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1. 发明申请

US20100255213A1 Method for Forming Microscopic 3D Structures 有权
标题翻译：形成微观3D结构的方法
公开(公告)号：US20100255213A1
公开(公告)日：2010-10-07
申请号：US12751727
申请日：2010-03-31
申请人： Jacob Simon Faber , Johannes Jacobus Lambertus Mulders , Alan Frank de Jong , Carmen Francisca Maria van Vilsteren
发明人： Jacob Simon Faber , Johannes Jacobus Lambertus Mulders , Alan Frank de Jong , Carmen Francisca Maria van Vilsteren
IPC分类号： B05D3/06
CPC分类号： H01J37/3178 , B29C64/135 , B29C2035/0827 , B29C2035/0833 , B29C2035/0844 , B29C2035/0877 , B29K2105/0076 , B29K2105/165 , B29L2023/005 , B29L2031/756 , B33Y10/00 , B82Y10/00 , B82Y40/00 , H01J37/3056 , H01J37/3174 , H01J2237/31732 , H01J2237/31749
摘要： A method for forming microscopic 3D structures. In the method according to the invention a substrate (105) is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) (110) for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (102), a stack of frozen layers (130) is built, each layer showing an irradiated part (131) in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor (132) can evaporate. As a result 3D structures with overhanging features can be built.
摘要翻译：一种形成微观3D结构的方法。在根据本发明的方法中，将衬底（105）放置在扫描电子显微镜（SEM）中。 SEM配备有用于将前体流体射流引导到基底的气体注入系统（110）。将衬底冷却到低于前体气体的凝固点，使得前体气体的冷冻层可以施加到衬底上。现在，将反应前体的冷冻层重复地施加到基板上并用电子束（102）照射冷冻层，构建一堆冷冻层（130），每个层显示辐射部分（131），其中前体被转换为另一种材料。在施加最后一层之后，升高温度，使得未处理的前体（132）可以蒸发。因此，可以构建具有突出特征的3D结构。

2. 发明授权

US08597565B2 Method for forming microscopic 3D structures 有权
标题翻译：形成微观3D结构的方法
公开(公告)号：US08597565B2
公开(公告)日：2013-12-03
申请号：US12751727
申请日：2010-03-31
申请人： Jacob Simon Faber , Johannes Jacobus Lambertus Mulders , Alan Frank de Jong , Carmen Francisca Maria van Vilsteren
发明人： Jacob Simon Faber , Johannes Jacobus Lambertus Mulders , Alan Frank de Jong , Carmen Francisca Maria van Vilsteren
IPC分类号： B05D3/06 , B29C35/08 , B29C41/02 , B29C41/22
CPC分类号： H01J37/3178 , B29C64/135 , B29C2035/0827 , B29C2035/0833 , B29C2035/0844 , B29C2035/0877 , B29K2105/0076 , B29K2105/165 , B29L2023/005 , B29L2031/756 , B33Y10/00 , B82Y10/00 , B82Y40/00 , H01J37/3056 , H01J37/3174 , H01J2237/31732 , H01J2237/31749
摘要： A method for forming microscopic 3D structures. In the method according to the invention a substrate (105) is placed in a Scanning Electron Microscope (SEM). The SEM is equipped with a Gas Injection System (GIS) (110) for directing a jet of precursor fluid to the substrate. The substrate is cooled below the freezing point of the precursor gas so that a frozen layer of the precursor gas can be applied to the substrate. By now repeatedly applying a frozen layer of the precursor to the substrate and irradiate the frozen layer with an electron beam (102), a stack of frozen layers (130) is built, each layer showing an irradiated part (131) in which the precursor is converted to another material. After applying the last layer the temperature is raised so that the unprocessed precursor (132) can evaporate. As a result 3D structures with overhanging features can be built.
摘要翻译：一种形成微观3D结构的方法。在根据本发明的方法中，将衬底（105）放置在扫描电子显微镜（SEM）中。 SEM配备有用于将前体流体射流引导到基底的气体注入系统（110）。将衬底冷却到低于前体气体的凝固点，使得前体气体的冷冻层可以施加到衬底上。现在，将反应前体的冷冻层重复地施加到基板上并用电子束（102）照射冷冻层，构建一堆冷冻层（130），每个层显示辐射部分（131），其中前体被转换为另一种材料。在施加最后一层之后，升高温度，使得未处理的前体（132）可以蒸发。因此，可以构建具有突出特征的3D结构。

3. 发明授权

US08399831B2 Forming an image while milling a work piece 有权
标题翻译：在铣削工件时形成图像
公开(公告)号：US08399831B2
公开(公告)日：2013-03-19
申请号：US12732924
申请日：2010-03-26
申请人： Jacob Simon Faber , Remco Theodorus Johannes Petrus Geurts
发明人： Jacob Simon Faber , Remco Theodorus Johannes Petrus Geurts
IPC分类号： H01J37/305 , H01J37/30
CPC分类号： H01J37/3056 , G01N1/286 , H01J37/304 , H01J2237/30466 , H01J2237/31745 , H01J2237/31749
摘要： Dual beam instruments, comprising a Scanning Electron Microscope (SEM) column for imaging and a Focused Ion Beam (FIB) column for milling, are routinely used to extract samples (lamellae) from semiconductor wafers. By observing the progress of the milling with the SEM column, end pointing of the milling process can be performed.The invention offers an alternative solution to this problem, in which an instrument with only a FIB column is used.For milling a lamella to its final thickness of, for example, 30 nm, the focused ion beam 100, is scanned repeatedly along the lamella. It is found that while milling the lamella a signal can be derived from the lamella that is sufficient for end pointing. No additional electron beam for inspection is needed.
摘要翻译：通常使用双光束仪器，包括用于成像的扫描电子显微镜（SEM）柱和用于研磨的聚焦离子束（FIB）柱，用于从半导体晶片提取样品（薄片）。通过使用SEM柱观察研磨的进展，可以进行铣削加工的结束指示。本发明为该问题提供了一种替代方案，其中仅使用具有FIB柱的仪器。为了将薄片研磨至其最终厚度例如30nm，聚焦离子束100沿薄片反复扫描。发现在铣削薄片时，信号可以从对于终点指示足够的薄片获得。不需要额外的电子束进行检查。

4. 发明授权

US07675034B2 Charged particle instrument equipped with optical microscope 有权
标题翻译：带电粒子仪器配有光学显微镜
公开(公告)号：US07675034B2
公开(公告)日：2010-03-09
申请号：US12130038
申请日：2008-05-30
申请人： Jacob Simon Faber
发明人： Jacob Simon Faber
IPC分类号： G01N13/10 , G01N23/02 , G21K5/04
CPC分类号： G02B21/0016 , H01J37/026 , H01J37/20 , H01J37/228 , H01J37/256 , H01J37/28 , H01J2237/2482
摘要： An optical microscope slide in a charged particle instrument such as an electron microscope or a focused ion beam instrument. Conventional microscope slides are not fit for use in an electron microscope as they are insulating and would thus charge when viewed in an electron microscope due to the impinging beam of charged particles. However, microscope slides exist that show a coating with a conductive layer of e.g. Indium Tin Oxide (ITO). These microscope slides are normally used for heating the object mounted on the slide by passing a current through the conductive layer. Experiments show that these microscope slides can be used advantageously in a charged particle instrument by connecting the conductive layer to e.g. ground potential, thereby forming a return path for the impinging charged particles and thus avoiding charging. The invention further relates to a charged particle instrument that is further equipped with an optical microscope.
摘要翻译：在电子显微镜或聚焦离子束仪器等带电粒子仪器中的光学显微镜载玻片。常规的显微镜载玻片不适合用于电子显微镜，因为它们是绝缘的，因此由于带电粒子的撞击光束在电子显微镜中观察时会充电。然而，显示器载玻片存在，其显示具有例如导电层的涂层。氧化铟锡（ITO）。这些显微镜幻灯片通常用于通过使电流通过导电层来加热安装在载玻片上的物体。实验表明，这些显微镜载玻片可以有利地用于带电粒子仪器，通过将导电层连接到例如电极。接地电位，从而形成用于撞击带电粒子的返回路径，从而避免充电。本发明还涉及另外配备有光学显微镜的带电粒子仪器。

5. 发明授权

US07362452B2 Method of adjusting the operating region of a tool component to a pre-determined element 有权
标题翻译：将工具部件的操作区域调整到预定元件的方法
公开(公告)号：US07362452B2
公开(公告)日：2008-04-22
申请号：US11522832
申请日：2006-09-18
申请人： Jacob Simon Faber
发明人： Jacob Simon Faber
IPC分类号： G01B11/14
CPC分类号： H01J37/28 , H01J2237/2807 , H01J2237/2826
摘要： The invention describes a method of positioning an image field of, for example, an electron microscope at a specific structure in a regular grid of nominally identical structures. Such structures can, for example, be memory cells on a chip. Such memory cells nowadays have an area of, for example, less than 1 μm2, and are arranged in a grid of 1000*1000 cells. During displacement, an error can occur that is larger than a grid distance of the structures, as a result of which the image field is adjusted to a structure other than the intended one. The displacement can be sub-divided into a large number of component displacements, whereby the error per component displacement is smaller than half a grid distance. By now determining the displacement after each component displacement, the error per component displacement can be eliminated. This method lends itself to automation, whereby the image displacements are determined with the aid of correlation techniques.
摘要翻译：本发明描述了一种在名义上相同的结构的规则网格中将特定结构的例如电子显微镜的图像场定位的方法。这样的结构可以例如是芯片上的存储器单元。这样的存储单元现在具有例如小于1mum 2的面积，并且排列成1000 * 1000个单元格。在位移期间，可能会发生大于结构的网格距离的错误，其结果是将图像场调整到不同于预期结构的结构。位移可以分为大量的部件位移，从而每个部件位移的误差小于栅格距离的一半。通过现在确定每个部件位移后的位移，可以消除每个部件位移的误差。该方法适用于自动化，由此通过相关技术确定图像位移。

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