically converting means, information related to one frequency component of zigzag lines, constituting an outline of an image of the zigzag opening, and determining the best focus position on the basis of the information.
摘要翻译：公开了一种确定投影透镜的最佳聚焦位置或最佳曝光量的方法，其中将掩模版放置在垂直于投影透镜的光轴的平面上，其中提供了沿预定方向具有周期性的图案在掩模版的表面上，其中通过投影透镜将图案转印到感光基板上，以在其上形成印刷图案。该方法包括通过使用在垂直于预定方向的方向上延伸的恒定线宽度的多个之字形开口来提供图案，并沿着该方向以恒定的周期排列，以不同的焦点依次传送图案到感光基片在其上形成多个印刷图案的位置，将印刷图案成像在光电转换装置的图像拾取表面上; 根据由光电转换装置产生的成像信号，计算与Z字形线的一个频率分量有关的信息，构成Z字形开口的图像的轮廓，并根据该信息确定最佳对焦位置。

6. 发明授权

US06636311B1 Alignment method and exposure apparatus using the same 失效
标题翻译：对准方法和使用其的曝光装置
公开(公告)号：US06636311B1
公开(公告)日：2003-10-21
申请号：US09450682
申请日：1999-11-30
申请人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
发明人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
IPC分类号： G01B1100
CPC分类号： G03F9/7061 , B82Y10/00 , G03F9/7076 , G03F9/7084 , G03F9/7092
摘要： An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.
摘要翻译：一种用于对准第一和第二物体的对准方法，在用于将第一物体的图案转印到第二物体上的涂布抗蚀剂的曝光装置中，包括产生与对准标记形成区域相关的取向偏移值的处理第二个目的是在其上形成抗蚀剂涂层之后，以及在曝光装置中，基于产生的偏移值，将第一物体与第二物体对准被涂覆有抗蚀剂的处理。

7. 发明授权

US5369486A Position detector for detecting the position of an object using a diffraction grating positioned at an angle 失效
$Position detector for detecting the position of an object using a diffraction grating positioned at an angle$
标题翻译：位置检测器，用于使用位于一定角度的衍射光栅来检测物体的位置
公开(公告)号：US5369486A
公开(公告)日：1994-11-29
申请号：US947383
申请日：1992-09-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Minoru Yoshii , Kenji Saitoh , Masanobu Hasegawa , Koichi Sentoku
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049
摘要： A position detector includes a diffraction grating provided on the surface of an object, an illumination system for illuminating the diffraction grating, a detection system for detecting diffracted light diffracted from the diffraction grating, and a processing system for detecting positional information relating to the object. The illumination system emits a first pair of beams which are diffracted by the diffraction grating and interfere with each other, and emits a second pair of beams which are diffracted by the diffraction grating and also interfere with each other. The first pair of beams are incident upon the diffraction grating along a plane extending in a first direction in which the diffraction grating extends. The second pair of beams are incident upon the diffraction grating along a plane extending in a second direction in which the diffraction grating extends. The first and second directions are different from a grating line direction. The detection system detects the interfering light and generates first and second beat signals therefrom. The processing system detects positional information with respect to the first direction from the phase state of the first beat signal and with respect to the second direction from the phase state of the second beat signal.
摘要翻译：位置检测器包括设置在物体表面上的衍射光栅，用于照射衍射光栅的照明系统，用于检测衍射光栅衍射的衍射光的检测系统，以及用于检测与物体有关的位置信息的处理系统。照明系统发射由衍射光栅衍射并彼此干涉的第一对光束，并且发射由衍射光栅衍射并且彼此干涉的第二对光束。第一对光束沿着沿衍射光栅延伸的第一方向延伸的平面入射在衍射光栅上。第二对光束沿着沿衍射光栅延伸的第二方向延伸的平面入射在衍射光栅上。第一和第二方向与光栅线方向不同。检测系统检测干扰光并从其产生第一和第二拍拍信号。处理系统从第一拍子信号的相位状态和相对于第二拍摄信号的相位状态相对于第二方向检测关于第一方向的位置信息。

8. 发明授权

US5343291A Method and apparatus for measuring an interval between two objects 失效
标题翻译：用于测量两个物体间隔的方法和装置
公开(公告)号：US5343291A
公开(公告)日：1994-08-30
申请号：US851109
申请日：1992-03-16
申请人： Mitsutoshi Ohwada , Masakazu Matsugu , Shigeyuki Suda , Minoru Yoshii , Yukichi Niwa , Noriyuki Nose , Kenji Saitoh , Masanobu Hasegawa
发明人： Mitsutoshi Ohwada , Masakazu Matsugu , Shigeyuki Suda , Minoru Yoshii , Yukichi Niwa , Noriyuki Nose , Kenji Saitoh , Masanobu Hasegawa
IPC分类号： G03F9/00 , G01B11/02
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.
摘要翻译：用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

9. 发明申请

US20050195405A1 POSITION DETECTING SYSTEM AND EXPOSURE APPARATUS USING THE SAME 失效
标题翻译：位置检测系统和曝光装置
公开(公告)号：US20050195405A1
公开(公告)日：2005-09-08
申请号：US11115366
申请日：2005-04-27
申请人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
发明人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F7/70633 , G03F9/7049 , G03F9/7069 , G03F9/7088
摘要： A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device into divided light, wherein one of the divided light beams produces an intermediate image, and light from the intermediate image is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the intermediate image, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.
摘要翻译：位置检测系统包括用于提供相干光的光源装置，用于将来自光源装置的相干光变换成非相干光的非相干变换装置，用于将来自不相干变换装置的非相干光分成分为光，其中所述分割光束中的一个产生中间图像，并且来自所述中间图像的光被引导以在对象的表面上照射目标，而另一个分割光束被指向由光学共轭的表面反射并且其中来自所述目标的光和由所述共轭表面反射的光被重新组合，用于根据由所述光学系统重新组合的光产生对应于所述目标的成像信号的图像拾取装置，其中与所述目标相对于沿着所述表面的方向的位置相关的位置信息可以基于图像信号产生ct，以及用于调整由图像拾取装置拾取的靠近目标的部分的图像的图像对比度的图像对比度调整装置。

10. 发明授权

US5523844A Displacement detection apparatus 失效
标题翻译：位移检测装置
公开(公告)号：US5523844A
公开(公告)日：1996-06-04
申请号：US90315
申请日：1993-07-13
申请人： Masanobu Hasegawa , Minoru Yoshii , Noriaki Ohguri , Masayoshi Sekine , Seiji Mishima
发明人： Masanobu Hasegawa , Minoru Yoshii , Noriaki Ohguri , Masayoshi Sekine , Seiji Mishima
IPC分类号： G01B11/00 , G01B11/02 , G01B11/14
CPC分类号： G01B11/026
摘要： An apparatus for detecting a displacement of an object comprises a light source element for emitting a detection light beam, a reflection member for reflecting the detection light beam from the light source element, the detection light beam being irradiated to the object by the reflection by the reflection member, a photo-sensing element for sensing the detection light beam reflected from the object by a photo-sensing plane thereof to detect an incident position of the detection light beam on the photo-sensing plane, displacement information of the object being determined in accordance with the detection by the photo-sensing element, and a substrate having the light source element, the reflection member and the photo-sensing element arranged thereon.
摘要翻译：用于检测物体的位移的装置包括用于发射检测光束的光源元件，用于反射来自光源元件的检测光束的反射部件，检测光束通过反射被照射到物体上反射构件，用于通过其感光面感测从物体反射的检测光束的光敏元件，以检测检测光束在感光平面上的入射位置，该物体的位移信息被确定在根据光敏元件的检测，以及具有设置在其上的光源元件，反射构件和感光元件的基板。

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