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    • 2. 发明授权
    • Regeneration type body fluid treating circuit and method for treating
body fluid
    • 再生型体液治疗电路及体液治疗方法
    • US4855057A
    • 1989-08-08
    • US190985
    • 1988-05-06
    • Michikazu OhnishiHiroshi OhgoshiSatoshi Takada
    • Michikazu OhnishiHiroshi OhgoshiSatoshi Takada
    • A61M1/34A61M1/36
    • A61M1/3472A61M1/3486A61M1/3679A61M2205/7554A61M2205/7581
    • A body fluid treating circuit comprising a block for collecting a body fluid from a human body, a body fluid treating block and a block for returning the treated body fluid to the human body, said body fluid treating block comprising a plurality of treating units for treating the body fluid by passing therethrough, the units being arranged in parallel flow relationship, body fluid feed and return lines connected to each of the treating units so as to selectively feed to and return from the units through line switching means. The body fluid is treated using the above circuit by a method wherein the body fluid is fed to at least one first treating unit among a plurality of treating units to treat it up to a predetermined volume and the feeding is then switched to the residual second treating unit or units, the regeneration and washing of the first unit are conducted by successively feeding the regenerating liquid and washing liquid while treating the body fluid in the second unit, and after the completion of the treatment in the second unit, the body fluid feed line is switched to the regenerated and washed first unit with confirmation of the salt concentration of the effluent therefrom by the salt concentration measuring means in order to conduct the treatment in the first unit during which the regeneration and washing of the second unit are conducted, the above procedures being further repeated as occassion demands.
    • 一种体液治疗电路,其特征在于,包括用于从人体收集体液的体块,体液处理块和将经处理的体液返回到人体的块,所述体液处理块包括多个处理单元, 所述体液通过其中,所述单元以平行流动关系布置,体液供给和返回管线连接到每个处理单元,以便通过线切换装置选择性地进给和返回单元。 使用上述回路,通过以下方法对体液进行处理,其中将体液供给到多个处理单元中的至少一个第一处理单元以将其处理至预定体积,然后将进料切换至残余的第二处理 单元或单元,第一单元的再生和洗涤通过在对第二单元中的体液进行处理的同时依次供给再生液体和洗涤液,并且在第二单元中的处理完成之后,体液供给管线 切换到再生和洗涤的第一单元,通过盐浓度测量装置确认其流出物的盐浓度,以便在进行第二单元的再生和洗涤的第一单元中进行处理,上述 根据需要进一步重复程序。
    • 3. 发明申请
    • VBI data slice circuit
    • VBI数据切片电路
    • US20080012993A1
    • 2008-01-17
    • US11730804
    • 2007-04-04
    • Takaaki IinumaSatoshi Takada
    • Takaaki IinumaSatoshi Takada
    • H04N5/44
    • H04N5/44H04N21/435H04N21/4884
    • An extraction cycle detection unit detects an extraction cycle of VBI data based on a CRI amplitude of a CVBS signal and a pedestal level detection unit detects a pedestal level value of the CVBS signal. A MAX detection unit detects a maximum value of the CRI amplitude. The maximum value of the CRI amplitude and the pedestal level value are supplied to an operation unit to execute an operation to obtain an average value of them, which is input to a data slice unit as a slice level. The data slice unit extracts the VBI data based on the slice level and the extraction cycle from the extraction cycle detection unit. Even if the CRI waveform of the CVBS signal becomes irregular, the slice level is suitably determined and the VBI data is properly extracted.
    • 提取周期检测单元基于CVBS信号的CRI幅度检测VBI数据的提取周期,并且基准电平检测单元检测CVBS信号的基准电平值。 MAX检测单元检测CRI振幅的最大值。 将CRI幅度和基准电平值的最大值提供给操作单元,以执行将其作为切片电平输入到数据切片单元的平均值的操作。 数据切片单元基于来自提取周期检测单元的切片级别和提取周期提取VBI数据。 即使CVBS信号的CRI波形变得不规则,适当地确定限幅电平,并适当地提取VBI数据。
    • 4. 发明申请
    • CHARGED PARTICLE BEAM APPARATUS
    • 充电颗粒光束装置
    • US20130105690A1
    • 2013-05-02
    • US13808608
    • 2011-06-15
    • Tatsuichi KatouSatoshi Takada
    • Tatsuichi KatouSatoshi Takada
    • G01N23/22G01N23/00
    • G01N23/2204G01N23/00G01N23/225H01J37/265H01J37/28H01J2237/0044H01J2237/2817
    • In recent years, in association with the miniaturization and high integration of semiconductor manufacturing processes, there have been arising many cases where observation target portions are densely located. In such a case, if observation is performed using a conventional pre-charge technology, scanning with an electron beam in pre-charging are repeatedly executed, therefore the charge potential on the surface of a specimen exceeds the dielectric breakdown voltage. As a result, dielectric breakdown arises in areas where scanning with an electron beam are repeatedly executed. An object of the present invention is to provide a defect observation method that can reduce the risk of dielectric breakdown, and a charged particle beam apparatus that utilizes the method. In the present invention, when a specimen is observed with the use of a technology relevant to pre-charging, after executing a piece of control processing, plural images are photographed. In addition, by grouping observation target portions, which plural pre-charge scanning areas overlap, into a group where charge control is executed all together on all the observation target portions, and by executing charge control processing on each group, the risk of dielectric breakdown is reduced.
    • 近年来,随着半导体制造工艺的小型化和高度集成化的发展,出现了观察目标部分密集地位置的许多情况。 在这种情况下,如果使用常规的预充电技术进行观察,则重复进行预充电时的电子束的扫描,因此,试样表面的电荷电位超过绝缘击穿电压。 结果,在重复执行电子束的扫描的区域中产生电介质击穿。 本发明的目的是提供一种能够降低电介质击穿的风险的缺陷观察方法以及利用该方法的带电粒子束装置。 在本发明中,当利用与预充电有关的技术观察样本时,在执行一个控制处理之后,拍摄多个图像。 此外,通过将多个预充电扫描区域重叠的观察对象部分分组到所有观察目标部分上一起进行充电控制的组,并且通过对每个组执行充电控制处理,将介电击穿的风险分组 降低了。
    • 7. 发明授权
    • Charged particle beam apparatus
    • 带电粒子束装置
    • US08822920B2
    • 2014-09-02
    • US13808608
    • 2011-06-15
    • Tatsuichi KatouSatoshi Takada
    • Tatsuichi KatouSatoshi Takada
    • H01J37/26
    • G01N23/2204G01N23/00G01N23/225H01J37/265H01J37/28H01J2237/0044H01J2237/2817
    • In recent years, in association with the miniaturization and high integration of semiconductor manufacturing processes, there have been arising many cases where observation target portions are densely located. In such a case, if observation is performed using a conventional pre-charge technology, scanning with an electron beam in pre-charging are repeatedly executed, therefore the charge potential on the surface of a specimen exceeds the dielectric breakdown voltage. As a result, dielectric breakdown arises in areas where scanning with an electron beam are repeatedly executed. An object of the present invention is to provide a defect observation method that can reduce the risk of dielectric breakdown, and a charged particle beam apparatus that utilizes the method. In the present invention, when a specimen is observed with the use of a technology relevant to pre-charging, after executing a piece of control processing, plural images are photographed. In addition, by grouping observation target portions, which plural pre-charge scanning areas overlap, into a group where charge control is executed all together on all the observation target portions, and by executing charge control processing on each group, the risk of dielectric breakdown is reduced.
    • 近年来,随着半导体制造工艺的小型化和高度集成化的发展,出现了观察目标部分密集地位置的许多情况。 在这种情况下,如果使用常规的预充电技术进行观察,则重复进行预充电时的电子束的扫描,因此,试样表面的电荷电位超过绝缘击穿电压。 结果,在重复执行电子束的扫描的区域中产生电介质击穿。 本发明的目的是提供一种能够降低电介质击穿的风险的缺陷观察方法以及利用该方法的带电粒子束装置。 在本发明中,当利用与预充电有关的技术观察样本时,在执行一个控制处理之后,拍摄多个图像。 此外,通过将多个预充电扫描区域重叠的观察对象部分分组到所有观察目标部分上一起进行充电控制的组,并且通过对每个组执行充电控制处理,将介电击穿的风险分组 降低了。