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1. 发明授权

US08888925B2 Nozzle, substrate processing apparatus, and substrate processing method 有权
标题翻译：喷嘴，基板处理装置和基板处理方法
公开(公告)号：US08888925B2
公开(公告)日：2014-11-18
申请号：US13408563
申请日：2012-02-29
申请人： Masanobu Sato , Hiroyuki Yashiki , Mai Yamakawa , Takayoshi Tanaka , Ayumi Higuchi , Rei Takeaki
发明人： Masanobu Sato , Hiroyuki Yashiki , Mai Yamakawa , Takayoshi Tanaka , Ayumi Higuchi , Rei Takeaki
IPC分类号： B08B3/04 , H01L21/67
CPC分类号： B08B3/024 , B05B17/0676 , B08B3/02 , H01L21/67051
摘要： A nozzle for discharging droplets of a processing liquid for processing a substrate has a main body including a supply port, a drain port, a processing liquid flow passageway connecting the supply port and the drain port, and a plurality of discharge ports from which the processing liquid is discharged. The processing liquid flow passageway includes a plurality of branch flow channels, which branch out between the supply port and the drain port and collect together between the supply port and the drain port. The plurality of discharge ports form a plurality of columns respectively corresponding to the plurality of branch flow channels; and are aligned along and connected to the corresponding branch flow channels. A piezo element applies vibration to the processing liquid flowing through the plurality of branch flow channels.
摘要翻译：用于排出用于处理衬底的处理液的液滴的喷嘴具有主体，其包括供给口，排出口，连接供给口和排出口的处理液流路，以及多个排出口，液体排出。处理液体流动通道包括多个分支流动通道，其在供给口和排出口之间分支并在供给口和排出口之间聚集在一起。多个排出口形成分别对应于多个分支流动通道的多个列; 并且对准并连接到相应的分支流动通道。压电元件对流过多个分支流动通道的处理液施加振动。

2. 发明授权

US09230836B2 Substrate treatment method 有权
标题翻译：底物处理方法
公开(公告)号：US09230836B2
公开(公告)日：2016-01-05
申请号：US13427370
申请日：2012-03-22
申请人： Ayumi Higuchi , Yoshiyuki Fujitani , Takemitsu Miura , Rei Takeaki
发明人： Ayumi Higuchi , Yoshiyuki Fujitani , Takemitsu Miura , Rei Takeaki
IPC分类号： H01L21/67 , B08B3/04 , B08B3/10 , B08B3/02
CPC分类号： H01L21/67248 , B08B3/024 , B08B3/04 , B08B3/10 , B08B3/108 , H01L21/67051 , H01L21/67057 , H01L21/67086 , H01L21/67253
摘要： A substrate treatment method that includes circulating a treatment liquid from a treatment vessel through a circulation path extending through a filter and a temperature controller, spouting the treatment liquid toward a substrate accommodated in the treatment vessel to recover the treatment liquid in the treatment vessel, and controlling the liquid surface level of the treatment liquid retained in the treatment vessel below the substrate held at a substrate treatment position.
摘要翻译：一种基板处理方法，其特征在于，包括使来自处理容器的处理液通过延伸通过过滤器的循环路径和温度控制器循环，将处理液朝向容纳在处理容器内的基板喷出，回收处理容器内的处理液，控制在保持在基板处理位置的基板下方的保留在处理容器中的处理液的液面。

3. 发明申请

US20070235064A9 Substrate processing apparatus and method 有权
标题翻译：基板加工装置及方法
公开(公告)号：US20070235064A9
公开(公告)日：2007-10-11
申请号：US11317971
申请日：2005-12-23
申请人： Koji Hasegawa , Masato Tanaka , Ayumi Higuchi , Kenichiro Arai
发明人： Koji Hasegawa , Masato Tanaka , Ayumi Higuchi , Kenichiro Arai
IPC分类号： B08B3/04
CPC分类号： B08B3/12 , B08B3/048
摘要： Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to be charged, the pure water itself never carries new particles from each component of the apparatus. These functions allow efficient particle removal from the substrate surface or the liquid.
摘要翻译：将纯水溶解氮气并含有微泡供应至基材。由于微泡的尺寸非常小，并且具有静电特性，因此它们可以有效地吸附基材表面或纯水中的颗粒。此外，由于纯水溶解氮气不太可能被充电，所以纯水本身不会从装置的每个部件携带新的颗粒。这些功能允许从基板表面或液体中有效地除去颗粒。

4. 发明申请

US20060137719A1 Substrate processing apparatus and method 有权
标题翻译：基板加工装置及方法
公开(公告)号：US20060137719A1
公开(公告)日：2006-06-29
申请号：US11317971
申请日：2005-12-24
申请人： Koji Hasegawa , Masato Tanaka , Ayumi Higuchi , Kenichiro Arai
发明人： Koji Hasegawa , Masato Tanaka , Ayumi Higuchi , Kenichiro Arai
IPC分类号： B08B3/04
CPC分类号： B08B3/12 , B08B3/048
摘要： Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to be charged, the pure water itself never carries new particles from each component of the apparatus. These functions allow efficient particle removal from the substrate surface or the liquid.
摘要翻译：将纯水溶解氮气并含有微泡供应至基材。由于微泡的尺寸非常小，并且具有静电特性，因此它们可以有效地吸附基材表面或纯水中的颗粒。此外，由于纯水溶解氮气不太可能被充电，所以纯水本身不会从装置的每个部件携带新的颗粒。这些功能允许从基板表面或液体中有效地除去颗粒。

5. 发明授权

US07841788B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US07841788B2
公开(公告)日：2010-11-30
申请号：US11689077
申请日：2007-03-21
申请人： Ayumi Higuchi , Kenichiro Arai
发明人： Ayumi Higuchi , Kenichiro Arai
IPC分类号： G03D5/00
CPC分类号： G03D5/00 , H01L21/67057
摘要： In a substrate processing apparatus of the present invention, a buffer bath is provided at any point in a supplying passage of a processing solution supplying part, and a micro bubble generator is provided in the buffer bath. When a substrate is processed, large quantities of micro bubbles can be generated and stored in the buffer bath, and the micro bubbles can be supplied from the buffer bath to a processing bath. This enables the large quantities of micro bubbles to be supplied to the surrounding of the substrate, while the use of the small micro bubble generator avoids an increase in the size of the substrate processing apparatus.
摘要翻译：在本发明的基板处理装置中，在处理液供给部的供给通路中的任意点设有缓冲槽，在缓冲槽内设置微气泡生成装置。当处理基板时，可以产生大量的微气泡并将其储存在缓冲槽中，并且微气泡可以从缓冲液供应到处理槽。这使得能够将大量的微气泡供应到基板的周围，而使用小的微气泡发生器避免了基板处理装置的尺寸的增加。

6. 发明申请

US20060054191A1 Substrate processing apparatus and method of removing particles 有权
标题翻译：基板处理装置和除去颗粒的方法
公开(公告)号：US20060054191A1
公开(公告)日：2006-03-16
申请号：US11226640
申请日：2005-09-14
申请人： Ayumi Higuchi , Kenichiro Arai
发明人： Ayumi Higuchi , Kenichiro Arai
IPC分类号： B08B3/00
CPC分类号： H01L21/67057 , B08B3/048 , Y10S134/902
摘要： A liquid within a processing tank is caused to overflow, and the overflowing liquid is circulated by a circulation system. In this process, bubbles are discharged into the liquid within the processing tank. Thus, particles within the processing tank are not only carried along by a flow of the liquid but also attach to the bubbles to be carried with the bubbles outwardly of the processing tank. A dip-type substrate processing apparatus removes the particles within the processing tank in a short time with efficiency.
摘要翻译：使处理槽内的液体溢出，溢流液体通过循环系统循环。在这个过程中，气泡被排放到处理槽内的液体中。因此，处理槽内的颗粒不仅通过液体的流动而被携带，而且还附着在气泡上，气泡在处理槽外面被携带。浸渍型基板处理装置在短时间内有效地除去处理槽内的颗粒。

7. 发明授权

US07981286B2 Substrate processing apparatus and method of removing particles 有权
标题翻译：基板处理装置和除去颗粒的方法
公开(公告)号：US07981286B2
公开(公告)日：2011-07-19
申请号：US11226640
申请日：2005-09-14
申请人： Ayumi Higuchi , Kenichiro Arai
发明人： Ayumi Higuchi , Kenichiro Arai
IPC分类号： C02F1/24 , B08B3/04 , B08B3/10 , B08B3/14 , B01D19/00 , H01L21/304
CPC分类号： H01L21/67057 , B08B3/048 , Y10S134/902
摘要： A liquid within a processing tank is caused to overflow, and the overflowing liquid is circulated by a circulation system. In this process, bubbles are discharged into the liquid within the processing tank. Thus, particles within the processing tank are not only carried along by a flow of the liquid but also attach to the bubbles to be carried with the bubbles outwardly of the processing tank. A dip-type substrate processing apparatus removes the particles within the processing tank in a short time with efficiency.
摘要翻译：使处理槽内的液体溢出，溢流液体通过循环系统循环。在这个过程中，气泡被排放到处理槽内的液体中。因此，处理槽内的颗粒不仅通过液体的流动而被携带，而且还附着在气泡上，气泡在处理槽外面被携带。浸渍型基板处理装置在短时间内有效地除去处理槽内的颗粒。

8. 发明授权

US07392814B2 Substrate processing apparatus and method 有权
标题翻译：基板加工装置及方法
公开(公告)号：US07392814B2
公开(公告)日：2008-07-01
申请号：US11317971
申请日：2005-12-23
申请人： Koji Hasegawa , Masato Tanaka , Ayumi Higuchi , Kenichiro Arai
发明人： Koji Hasegawa , Masato Tanaka , Ayumi Higuchi , Kenichiro Arai
IPC分类号： B08B3/12
CPC分类号： B08B3/12 , B08B3/048
摘要： Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to be charged, the pure water itself never carries new particles from each component of the apparatus. These functions allow efficient particle removal from the substrate surface or the liquid.
摘要翻译：将纯水溶解氮气并含有微泡供应至基材。由于微泡的尺寸非常小，并且具有静电特性，因此它们可以有效地吸附基材表面或纯水中的颗粒。此外，由于纯水溶解氮气不太可能被充电，所以纯水本身不会从装置的每个部件携带新的颗粒。这些功能允许从基板表面或液体中有效地除去颗粒。

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