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    • 5. 发明授权
    • Hockey stick rack
    • 曲棍球架
    • US07422122B2
    • 2008-09-09
    • US11334298
    • 2006-01-19
    • John Holland
    • John Holland
    • A47F7/00
    • A63B71/0036A63B71/0045A63B2102/22A63B2102/24
    • The invention is a rack holding hockey sticks and other sporting equipment. The base is comprised of a member to which is attached at right angles another two members on opposite sides and a post rising vertically from the point of attachment. A second vertical member slides over the first vertical member. Near the top of the second vertical member are attached two members. Attached to these two members are two additional members at right angles. To each of those members are attached a plurality of other members at right angles projecting outwards. There are two additional members attached lower on the second vertical member. Each of these members have an additional member attached at right angles and a plurality of members attached to such member at right angles, which members extend inwards towards the vertical member.
    • 本发明是一种搁置曲棍球棒和其他运动器材的机架。 底座由一个构件组成,在该构件上以直角连接两个相对侧的两个构件,以及从安装点垂直上升的柱。 第二垂直构件在第一垂直构件上滑动。 靠近第二垂直构件的顶部附有两个构件。 这两名成员的附属成员是两个成员。 对于这些构件中的每一个,以向外突出的直角附接多个其它构件。 在第二垂直构件上附加有两个附加构件。 这些构件中的每一个具有直角连接的附加构件,并且多个构件以直角附接到该构件,该构件向着垂直构件向内延伸。
    • 10. 发明申请
    • Method and apparatus for controlling temperature of a substrate
    • 用于控制基板温度的方法和装置
    • US20060076109A1
    • 2006-04-13
    • US11246012
    • 2005-10-07
    • John HollandTheodoros Panagopoulos
    • John HollandTheodoros Panagopoulos
    • C23F1/00H01L21/306C23C16/00H01L21/00
    • H01L21/67248H01L21/67103H01L21/6831Y10T279/23
    • A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes an electrostatic chuck coupled to a metallic base. The electrostatic chuck includes at least one chucking electrode and metallic base includes at least two fluidly isolated conduit loops disposed therein. In another embodiment, the pedestal assembly includes a support member that is coupled to a base by a material layer. The material layer has at least two regions having different coefficients of thermal conductivity. In another embodiment, the support member is an electrostatic chuck. In further embodiments, a pedestal assembly has channels formed between the base and support member for providing cooling gas in proximity to the material layer to further control heat transfer between the support member and the base, thereby controlling the temperature profile of a substrate disposed on the support member.
    • 提供了一种用于在处理期间控制基板的温度的基座组件和方法。 在一个实施例中,基座组件包括联接到金属基座的静电卡盘。 静电吸盘包括至少一个夹紧电极和金属底座,其包括设置在其中的至少两个流体隔离的导管环。 在另一个实施例中,基座组件包括通过材料层联接到基座的支撑构件。 材料层具有至少两个具有不同导热系数的区域。 在另一个实施例中,支撑构件是静电卡盘。 在另外的实施例中,基座组件具有形成在基部和支撑构件之间的通道,用于在材料层附近提供冷却气体,以进一步控制支撑构件和基座之间的热传递,由此控制设置在基座上的基板的温度分布 支持会员