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1. 发明授权

US5883391A Ion implantation apparatus and a method of monitoring high energy neutral contamination in an ion implantation process 失效
标题翻译：离子注入装置和在离子注入工艺中监测高能量中性污染的方法
公开(公告)号：US5883391A
公开(公告)日：1999-03-16
申请号：US876434
申请日：1997-06-16
申请人： Babak Adibi , Jonathan Gerald England , Stephen Moffatt , Jose Antonio Marin
发明人： Babak Adibi , Jonathan Gerald England , Stephen Moffatt , Jose Antonio Marin
IPC分类号： H01J37/317 , H01L21/265
CPC分类号： H01J37/3171 , H01J2237/0225 , H01J2237/304
摘要： High energy neutral contamination in an ion implanter can be caused by beam ions neutralised as they are temporarily accelerated at an electrode before being decelerated again to the desired implant energy. This occurs for example in the decel lens arrangement which includes an electrode at a relatively high negative potential to provide the required focusing. The level of this contamination is monitored by measuring the current drain on this negative field electrode.
摘要翻译：离子注入机中的高能量中性污染可以由束离子中和，因为它们在被再次减速到期望的注入能量之前被暂时加速在电极处。这种情况发生在例如减速透镜装置中，其包括在相对高的负电位处提供所需聚焦的电极。通过测量该负电场电极上的电流消耗来监测该污染程度。

2. 发明申请

US20100221583A1 HDD PATTERN IMPLANT SYSTEM 有权
标题翻译：硬盘图案植入系统
公开(公告)号：US20100221583A1
公开(公告)日：2010-09-02
申请号：US12703897
申请日：2010-02-11
申请人： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel Hoffman , Stephen Moffatt , Steven Verhaverbeke
发明人： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel Hoffman , Stephen Moffatt , Steven Verhaverbeke
IPC分类号： G11B5/82 , C23C16/44 , C23C16/04
CPC分类号： G11B5/82 , C23C14/48 , C23C14/50 , C23C16/00 , C23F1/00 , G11B5/84 , G11B5/855 , H01L21/673 , H01L21/677 , H01L21/687
摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of processes that expose substrates to energy of varying forms. Apparatus and methods disclosed herein enable processing of two major surfaces of a substrate simultaneously, or sequentially by flipping. In some embodiments, magnetic properties of the substrate surface may be uniformly altered by plasma exposure and then selectively restored by exposure to patterned energy.
摘要翻译：提供了用于形成具有磁性图案化表面的基底的方法和设备。在基板上形成包含一种或多种具有磁性的材料的磁性层。对磁性层进行图案化处理，其中磁性层的表面的选定部分被改变，使得改变的部分与未改变的部分具有不同的磁性，而不改变衬底的形貌。在图案化的磁性层上沉积保护层和润滑剂层。图案化通过使衬底暴露于不同形式的能量的许多工艺来完成。本文公开的装置和方法能够同时或顺序地翻转来处理衬底的两个主表面。在一些实施例中，衬底表面的磁特性可以通过等离子体暴露均匀地改变，然后通过暴露于图案化能量选择性地恢复。

3. 发明授权

US09685186B2 HDD pattern implant system 有权
公开(公告)号：US09685186B2
公开(公告)日：2017-06-20
申请号：US12703897
申请日：2010-02-11
申请人： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel J. Hoffman , Stephen Moffatt , Steven Verhaverbeke
发明人： Majeed A. Foad , Jacob Newman , Jose Antonio Marin , Daniel J. Hoffman , Stephen Moffatt , Steven Verhaverbeke
IPC分类号： G11B5/85 , C23C16/00 , G11B5/82 , C23F1/00 , H01L21/673 , G11B5/84 , H01L21/677 , G11B5/855 , C23C14/48 , H01L21/687 , C23C14/50
CPC分类号： G11B5/82 , C23C14/48 , C23C14/50 , C23C16/00 , C23F1/00 , G11B5/84 , G11B5/855 , H01L21/673 , H01L21/677 , H01L21/687
摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of processes that expose substrates to energy of varying forms. Apparatus and methods disclosed herein enable processing of two major surfaces of a substrate simultaneously, or sequentially by flipping. In some embodiments, magnetic properties of the substrate surface may be uniformly altered by plasma exposure and then selectively restored by exposure to patterned energy.

4. 发明授权

US5969366A Ion implanter with post mass selection deceleration 失效
标题翻译：离子注入机，后质量选择减速
公开(公告)号：US5969366A
公开(公告)日：1999-10-19
申请号：US860748
申请日：1997-09-08
申请人： Jonathan Gerald England , Stephen Moffatt , David George Armour , Majeed Foad
发明人： Jonathan Gerald England , Stephen Moffatt , David George Armour , Majeed Foad
IPC分类号： H01J37/05 , H01J37/30 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/3007 , H01J2237/04756
摘要： A post mass selection decel lens (9) is located between the exit aperture (55) of the mass selection chamber (47) and the entry (74) to the electron confinement tube (69) of the PFS. The lens comprises a first electrode (65) at the substrate potential, a second electrode (60) at the flight tube potential, and a field electrode (61) between them at a relatively high (negative) potential sufficient to provide focusing of the ion beam at the first electrode. The first electrode is larger than the beam to avoid deflecting ions at the periphery of the aperture out of the beam. The first electrode has an aperture which is smaller than that of the field electrode. The field electrode is at least -5 kV relative to the flight tube, that is substantially more than required for electron suppression. Additional apertures are provided between the process chamber and the mass selection chamber to improve evacuation.
摘要翻译： PCT No.PCT / GB96 / 02740 Sec。 371日期：1997年9月8日 102（e）1997年9月8日PCT PCT 1996年11月8日PCT公布。第WO97 / 17716号公报日期1997年5月15日后质量选择减速透镜（9）位于质量选择室（47）的出口孔（55）和PFS的电子限制管（69）的入口（74）之间。该透镜包括在基底电位处的第一电极（65），处于飞行管电位的第二电极（60）和位于它们之间的场电极（61），其处于相对高（负）电位，足以提供离子的聚焦光束在第一电极处。第一电极大于光束，以避免将光圈外围的离子偏离光束。第一电极具有小于场电极的孔径。场电极相对于飞行管至少为-5kV，这实质上大于电子抑制所需要的。在处理室和质量选择室之间提供额外的孔，以改善抽气。

5. 发明授权

US06515408B1 Ion beam apparatus and a method for neutralizing space charge in an ion beam 失效
标题翻译：离子束装置和用于中和离子束中的空间电荷的方法
公开(公告)号：US06515408B1
公开(公告)日：2003-02-04
申请号：US09700206
申请日：2001-02-15
申请人： Jonathan Gerald England , Andrew Holmes , David Armour , Jaap Van Den Berg , Stephen Moffatt
发明人： Jonathan Gerald England , Andrew Holmes , David Armour , Jaap Van Den Berg , Stephen Moffatt
IPC分类号： H05H300
CPC分类号： H01J49/02 , H01J37/026 , H01J37/3171 , H01J2237/0041
摘要： A source of thermionic electrons is provided inside the flight tube of a magnet, especially an analysing magnet, and extends along the beam flight path. This allows space charge to be neutralised along the beam's axis in spite of severely restricted electron mobility in this direction owing to the presence of substantially transverse magnetic field. Thermionically emitted electrons may contribute directly to the neutralisation of space charge in positive ion beams, or, in the case of negative ion beams, indirectly by ionizing residual or deliberately introduced neutral gas atoms or molecules. Examples are described and claimed in which the source is arranged outside the nominal beam envelope in the flight tube, but linked to the beam by magnetic flux generated in the flight tube. This reduces erosion of the source by the beam and so reduces beam contamination. In these examples, an important feature is the provision of electron repellers to reflect electrons back and forth across the beam. Alternative arrangements are described and claimed in which the source is positioned inside the beam. The thermionic electron source may comprise an array of filaments, and preferably is negatively biased with respect to the flight tube. Adjustment of this bias enables the energy of emitted electrons to be controlled.
摘要翻译：在一个磁体的飞行管内部，特别是一个分析磁体的内部，设有一个热离子电子源，并沿着光束飞行路径延伸。尽管由于存在基本上横向的磁场，但是在该方向上电子迁移率受到严格的限制，这允许空间电荷沿着光束的轴线被中和。热离子发射的电子可以直接影响正离子束中的空间电荷的中和，或者在负离子束的情况下，间接地通过电离剩余或故意引入的中性气体原子或分子。这些实施例被描述和要求保护，其中源被布置在飞行管中的标称束包络外部，但是通过在飞行管中产生的磁通量与束束相连。这减少了光束对光源的侵蚀，从而减少了光束的污染。在这些示例中，重要的特征是提供电子驱除器以反射来自横梁的电子。描述和要求保护其中源位于梁内的替代布置。热离子电子源可以包括长丝阵列，并且优选地相对于飞行管负偏压。该偏置的调整使得能够控制发射电子的能量。

6. 发明授权

US09557111B2 Ambient laminar gas flow distribution in laser processing systems 有权
标题翻译：激光加工系统环境层流气流分布
公开(公告)号：US09557111B2
公开(公告)日：2017-01-31
申请号：US13204068
申请日：2011-08-05
申请人： Stephen Moffatt , Aaron Muir Hunter
发明人： Stephen Moffatt , Aaron Muir Hunter
IPC分类号： F27D5/00
CPC分类号： F27D21/00 , F27D5/0037 , F27D2021/0078 , H01L21/67115
摘要： A method and apparatus for annealing semiconductor substrates is disclosed. The apparatus has an annealing energy source and a substrate support, with a shield member disposed between the annealing energy source and the substrate support. The shield member is a substantially flat member having a dimension larger than a substrate processed on the substrate support, with a window covering a central opening in the substantially flat member. The central opening has a gas inlet portal and a gas outlet portal, each in fluid communication with a gas inlet plenum and gas outlet plenum, respectively. A connection member is disposed around the central opening and holds the window over the central opening. Connection openings in the connection member are in fluid communication with the gas inlet plenum and gas outlet plenum, respectively, through a gas inlet conduit and a gas outlet conduit formed through the connection member.
摘要翻译：公开了半导体衬底退火的方法和装置。该装置具有退火能量源和衬底支撑件，其中屏蔽构件设置在退火能量源和衬底支撑件之间。屏蔽构件是具有大于在基板支撑件上处理的基板的尺寸的基本上平坦的构件，窗口覆盖基本平坦的构件中的中心开口。中心开口具有气体入口入口和气体出口入口，每个入口入口和气体出口通道分别与气体入口气室和气体出口增压室流体连通。连接构件设置在中心开口周围并将窗口保持在中心开口的上方。连接构件中的连接开口分别通过气体入口导管和通过连接构件形成的气体出口导管与气体入口气室和气体出口增压室流体连通。

7. 发明授权

US09376731B2 Magneto-thermal processing apparatus and methods 有权
标题翻译：磁热处理装置及方法
公开(公告)号：US09376731B2
公开(公告)日：2016-06-28
申请号：US13864959
申请日：2013-04-17
申请人： Stephen Moffatt
发明人： Stephen Moffatt
IPC分类号： C21D9/00 , B23K26/00 , H01L21/268
CPC分类号： C21D9/0006 , B23K26/354 , H01L21/268
摘要： An apparatus is disclosed for magneto-thermal processing of substrates comprises a work surface for supporting a substrate for processing, a source of electromagnetic radiation that delivers an intense electromagnetic field to an area of a substrate disposed on the work surface, and a magnetic assembly that delivers a magnetic field to the area of the substrate. The intense electromagnetic field typically has an energy density of at least about 0.2 J/cm2 and a cross-sectional area typically not more than about 10 cm2. The magnetic field typically has a strength at least about 0.5 T and an area not more than about 10 cm2.
摘要翻译：公开了一种用于基板的磁热处理的装置，包括用于支撑用于处理的基板的工作表面，将电磁辐射源传送到设置在工作表面上的基板的区域的电磁辐射源，以及磁性组件，向基板的区域传递磁场。强电场通常具有至少约0.2J / cm 2的能量密度和通常不超过约10cm 2的横截面积。磁场通常具有至少约0.5T的强度和不超过约10cm 2的面积。

8. 发明授权

US08970963B2 Multiple beam combiner for laser processing apparatus 有权
标题翻译：用于激光加工设备的多光束组合器
公开(公告)号：US08970963B2
公开(公告)日：2015-03-03
申请号：US13715804
申请日：2012-12-14
申请人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
发明人： Stephen Moffatt , Douglas E. Holmgren , Samuel C. Howells , Edric Tong , Bruce E. Adams , Jiping Li , Aaron Muir Hunter
IPC分类号： G02B27/12 , G02B27/10 , G02B27/14 , G02B17/08
CPC分类号： G02B27/106 , G02B17/0888 , G02B27/0025 , G02B27/10 , G02B27/1006 , G02B27/12 , G02B27/123 , G02B27/126 , G02B27/14 , G02B27/143 , G02B27/30
摘要： Apparatus and methods for combining beams of amplified radiation are disclosed. A beam combiner has a collimating optic positioned to receive a plurality of coherent radiation beams at a constant angle of incidence with respect to an optical axis of the collimating optic. The respective angles of incidence may also be different in some embodiments. The collimating optic has an optical property that collimates the beams. The optical property may be refractive or reflective, or a combination thereof. A collecting optic may also be provided to direct the plurality of beams to the collimating optic. The beam combiner may be used in a thermal processing apparatus to combine more than two beams of coherent amplified radiation, such as lasers, into a single beam.
摘要翻译：公开了用于组合放大辐射束的装置和方法。光束组合器具有准直光学器件，其被定位成以相对于准直光学器件的光轴的恒定入射角接收多个相干辐射束。在一些实施例中，相应的入射角也可以不同。准直光学元件具有使光束准直的光学特性。光学性质可以是折射或反射的，或其组合。还可以提供收集光学器件以将多个光束引导到准直光学元件。光束组合器可以用在热处理装置中，以将多于两个的相干放大辐射束（例如激光器）组合成单个光束。

9. 发明授权

US08372667B2 Fiber laser substrate processing 有权
标题翻译：光纤激光基板加工
公开(公告)号：US08372667B2
公开(公告)日：2013-02-12
申请号：US12761306
申请日：2010-04-15
申请人： Stephen Moffatt
发明人： Stephen Moffatt
IPC分类号： G01R31/26 , H01L21/66
CPC分类号： B23K26/0604 , B23K26/0006 , B23K26/12 , B23K26/127 , B23K2103/56
摘要： Embodiments of the present invention pertain to substrate processing equipment and methods incorporating light sources which provide independent control of light pulse duration, shape and repetition rate. Embodiments further provide rapid increases and decreases in intensity of illumination.
摘要翻译：本发明的实施例涉及提供对光脉冲持续时间，形状和重复率的独立控制的光源的基板处理设备和方法。实施例进一步提供了照明强度的快速增加和降低。

10. 发明申请

US20120183915A1 USE OF INFRARED CAMERA FOR REAL-TIME TEMPERATURE MONITORING AND CONTROL 有权
标题翻译：使用红外摄像机进行实时温度监测和控制
公开(公告)号：US20120183915A1
公开(公告)日：2012-07-19
申请号：US13433780
申请日：2012-03-29
申请人： Nir Merry , Stephen Moffatt , Kailash Patalay , David Keith Carlson
发明人： Nir Merry , Stephen Moffatt , Kailash Patalay , David Keith Carlson
IPC分类号： F27D19/00
CPC分类号： F27B17/0025 , C23C16/481 , C23C16/52 , H01L21/67115 , H01L21/67248
摘要： Embodiments of the invention generally contemplate an apparatus and method for monitoring and controlling the temperature of a substrate during processing. One embodiment of the apparatus and method takes advantage of an infrared camera to obtain the temperature profile of multiple regions or the entire surface of the substrate and a system controller to calculate and coordinate in real time an optimized strategy for reducing any possible temperature non-uniformity found on the substrate during processing.
摘要翻译：本发明的实施例通常考虑用于在处理期间监测和控制衬底的温度的装置和方法。该装置和方法的一个实施例利用红外相机获得多个区域或基板的整个表面的温度分布，以及系统控制器实时计算和协调用于降低任何可能的温度不均匀性的优化策略在加工过程中在基板上发现。

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