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1. 发明授权

US09685186B2 HDD pattern implant system 有权
公开(公告)号：US09685186B2
公开(公告)日：2017-06-20
申请号：US12703897
申请日：2010-02-11
申请人： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel J. Hoffman , Stephen Moffatt , Steven Verhaverbeke
发明人： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel J. Hoffman , Stephen Moffatt , Steven Verhaverbeke
IPC分类号： G11B5/85 , C23C16/00 , G11B5/82 , C23F1/00 , H01L21/673 , G11B5/84 , H01L21/677 , G11B5/855 , C23C14/48 , H01L21/687 , C23C14/50
CPC分类号： G11B5/82 , C23C14/48 , C23C14/50 , C23C16/00 , C23F1/00 , G11B5/84 , G11B5/855 , H01L21/673 , H01L21/677 , H01L21/687
摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of processes that expose substrates to energy of varying forms. Apparatus and methods disclosed herein enable processing of two major surfaces of a substrate simultaneously, or sequentially by flipping. In some embodiments, magnetic properties of the substrate surface may be uniformly altered by plasma exposure and then selectively restored by exposure to patterned energy.

2. 发明申请

US20100221583A1 HDD PATTERN IMPLANT SYSTEM 有权
标题翻译：硬盘图案植入系统
公开(公告)号：US20100221583A1
公开(公告)日：2010-09-02
申请号：US12703897
申请日：2010-02-11
申请人： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel Hoffman , Stephen Moffatt , Steven Verhaverbeke
发明人： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel Hoffman , Stephen Moffatt , Steven Verhaverbeke
IPC分类号： G11B5/82 , C23C16/44 , C23C16/04
CPC分类号： G11B5/82 , C23C14/48 , C23C14/50 , C23C16/00 , C23F1/00 , G11B5/84 , G11B5/855 , H01L21/673 , H01L21/677 , H01L21/687
摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of processes that expose substrates to energy of varying forms. Apparatus and methods disclosed herein enable processing of two major surfaces of a substrate simultaneously, or sequentially by flipping. In some embodiments, magnetic properties of the substrate surface may be uniformly altered by plasma exposure and then selectively restored by exposure to patterned energy.
摘要翻译：提供了用于形成具有磁性图案化表面的基底的方法和设备。在基板上形成包含一种或多种具有磁性的材料的磁性层。对磁性层进行图案化处理，其中磁性层的表面的选定部分被改变，使得改变的部分与未改变的部分具有不同的磁性，而不改变衬底的形貌。在图案化的磁性层上沉积保护层和润滑剂层。图案化通过使衬底暴露于不同形式的能量的许多工艺来完成。本文公开的装置和方法能够同时或顺序地翻转来处理衬底的两个主表面。在一些实施例中，衬底表面的磁特性可以通过等离子体暴露均匀地改变，然后通过暴露于图案化能量选择性地恢复。

3. 发明申请

US20140038431A1 APPARATUS AND METHODS FOR MICROWAVE PROCESSING OF SEMICONDUCTOR SUBSTRATES 有权
标题翻译：半导体衬底微波加工的装置和方法
公开(公告)号：US20140038431A1
公开(公告)日：2014-02-06
申请号：US14112012
申请日：2012-03-29
申请人： Michael W. Stowell , Majeed A. Foad , Ralf Hofmann , Wolfgang R. Aderhold , Stephen Moffatt
发明人： Michael W. Stowell , Majeed A. Foad , Ralf Hofmann , Wolfgang R. Aderhold , Stephen Moffatt
IPC分类号： H01L21/263 , H05B6/70
CPC分类号： H01L21/263 , H01L21/324 , H01L21/67115 , H05B6/702 , H05B6/708
摘要： Methods and apparatus for radiation processing of semiconductor substrates using microwave or millimeter wave energy are provided. The microwave or millimeter wave energy may have a frequency between about 600 MHz and about 1 THz. Alternating current from a magnetron is coupled to a leaky microwave emitter that has an inner conductor and an outer conductor, the outer conductor having openings with a dimension smaller than a wavelength of the emitted radiation. The inner and outer conductors are separated by an insulating material. Interference patterns produced by the microwave emissions may be uniformized by phase modulating the power to the emitter and/or by frequency modulating the frequency of the power itself. Power from a single generator may be divided to two or more emitters by a power divider.
摘要翻译：提供了使用微波或毫米波能量的半导体衬底的辐射处理方法和装置。微波或毫米波能量可以具有在约600MHz和约1THz之间的频率。来自磁控管的交流电耦合到具有内部导体和外部导体的泄漏的微波发射器，该外部导体具有尺寸小于所发射的辐射的波长的开口。内外导体由绝缘材料分开。由微波发射产生的干扰模式可以通过相位调制发射器的功率和/或通过频率调制电源本身的频率而被均匀化。来自单个发电机的功率可以由功率分配器划分为两个或更多个发射器。

4. 发明授权

US08431911B2 HDD pattern apparatus using laser, E-beam, or focused ion beam 有权
标题翻译：使用激光，电子束或聚焦离子束的HDD图案设备
公开(公告)号：US08431911B2
公开(公告)日：2013-04-30
申请号：US12759587
申请日：2010-04-13
申请人： Majeed A. Foad , Stephen Moffatt
发明人： Majeed A. Foad , Stephen Moffatt
IPC分类号： A61B6/00 , G01N21/64 , G11B5/02 , G11B21/02 , G11B11/00 , G03G13/00 , G03G19/00
CPC分类号： G03B27/42 , G11B5/8404 , H01F10/187 , H01F41/34
摘要： A method and apparatus for manufacturing magnetic storage media is provided. A structural substrate is coated with a magnetically active material, and a magnetic pattern is formed in the magnetically active material by treating portions of the material with energy from a laser, e-beam, or focused ion beam. The beam may be divided into a packet of beamlets by passing the beam through a divider, which may be a diffraction grating for laser energy, a thin film single crystal for electrons, or a perforated plate for ions, or the beam may be generated by an array of emitters. The beamlets are then focused to a desired dimension and distribution by optics or electric fields. The resulting beam packet may be shaped further by passing through an aperture of any desired shape. The resulting beam may be applied sequentially to exposure zones to treat an entire substrate or plurality of substrates.
摘要翻译：提供了一种用于制造磁存储介质的方法和装置。用磁性活性材料涂覆结构基材，通过用激光，电子束或聚焦离子束的能量处理材料的部分，在磁性活性材料中形成磁性图案。通过将光束通过分隔器（可以是用于激光能量的衍射光栅），用于电子的薄膜单晶或用于离子的多孔板，光束可以被分成小束束，或者可以通过一组发射器。然后通过光学或电场将子束聚焦到期望的尺寸和分布。所得到的束束可以进一步通过穿过任何所需形状的孔。所得到的光束可以顺序施加到曝光区域以处理整个基板或多个基板。

5. 发明申请

US20100258431A1 USE SPECIAL ION SOURCE APPARATUS AND IMPLANT WITH MOLECULAR IONS TO PROCESS HDD (HIGH DENSITY MAGNETIC DISKS) WITH PATTERNED MAGNETIC DOMAINS 审中-公开
标题翻译：使用特殊离子源装置和分子离子注入具有图形磁场的HDD（高密度磁性磁盘）
公开(公告)号：US20100258431A1
公开(公告)日：2010-10-14
申请号：US12756793
申请日：2010-04-08
申请人： Stephen Moffatt , Majeed A. Foad
发明人： Stephen Moffatt , Majeed A. Foad
IPC分类号： C23C14/46
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/746 , H01F10/16 , H01F10/265 , H01F41/34
摘要： A method and apparatus for manufacturing magnetic storage media is provided. A structural substrate is coated with a magnetically susceptible material, and a patterned resist layer is formed over the magnetically susceptible material. Atom groups are directed toward the substrate, penetrating the resist and implanting into the magnetically susceptible layer. Thick portions of the resist prevent implantation in some areas to form a pattern of magnetic properties on the substrate. Energy and composition of the atom groups, thickness and hardness of the resist, and lattice energy of the magnetically susceptible material may all be adjusted to yield desired fragmentation and implantation of the atom groups, including in some embodiments mere impact on the surface without implanting. A protective layer and a lubricating layer are formed over the patterned magnetically susceptible layer.
摘要翻译：提供了一种用于制造磁存储介质的方法和装置。用磁敏材料涂覆结构基材，并且在磁敏感材料上形成图案化的抗蚀剂层。原子团指向衬底，穿透抗蚀剂并注入到磁敏感层中。抗蚀剂的厚部分防止在一些区域中的注入以在基底上形成磁性的图案。原子组的能量和组成，抗蚀剂的厚度和硬度以及磁敏材料的晶格能都可以被调整以产生所需的原子团的分裂和注入，包括在一些实施方案中仅仅对表面的冲击而不会进行注入。在图案化的易磁化层上形成保护层和润滑层。

6. 发明授权

US09018110B2 Apparatus and methods for microwave processing of semiconductor substrates 有权
标题翻译：半导体衬底的微波处理装置和方法
公开(公告)号：US09018110B2
公开(公告)日：2015-04-28
申请号：US14112012
申请日：2012-03-29
申请人： Michael W. Stowell , Majeed A. Foad , Ralf Hofmann , Wolfgang R. Aderhold , Stephen Moffatt
发明人： Michael W. Stowell , Majeed A. Foad , Ralf Hofmann , Wolfgang R. Aderhold , Stephen Moffatt
IPC分类号： H01L23/66 , H01L21/263 , H01L21/324 , H01L21/67 , H05B6/70
CPC分类号： H01L21/263 , H01L21/324 , H01L21/67115 , H05B6/702 , H05B6/708
摘要： Methods and apparatus for radiation processing of semiconductor substrates using microwave or millimeter wave energy are provided. The microwave or millimeter wave energy may have a frequency between about 600 MHz and about 1 THz. Alternating current from a magnetron is coupled to a leaky microwave emitter that has an inner conductor and an outer conductor, the outer conductor having openings with a dimension smaller than a wavelength of the emitted radiation. The inner and outer conductors are separated by an insulating material. Interference patterns produced by the microwave emissions may be uniformized by phase modulating the power to the emitter and/or by frequency modulating the frequency of the power itself. Power from a single generator may be divided to two or more emitters by a power divider.
摘要翻译：提供了使用微波或毫米波能量的半导体衬底的辐射处理方法和装置。微波或毫米波能量可以具有在约600MHz和约1THz之间的频率。来自磁控管的交流电耦合到具有内部导体和外部导体的泄漏的微波发射器，该外部导体具有尺寸小于所发射的辐射的波长的开口。内外导体由绝缘材料分开。由微波发射产生的干扰模式可以通过相位调制发射器的功率和/或通过频率调制电源本身的频率而被均匀化。来自单个发电机的功率可以由功率分配器划分为两个或更多个发射器。

7. 发明申请

US20100258758A1 HDD PATTERN APPARATUS USING LASER, E-BEAM, OR FOCUSED ION BEAM 有权
标题翻译：使用激光，电子束或聚焦离子束的硬盘图案设备
公开(公告)号：US20100258758A1
公开(公告)日：2010-10-14
申请号：US12759587
申请日：2010-04-13
申请人： Majeed A. Foad , Stephen Moffatt
发明人： Majeed A. Foad , Stephen Moffatt
IPC分类号： G03F7/20 , G03B27/42 , H01F1/00
CPC分类号： G03B27/42 , G11B5/8404 , H01F10/187 , H01F41/34
摘要： A method and apparatus for manufacturing magnetic storage media is provided. A structural substrate is coated with a magnetically active material, and a magnetic pattern is formed in the magnetically active material by treating portions of the material with energy from a laser, e-beam, or focused ion beam. The beam may be divided into a packet of beamlets by passing the beam through a divider, which may be a diffraction grating for laser energy, a thin film single crystal for electrons, or a perforated plate for ions, or the beam may be generated by an array of emitters. The beamlets are then focused to a desired dimension and distribution by optics or electric fields. The resulting beam packet may be shaped further by passing through an aperture of any desired shape. The resulting beam may be applied sequentially to exposure zones to treat an entire substrate or plurality of substrates.
摘要翻译：提供了一种用于制造磁存储介质的方法和装置。用磁性活性材料涂覆结构基材，通过用激光，电子束或聚焦离子束的能量处理材料的部分，在磁性活性材料中形成磁性图案。通过将光束通过分隔器（可以是用于激光能量的衍射光栅），用于电子的薄膜单晶或用于离子的多孔板，可以将光束分成束分束，或者可以通过一组发射器。然后通过光学或电场将子束聚焦到期望的尺寸和分布。所得到的束束可以进一步通过穿过任何所需形状的孔。所得到的光束可以顺序施加到曝光区域以处理整个基板或多个基板。

8. 发明授权

US5883391A Ion implantation apparatus and a method of monitoring high energy neutral contamination in an ion implantation process 失效
标题翻译：离子注入装置和在离子注入工艺中监测高能量中性污染的方法
公开(公告)号：US5883391A
公开(公告)日：1999-03-16
申请号：US876434
申请日：1997-06-16
申请人： Babak Adibi , Jonathan Gerald England , Stephen Moffatt , Jose Antonio Marin
发明人： Babak Adibi , Jonathan Gerald England , Stephen Moffatt , Jose Antonio Marin
IPC分类号： H01J37/317 , H01L21/265
CPC分类号： H01J37/3171 , H01J2237/0225 , H01J2237/304
摘要： High energy neutral contamination in an ion implanter can be caused by beam ions neutralised as they are temporarily accelerated at an electrode before being decelerated again to the desired implant energy. This occurs for example in the decel lens arrangement which includes an electrode at a relatively high negative potential to provide the required focusing. The level of this contamination is monitored by measuring the current drain on this negative field electrode.
摘要翻译：离子注入机中的高能量中性污染可以由束离子中和，因为它们在被再次减速到期望的注入能量之前被暂时加速在电极处。这种情况发生在例如减速透镜装置中，其包括在相对高的负电位处提供所需聚焦的电极。通过测量该负电场电极上的电流消耗来监测该污染程度。

9. 发明授权

US09557111B2 Ambient laminar gas flow distribution in laser processing systems 有权
标题翻译：激光加工系统环境层流气流分布
公开(公告)号：US09557111B2
公开(公告)日：2017-01-31
申请号：US13204068
申请日：2011-08-05
申请人： Stephen Moffatt , Aaron Muir Hunter
发明人： Stephen Moffatt , Aaron Muir Hunter
IPC分类号： F27D5/00
CPC分类号： F27D21/00 , F27D5/0037 , F27D2021/0078 , H01L21/67115
摘要： A method and apparatus for annealing semiconductor substrates is disclosed. The apparatus has an annealing energy source and a substrate support, with a shield member disposed between the annealing energy source and the substrate support. The shield member is a substantially flat member having a dimension larger than a substrate processed on the substrate support, with a window covering a central opening in the substantially flat member. The central opening has a gas inlet portal and a gas outlet portal, each in fluid communication with a gas inlet plenum and gas outlet plenum, respectively. A connection member is disposed around the central opening and holds the window over the central opening. Connection openings in the connection member are in fluid communication with the gas inlet plenum and gas outlet plenum, respectively, through a gas inlet conduit and a gas outlet conduit formed through the connection member.
摘要翻译：公开了半导体衬底退火的方法和装置。该装置具有退火能量源和衬底支撑件，其中屏蔽构件设置在退火能量源和衬底支撑件之间。屏蔽构件是具有大于在基板支撑件上处理的基板的尺寸的基本上平坦的构件，窗口覆盖基本平坦的构件中的中心开口。中心开口具有气体入口入口和气体出口入口，每个入口入口和气体出口通道分别与气体入口气室和气体出口增压室流体连通。连接构件设置在中心开口周围并将窗口保持在中心开口的上方。连接构件中的连接开口分别通过气体入口导管和通过连接构件形成的气体出口导管与气体入口气室和气体出口增压室流体连通。

10. 发明授权

US09376731B2 Magneto-thermal processing apparatus and methods 有权
标题翻译：磁热处理装置及方法
公开(公告)号：US09376731B2
公开(公告)日：2016-06-28
申请号：US13864959
申请日：2013-04-17
申请人： Stephen Moffatt
发明人： Stephen Moffatt
IPC分类号： C21D9/00 , B23K26/00 , H01L21/268
CPC分类号： C21D9/0006 , B23K26/354 , H01L21/268
摘要： An apparatus is disclosed for magneto-thermal processing of substrates comprises a work surface for supporting a substrate for processing, a source of electromagnetic radiation that delivers an intense electromagnetic field to an area of a substrate disposed on the work surface, and a magnetic assembly that delivers a magnetic field to the area of the substrate. The intense electromagnetic field typically has an energy density of at least about 0.2 J/cm2 and a cross-sectional area typically not more than about 10 cm2. The magnetic field typically has a strength at least about 0.5 T and an area not more than about 10 cm2.
摘要翻译：公开了一种用于基板的磁热处理的装置，包括用于支撑用于处理的基板的工作表面，将电磁辐射源传送到设置在工作表面上的基板的区域的电磁辐射源，以及磁性组件，向基板的区域传递磁场。强电场通常具有至少约0.2J / cm 2的能量密度和通常不超过约10cm 2的横截面积。磁场通常具有至少约0.5T的强度和不超过约10cm 2的面积。

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