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1. 发明申请

US20070151841A1 Flexible magnetron including partial rolling support and centering pins 审中-公开
标题翻译：柔性磁控管包括部分滚动支撑和定心销
公开(公告)号：US20070151841A1
公开(公告)日：2007-07-05
申请号：US11601576
申请日：2006-11-17
申请人： Makoto Inagawa , Akihiro Hosokawa , Hien-Minh Le , Ilya Lavitsky , John White , Todd Martin , Bradley Stimson
发明人： Makoto Inagawa , Akihiro Hosokawa , Hien-Minh Le , Ilya Lavitsky , John White , Todd Martin , Bradley Stimson
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/3408 , H01J37/3435 , H01J37/3452 , H01J37/3455
摘要： A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on the target, on which it slides or rolls. In one embodiment, the yoke plate is continuous and uniform. In another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes, for example, of complementary serpentine shape and each supporting magnets of respective polarity. In another embodiment, the target and magnetron are divided into respective strips separated by other structure. Each magnetron strip is supported partially from above from a common scanning plate and partially on a respective target strip. A centering mechanism may align the different magnetron strips.
摘要翻译：一种磁控管扫描和支撑机构，其中磁控管通过耦合到磁控管上的不同水平位置的多个弹簧部分地从顶部扫描机构支撑，并且在靶上的多个位置处从其下方部分地支撑，在其上滑动或滚动。在一个实施例中，轭板是连续且均匀的。在另一个实施例中，磁控管的磁轭被分成两个柔性轭，例如互补的蛇形形状和各个极性的每个支撑磁体。在另一个实施例中，靶和磁控管被分成由其它结构分开的相应条。每个磁控管从上面部分地从普通扫描板支撑并部分地支撑在相应的目标条上。定心机构可以对准不同的磁控管条。

2. 发明申请

US20070051617A1 Apparatus and method of positioning a multizone magnetron assembly 有权
标题翻译：定位多区域磁控管组件的装置和方法
公开(公告)号：US20070051617A1
公开(公告)日：2007-03-08
申请号：US11301849
申请日：2005-12-12
申请人： John White , Hien-Minh Le , Akihiro Hosokawa
发明人： John White , Hien-Minh Le , Akihiro Hosokawa
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： H01J37/3408 , H01J37/3455
摘要： The present invention generally provides an apparatus and method for processing a surface of a substrate in a PVD chamber that has a magnetron assembly whose shape can be distorted to adjust the magnetic field strength in the processing region of the deposition chamber to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more magnetron regions and magnetron actuators that are used to increase and more evenly distribute the magnetic field strength throughout the processing region of the processing chamber during processing.
摘要翻译：本发明总体上提供了一种用于处理PVD室中的基板的表面的装置和方法，该PVD腔具有可以变形形状的磁控管组件，以调节沉积室的处理区域中的磁场强度，以提高沉积均匀性。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，处理室包含一个或多个磁控管区域和磁控管致动器，其用于在处理期间增加并均匀地分布整个处理室的处理区域的磁场强度。

3. 发明申请

US20060266638A1 Multiple target tiles with complementary beveled edges forming a slanted gap therebetween 有权
标题翻译：具有互补的倾斜边缘的多个目标瓦片在它们之间形成倾斜的间隙
公开(公告)号：US20060266638A1
公开(公告)日：2006-11-30
申请号：US11137262
申请日：2005-05-24
申请人： Akihiro Hosokawa , Hien-Minh Le
发明人： Akihiro Hosokawa , Hien-Minh Le
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407
摘要： A target assembly composed of multiple target tiles bonded in an array to a backing plate of another material. The edges of the tile within the interior of the array are formed with complementary beveled edges to form slanted gaps between the tiles. The gaps may slant at an angle of between 10° and 55°, preferably 15° and 45°, with respect to the target normal. The facing sides of tiles may be roughened by bead blasting, for both perpendicular and sloping gaps. The area of the backing plate underlying the gap may be roughened or may coated or overlain with a region of the material of the target, for both perpendicular and sloping gaps.
摘要翻译：由多个靶阵列组成的目标组件，其以阵列的形式结合到另一材料的背板上。在阵列内部的瓦片的边缘形成有互补的斜边以在瓦片之间形成倾斜的间隙。间隙可以相对于目标法线在10°至55°之间，优选15°和45°的角度倾斜。对于垂直和倾斜的间隙，瓷砖的面对侧可以通过珠粒喷砂粗糙化。对于垂直和倾斜的间隙，在间隙下面的背板的区域可以被粗糙化或者可以涂覆或覆盖靶材料的区域。

4. 发明申请

US20060272935A1 Multiple scanning magnetrons 审中-公开
标题翻译：多重扫描磁控管
公开(公告)号：US20060272935A1
公开(公告)日：2006-12-07
申请号：US11146762
申请日：2005-06-06
申请人： Hien-Minh Le , Akihiro Hosokawa
发明人： Hien-Minh Le , Akihiro Hosokawa
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/35 , H01J37/3408
摘要： A sputter reactor configured for magnetron sputtering from a rectangular target onto a rectangular panel and including multiple magnetrons independently scannable across the back of the target. In one embodiment, the magnetrons scan only along paths parallel to one axis. A system controller may control actuators providing the mechanical movement and also control the amount of power delivered to the target in synchronism to the mechanical movement. The invention also includes scanning a magnetron in a rectangular path about the back of the rectangular target.
摘要翻译：一种溅射反应器，其被配置用于从矩形靶材到矩形面板的磁控溅射，并且包括可以跨靶材背面独立扫描的多个磁控管。在一个实施例中，磁控管仅沿着平行于一个轴的路径扫描。系统控制器可以控制提供机械运动的致动器，并且还与机械运动同步地控制输送到目标的功率的量。本发明还包括围绕矩形靶的背面以矩形路径扫描磁控管。

5. 发明申请

US20060283703A1 Bonding of target tiles to backing plate with patterned bonding agent 失效
标题翻译：目标瓦片与带有图案化粘合剂的背板接合
公开(公告)号：US20060283703A1
公开(公告)日：2006-12-21
申请号：US11146763
申请日：2005-06-06
申请人： Hien-Minh Le , Akihiro Hosokawa
发明人： Hien-Minh Le , Akihiro Hosokawa
IPC分类号： C23C14/00
CPC分类号： C23C14/3407 , H01J37/3435 , Y10T29/49856 , Y10T29/49863 , Y10T29/49865 , Y10T29/49885
摘要： A target assembly including a plurality of target tiles bonded to a backing plate by adhesive, for example of indium or conductive polymer, filled into recesses in the backing plate formed beneath each of the target tiles. A sole peripheral recess formed as a rectangular close band may be formed inside the tile periphery. Additional recesses may be formed inside the peripheral recess, preferably symmetrically arranged about perpendicular bisectors of rectangular tiles. The depth and width of the recesses may be varied to control the amount of stress and the stress direction.
摘要翻译：包括通过粘合剂（例如铟或导电聚合物）粘合到背板的多个目标瓦片的目标组件填充到形成在每个目标瓦片下方的背板中的凹部中。形成为矩形紧密带的唯一周边凹部可以形成在瓷砖周边内。可以在周边凹部内部形成附加的凹槽，优选地围绕矩形瓦片的垂直平分线对称地布置。可以改变凹部的深度和宽度以控制应力和应力方向的量。

6. 发明申请

US20070012562A1 Method and apparatus for sputtering onto large flat panels 有权
标题翻译：用于溅射到大平板上的方法和装置
公开(公告)号：US20070012562A1
公开(公告)日：2007-01-18
申请号：US11484333
申请日：2006-07-11
申请人： Hien Minh Le , Akihiro Hosokawa , Avi Tepman
发明人： Hien Minh Le , Akihiro Hosokawa , Avi Tepman
IPC分类号： C23C14/00 , C23C14/32
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3455
摘要： A rectangular magnetron placed at the back of a rectangular sputtering target for coating a rectangular panel and having magnets of opposed polarities arranged to form a gap therebetween corresponding to a plasma track adjacent the target which extends in a closed serpentine or spiral loop. The spiral may have a large number of wraps and the closed loop may be folded before wrapping. The magnetron has a size only somewhat less than that of the target and is scanned in the two perpendicular directions of the target with a scan length of, for example, about 100 mm for a 2 m target corresponding to at least the separation of the gap between parallel portions of the loop. A central ferromagnetic shim beneath some magnets in the loop may compensate for vertical droop. The magnetron may be scanned in two alternating double-Z patterns rotated 90° between them.
摘要翻译：放置在矩形溅射靶的背面的矩形磁控管，用于涂覆矩形面板并且具有相对极性的磁体，所述磁体布置成在对应于邻近靶的等离子体轨道之间形成间隙，所述等离子体轨道以闭合的蛇形或螺旋形环路延伸。螺旋可以具有大量的包装，并且闭合的环可以在包装之前折叠。磁控管的尺寸仅稍低于目标的尺寸，并且在目标的两个垂直方向上扫描，对于对应于至少间隙间隔的2m靶的扫描长度例如为约100mm 在环路的平行部分之间。环路中一些磁铁下方的中心铁磁垫片可以补偿垂直下垂。磁控管可以以它们之间旋转90°的两个交替的双Z图案进行扫描。

7. 发明申请

US20070193881A1 Partially suspended rolling magnetron 有权
标题翻译：部分悬浮磁控管
公开(公告)号：US20070193881A1
公开(公告)日：2007-08-23
申请号：US11347667
申请日：2006-02-03
申请人： Makoto Inagawa , Akihiro Hosokawa , John White
发明人： Makoto Inagawa , Akihiro Hosokawa , John White
IPC分类号： C23C14/00
CPC分类号： H01J37/3408 , H01J37/3435 , H01J37/3455
摘要： A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on the target, on which it slides or rolls. In one embodiment, the yoke plate is continuous and uniform. In another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes, for example, of complementary serpentine shape and each supporting magnets of respective polarity. The yokes separated by a gap sufficiently small that the two yokes are magnetically coupled. Each yoke has its own set of spring supports from above and rolling/sliding supports from below to allow the magnetron shape to conform to that of the target. Alternatively, narrow slots are formed in a unitary yoke.
摘要翻译：一种磁控管扫描和支撑机构，其中磁控管通过耦合到磁控管上的不同水平位置的多个弹簧部分地从顶部扫描机构支撑，并且在其上滑动或滚动的靶上的多个位置处从下方部分支撑。在一个实施例中，轭板是连续且均匀的。在另一个实施例中，磁控管的磁轭被分成两个柔性轭，例如互补的蛇形形状和各个极性的每个支撑磁体。磁轭分开足够小的间隙，使得两个磁轭磁耦合。每个轭具有其自己的一组弹簧支撑件，从上方起滚动/滑动支撑件，从而允许磁控管形状与靶材的形状一致。或者，窄槽形成为单一轭。

8. 发明申请

US20070012559A1 Method of improving magnetron sputtering of large-area substrates using a removable anode 审中-公开
标题翻译：使用可移除阳极改进大面积基板的磁控管溅射的方法
公开(公告)号：US20070012559A1
公开(公告)日：2007-01-18
申请号：US11247438
申请日：2005-10-11
申请人： Akihiro Hosokawa , Hienminh Le , Makoto Inagawa , John White
发明人： Akihiro Hosokawa , Hienminh Le , Makoto Inagawa , John White
IPC分类号： C23C14/32
CPC分类号： C23C14/35 , C23C14/564 , H01J37/3408 , H01J37/3438
摘要： The present invention generally provides an apparatus and method for processing a surface of a substrate in physical vapor deposition (PVD) chamber that has an increased anode surface area to improve the deposition uniformity on large area substrates. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, the processing chamber contains one or more anode assemblies that are used to increase and more evenly distribute the anode surface area throughout the processing region of the processing chamber. In one aspect, the anode assembly contains a conductive member and conductive member support. In one aspect, the processing chamber is adapted to allow the conductive member to be removed from the processing chamber without removing any major components from the processing chamber.
摘要翻译：本发明通常提供一种用于处理物理气相沉积（PVD）室中的衬底的表面的装置和方法，其具有增加的阳极表面积以改善大面积衬底上的沉积均匀性。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，处理室包含一个或多个阳极组件，其用于增加并且更均匀地分布整个处理室的整个处理区域中的阳极表面区域。在一个方面，阳极组件包含导电构件和导电构件支撑件。在一个方面，处理室适于允许导电构件从处理室移除，而不会从处理室中移除任何主要部件。

9. 发明申请

US20070056850A1 Large-area magnetron sputtering chamber with individually controlled sputtering zones 审中-公开
标题翻译：具有单独控制溅射区的大面积磁控溅射室
公开(公告)号：US20070056850A1
公开(公告)日：2007-03-15
申请号：US11225922
申请日：2005-09-13
申请人： Yan Ye , John White , Akihiro Hosokawa , Hienminh Le
发明人： Yan Ye , John White , Akihiro Hosokawa , Hienminh Le
IPC分类号： C23C14/00
CPC分类号： C23C14/352 , C23C14/3407
摘要： The present invention generally provides an apparatus for processing a surface of a substrate in a physical vapor deposition (PVD) chamber that has a sputtering target that has separately biasable sections, regions or zones to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one or more DC or RF power sources. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one power source and one or more resistive, capacitive and/or inductive elements. In one aspect, the processing chamber contains a multizone target assembly that has one or more ports that are adapted deliver a processing gas to the processing region of the PVD chamber. In one aspect, the processing chamber contains a multizone target assembly that has one or more magnetron assemblies positioned adjacent to one or more of the target sections.
摘要翻译：本发明总体上提供了一种用于处理物理气相沉积（PVD）室中的衬底的表面的设备，其具有具有可分离的偏压部分，区域或区域以提高沉积均匀性的溅射靶。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，通过使用一个或多个DC或RF电源将多区域目标组件的每个目标区段偏置在不同的阴极偏压。在一个方面，通过使用一个电源和一个或多个电阻，电容和/或电感元件，多区域目标组件的每个目标部分被偏置在不同的阴极偏压。在一个方面，处理室包含一个多区域目标组件，其具有适于将处理气体输送到PVD室的处理区域的一个或多个端口。在一个方面，处理室包含一个多区域目标组件，其具有邻近一个或多个目标区段定位的一个或多个磁控管组件。

10. 发明申请

US20070056843A1 Method of processing a substrate using a large-area magnetron sputtering chamber with individually controlled sputtering zones 审中-公开
标题翻译：使用具有单独控制的溅射区域的大面积磁控溅射室来处理衬底的方法
公开(公告)号：US20070056843A1
公开(公告)日：2007-03-15
申请号：US11225923
申请日：2005-09-13
申请人： Yan Ye , John White , Akihiro Hosokawa , Hienminh Le
发明人： Yan Ye , John White , Akihiro Hosokawa , Hienminh Le
IPC分类号： C23C14/32
CPC分类号： C23C14/3407 , C23C14/352
摘要： The present invention generally provides a method for processing a surface of a substrate in a physical vapor deposition (PVD) chamber that has a sputtering target that has separately biasable sections, regions or zones to improve the deposition uniformity. In general, aspects of the present invention can be used for flat panel display processing, semiconductor processing, solar cell processing, or any other substrate processing. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one or more DC or RF power sources. In one aspect, each of the target sections of the multizone target assembly are biased at a different cathodic biases by use of one power source and one or more resistive, capacitive and/or inductive elements. In one aspect, the processing chamber contains a multizone target assembly that has one or more ports that are adapted deliver a processing gas to the processing region of the PVD chamber. In one aspect, the processing chamber contains a multizone target assembly that has one or more magnetron assemblies positioned adjacent to one or more of the target sections.
摘要翻译：本发明通常提供了一种用于处理物理气相沉积（PVD）室中的衬底的表面的方法，所述物理气相沉积（PVD）室具有分离的偏压部分，区域或区域以提高沉积均匀性的溅射靶。通常，本发明的各方面可用于平板显示处理，半导体处理，太阳能电池处理或任何其它基板处理。在一个方面，通过使用一个或多个DC或RF电源将多区域目标组件的每个目标区段偏置在不同的阴极偏压。在一个方面，通过使用一个电源和一个或多个电阻，电容和/或电感元件，多区域目标组件的每个目标部分被偏置在不同的阴极偏压。在一个方面，处理室包含一个多区域目标组件，其具有适于将处理气体输送到PVD室的处理区域的一个或多个端口。在一个方面，处理室包含一个多区域目标组件，其具有邻近一个或多个目标区段定位的一个或多个磁控管组件。

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