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1. 发明授权

US08058628B2 Substrate processing apparatus and method 有权
标题翻译：基板加工装置及方法
公开(公告)号：US08058628B2
公开(公告)日：2011-11-15
申请号：US12170361
申请日：2008-07-09
申请人： Marek Zywno , Noah Bareket
发明人： Marek Zywno , Noah Bareket
IPC分类号： G03B27/62
CPC分类号： F16C32/044 , B82Y10/00 , B82Y40/00 , F16C32/0472 , H01J37/3174 , H01L21/68
摘要： Substrate processing methods and apparatus are disclosed. In some embodiments a substrate processing apparatus may comprise a support structure and a moveable stage including first and second stages. The moveable stage has one or more maglev units attached to the first stage and/or second stage proximate an edge of the first stage. The first stage retains one or more substrates and moves with respect to a first axis that is substantially fixed with respect to the second stage. The second stage translates along a second axis with respect to the support structure. In other embodiments, a primary motor may maintain a rotary stage at an angular speed and/or accelerate or decelerate the stage from a first angular speed to a second angular speed. A secondary motor may accelerate the stage from rest to the first angular speed and/or decelerate the stage from a non-zero angular speed.
摘要翻译：公开了基板加工方法和装置。在一些实施例中，衬底处理设备可以包括支撑结构和包括第一和第二阶段的可移动台。可移动台具有一个或多个磁悬浮单元，其附接到靠近第一级边缘的第一级和/或第二级。第一阶段保持一个或多个基板并相对于相对于第二阶段基本固定的第一轴线移动。第二级相对于支撑结构沿第二轴平移。在其他实施例中，主电动机可以以角速度保持旋转台并且/或者将平台从第一角速度加速或减速到第二角速度。次级电动机可以将舞台从休息加速到第一角速度和/或使舞台从非零角速度减速。

2. 发明授权

US07897942B1 Dynamic tracking of wafer motion and distortion during lithography 有权
标题翻译：光刻期间晶片运动和失真的动态跟踪
公开(公告)号：US07897942B1
公开(公告)日：2011-03-01
申请号：US12335736
申请日：2008-12-16
申请人： Noah Bareket , Marek Zywno
发明人： Noah Bareket , Marek Zywno
IPC分类号： G03B27/62
CPC分类号： G03B27/62 , G03F7/70783
摘要： A substrate processing apparatus and method for dynamic tracking of wafer motion and distortion during lithography are disclosed. An energetic beam may be applied to a portion of a substrate according to a predetermined pattern. The relative positions of one or more targets on the substrate may be determined while applying the energetic beam to the portion of the substrate. A dynamic distortion of the substrate may be determined from the relative positions while applying the energetic beam to the portion of the substrate. Application of the energetic beam may be deviated from the predetermined pattern in a manner calculated to compensate for the dynamic distortion of the substrate.
摘要翻译：公开了一种用于在光刻期间晶片运动和失真的动态跟踪的衬底处理装置和方法。可以根据预定图案将能量束施加到基板的一部分。可以在将能量束施加到衬底的部分的同时确定衬底上的一个或多个靶的相对位置。可以根据相对位置确定衬底的动态变形，同时将能量束施加到衬底的该部分。能量光束的应用可以以计算为补偿基板的动态失真的方式偏离预定图案。

3. 发明授权

US07633070B2 Substrate processing apparatus and method 有权
标题翻译：基板加工装置及方法
公开(公告)号：US07633070B2
公开(公告)日：2009-12-15
申请号：US11670896
申请日：2007-02-02
申请人： Marek Zywno , Noah Bareket
发明人： Marek Zywno , Noah Bareket
IPC分类号： G03B27/62
CPC分类号： H01J37/20 , H01J2237/201 , H01J2237/202 , H01J2237/26 , H01J2237/317 , H01L21/6719 , H01L21/68 , H01L21/68764 , H01L21/68771
摘要： A substrate processing apparatus and method are disclosed.
摘要翻译：公开了一种基板处理装置和方法。

4. 发明申请

US20090028683A1 SUBSTRATE PROCESSING APPARATUS AND METHOD 有权
标题翻译：基板加工装置和方法
公开(公告)号：US20090028683A1
公开(公告)日：2009-01-29
申请号：US12170361
申请日：2008-07-09
申请人： Marek Zywno , Noah Bareket
发明人： Marek Zywno , Noah Bareket
IPC分类号： H01L21/68
CPC分类号： F16C32/044 , B82Y10/00 , B82Y40/00 , F16C32/0472 , H01J37/3174 , H01L21/68
摘要： Substrate processing methods and apparatus are disclosed. In some embodiments a substrate processing apparatus may comprise a support structure and a moveable stage including first and second stages. The moveable stage has one or more maglev units attached to the first stage and/or second stage proximate an edge of the first stage. The first stage retains one or more substrates and moves with respect to a first axis that is substantially fixed with respect to the second stage. The second stage translates along a second axis with respect to the support structure. In other embodiments, a primary motor may maintain a rotary stage at an angular speed and/or accelerate or decelerate the stage from a first angular speed to a second angular speed. A secondary motor may accelerate the stage from rest to the first angular speed and/or decelerate the stage from a non-zero angular speed.
摘要翻译：公开了基板加工方法和装置。在一些实施例中，衬底处理设备可以包括支撑结构和包括第一和第二阶段的可移动台。可移动台具有一个或多个磁悬浮单元，其附接到靠近第一级边缘的第一级和/或第二级。第一阶段保持一个或多个基板并相对于相对于第二阶段基本固定的第一轴线移动。第二级相对于支撑结构沿第二轴平移。在其他实施例中，主电动机可以以角速度保持旋转台并且/或者将平台从第一角速度加速或减速到第二角速度。次级电动机可以将舞台从休息加速到第一角速度和/或使舞台从非零角速度减速。

5. 发明授权

US07342238B2 Systems, control subsystems, and methods for projecting an electron beam onto a specimen 失效
标题翻译：系统，控制子系统以及将电子束投射到样品上的方法
公开(公告)号：US07342238B2
公开(公告)日：2008-03-11
申请号：US11198985
申请日：2005-08-08
申请人： Marek Zywno , Marian Mankos , Harald Hess , Shem-Tov Levi
发明人： Marek Zywno , Marian Mankos , Harald Hess , Shem-Tov Levi
IPC分类号： G01N23/00
CPC分类号： H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/2817 , H01J2237/31766
摘要： Systems, control subsystems, and methods for projecting an electron beam onto a specimen are provided. One system includes a stage configured to move the specimen with a non-uniform velocity. The system also includes a projection subsystem configured to project the electron beam onto the specimen while the stage is moving the specimen at the non-uniform velocity. In addition, the system includes a control subsystem configured to alter one or more characteristics of the electron beam while the projection subsystem is projecting the electron beam onto the specimen based on the non-uniform velocity. One method includes moving the specimen with a non-uniform velocity and projecting the electron beam onto the specimen during movement of the specimen. In addition, the method includes altering one or more characteristics of the electron beam during projection of the electron beam onto the specimen based on the non-uniform velocity.
摘要翻译：提供了将电子束投射到试样上的系统，控制子系统和方法。一个系统包括配置成以不均匀的速度移动样本的台。该系统还包括一个投影子系统，配置成将电子束投射到样本上，同时舞台以不均匀的速度移动样本。另外，该系统包括控制子系统，该控制子系统被配置为改变电子束的一个或多个特性，同时投影子系统基于非均匀速度将电子束投影到样本上。一种方法包括以不均匀的速度移动样品并在样品移动期间将电子束投射到样品上。另外，该方法包括在基于非均匀速度将电子束投影到样本上时改变电子束的一个或多个特性。

6. 发明申请

US20130176548A1 Z-STAGE WITH DYNAMICALLY DRIVEN STAGE MIRROR AND CHUCK ASSEMBLY 有权
标题翻译： Z型舞台动态舞台和大型组合
公开(公告)号：US20130176548A1
公开(公告)日：2013-07-11
申请号：US13784402
申请日：2013-03-04
申请人： Salam Harb , Kent Douglas , Marek Zywno , James Haslim , Jon Hamilton
发明人： Salam Harb , Kent Douglas , Marek Zywno , James Haslim , Jon Hamilton
IPC分类号： G03F7/20
CPC分类号： G03F7/70758 , H01L21/68 , H01L21/6831 , Y10T74/20006 , Y10T279/21 , Y10T279/23 , Y10T279/27
摘要： Substrate support apparatus and methods are disclosed. Motion of a substrate chuck relative to a stage mirror may be dynamically compensated by sensing a displacement of the substrate chuck relative to the stage mirror and coupling a signal proportional to the displacement in one or more feedback loops with Z stage actuators and/or XY stage actuators coupled to the stage mirror. Alternatively, a substrate support apparatus may include a Z stage plate a stage mirror, one or more actuators attached to the Z stage plate, and a substrate chuck mounted to the stage mirror with constraints on six degrees of freedom of movement of the substrate chuck. The actuators impart movement to the Z stage in a Z direction as the Z stage plate is scanned in a plane perpendicular to the Z direction. The actuators may include force flexures having a base portion attached to the Z stage plate and a cantilever portion extending in a lateral direction from the base portion. The cantilever portion may include a parallelogram flexure coupled between the base portion and a free end of the cantilever portion.
摘要翻译：公开了基板支撑装置和方法。衬底卡盘相对于舞台反射镜的运动可以通过感测衬底卡盘相对于舞台镜的位移而被动态地补偿，并将与一个或多个反馈回路中的位移成比例的信号与Z级致动器和/或XY平台耦合到舞台镜的致动器。或者，基板支撑装置可以包括Z平台板，平台反射镜，附接到Z平台板的一个或多个致动器以及安装到平台反射镜的基板卡盘，其具有基板卡盘的六个自由度的限制。当Z平台板在与Z方向垂直的平面中扫描时，执行器在Z方向上向Z平台施加移动。致动器可以包括具有附接到Z平台板的基部部分和从基部沿横向方向延伸的悬臂部分的力弯曲。悬臂部分可以包括耦合在基部和悬臂部分的自由端之间的平行四边形弯曲部。

7. 发明授权

US06584218B2 Automated photomask inspection apparatus 有权
公开(公告)号：US06584218B2
公开(公告)日：2003-06-24
申请号：US10003166
申请日：2001-11-14
申请人： Mark Joseph Wihl , Tao-Yi Fu , Marek Zywno , Damon Floyd Kvamme , Michael E. Fein
发明人： Mark Joseph Wihl , Tao-Yi Fu , Marek Zywno , Damon Floyd Kvamme , Michael E. Fein
IPC分类号： G06K900
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676
摘要： An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.

8. 发明授权

US06516517B2 Fluid bearings and vacuum chucks and methods for producing same 失效
公开(公告)号：US06516517B2
公开(公告)日：2003-02-11
申请号：US10039969
申请日：2001-12-31
申请人： Marek Zywno
发明人： Marek Zywno
IPC分类号： B21D5310
CPC分类号： F16C29/025 , B25B11/005 , F16C32/0603 , F16C32/0662 , F16C32/0666 , Y10S29/044 , Y10T29/49639 , Y10T29/49885 , Y10T29/49906 , Y10T29/53191
摘要： Fluid bearings, vacuum chucks and methods for producing these devices. One example of a method for forming a fluid bearing includes forming a plate having a face surface and a bonding surface, coupling a first side of a body to the bonding surface, placing the face surface of the plate against a predetermined surface, and generating a pressure difference to conform the face surface to the predetermined surface. One example of a fluid bearing of the invention includes a plate support and a flexible bearing plate having a bonding surface which is attached to the plate support with an adhesive which is flexible before hardening. The flexible bearing plate conforms to a predetermined surface during a portion of the time that the adhesive hardens. Examples of vacuum chucks, and methods for forming vacuum chucks, and other aspects of the invention are described.

9. 发明授权

US06990737B2 Fluid bearings and vacuum chucks and methods for producing same 失效
公开(公告)号：US06990737B2
公开(公告)日：2006-01-31
申请号：US10782250
申请日：2004-02-18
申请人： Marek Zywno
发明人： Marek Zywno
IPC分类号： B21D53/10 , F16C32/06
CPC分类号： F16C29/025 , B25B11/005 , F16C32/0603 , F16C32/0662 , F16C32/0666 , Y10S29/044 , Y10T29/49639 , Y10T29/49885 , Y10T29/49906 , Y10T29/53191
摘要： Fluid bearings, vacuum chucks and methods for producing these devices. One example of a method for forming a fluid bearing includes forming a plate having a face surface and a bonding surface, coupling a first side of a body to the bonding surface, placing the face surface of the plate against a predetermined surface, and generating a pressure difference to conform the face surface to the predetermined surface. One example of a fluid bearing of the invention includes a plate support and a flexible bearing plate having a bonding surface which is attached to the plate support with an adhesive which is flexible before hardening. The flexible bearing plate conforms to a predetermined surface during a portion of the time that the adhesive hardens. Examples of vacuum chucks, and methods for forming vacuum chucks, and other aspects of the invention are described.

10. 发明授权

US06698735B2 Fluid bearings and vacuum chucks and methods for producing same 失效
公开(公告)号：US06698735B2
公开(公告)日：2004-03-02
申请号：US10324982
申请日：2002-12-19
申请人： Marek Zywno
发明人： Marek Zywno
IPC分类号： B25B1100
CPC分类号： F16C29/025 , B25B11/005 , F16C32/0603 , F16C32/0662 , F16C32/0666 , Y10S29/044 , Y10T29/49639 , Y10T29/49885 , Y10T29/49906 , Y10T29/53191
摘要： Fluid bearings, vacuum chucks and methods for producing these devices. One example of a method for forming a fluid bearing includes forming a plate having a face surface and a bonding surface, coupling a first side of a body to the bonding surface, placing the face surface of the plate against a predetermined surface, and generating a pressure difference to conform the face surface to the predetermined surface. One example of a fluid bearing of the invention includes a plate support and a flexible bearing plate having a bonding surface which is attached to the plate support with an adhesive which is flexible before hardening. The flexible bearing plate conforms to a predetermined surface during a portion of the time that the adhesive hardens. Examples of vacuum chucks, and methods for forming vacuum chucks, and other aspects of the invention are described.

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