专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

US20240383017A1 CONDITIONING CHAMBER COMPONENT 审中-公开
公开(公告)号：US20240383017A1
公开(公告)日：2024-11-21
申请号：US18787708
申请日：2024-07-29
申请人： Lam Research Corporation
发明人： Amir A. YASSERI , Hong SHIH , John DAUGHERTY , Duane OUTKA , Lin XU , Armen AVOYAN , Cliff LA CROIX , Girish M HUNDI
IPC分类号： B08B7/04 , B08B3/04 , B08B3/12 , B08B3/14 , B08B5/02 , H01J37/32
CPC分类号： B08B7/04 , B08B3/048 , B08B3/12 , B08B3/14 , B08B5/02 , H01J37/32853
摘要： A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.

2. 发明授权

US11985736B2 Fluid heating device 有权
公开(公告)号：US11985736B2
公开(公告)日：2024-05-14
申请号：US17041277
申请日：2019-02-04
申请人： KELK Ltd.
发明人： Daisuke Watanabe , Junji Muko
IPC分类号： H05B3/02 , B08B3/08 , B08B3/10 , F24H1/12 , F24H1/14 , H05B3/00 , H05B3/08 , B08B3/04 , B08B3/14 , G03F7/30 , H01L21/67
CPC分类号： H05B3/0047 , B08B3/08 , B08B3/10 , F24H1/12 , H05B3/08 , B08B3/048 , B08B3/14 , B08B2203/007 , G03F7/3085 , H01L21/6704 , H05B3/0052 , H05B2203/021 , H05B2203/032
摘要： A fluid heating device includes a container in which fluid is supplied between an inner surface of an outer cylindrical member and outer surfaces of the inner cylindrical members, lamp heaters arranged in an inner cylindrical members, a nozzle member arranged on a leading end side of the lamp heaters and having an air supply port, and a guide mechanism that guides gas supplied from the air supply port of the nozzle member. The inner cylindrical members include a central inner cylindrical member arranged at a center of the outer cylindrical member, and peripheral inner cylindrical members arranged around the central inner cylindrical member. The lamp heaters include a central lamp heater arranged in the central inner cylindrical member and peripheral lamp heaters respectively arranged in the peripheral inner cylindrical members. The guide mechanism guides the gas to a leading end side of the central lamp heater.

3. 发明公开

US20230364732A1 POLISHING AND CLEANING METHOD, CLEANER AND POLISHING CLEANING SET 审中-公开
公开(公告)号：US20230364732A1
公开(公告)日：2023-11-16
申请号：US18029059
申请日：2021-09-17
申请人： FUJIMI INCORPORATED
发明人： SACHIKO HIRAKO , NAOTO NOGUCHI
IPC分类号： B24B37/04 , B08B1/00 , B08B3/08 , B08B3/04 , C09G1/02 , C11D11/00 , C11D1/29 , C11D1/72 , C11D1/62
CPC分类号： B24B37/044 , B08B1/001 , B08B3/08 , B08B3/048 , C09G1/02 , C11D11/0047 , C11D1/29 , C11D1/721 , C11D1/62
摘要： Provided is a method that enables good cleaning of a polished substrate formed of a high-hardness material. Provided is a method of polishing and cleaning a substrate formed of a material having a Vickers hardness of 1500 Hv or more. The method includes: polishing a substrate to be polished using a polishing composition; and cleaning the polished substrate using a cleaner. The polishing composition contains a polishing auxiliary. Furthermore, the cleaner contains a surfactant.

4. 发明授权

US11806766B2 Treatment system and method for treating workpieces 有权
公开(公告)号：US11806766B2
公开(公告)日：2023-11-07
申请号：US17519684
申请日：2021-11-05
申请人： ECOCLEAN GMBH
发明人： Otfried Meyer , Marko Flatten
IPC分类号： B08B7/04 , B08B3/02 , B08B3/04 , B08B7/00 , B08B7/02 , B24C1/08 , B24C3/08
CPC分类号： B08B7/04 , B08B3/02 , B08B3/048 , B08B7/0014 , B08B7/028 , B24C1/083 , B24C3/083
摘要： The invention relates to a treatment system for treating workpieces. Devices and methods of the disclosure are configured to perform at least one treatment operation on the workpiece, as well as at least one receiving unit for accommodating the workpiece on or in the treatment device. A transport device is provided that comprises at least one transport unit, with which the workpiece is transferable into a transfer position, from which the workpiece is transferable by means of the at least one receiving unit into a treatment position, as well as a control device for controlling the at least one treatment unit, the at least one receiving unit, and the at least one transport unit.

5. 发明授权

US09993850B2 Glass substrate detergent tank and cleaning device 有权
公开(公告)号：US09993850B2
公开(公告)日：2018-06-12
申请号：US14744179
申请日：2015-06-19
申请人： Boe Technology Group Co., Ltd. , Hefei Xinsheng Optoelectronics Technology Co., Ltd.
发明人： Liangliang Li , Jaeyun Jung , Shikai Wang , Dongseob Kim , Yadong Liang , Mingming Wang
IPC分类号： B65D25/04 , B65D25/38 , B08B3/04 , B65D13/02 , B08B3/10 , C03C23/00 , B65D1/24
CPC分类号： B08B3/048 , B08B3/10 , B65D13/02 , B65D25/04 , B65D25/38 , C03C23/0075
摘要： The present disclosure relates to the technical field of glass substrate cleaning. Specifically, the present disclosure provides a glass substrate detergent tank which can solve the technical problem of wasting detergent solution. The detergent tank includes a tank body enclosed by a top face, a bottom face and side faces. There are a water inlet, a water outlet and a vent hole in tank body. There is a partition plate disposed between two facing inside faces of the tank body, which separate the tank body into two cavities communicating at the bottom. The detergent tank according to the embodiment of the present disclosure will not let froth discharge outside the tank body with gas, and thus can reduce the amount of wasted detergent solution, thereby extending the usage time of the detergent solution.

6. 发明申请

US20180043403A1 METHOD FOR MACHINE-CLEANING WORKPIECES AND/OR MACHINE COMPONENTS, AND CLEANING SYSTEM 审中-公开
公开(公告)号：US20180043403A1
公开(公告)日：2018-02-15
申请号：US15546950
申请日：2016-02-24
申请人： ZIPPEL GMBH
发明人： Gunther ZIPPEL , Jurgen HANNEMANN
IPC分类号： B08B17/02 , B08B3/10 , B25J11/00 , B08B3/02
CPC分类号： B08B17/025 , B08B3/024 , B08B3/048 , B08B3/10 , B08B3/108 , B25J11/0085
摘要： The invention relates to a method and a cleaning system for machine-cleaning workpieces and/or machine components received in at least one partly open cleaning chamber. A first aspect of the invention relates to a method for machine-cleaning workpieces or machine components received in at least one partly open cleaning chamber, wherein the workpieces or machine components to be cleaned are introduced into the cleaning chamber on a workpiece support and/or a rotary arrangement; at least one cleaning flow is generated by at least one lance device. The cleaning flow being supplied to at least some sections of the outer contour of the workpieces or machine components to be cleaned; and where the lance device can be moved along the outer contour of the workpiece or machine component to be cleaned in a controlled manner by a guiding and moving device dependent on a control routine which is executed in a control unit. Multiple cleaning sections are defined on the three-dimensional outer contour in an individual manner for the workpiece or machine component to be cleaned on the basis of test specifications for the residual dirt analysis of workpieces or machine components, and the control routine is generated based thereon. The lance device is guided at least to the ascertained cleaning sections in a controlled manner by means of the guiding and moving device, and each cleaning section is supplied with the cleaning flow in a controlled manner.

7. 发明申请

US20180001355A1 CLEANING DEVICE 审中-公开
公开(公告)号：US20180001355A1
公开(公告)日：2018-01-04
申请号：US15541834
申请日：2016-03-10
申请人： MITSUBISHI ELECTRIC CORPORATION
发明人： Yohei SHIBATA , Akio MASUDA
IPC分类号： B08B3/12 , C23G1/24 , B08B3/04 , B08B3/02 , B08B3/08 , C23G3/00 , B08B3/14
CPC分类号： B08B3/123 , B08B3/022 , B08B3/048 , B08B3/08 , B08B3/10 , B08B3/102 , B08B3/14 , B08B2203/007 , C23G1/24 , C23G3/00
摘要： A cleaning device is configured to include a first cleaning tank that holds water to which a small amount of an additive is added as a first cleaning fluid, a second cleaning tank that holds water, a water-based cleaning agent, an alkaline cleaning fluid, or a hydrophilic organic solvent as a second cleaning fluid, a first microscopic air bubble generation device, a first circulating pump, an ultrasonic wave emitting device, and a carrier device. Hydrophobic oil is removed by a cleaning target being exposed to the first cleaning fluid including microscopic air bubbles sprayed from a nozzle in an interior of the first cleaning tank, after which hydrophilic oil is removed by ultrasonic cleaning in the second cleaning tank.

8. 发明授权

US09437464B2 Substrate treating method for treating substrates with treating liquids 有权
标题翻译：用处理液处理基材的基板处理方法
公开(公告)号：US09437464B2
公开(公告)日：2016-09-06
申请号：US14148324
申请日：2014-01-06
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Toyohide Hayashi
IPC分类号： B08B7/04 , H01L21/67 , B08B3/08 , B08B3/04
CPC分类号： H01L21/67023 , B08B3/048 , B08B3/08 , H01L21/67028 , H01L21/67051 , H01L21/67057 , H01L21/67253
摘要： A method for treating substrates with treating liquids, using a treating tank for storing the treating liquids, a holding mechanism for holding the substrates and placing the substrates in a treating position inside the treating tank, a first and a second treating liquid supply device, a temperature control device, and a control device. A first treating liquid is supplied into the treating tank, then a second treating liquid of lower surface tension and higher boiling point than the first treating liquid, is supplied into the treating tank, and placed in a temperature range above the boiling point of the first treating liquid and below the boiling point of the second treating liquid, and then controlling the second treating liquid supply device to replace the first treating liquid stored in the treating tank with the second treating liquid, and controlling the temperature control device to maintain the second treating liquid in the same said temperature range.
摘要翻译：一种用处理液处理基材的方法，使用处理槽储存处理液，保持机构用于保持基板并将基板放置在处理槽内的处理位置，第一和第二处理液供应装置，温度控制装置和控制装置。将第一处理液体供给到处理槽中，然后将比第一处理液低的表面张力低沸点的第二处理液供给到处理槽中，放置在高于第一处理液的沸点的温度范围内处理液体并且低于第二处理液的沸点，然后控制第二处理液体供给装置以用第二处理液替换存储在处理槽中的第一处理液，并且控制温度控制装置保持第二处理液体在相同的温度范围内。

9. 发明授权

US09174249B2 Ultrasonic cleaning method and apparatus therefore 有权
标题翻译：因此，超声波清洗方法和装置
公开(公告)号：US09174249B2
公开(公告)日：2015-11-03
申请号：US13711962
申请日：2012-12-12
申请人： Lam Research Corporation
发明人： Evangelos T. Spyropoulos , Iqbal A. Shareef , Clifford Erik La Croix
IPC分类号： B08B3/12 , G02B27/00 , B08B3/10 , B08B3/04 , B08B11/04 , B08B11/00 , B08B1/00 , B08B11/02
CPC分类号： B08B3/12 , A47L2601/17 , B08B1/00 , B08B3/00 , B08B3/044 , B08B3/045 , B08B3/047 , B08B3/048 , B08B3/10 , B08B3/108 , B08B11/00 , B08B11/02 , B08B11/04 , B08B2209/005 , G02B27/0006 , H01J37/32862
摘要： Ultrasonic cleaning apparatuses and methods of cleaning substantially planar articles. An apparatus comprises (i) a substantially circular tank; (ii) a plurality of cleaning fluid inlets for delivering a cleaning fluid to the tank; (iii) an intermediate support for receiving an article to be cleaned; and (iv) an ultrasonic generator coupled to the tank for generating ultrasonic waves in the tank and cleaning fluid received therein. The apparatus is configured to remove particles from a substantially planar article and have them carried by flow of cleaning fluid away from the article and out of the tank. Using such an apparatus, a cleaning method comprises introducing a substantially planar article to be cleaned into the tank; introducing a cleaning fluid into the tank through the plurality of cleaning fluid inlets; and exciting the cleaning fluid with ultrasonic waves.
摘要翻译：超声波清洗装置和清洁基本上平面的物品的方法。一种装置包括（i）基本圆形的罐; （ii）用于将清洁流体输送到罐的多个清洁流体入口; （iii）用于接收待清洁物品的中间支撑件; 以及（iv）耦合到所述罐的超声波发生器，用于在所述罐中产生超声波并且在其中接收清洁流体。该装置构造成从基本上平面的制品中除去颗粒，并使它们通过清洁流体的流动远离制品并从罐中运送。使用这种装置，清洁方法包括将待清洁的基本上平面的物品引入到罐中; 通过所述多个清洁流体入口将清洁流体引入所述罐中; 并用超声波激发清洗液。

10. 发明授权

US09156036B2 Method of separating workpieces from chips 有权
标题翻译：从芯片上分离工件的方法
公开(公告)号：US09156036B2
公开(公告)日：2015-10-13
申请号：US14583917
申请日：2014-12-29
申请人： Shozen Yanakawa , Hiroshi Kasuya , Kyota Kotake , Satoru Akimoto , Takahiro Mogi , Youji Takeuchi , Umeo Tsuyusaki
发明人： Shozen Yanakawa , Hiroshi Kasuya , Kyota Kotake , Satoru Akimoto , Takahiro Mogi , Youji Takeuchi , Umeo Tsuyusaki
IPC分类号： B03B5/62 , B08B3/04 , B23Q7/12 , B03B5/00 , B23Q11/00
CPC分类号： B03B5/623 , B03B5/00 , B03B11/00 , B08B3/048 , B23Q7/12 , B23Q11/0075
摘要： There is provided a workpiece separation apparatus permitting input of a mixture of workpieces and chips stably within a flow current and separating them accurately and efficiently. The workpiece separation apparatus includes an input cylinder inserted within a separating container, and a fluid supplying means arranged so as to supply fluid to the separating container from a part lower than a lower end of the input cylinder, and configured such that the fluid overflows and flows out of the upper end of the separating container due to a flow current generated within the separating container, and such that the level of the fluid rises up in the input cylinder and the fluid does not flow out of the upper end of the input cylinder, but is maintained substantially in a resting state and at a level above the level of the upper end of the separating container.
摘要翻译：提供了一种允许在流动电流内稳定地输入工件和芯片的混合物的工件分离装置，并且准确而有效地分离它们。工件分离装置包括插入在分离容器内的输入圆筒和流体供给装置，该流体供给装置布置成从分离容器的低于输入圆筒的下端的部分供给流体，并且构造成使得流体溢出由于在分离容器内产生的流动流动而从分离容器的上端流出，并且使得流体在输入气缸中升高，并且流体不会从输入圆筒的上端流出但是基本上保持在静止状态并且处于高于分离容器的上端的高度的水平。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式