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1. 发明申请

US20120236281A1 SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION 有权
标题翻译：源检测的多重反射照明
公开(公告)号：US20120236281A1
公开(公告)日：2012-09-20
申请号：US13419157
申请日：2012-03-13
申请人： Daimian Wang , Daniel Wack , Damon F. Kvamme , Tao-Yi Fu
发明人： Daimian Wang , Daniel Wack , Damon F. Kvamme , Tao-Yi Fu
IPC分类号： G03B27/54
CPC分类号： G03F1/84
摘要： Methods and systems for source multiplexing illumination for mask inspection are disclosed. Such illumination systems enable EUV sources of small brightness to be used for EUV mask defect inspection at nodes below the 22 nm. Utilizing the multiple plane or conic mirrors that are either attached to a continuously rotating base with different angles or individually rotating to position for each pulse, the reflected beams may be directed through a common optical path. The light may then be focused by a condenser to an EUV mask. The reflected and scattered light from the mask may then be imaged by some imaging optics onto some sensors. The mask image may be subsequently processed for defect information.
摘要翻译：公开了用于掩模检查的源多路复用照明的方法和系统。这种照明系统使EUV源的小亮度可用于在22nm以下的节点进行EUV掩模缺陷检查。利用多个平面或圆锥镜，其连接到具有不同角度的连续旋转底座或单独旋转以适应每个脉冲的位置，反射光束可以被引导通过公共光路。然后可以通过冷凝器将光聚焦到EUV掩模。然后可以通过一些成像光学器件将来自掩模的反射和散射的光成像到一些传感器上。随后可以对掩模图像进行缺陷信息的处理。

2. 发明授权

US07858911B2 Confocal wafer inspection system and method 有权
标题翻译：共聚焦晶片检测系统及方法
公开(公告)号：US07858911B2
公开(公告)日：2010-12-28
申请号：US12218189
申请日：2008-07-11
申请人： Christopher R. Fairley , Tao-Yi Fu , Bin-Ming Benjanim Tsai , Scott A. Young
发明人： Christopher R. Fairley , Tao-Yi Fu , Bin-Ming Benjanim Tsai , Scott A. Young
IPC分类号： G02B7/04
CPC分类号： G01N21/9501 , G02B3/0056 , G02B21/0024 , G02B21/0028 , G02B21/008 , G02B27/40
摘要： A semiconductor wafer inspection system and method is provided which uses a multiple element arrangement, such as an offset fly lens array. The preferred embodiment uses a laser to transmit light energy toward a beam expander, which expands the light energy to create an illumination field. An offset fly lens array converts light energy from the illumination field into an offset pattern of illumination spots. A lensing arrangement, including a first lens, a transmitter/reflector, an objective, and a Mag tube imparts light energy onto the specimen and passes the light energy toward a pinhole mask. The pinhole mask is mechanically aligned with the offset fly lens array. Light energy passing through each pinhole in the pinhole mask is directed toward a relay lens, which guides light energy onto a sensor. The offset fly lens array corresponds to the pinhole mask. The offset pattern of the offset fly lens array is chosen such that spots produced can be recombined into a continuous image, and the system utilizes a time delay and integration charge coupled device for rapid sensing along with an autofocus system that measures and cancels topological features of the specimen.
摘要翻译：提供了使用多重元件布置的半导体晶片检查系统和方法，例如偏移飞行透镜阵列。优选实施例使用激光将光能传递到光束扩展器，其扩展光能以产生照明场。偏移飞行透镜阵列将来自照明场的光能转换成照明点的偏移图案。包括第一透镜，发射器/反射器，物镜和Mag管的透镜装置将光能量施加到样本上，并将光能传递给针孔掩模。针孔掩模与偏置飞行透镜阵列机械对准。通过针孔掩模中的每个针孔的光能被引向中继透镜，该中继透镜将光能引导到传感器上。偏移飞行透镜阵列对应于针孔掩模。选择偏移飞行透镜阵列的偏移图案，使得所产生的斑点可以重新组合成连续图像，并且系统利用时间延迟和积分电荷耦合器件与快速感测以及自动对焦系统一起测量和消除拓扑特征标本。

3. 发明申请

US20100238433A1 METHODS AND SYSTEMS FOR INSPECTION OF A SPECIMEN USING DIFFERENT INSPECTION PARAMETERS 有权
标题翻译：使用不同检查参数检验样本的方法和系统
公开(公告)号：US20100238433A1
公开(公告)日：2010-09-23
申请号：US12796047
申请日：2010-06-08
申请人： Steve R. Lange , Paul Frank Marella , Nat Ceglio , Shiow-Hwei Hwang , Tao-Yi Fu
发明人： Steve R. Lange , Paul Frank Marella , Nat Ceglio , Shiow-Hwei Hwang , Tao-Yi Fu
IPC分类号： G01N21/01
CPC分类号： G01N21/9501 , G01N21/8806
摘要： Methods and systems for inspection of a specimen using different parameters are provided. One computer-implemented method includes determining optimal parameters for inspection based on selected defects. This method also includes setting parameters of an inspection system at the optimal parameters prior to inspection. Another method for inspecting a specimen includes illuminating the specimen with light having a wavelength below about 350 nm and with light having a wavelength above about 350 nm. The method also includes processing signals representative of light collected from the specimen to detect defects or process variations on the specimen. One system configured to inspect a specimen includes a first optical subsystem coupled to a broadband light source and a second optical subsystem coupled to a laser. The system also includes a third optical subsystem configured to couple light from the first and second optical subsystems to an objective, which focuses the light onto the specimen.
摘要翻译：提供了使用不同参数检查试样的方法和系统。一种计算机实现的方法包括基于所选择的缺陷来确定用于检查的最佳参数。该方法还包括在检查之前将检查系统的参数设置为最佳参数。用于检查样品的另一种方法包括用波长低于约350nm的光和波长高于约350nm的光照射样品。该方法还包括处理代表从样品收集的光的信号，以检测样品上的缺陷或过程变化。配置成检查样本的一个系统包括耦合到宽带光源的第一光学子系统和耦合到激光器的第二光学子系统。该系统还包括配置成将来自第一和第二光学子系统的光耦合到物镜的第三光学子系统，其将光聚焦到样本上。

4. 发明授权

US07399950B2 Confocal wafer inspection method and apparatus using fly lens arrangement 有权
标题翻译：共焦晶片检查方法和使用飞行透镜装置的装置
公开(公告)号：US07399950B2
公开(公告)日：2008-07-15
申请号：US11521930
申请日：2006-09-15
申请人： Christopher R. Fairley , Tao-Yi Fu , Bin-Ming Benjamin Tsai , Scott A. Young
发明人： Christopher R. Fairley , Tao-Yi Fu , Bin-Ming Benjamin Tsai , Scott A. Young
IPC分类号： G02B7/04
CPC分类号： G01N21/9501 , G02B3/0056 , G02B21/0024 , G02B21/0028 , G02B21/008 , G02B27/40
摘要： A semiconductor wafer inspection system and method is provided which uses a multiple element arrangement, such as an offset fly lens array. The preferred embodiment uses a laser to transmit light energy toward a beam expander, which expands the light energy to create an illumination field. An offset fly lens array converts light energy from the illumination field into an offset pattern of illumination spots. A lensing arrangement, including a first lens, a transmitter/reflector, an objective, and a Mag tube imparts light energy onto the specimen and passes the light energy toward a pinhole mask. The pinhole mask is mechanically aligned with the offset fly lens array. Light energy passing through each pinhole in the pinhole mask is directed toward a relay lens, which guides light energy onto a sensor. The offset fly lens array corresponds to the pinhole mask. The offset pattern of the offset fly lens array is chosen such that spots produced can be recombined into a continuous image, and the system utilizes a time delay and integration charge coupled device for rapid sensing along with an autofocus system that measures and cancels topological features of the specimen.
摘要翻译：提供了使用多重元件布置的半导体晶片检查系统和方法，例如偏移飞行透镜阵列。优选实施例使用激光将光能传递到光束扩展器，其扩展光能以产生照明场。偏移飞行透镜阵列将来自照明场的光能转换成照明点的偏移图案。包括第一透镜，发射器/反射器，物镜和Mag管的透镜装置将光能量施加到样本上并将光能传递给针孔掩模。针孔掩模与偏置飞行透镜阵列机械对准。通过针孔掩模中的每个针孔的光能被引向中继透镜，该中继透镜将光能引导到传感器上。偏移飞行透镜阵列对应于针孔掩模。选择偏移飞行透镜阵列的偏移图案，使得所产生的斑点可以重新组合成连续图像，并且系统利用时间延迟和积分电荷耦合器件与快速感测以及自动对焦系统一起测量和消除拓扑特征标本。

5. 发明申请

US20070195332A1 System And Method For Coherent Optical Inspection 有权
标题翻译：相干光学检测系统与方法
公开(公告)号：US20070195332A1
公开(公告)日：2007-08-23
申请号：US11738756
申请日：2007-04-23
申请人： Shiow-Hwei Hwang , Tao-Yi Fu
发明人： Shiow-Hwei Hwang , Tao-Yi Fu
IPC分类号： G01B11/02
CPC分类号： G01B11/303 , G01N21/9501
摘要： A system and method for coherent optical inspection are described. In one embodiment, an illuminating beam illuminates a sample, such as a semiconductor wafer, to generate a reflected beam. A reference beam then interferes with the reflected beam to generate an interference pattern at a detector, which records the interference pattern. The interference pattern may then be compared with a comparison image to determine differences between the interference pattern and the comparison image. According to another aspect, the phase difference between the reference beam and the reflected beam may be adjusted to enhance signal contrast. Another embodiment provides for using differential interference techniques to suppress a regular pattern in the sample.
摘要翻译：描述了用于相干光学检查的系统和方法。在一个实施例中，照明光束照射诸如半导体晶片的样本以产生反射光束。参考光束然后干扰反射光束，以在记录干涉图案的检测器处产生干涉图案。然后可以将干涉图案与比较图像进行比较，以确定干涉图案和比较图像之间的差异。根据另一方面，可以调整参考光束和反射光束之间的相位差以增强信号对比度。另一实施例提供使用差分干涉技术来抑制样本中的规则图案。

6. 发明申请

US20070030477A1 Systems Configured to Generate Output Corresponding to Defects on a Specimen 有权
标题翻译：系统配置为生成与样品缺陷相对应的输出
公开(公告)号：US20070030477A1
公开(公告)日：2007-02-08
申请号：US11461893
申请日：2006-08-02
申请人： Shiow-Hwei Hwang , Tao-Yi Fu , Xiumei Liu
发明人： Shiow-Hwei Hwang , Tao-Yi Fu , Xiumei Liu
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/45
摘要： Systems configured to generate output corresponding to defects on a specimen and systems configured to generate phase information about defects on a specimen are provided. One system includes an optical subsystem that is configured to create interference between a test beam and a reference beam. The test beam and the reference beam are reflected from the specimen. The system also includes a detector that is configured to generate output representative of the interference between the test and reference beams. The interference increases contrast between the output corresponding to the defects and output corresponding to non-defective portions of the specimen.
摘要翻译：提供了被配置为产生对应于样本上的缺陷的输出和被配置为生成关于样本上的缺陷的相位信息的系统的系统。一个系统包括被配置为在测试光束和参考光束之间产生干涉的光学子系统。测试光束和参考光束从样品反射。该系统还包括被配置为产生表示测试参考光束和参考光束之间的干扰的输出的检测器。干扰增加对应于缺陷的输出与对应于样本的无缺陷部分的输出之间的对比度。

7. 发明申请

US20050156098A1 Confocal wafer inspection method and apparatus 有权
标题翻译：共焦晶片检查方法和装置
公开(公告)号：US20050156098A1
公开(公告)日：2005-07-21
申请号：US11079614
申请日：2005-03-14
申请人： Christopher Fairley , Tao-Yi Fu , Bin-Ming Tsai , Scott Young
发明人： Christopher Fairley , Tao-Yi Fu , Bin-Ming Tsai , Scott Young
IPC分类号： G02B21/00 , G02B7/04
CPC分类号： G01N21/9501 , G02B3/0056 , G02B21/0024 , G02B21/0028 , G02B21/008 , G02B27/40
摘要： A semiconductor wafer inspection system and method is provided which uses a multiple element arrangement, such as an offset fly lens array. The preferred embodiment uses a laser to transmit light energy toward a beam expander, which expands the light energy to create an illumination field. An offset fly lens array converts light energy from the illumination field into an offset pattern of illumination spots. A lensing arrangement, including a first lens, a transmitter/reflector, an objective, and a Mag tube imparts light energy onto the specimen and passes the light energy toward a pinhole mask. The pinhole mask is mechanically aligned with the offset fly lens array. Light energy passing through each pinhole in the pinhole mask is directed toward a relay lens, which guides light energy onto a sensor. The offset fly lens array corresponds to the pinhole mask. The offset pattern of the offset fly lens array is chosen such that spots produced can be recombined into a continuous image, and the system utilizes a time delay and integration charge coupled device for rapid sensing along with an autofocus system that measures and cancels topological features of the specimen.
摘要翻译：提供了使用多重元件布置的半导体晶片检查系统和方法，例如偏移飞行透镜阵列。优选实施例使用激光将光能传递到光束扩展器，其扩展光能以产生照明场。偏移飞行透镜阵列将来自照明场的光能转换成照明点的偏移图案。包括第一透镜，发射器/反射器，物镜和Mag管的透镜装置将光能量施加到样本上并将光能传递给针孔掩模。针孔掩模与偏置飞行透镜阵列机械对准。通过针孔掩模中的每个针孔的光能被引向中继透镜，该中继透镜将光能引导到传感器上。偏移飞行透镜阵列对应于针孔掩模。选择偏移飞行透镜阵列的偏移图案，使得所产生的斑点可以重新组合成连续图像，并且系统利用时间延迟和积分电荷耦合器件与快速感测以及自动对焦系统一起测量和消除拓扑特征标本。

8. 发明授权

US5572598A Automated photomask inspection apparatus 失效
公开(公告)号：US5572598A
公开(公告)日：1996-11-05
申请号：US202868
申请日：1994-02-25
申请人： Mark J. Wihl , Tao-Yi Fu , Marek Zywno , Damon F. Kvamme , Michael E. Fein
发明人： Mark J. Wihl , Tao-Yi Fu , Marek Zywno , Damon F. Kvamme , Michael E. Fein
IPC分类号： G01B11/30 , G01N21/93 , G01N21/956 , G03F1/84 , G06K9/00 , G06T7/00 , H01L21/66
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676
摘要： An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.

9. 发明授权

US07554655B2 High throughput brightfield/darkfield water inspection system using advanced optical techniques 有权
标题翻译：采用先进光学技术的高通量明场/暗场水检测系统
公开(公告)号：US07554655B2
公开(公告)日：2009-06-30
申请号：US12154593
申请日：2008-05-22
申请人： Christopher R. Fairley , Tao Yi Fu , Gershon Perelman , Bin-Ming Benjamin Tsai
发明人： Christopher R. Fairley , Tao Yi Fu , Gershon Perelman , Bin-Ming Benjamin Tsai
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/95607 , G01N2021/8825
摘要： The broadband brightfield/darkfield wafer inspection system provided receives broadband brightfield illumination information via a defect detector, which signals for initiation of darkfield illumination. The defect detector forms a two dimensional histogram of the defect data and a dual mode defect decision algorithm and post processor assess defects. Darkfield radiation is provided by two adjustable height laser beams which illuminate the surface of the wafer from approximately 6 to 39 degrees. Each laser is oriented at an azimuth angle 45 degrees from the orientation of the manhattan geometry on the wafer, and 90 degrees in azimuth from one another. Vertical angular adjustability is provided by modifying cylindrical lens position to compensate for angular mirror change by translating an adjustable mirror, positioning the illumination spot into the sensor field of view, rotating and subsequently moving the cylindrical lens. A brightfield beamsplitter in the system is removable, and preferably replaced with a blank when performing darkfield illumination. Light level control for the system is provided by a dual polarizer first stage. Light exiting from the second polarizer passes through a filter which absorbs a portion of the light and comprises the second stage of light control. The beam then passes through a polarizing beamsplitter. The second channel is further reflected and polarized and both beams thereafter illuminate the substrate.
摘要翻译：提供的宽带明场/暗场晶片检查系统经由缺陷检测器接收宽带明场照明信息，该缺陷检测器信号用于开始暗场照明。缺陷检测器形成缺陷数据的二维直方图，并且双模缺陷判定算法和后处理器评估缺陷。暗场辐射由两个可调节的高度激光束提供，其将晶片的表面从约6度39度照射。每个激光器定向在与晶片上的曼哈顿几何形状的取向成45度的方位角，并且彼此成90度的方位角。通过改变柱面透镜位置来补偿角度反射镜的变化，通过平移可调节的反射镜，将照明光斑定位在传感器视场内，旋转和随后移动柱面透镜来提供垂直角度调整性。系统中的明场分束器是可拆卸的，并且当执行暗场照明时，优选地用空白物替换。系统的光级控制由双偏振器第一级提供。从第二偏振片射出的光通过吸收一部分光的滤光器，并包括第二级光控制。然后光束通过偏振分光镜。第二通道被进一步反射和偏振，并且两个光束此后照亮基板。

10. 发明授权

US07535563B1 Systems configured to inspect a specimen 有权
标题翻译：配置为检查样本的系统
公开(公告)号：US07535563B1
公开(公告)日：2009-05-19
申请号：US11464567
申请日：2006-08-15
申请人： Grace Hsiu-Ling Chen , Tao-Yi Fu , Jamie Sullivan , Shing Lee , Greg Kirk
发明人： Grace Hsiu-Ling Chen , Tao-Yi Fu , Jamie Sullivan , Shing Lee , Greg Kirk
IPC分类号： G01N21/00
CPC分类号： G01N21/4788 , G01N21/9501 , G01N21/95623 , G02B26/0841
摘要： Systems configured to inspect a specimen are provided. One system includes an illumination subsystem configured to illuminate a two-dimensional field of view on the specimen. The system also includes a collection subsystem configured to collect light scattered from the specimen. In addition, the system includes an array of micro-mirrors configured to reflect a two-dimensional pattern of light diffracted from periodic structures on the specimen out of the optical path of the system without reflecting light across an entire dimension of the array out of the optical path. The system further includes a detection subsystem configured to generate output responsive to light reflected by the array into the optical path. The output can be used to detect defects on the specimen. In one embodiment, the system includes an optical element configured to increase the uniformity of the wavefront of the light reflected by the array into the optical path.
摘要翻译：提供了配置为检查样本的系统。一个系统包括被配置为照亮样本上的二维视场的照明子系统。该系统还包括收集子系统，其被配置为收集从样本散射的光。另外，该系统包括微镜阵列，微阵列阵列被配置成将来自系统的光路上的样品上的周期性结构衍射的光的二维图案反射出来，而不会反射穿过该阵列的整个尺寸的光光路。该系统还包括检测子系统，该检测子系统被配置为响应于由阵列反射到光路中的光产生输出。输出可用于检测样品上的缺陷。在一个实施例中，该系统包括被配置为增加由阵列反射到光路中的光的波前的均匀性的光学元件。

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