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1. 发明授权

US08598542B2 Charged particle beam processing 有权
标题翻译：带电粒子束处理
公开(公告)号：US08598542B2
公开(公告)日：2013-12-03
申请号：US12719619
申请日：2010-03-08
申请人： Milos Toth , Richard J. Young , Alexander Henstra , Alan Frank de Jong , Johannes Jacobus Lambertus Mulders
发明人： Milos Toth , Richard J. Young , Alexander Henstra , Alan Frank de Jong , Johannes Jacobus Lambertus Mulders
IPC分类号： G21G4/00
CPC分类号： H01J37/3056 , B81C99/0095 , H01J37/045 , H01J37/302 , H01J2237/0432 , H01J2237/04756 , H01J2237/2001 , H01J2237/24535 , H01J2237/30472
摘要： Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.
摘要翻译：电子束诱导的与前体气体的化学反应是通过吸附物去除控制来控制的。可以通过控制束电流来控制吸附物消耗，优选地通过快速消隐光束，以及通过冷却衬底来控制。光束优选具有低能量以减小相互作用体积。通过控制耗尽和相互作用体积，用户具有产生精确形状的能力。

2. 发明申请

US20100224592A1 CHARGED PARTICLE BEAM PROCESSING 有权
标题翻译：充电颗粒光束处理
公开(公告)号：US20100224592A1
公开(公告)日：2010-09-09
申请号：US12719619
申请日：2010-03-08
申请人： MILOS TOTH , Richard J. Young , Alexander Henstra , Alan Frank de Jong , Johannes Jacobus Lambertus Mulders
发明人： MILOS TOTH , Richard J. Young , Alexander Henstra , Alan Frank de Jong , Johannes Jacobus Lambertus Mulders
IPC分类号： C23F1/00 , H01J37/10 , H01J37/147 , H01J37/305 , C23C16/44 , C23C14/22
CPC分类号： H01J37/3056 , B81C99/0095 , H01J37/045 , H01J37/302 , H01J2237/0432 , H01J2237/04756 , H01J2237/2001 , H01J2237/24535 , H01J2237/30472
摘要： Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.
摘要翻译：电子束诱导的与前体气体的化学反应是通过吸附物去除控制来控制的。可以通过控制束电流来控制吸附物消耗，优选地通过快速消隐光束，以及通过冷却衬底来控制。光束优选具有低能量以减小相互作用体积。通过控制耗尽和相互作用体积，用户具有产生精确形状的能力。

3. 发明授权

US08268532B2 Method for forming microscopic structures on a substrate 有权
标题翻译：在基板上形成微观结构的方法
公开(公告)号：US08268532B2
公开(公告)日：2012-09-18
申请号：US12642298
申请日：2009-12-18
申请人： Alan Frank De Jong , Johannes Jacobus Lambertus Mulders , Wilhelmus Mathijs Marie Kessels , Adriaan Jacobus Martinus Mackus
发明人： Alan Frank De Jong , Johannes Jacobus Lambertus Mulders , Wilhelmus Mathijs Marie Kessels , Adriaan Jacobus Martinus Mackus
IPC分类号： G03C5/00
CPC分类号： C23C16/047 , C23C16/18 , C30B23/02 , C30B25/02
摘要： The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapor Deposition, a high quality layer can be grown.An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.
摘要翻译：本发明涉及一种形成微观结构的方法。通过在存在前体流体的情况下通过在基底上扫描聚焦的粒子束，形成图案化种子层。现在，通过原子层沉积或化学气相沉积生长该层，可以生长高质量的层。该方法的优点在于，形成种子层需要相当少的时间，因为仅需要沉积非常薄的层。

4. 发明申请

US20100255213A1 Method for Forming Microscopic 3D Structures 有权
标题翻译：形成微观3D结构的方法
公开(公告)号：US20100255213A1
公开(公告)日：2010-10-07
申请号：US12751727
申请日：2010-03-31
申请人： Jacob Simon Faber , Johannes Jacobus Lambertus Mulders , Alan Frank de Jong , Carmen Francisca Maria van Vilsteren
发明人： Jacob Simon Faber , Johannes Jacobus Lambertus Mulders , Alan Frank de Jong , Carmen Francisca Maria van Vilsteren
IPC分类号： B05D3/06
CPC分类号： H01J37/3178 , B29C64/135 , B29C2035/0827 , B29C2035/0833 , B29C2035/0844 , B29C2035/0877 , B29K2105/0076 , B29K2105/165 , B29L2023/005 , B29L2031/756 , B33Y10/00 , B82Y10/00 , B82Y40/00 , H01J37/3056 , H01J37/3174 , H01J2237/31732 , H01J2237/31749
摘要： A method for forming microscopic 3D structures. In the method according to the invention a substrate (105) is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) (110) for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (102), a stack of frozen layers (130) is built, each layer showing an irradiated part (131) in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor (132) can evaporate. As a result 3D structures with overhanging features can be built.
摘要翻译：一种形成微观3D结构的方法。在根据本发明的方法中，将衬底（105）放置在扫描电子显微镜（SEM）中。 SEM配备有用于将前体流体射流引导到基底的气体注入系统（110）。将衬底冷却到低于前体气体的凝固点，使得前体气体的冷冻层可以施加到衬底上。现在，将反应前体的冷冻层重复地施加到基板上并用电子束（102）照射冷冻层，构建一堆冷冻层（130），每个层显示辐射部分（131），其中前体被转换为另一种材料。在施加最后一层之后，升高温度，使得未处理的前体（132）可以蒸发。因此，可以构建具有突出特征的3D结构。

5. 发明申请

US20100159370A1 METHOD FOR FORMING MICROSCOPIC STRUCTURES ON A SUBSTRATE 有权
标题翻译：在基板上形成微结构的方法
公开(公告)号：US20100159370A1
公开(公告)日：2010-06-24
申请号：US12642298
申请日：2009-12-18
申请人： Alan Frank de Jong , Johannes Jacobus Lambertus Mulders , Wilhelmus Mathijs Marie Kessels , Adriaan Jacobus Martinus Mackus
发明人： Alan Frank de Jong , Johannes Jacobus Lambertus Mulders , Wilhelmus Mathijs Marie Kessels , Adriaan Jacobus Martinus Mackus
IPC分类号： G03F1/00 , B05C11/00 , B05C11/10
CPC分类号： C23C16/047 , C23C16/18 , C30B23/02 , C30B25/02
摘要： The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapour Deposition, a high quality layer can be grown.An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.
摘要翻译：本发明涉及一种形成微观结构的方法。通过在存在前体流体的情况下通过在基底上扫描聚焦的粒子束，形成图案化种子层。现在，通过原子层沉积或化学气相沉积生长该层，可以生长高质量的层。该方法的优点在于，形成种子层需要相当少的时间，因为仅需要沉积非常薄的层。

6. 发明授权

US08597565B2 Method for forming microscopic 3D structures 有权
标题翻译：形成微观3D结构的方法
公开(公告)号：US08597565B2
公开(公告)日：2013-12-03
申请号：US12751727
申请日：2010-03-31
申请人： Jacob Simon Faber , Johannes Jacobus Lambertus Mulders , Alan Frank de Jong , Carmen Francisca Maria van Vilsteren
发明人： Jacob Simon Faber , Johannes Jacobus Lambertus Mulders , Alan Frank de Jong , Carmen Francisca Maria van Vilsteren
IPC分类号： B05D3/06 , B29C35/08 , B29C41/02 , B29C41/22
CPC分类号： H01J37/3178 , B29C64/135 , B29C2035/0827 , B29C2035/0833 , B29C2035/0844 , B29C2035/0877 , B29K2105/0076 , B29K2105/165 , B29L2023/005 , B29L2031/756 , B33Y10/00 , B82Y10/00 , B82Y40/00 , H01J37/3056 , H01J37/3174 , H01J2237/31732 , H01J2237/31749
摘要： A method for forming microscopic 3D structures. In the method according to the invention a substrate (105) is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) (110) for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (102), a stack of frozen layers (130) is built, each layer showing an irradiated part (131) in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor (132) can evaporate. As a result 3D structures with overhanging features can be built.
摘要翻译：一种形成微观3D结构的方法。在根据本发明的方法中，将衬底（105）放置在扫描电子显微镜（SEM）中。 SEM配备有用于将前体流体射流引导到基底的气体注入系统（110）。将衬底冷却到低于前体气体的凝固点，使得前体气体的冷冻层可以施加到衬底上。现在，将反应前体的冷冻层重复地施加到基板上并用电子束（102）照射冷冻层，构建一堆冷冻层（130），每个层显示辐射部分（131），其中前体被转换为另一种材料。在施加最后一层之后，升高温度，使得未处理的前体（132）可以蒸发。因此，可以构建具有突出特征的3D结构。

7. 发明授权

US07258901B1 Directed growth of nanotubes on a catalyst 有权
标题翻译：纳米管在催化剂上的定向生长
公开(公告)号：US07258901B1
公开(公告)日：2007-08-21
申请号：US11387561
申请日：2006-03-23
申请人： Randall Lee , Thomas Owen Mitchell , Johannes Jacobus Lambertus Mulders
发明人： Randall Lee , Thomas Owen Mitchell , Johannes Jacobus Lambertus Mulders
IPC分类号： C23C14/14 , C23C14/30 , B05D3/00 , G01B5/28
CPC分类号： G01Q70/12 , G01Q60/38
摘要： A nanostructure is fabricated using charged particle deposition to deposit a catalyst on a substrate. A charged particle beam is directed to location on the substrate where the catalyst is to be deposited, with a beam-activated precursor gas also being directed to the location. For example, a nickel dot can be selectively deposited onto a substrate by using a charged particle beam to decompose a nickel-containing precursor gas, and then a carbon nanotube can be grown on the nickel dot, with the diameter of the nanotube conforming to the size of the nickel dot.
摘要翻译：使用带电粒子沉积法在基底上沉积催化剂制造纳米结构。带电的粒子束被引导到衬底上要沉积催化剂的位置，而束激活的前体气体也被引导到该位置。例如，可以通过使用带电粒子束将镍点选择性地沉积在基底上以分解含镍前体气体，然后可以在镍点上生长碳纳米管，纳米管的直径符合镍点的大小。

8. 发明授权

US08168948B2 Method of machining a work piece with a focused particle beam 有权
标题翻译：用聚焦粒子束加工工件的方法
公开(公告)号：US08168948B2
公开(公告)日：2012-05-01
申请号：US12537841
申请日：2009-08-07
申请人： Aurélien Philippe Jean Maclou Botman , Bert Henning Freitag , Johannes Jacobus Lambertus Mulders
发明人： Aurélien Philippe Jean Maclou Botman , Bert Henning Freitag , Johannes Jacobus Lambertus Mulders
IPC分类号： G01N23/00
CPC分类号： G01N1/286 , G01N1/32 , H01J37/317 , H01J37/3178 , H01J2237/31745
摘要： The invention relates to a method for producing high-quality samples for e.g. TEM inspection. When thinning samples with e.g. a Focused Ion Beam apparatus (FIB), the sample often oxidizes when taken from the FIB due to the exposure to air. This results in low-quality samples, that may be unfit for further analysis. By forming a passivation layer, preferably a hydrogen passivation layer, on the sample in situ, that is: before taking the sample from the FIB, high quality TEM samples can be produced.
摘要翻译：本发明涉及一种生产例如高品质样品的方法。 TEM检查。当用例如稀释样品聚焦离子束装置（FIB），当FIB从暴露于空气中时，样品经常氧化。这导致低质量的样品，这可能不适合进一步分析。通过在样品上原位形成钝化层，优选氢钝化层，即：在从FIB中取样之前，可以生产高质量的TEM样品。

9. 发明授权

US08431896B2 Method for obtaining images from slices of specimen 有权
标题翻译：从样本片中获取图像的方法
公开(公告)号：US08431896B2
公开(公告)日：2013-04-30
申请号：US13149834
申请日：2011-05-31
申请人： Johannes Jacobus Lambertus Mulders , Laurent Roussel , Wilhelmus Michael Busing
发明人： Johannes Jacobus Lambertus Mulders , Laurent Roussel , Wilhelmus Michael Busing
IPC分类号： G01N23/225
CPC分类号： G01N23/225 , G01N1/30 , H01J2237/31745
摘要： The invention relates to a method for obtaining images from slices of a specimen, the method comprising: repeatedly obtaining an image of the surface layer of the specimen (1) and removing the surface layer of the specimen, thereby bringing the next slice to the surface; characterized in that after at least one of the removals of a surface layer the specimen is exposed to a staining agent. This method is especially suited for use in a particle-optical instrument equipped with both a scanning electron microscope column (20) and a focused ion beam column (10). The specimen can e.g. be stained in situ by admitting a gas, such as OsO4 (osmiumtetroxide), to the specimen. This method also makes it possible to perform differential staining by first making an image of the specimen exposed to a first staining agent, and subsequently making an image of the specimen when it is additionally stained by a second staining agent.
摘要翻译：本发明涉及一种从样本切片获取图像的方法，该方法包括：重复获取样本（1）的表面层的图像并去除样本的表面层，从而使下一个切片进入表面 ; 其特征在于，在将表面层的至少一个清除物暴露于染色剂之后。该方法特别适用于配有扫描电子显微镜柱（20）和聚焦离子束柱（10）的粒子光学仪器。样品可以例如通过将诸如OsO4（四氧化锇）的气体引入样品而被原位染色。该方法还可以通过首先使样品暴露于第一染色剂的图像进行差异染色，并且随后在被第二染色剂另外染色时进行样品的图像。

10. 发明申请

US20100032567A1 Method of Machining a Work Piece with a Focused Particle Beam 有权
标题翻译：用聚焦粒子束加工工件的方法
公开(公告)号：US20100032567A1
公开(公告)日：2010-02-11
申请号：US12537841
申请日：2009-08-07
申请人： Aurélien Philippe Jean Maclou Botman , Bert Henning Freitag , Johannes Jacobus Lambertus Mulders
发明人： Aurélien Philippe Jean Maclou Botman , Bert Henning Freitag , Johannes Jacobus Lambertus Mulders
IPC分类号： G21K7/00
CPC分类号： G01N1/286 , G01N1/32 , H01J37/317 , H01J37/3178 , H01J2237/31745
摘要： The invention relates to a method for producing high-quality samples for e.g. TEM inspection. When thinning samples with e.g. a Focused Ion Beam apparatus (FIB), the sample often oxidizes when taken from the FIB due to the exposure to air. This results in low-quality samples, that may be unfit for further analysis. By forming a passivation layer, preferably a hydrogen passivation layer, on the sample in situ, that is: before taking the sample from the FIB, high quality.
摘要翻译：本发明涉及一种生产例如高品质样品的方法。 TEM检查。当用例如稀释样品聚焦离子束装置（FIB），当FIB从暴露于空气中时，样品经常氧化。这导致低质量的样品，这可能不适合进一步分析。通过在样品上原位形成钝化层，优选氢钝化层，即：在从FIB中取样之前，其质量高。

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