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1. 发明授权

US06636311B1 Alignment method and exposure apparatus using the same 失效
标题翻译：对准方法和使用其的曝光装置
公开(公告)号：US06636311B1
公开(公告)日：2003-10-21
申请号：US09450682
申请日：1999-11-30
申请人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
发明人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
IPC分类号： G01B1100
CPC分类号： G03F9/7061 , B82Y10/00 , G03F9/7076 , G03F9/7084 , G03F9/7092
摘要： An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.
摘要翻译：一种用于对准第一和第二物体的对准方法，在用于将第一物体的图案转印到第二物体上的涂布抗蚀剂的曝光装置中，包括产生与对准标记形成区域相关的取向偏移值的处理第二个目的是在其上形成抗蚀剂涂层之后，以及在曝光装置中，基于产生的偏移值，将第一物体与第二物体对准被涂覆有抗蚀剂的处理。

2. 发明授权

US06972847B2 Position detecting system and exposure apparatus using the same 失效
公开(公告)号：US06972847B2
公开(公告)日：2005-12-06
申请号：US11115366
申请日：2005-04-27
申请人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
发明人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B11/02
CPC分类号： G03F7/70633 , G03F9/7049 , G03F9/7069 , G03F9/7088
摘要： A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device into divided light, wherein one of the divided light beams produces an intermediate image, and light from the intermediate image is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the intermediate image, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.

3. 发明授权

US06906805B1 Position detecting system and exposure apparatus using the same 失效
标题翻译：位置检测系统及使用其的曝光装置
公开(公告)号：US06906805B1
公开(公告)日：2005-06-14
申请号：US09428490
申请日：1999-10-28
申请人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
发明人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B9/02
CPC分类号： G03F7/70633 , G03F9/7049 , G03F9/7069 , G03F9/7088
摘要： A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device into divided light, wherein one of the divided light beams produces an intermediate image, and light from the intermediate image is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the intermediate image, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.
摘要翻译：位置检测系统包括用于提供相干光的光源装置，用于将来自光源装置的相干光变换成非相干光的非相干变换装置，用于将来自不相干变换装置的非相干光分成分为光，其中所述分割光束中的一个产生中间图像，并且来自所述中间图像的光被引导以在对象的表面上照射目标，而另一个分割光束被指向由光学共轭的表面反射并且其中来自所述目标的光和由所述共轭表面反射的光被重新组合，用于根据由所述光学系统重新组合的光产生对应于所述目标的成像信号的图像拾取装置，其中与所述目标相对于沿着所述表面的方向的位置相关的位置信息可以基于图像信号产生ct，以及用于调整由图像拾取装置拾取的靠近目标的部分的图像的图像对比度的图像对比度调整装置。

4. 发明申请

US20050195405A1 POSITION DETECTING SYSTEM AND EXPOSURE APPARATUS USING THE SAME 失效
标题翻译：位置检测系统和曝光装置
公开(公告)号：US20050195405A1
公开(公告)日：2005-09-08
申请号：US11115366
申请日：2005-04-27
申请人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
发明人： Hideki Ina , Minoru Yoshii , Masanobu Hasegawa , Takashi Satoh
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F7/70633 , G03F9/7049 , G03F9/7069 , G03F9/7088
摘要： A position detecting system includes a light source device for providing coherent light, an incoherence-transforming device for transforming the coherent light from the light source device, into incoherent light, an optical system for dividing the incoherent light from the incoherence-transforming device into divided light, wherein one of the divided light beams produces an intermediate image, and light from the intermediate image is directed to illuminate a target upon a surface of an object while another of divided light beams is directed to be reflected by a surface which is optically conjugate with the intermediate image, and wherein light from the target and light reflected by the conjugate surface are re-combined, an image pickup device for producing an imagewise signal corresponding to the target on the basis of the light re-combined by the optical system, wherein positional information related to a position of the target with respect to a direction along the surface of the object can be produced on the basis of the imagewise signal, and an image contrast adjusting device for adjusting image contrast of an image of a portion close to the target, as picked up by the image pickup device.
摘要翻译：位置检测系统包括用于提供相干光的光源装置，用于将来自光源装置的相干光变换成非相干光的非相干变换装置，用于将来自不相干变换装置的非相干光分成分为光，其中所述分割光束中的一个产生中间图像，并且来自所述中间图像的光被引导以在对象的表面上照射目标，而另一个分割光束被指向由光学共轭的表面反射并且其中来自所述目标的光和由所述共轭表面反射的光被重新组合，用于根据由所述光学系统重新组合的光产生对应于所述目标的成像信号的图像拾取装置，其中与所述目标相对于沿着所述表面的方向的位置相关的位置信息可以基于图像信号产生ct，以及用于调整由图像拾取装置拾取的靠近目标的部分的图像的图像对比度的图像对比度调整装置。

5. 发明授权

US06266130B1 Position detecting method and position detecting system 有权
标题翻译：位置检测方法和位置检测系统
公开(公告)号：US06266130B1
公开(公告)日：2001-07-24
申请号：US09231795
申请日：1999-01-15
申请人： Masanobu Hasegawa , Hideki Ina
发明人： Masanobu Hasegawa , Hideki Ina
IPC分类号： G03B2742
CPC分类号： G03F9/7069 , G03F9/7084 , G03F9/7088
摘要： A position detecting system and method, wherein a wavefront that provides an optical path length distribution opposite to an optical pat length distribution to be defined in accordance with a shape of a light transmissive film on a mark provided on an object to be inspected, is produced, wherein the mark is illuminated with the produced wavefront, and an image of the illuminated mark is taken, such that positional information related to the mark is produced in response to the image taking.
摘要翻译：一种位置检测系统和方法，其中产生提供与根据设在待检查对象上的标记上的透光膜的形状来定义的光学照度长度分布相反的光程长度分布的波前，其中标记被产生的波前照射，并且拍摄照明标记的图像，使得响应于图像拍摄产生与标记相关的位置信息。

6. 发明授权

US08564761B2 Surface shape measuring apparatus, exposure apparatus, and device manufacturing method 失效
标题翻译：表面形状测量装置，曝光装置和装置制造方法
公开(公告)号：US08564761B2
公开(公告)日：2013-10-22
申请号：US12393767
申请日：2009-02-26
申请人： Wataru Yamaguchi , Takahiro Matsumoto , Hideki Ina
发明人： Wataru Yamaguchi , Takahiro Matsumoto , Hideki Ina
IPC分类号： G03B27/72
CPC分类号： G01B11/2441 , G01B9/02063 , G01B9/02072 , G01B9/0209 , G01B11/0608 , G01B2290/70 , G03F9/7026 , G03F9/7049
摘要： A surface shape measuring apparatus includes an illumination system and a light receiving system. The illumination system splits wide-band light from a light source into measurement light and reference light, illuminates the measurement light to obliquely enter a surface of the film, and illuminates the reference light to obliquely enter a reference mirror. The light receiving system combines the measurement light reflected by the surface of the film and the reference light reflected by the reference mirror with each other and introduces the combined light to a photoelectric conversion element. An incident angle of the measurement light upon the surface of the film and an incident angle of the reference light upon the reference mirror are each larger than the Brewster's angle. S-polarized light and p-polarized light included in the measurement light entering a surface of the substrate have equal intensity on the photoelectric conversion element.
摘要翻译：表面形状测量装置包括照明系统和光接收系统。照明系统将来自光源的宽带光分解为测量光和参考光，照射测量光以倾斜地进入胶片的表面，并照亮参考光以倾斜地进入参考镜。光接收系统将由膜的表面反射的测量光与由参考反射镜反射的参考光相互组合，并将组合的光引入光电转换元件。在薄膜表面上的测量光的入射角和参考反射镜上的参考光的入射角均大于布鲁斯特角。入射到衬底表面的测量光中包括的S偏振光和p偏振光在光电转换元件上具有相等的强度。

7. 发明授权

US08414279B2 Imprint apparatus and article manufacturing method 有权
标题翻译：印刷装置及制品制造方法
公开(公告)号：US08414279B2
公开(公告)日：2013-04-09
申请号：US12562052
申请日：2009-09-17
申请人： Eigo Kawakami , Kazuyuki Kasumi , Hideki Ina
发明人： Eigo Kawakami , Kazuyuki Kasumi , Hideki Ina
IPC分类号： B29C43/22 , B29B17/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint apparatus molds resin dispensed on a shot region of a substrate with a mold and forms a pattern of resin on the shot region. The apparatus includes a mold stage configured to hold the mold, a substrate stage configured to hold the substrate, a drive mechanism configured to change a relative positional relationship between the mold stage and the substrate stage in an X-Y plane that defines a coordinate of the shot region and a Z-axis direction perpendicular to the X-Y plane, and a controller. The controller is configured to control the drive mechanism so that the mold and the shot region perform relative vibration, in the X-Y plane, with respect to a relative position where the mold and the shot region align, and a distance between the mold and the shot region decreases in the Z-axis direction in parallel with the vibration, and the resin is molded by the mold.
摘要翻译：压印装置用模具模制分配在基板的注射区域上的树脂，并在注射区域上形成树脂图案。该装置包括：模具台，其被配置为保持模具;衬底台架，其被配置为保持基板;驱动机构，其构造成在限定射击坐标的XY平面内改变模具台架和基板台架之间的相对位置关系区域和垂直于XY平面的Z轴方向，以及控制器。控制器被配置为控制驱动机构，使得模具和射击区域在XY平面中相对于模具和射击区域对准的相对位置以及模具和射击之间的距离执行相对振动 Z轴方向的区域与振动平行地减小，树脂由模具成型。

8. 发明授权

US07981304B2 Process for producing a chip using a mold 有权
标题翻译：使用模具制造芯片的工艺
公开(公告)号：US07981304B2
公开(公告)日：2011-07-19
申请号：US12388179
申请日：2009-02-18
申请人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
发明人： Atsunori Terasaki , Junichi Seki , Nobuhito Suehira , Hideki Ina , Shingo Okushima
IPC分类号： C03C15/00
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.
摘要翻译：该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成标记2102由与第一材料不同的第二材料形成。第一材料和第二材料在紫外线波长范围的一部分中具有透光性。第二种材料的折射率不小于1.7。

9. 发明申请

US20090286172A1 SURFACE SHAPE MEASUREMENT APPARATUS AND EXPOSURE APPARATUS 失效
标题翻译：表面形状测量装置和曝光装置
公开(公告)号：US20090286172A1
公开(公告)日：2009-11-19
申请号：US12465567
申请日：2009-05-13
申请人： Koichi Sentoku , Takahiro Matsumoto , Satoru Oishi , Hideki Ina
发明人： Koichi Sentoku , Takahiro Matsumoto , Satoru Oishi , Hideki Ina
IPC分类号： G03F7/20 , G01B11/24 , G03B27/54
CPC分类号： G03B27/54 , G01B11/24 , G01J3/45 , G01J2003/1213 , G01J2003/1226 , G03F9/7003 , G03F9/7015 , G03F9/7026 , G03F9/7088
摘要： A surface shape measurement apparatus is configured to measure a surface shape of an object to be measured, and includes a beam splitter configured to split white light from a light source into two light beams, a pair of prisms each configured to increase an incident angle of each light beam that has been split by the beam splitter and directed to the object or a reference surface, each prism having an antireflection part that is formed at a period of a wavelength of the white light or smaller and has a moth-eye shape, a superimposition unit configured to superimpose object light from the object with reference light from the reference surface and has passed the second prism, and to generate white interference light, and a Lyot filter configured to discretely separate the white interference light for each of a plurality of wavelengths.
摘要翻译：表面形状测量装置被配置为测量待测物体的表面形状，并且包括：分束器，被配置为将来自光源的白光分成两束光束;一对棱镜，每个棱镜被配置为增加入射角已经被分束器分离并被引导到物体或参考表面的每个光束，每个棱镜具有在白色光的波长或更小的周期形成并具有蛾眼形状的抗反射部分，叠加单元，被配置为用来自所述参考表面的参考光叠加来自所述物体的物体光并且已经通过所述第二棱镜，并且产生白色干涉光;以及Lyot滤波器，其被配置为离散地分离所述白色干涉光，波长。

10. 发明申请

US20090283938A1 IMPRINT APPARATUS, IMPRINT METHOD, AND MOLD FOR IMPRINT 有权
标题翻译：印刷装置，印刷方法和模具用于印刷
公开(公告)号：US20090283938A1
公开(公告)日：2009-11-19
申请号：US12509996
申请日：2009-07-27
申请人： Nobuhito Suehira , Junichi Seki , Hideki Ina
发明人： Nobuhito Suehira , Junichi Seki , Hideki Ina
IPC分类号： B29C59/16 , B29C35/08
CPC分类号： G03F7/0002 , B29C35/08 , B29C59/16 , B82Y10/00 , B82Y40/00 , G01B11/14 , G03F9/703 , G03F9/7042 , G03F9/7065
摘要： An imprint apparatus for imprinting a mold pattern onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.
摘要翻译：用于将模具图案压印到基板或基板上的部件上的压印装置包括用于照射与基板相对设置的模具表面和基板的表面的光源; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。

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