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1. 发明申请

US20070151841A1 Flexible magnetron including partial rolling support and centering pins 审中-公开
标题翻译：柔性磁控管包括部分滚动支撑和定心销
公开(公告)号：US20070151841A1
公开(公告)日：2007-07-05
申请号：US11601576
申请日：2006-11-17
申请人： Makoto Inagawa , Akihiro Hosokawa , Hien-Minh Le , Ilya Lavitsky , John White , Todd Martin , Bradley Stimson
发明人： Makoto Inagawa , Akihiro Hosokawa , Hien-Minh Le , Ilya Lavitsky , John White , Todd Martin , Bradley Stimson
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/3408 , H01J37/3435 , H01J37/3452 , H01J37/3455
摘要： A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on the target, on which it slides or rolls. In one embodiment, the yoke plate is continuous and uniform. In another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes, for example, of complementary serpentine shape and each supporting magnets of respective polarity. In another embodiment, the target and magnetron are divided into respective strips separated by other structure. Each magnetron strip is supported partially from above from a common scanning plate and partially on a respective target strip. A centering mechanism may align the different magnetron strips.
摘要翻译：一种磁控管扫描和支撑机构，其中磁控管通过耦合到磁控管上的不同水平位置的多个弹簧部分地从顶部扫描机构支撑，并且在靶上的多个位置处从其下方部分地支撑，在其上滑动或滚动。在一个实施例中，轭板是连续且均匀的。在另一个实施例中，磁控管的磁轭被分成两个柔性轭，例如互补的蛇形形状和各个极性的每个支撑磁体。在另一个实施例中，靶和磁控管被分成由其它结构分开的相应条。每个磁控管从上面部分地从普通扫描板支撑并部分地支撑在相应的目标条上。定心机构可以对准不同的磁控管条。

2. 发明申请

US20070051617A1 Apparatus and method of positioning a multizone magnetron assembly 有权
标题翻译：定位多区域磁控管组件的装置和方法
公开(公告)号：US20070051617A1
公开(公告)日：2007-03-08
申请号：US11301849
申请日：2005-12-12
申请人： John White , Hien-Minh Le , Akihiro Hosokawa
发明人： John White , Hien-Minh Le , Akihiro Hosokawa
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： H01J37/3408 , H01J37/3455
摘要： The present invention generally provides an apparatus and method for processing a surface of a substrate in a PVD chamber that has a magnetron assembly whose shape can be distorted to adjust the magnetic field strength in the processing region of the deposition chamber to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more magnetron regions and magnetron actuators that are used to increase and more evenly distribute the magnetic field strength throughout the processing region of the processing chamber during processing.
摘要翻译：本发明总体上提供了一种用于处理PVD室中的基板的表面的装置和方法，该PVD腔具有可以变形形状的磁控管组件，以调节沉积室的处理区域中的磁场强度，以提高沉积均匀性。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，处理室包含一个或多个磁控管区域和磁控管致动器，其用于在处理期间增加并均匀地分布整个处理室的处理区域的磁场强度。

3. 发明申请

US20070261951A1 REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES 审中-公开
标题翻译：氧化锌氧化物透明导电氧化物在大面积基材上的反应性溅射
公开(公告)号：US20070261951A1
公开(公告)日：2007-11-15
申请号：US11697476
申请日：2007-04-06
申请人： Yan Ye , Ankur Kadam , Yanping Li , Allen Lau , Makoto Inagawa , Bradley Stimson , Akihiro Hosokawa
发明人： Yan Ye , Ankur Kadam , Yanping Li , Allen Lau , Makoto Inagawa , Bradley Stimson , Akihiro Hosokawa
IPC分类号： C23C14/00
CPC分类号： C23C14/564 , C23C14/0063 , C23C14/35 , H01J37/3244 , H01J37/34 , H01J37/3438
摘要： The present invention generally comprises one or more cooled anodes shadowing one or more gas introduction tubes where both the cooled anodes and the gas introduction tubes span a processing space defined between one or more sputtering targets and one or more substrates within a sputtering chamber. The gas introduction tubes may have gas outlets that direct the gas introduced away from the one or more substrates. The gas introduction tubes may introduce reactive gas, such as oxygen, into the sputtering chamber for depositing TCO films by reactive sputtering. During a multiple step sputtering process, the gas flows (i.e., the amount of gas and the type of gas), the spacing between the target and the substrate, and the DC power may be changed to achieve a desired result.
摘要翻译：本发明通常包括一个或多个冷却的阳极，其遮蔽一个或多个气体导入管，其中冷却的阳极和气体引入管都跨越在溅射室内的一个或多个溅射靶和一个或多个衬底之间限定的处理空间。气体导入管可以具有引导从一个或多个基底引入的气体的气体出口。气体引入管可以将诸如氧的反应性气体引入到用于通过反应溅射沉积TCO膜的溅射室中。在多步骤溅射处理中，可以改变气体流动（即，气体的量和气体的类型），靶和基板之间的间隔以及DC功率以实现期望的结果。

4. 发明申请

US20070056845A1 Multiple zone sputtering target created through conductive and insulation bonding 审中-公开
标题翻译：通过导电和绝缘结合产生多区域溅射靶
公开(公告)号：US20070056845A1
公开(公告)日：2007-03-15
申请号：US11399122
申请日：2006-04-06
申请人： Yan Ye , John White , Akihiro Hosokawa , Hien Le , Elpidio Nisperos , Bradley Stimson
发明人： Yan Ye , John White , Akihiro Hosokawa , Hien Le , Elpidio Nisperos , Bradley Stimson
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , H01J37/3408 , H01J37/3423 , H01J37/3435 , H01J37/3438 , H01J37/3441
摘要： The present invention generally provides a sputtering apparatus and method in which a sputtering target has a plurality of target sections bonded to a common backing plate. Each segment can be bonded to the common backing plate using a different bonding material. One target segment can be bonded to the backing plate using electrically conductive bonding material while another section is bonded to the backing plate using electrically insulating bonding material. Additionally, each different target section can be separately biased.
摘要翻译：本发明通常提供一种溅射装置和方法，其中溅射靶具有多个目标部分结合到共同的背板上。可以使用不同的接合材料将每个段结合到公共背板上。可以使用导电接合材料将一个目标段结合到背板上，而使用电绝缘接合材料将另一部分结合到背板上。此外，每个不同的目标部分可以单独偏置。

5. 发明申请

US20070193881A1 Partially suspended rolling magnetron 有权
标题翻译：部分悬浮磁控管
公开(公告)号：US20070193881A1
公开(公告)日：2007-08-23
申请号：US11347667
申请日：2006-02-03
申请人： Makoto Inagawa , Akihiro Hosokawa , John White
发明人： Makoto Inagawa , Akihiro Hosokawa , John White
IPC分类号： C23C14/00
CPC分类号： H01J37/3408 , H01J37/3435 , H01J37/3455
摘要： A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on the target, on which it slides or rolls. In one embodiment, the yoke plate is continuous and uniform. In another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes, for example, of complementary serpentine shape and each supporting magnets of respective polarity. The yokes separated by a gap sufficiently small that the two yokes are magnetically coupled. Each yoke has its own set of spring supports from above and rolling/sliding supports from below to allow the magnetron shape to conform to that of the target. Alternatively, narrow slots are formed in a unitary yoke.
摘要翻译：一种磁控管扫描和支撑机构，其中磁控管通过耦合到磁控管上的不同水平位置的多个弹簧部分地从顶部扫描机构支撑，并且在其上滑动或滚动的靶上的多个位置处从下方部分支撑。在一个实施例中，轭板是连续且均匀的。在另一个实施例中，磁控管的磁轭被分成两个柔性轭，例如互补的蛇形形状和各个极性的每个支撑磁体。磁轭分开足够小的间隙，使得两个磁轭磁耦合。每个轭具有其自己的一组弹簧支撑件，从上方起滚动/滑动支撑件，从而允许磁控管形状与靶材的形状一致。或者，窄槽形成为单一轭。

6. 发明申请

US20070012559A1 Method of improving magnetron sputtering of large-area substrates using a removable anode 审中-公开
标题翻译：使用可移除阳极改进大面积基板的磁控管溅射的方法
公开(公告)号：US20070012559A1
公开(公告)日：2007-01-18
申请号：US11247438
申请日：2005-10-11
申请人： Akihiro Hosokawa , Hienminh Le , Makoto Inagawa , John White
发明人： Akihiro Hosokawa , Hienminh Le , Makoto Inagawa , John White
IPC分类号： C23C14/32
CPC分类号： C23C14/35 , C23C14/564 , H01J37/3408 , H01J37/3438
摘要： The present invention generally provides an apparatus and method for processing a surface of a substrate in physical vapor deposition (PVD) chamber that has an increased anode surface area to improve the deposition uniformity on large area substrates. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more anode assemblies that are used to increase and more evenly distribute the anode surface area throughout the processing region of the processing chamber. In one aspect, the anode assembly contains a conductive member and conductive member support. In one aspect, the processing chamber is adapted to allow the conductive member to be removed from the processing chamber without removing any major components from the processing chamber.
摘要翻译：本发明通常提供一种用于处理物理气相沉积（PVD）室中的衬底的表面的装置和方法，其具有增加的阳极表面积以改善大面积衬底上的沉积均匀性。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，处理室包含一个或多个阳极组件，其用于增加并且更均匀地分布整个处理室的整个处理区域中的阳极表面区域。在一个方面，阳极组件包含导电构件和导电构件支撑件。在一个方面，处理室适于允许导电构件从处理室移除，而不会从处理室中移除任何主要部件。

7. 发明申请

US20070084720A1 MAGNETRON SPUTTERING SYSTEM FOR LARGE-AREA SUBSTRATES HAVING REMOVABLE ANODES 审中-公开
标题翻译：具有可拆卸阳极的大面积基底的MAGNETRON溅射系统
公开(公告)号：US20070084720A1
公开(公告)日：2007-04-19
申请号：US11610772
申请日：2006-12-14
申请人： Akihiro Hosokawa , Hienminh Le , Makoto Inagawa , John White
发明人： Akihiro Hosokawa , Hienminh Le , Makoto Inagawa , John White
IPC分类号： C23C14/00
CPC分类号： H01J37/3408 , H01J37/3438
摘要： The present invention generally provides an apparatus and method for processing a surface of a substrate in physical vapor deposition (PVD) chamber that has an increased anode surface area to improve the deposition uniformity on large area substrates. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more anode assemblies that are used to increase and more evenly distribute the anode surface area throughout the processing region of the processing chamber. In one aspect, the anode assembly contains a conductive member and conductive member support. In one aspect, the processing chamber is adapted to allow the conductive member to be removed from the processing chamber without removing any major components from the processing chamber.
摘要翻译：本发明通常提供一种用于处理物理气相沉积（PVD）室中的衬底的表面的装置和方法，其具有增加的阳极表面积以改善大面积衬底上的沉积均匀性。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，处理室包含一个或多个阳极组件，其用于增加并且更均匀地分布整个处理室的整个处理区域中的阳极表面区域。在一个方面，阳极组件包含导电构件和导电构件支撑件。在一个方面，处理室适于允许导电构件从处理室移除，而不会从处理室中移除任何主要部件。

8. 发明申请

US20070012558A1 Magnetron sputtering system for large-area substrates 审中-公开
标题翻译：用于大面积衬底的磁控溅射系统
公开(公告)号：US20070012558A1
公开(公告)日：2007-01-18
申请号：US11182034
申请日：2005-07-13
申请人： John White , Akihiro Hosokawa , Hienminh Le , Makoto Inagawa
发明人： John White , Akihiro Hosokawa , Hienminh Le , Makoto Inagawa
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： H01J37/3408 , C23C14/35 , H01J37/3438 , H01L21/68742
摘要： The present invention generally provides an apparatus and method for processing a surface of a substrate in physical vapor deposition (PVD) chamber that has an increased anode surface area to improve the deposition uniformity on large area substrates. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more adjustable anode assemblies that are used to increase and more evenly distribute the anode surface area throughout the processing region of the processing chamber. In one aspect, the one or more adjustable anode assemblies are adapted to exchange deposited on anode surfaces with new, un-deposited on, anode surfaces without breaking vacuum. In another aspect, a shadow frame that has a path to ground is adapted to contact a deposited layer on the surface of a substrate during deposition to increase the anode area and thus deposition uniformity.
摘要翻译：本发明通常提供一种用于处理物理气相沉积（PVD）室中的衬底的表面的装置和方法，其具有增加的阳极表面积以改善大面积衬底上的沉积均匀性。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，处理室包含一个或多个可调阳极组件，其用于增加并且更均匀地分布整个处理室的整个处理区域中的阳极表面区域。在一个方面，一个或多个可调节阳极组件适于在不破坏真空的情况下交换沉积在阳极表面上的新的未沉积的阳极表面。在另一方面，具有到地的路径的阴影框架适于在沉积期间接触衬底的表面上的沉积层以增加阳极区域并因此沉积均匀性。

9. 发明申请

US20070048992A1 Integrated PVD system using designated PVD chambers 失效
标题翻译：集成PVD系统使用指定的PVD腔
公开(公告)号：US20070048992A1
公开(公告)日：2007-03-01
申请号：US11213662
申请日：2005-08-26
申请人： Akihiro Hosokawa , Makoto Inagawa , Hienminh Le , John White
发明人： Akihiro Hosokawa , Makoto Inagawa , Hienminh Le , John White
IPC分类号： H01L21/44
CPC分类号： H01L21/67201 , C23C14/566 , C23C14/568 , H01L21/67167 , H01L21/67184 , H01L21/67196 , H01L29/66765
摘要： A method for making a film stack containing one or more metal-containing layers and a substrate processing system for forming the film stack on a substrate are provided. The substrate processing system includes at least one transfer chamber coupled to at least one load lock chamber, at least one first physical vapor deposition (PVD) chamber configured to deposit a first material layer on a substrate, and at least one second PVD chamber for in-situ deposition of a second material layer over the first material layer within the same substrate processing system without breaking the vacuum or taking the substrate out of the substrate processing system to prevent surface contamination, oxidation, etc. The substrate processing system is configured to provide high throughput and compact footprint for in-situ sputtering of different material layers in designated PVD chambers.
摘要翻译：提供了一种制造包含一个或多个含金属层的膜堆叠的方法和用于在基板上形成膜堆叠的基板处理系统。衬底处理系统包括耦合到至少一个负载锁定室的至少一个传送室，被配置成将第一材料层沉积在衬底上的至少一个第一物理气相沉积（PVD）室和至少一个第二PVD室在相同的基板处理系统内在第一材料层上沉积第二材料层而不破坏真空或将基板从基板处理系统取出以防止表面污染，氧化等。基板处理系统被配置为提供高产量和紧凑的占地面积，用于在指定的PVD室中不同材料层的原位溅射。

10. 发明申请

US20070012663A1 Magnetron sputtering system for large-area substrates having removable anodes 审中-公开
标题翻译：用于具有可拆卸阳极的大面积基板的磁控管溅射系统
公开(公告)号：US20070012663A1
公开(公告)日：2007-01-18
申请号：US11247705
申请日：2005-10-11
申请人： Akihiro Hosokawa , Hienminh Le , Makoto Inagawa , John White
发明人： Akihiro Hosokawa , Hienminh Le , Makoto Inagawa , John White
IPC分类号： B23K9/02
CPC分类号： H01L21/68742 , H01J37/3408 , H01J37/3438 , H01J37/3447
摘要： The present invention generally provides an apparatus and method for processing a surface of a substrate in physical vapor deposition (PVD) chamber that has an increased anode surface area to improve the deposition uniformity on large area substrates. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more anode assemblies that are used to increase and more evenly distribute the anode surface area throughout the processing region of the processing chamber. In one aspect, the anode assembly contains a conductive member and conductive member support. In one aspect, the processing chamber is adapted to allow the conductive member to be removed from the processing chamber without removing any major components from the processing chamber.
摘要翻译：本发明通常提供一种用于处理物理气相沉积（PVD）室中的衬底的表面的装置和方法，其具有增加的阳极表面积以改善大面积衬底上的沉积均匀性。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，处理室包含一个或多个阳极组件，其用于增加并且更均匀地分布整个处理室的整个处理区域中的阳极表面区域。在一个方面，阳极组件包含导电构件和导电构件支撑件。在一个方面，处理室适于允许导电构件从处理室移除，而不会从处理室中移除任何主要部件。

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