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    • 1. 发明授权
    • Electron beam-curable resist composition and method for fine patterning
using the same
    • 电子束固化型抗蚀剂组合物及使用其的精细图案化方法
    • US5180653A
    • 1993-01-19
    • US693664
    • 1991-04-30
    • Masanori MiyabeHidekatsu KoharaToshimasa Nakayama
    • Masanori MiyabeHidekatsu KoharaToshimasa Nakayama
    • C08K5/3492C08L61/06
    • C08K5/3492C08L61/06Y10S430/143
    • An electron beam-curable resist composition suitable for fine patterning works in the manufacturing process of semiconductor devices is proposed which is outstandingly stable in storage and capable of being developed using an aqueous alkaline developer solution without scums and giving a patterned resist layer with high contrast and orthogonal cross sectional profile of a line pattern. The composition comprises (A) a triazine compound, such as 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, (B) a cresol novolac resin, of which at least 30% by weight of the phenolic moiety is derived from m-cresol, and (C) an alkoxymethylated melamine resin in specified proportions of (B):(C) and (A):[(B)+(C)]. The sensitivity of the resist composition is greatly enhanced by a heat treatment of the resist layer at 90.degree.-140.degree. C. after patternwise irradiation with electron beams.
    • 提出了一种适用于半导体器件制造工艺中精细图案化的电子束固化型抗蚀剂组合物,其在储存中非常稳定,并且能够使用不含浮渣的碱性显影剂水溶液显影,并提供具有高对比度的图案化抗蚀剂层, 线图案的正交横截面轮廓。 组合物包含(A)三嗪化合物,例如2-(4-甲氧基苯基)-4,6-双(三氯甲基)-1,3,5-三嗪,(B)甲酚酚醛清漆树脂,其中至少30 酚类部分的重量百分比来自间甲酚,(C)(B):( C)和(A):[(B)+(C)]的规定比例的烷氧基甲基化三聚氰胺树脂。 通过在用电子束图案照射之后,在90℃-140℃下对抗蚀剂层进行热处理,抗蚀剂组合物的灵敏度大大提高。
    • 8. 发明授权
    • Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin
    • 酚醛清漆树脂前体,酚醛清漆树脂和含有酚醛清漆树脂的正性光致抗蚀剂组合物
    • US06417317B1
    • 2002-07-09
    • US09459606
    • 1999-12-13
    • Ken MiyagiKousuke DoiRyuusaku TakahashiHidekatsu KoharaToshimasa Nakayama
    • Ken MiyagiKousuke DoiRyuusaku TakahashiHidekatsu KoharaToshimasa Nakayama
    • C08G1404
    • G03F7/0236
    • A novolak resin precursor is composed of bonded phenolic moieties, one of the hydrogen atoms in the o- or p-positions relative to the hydroxy group of each phenolic moiety is substituted with an alkyl or alkenyl group having 1 to 3 carbon atoms, and the other two hydrogen atoms are bonded through methylene bonds. The content of ortho-ortho bonding is 30 to 70% relative to the number of total methylene bonds and the weight average molecular weight of the precursor is 300 to 10,000. A novolak resin is obtained from this precursor, and a positive photoresist composition comprises this novolak resin. The invention provides a positive photoresist composition that comprises less binuclear compounds, suppresses scum formation, is excellent in terms of definition and coating performance and provides a resist pattern having satisfactory heat resistance.
    • 酚醛清漆树脂前体由键合的酚部分组成,相对于每个酚部分的羟基的邻位或对位中的氢原子之一被具有1至3个碳原子的烷基或烯基取代,并且 其他两个氢原子通过亚甲基键键合。 邻位键合的含量相对于总亚甲基的数量为30〜70%,前体的重均分子量为300〜10000。 从该前体获得酚醛清漆树脂,正性光致抗蚀剂组合物包含该酚醛清漆树脂。 本发明提供一种正光致抗蚀剂组合物,其包含较少的双核化合物,抑制浮渣形成,在定义和涂布性能方面优异,并提供具有令人满意的耐热性的抗蚀剂图案。