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1. 发明授权

US5818078A Semiconductor device having a regrowth crystal region 失效
公开(公告)号：US5818078A
公开(公告)日：1998-10-06
申请号：US517041
申请日：1995-08-21
申请人： Kozo Makiyama , Masahiko Takikawa , Satoru Asai , Yusuke Matsukura , Toshihide Kikkawa
发明人： Kozo Makiyama , Masahiko Takikawa , Satoru Asai , Yusuke Matsukura , Toshihide Kikkawa
IPC分类号： H01L21/331 , H01L21/335 , H01L21/8252 , H01L27/06 , H01L29/08 , H01L29/417 , H01L29/45 , H01L29/737 , H01L29/778 , H01L29/80 , H01L29/90 , H01L31/112
CPC分类号： H01L29/66318 , H01L21/8252 , H01L27/0605 , H01L29/0891 , H01L29/41725 , H01L29/452 , H01L29/66462 , H01L29/7371 , H01L29/7783 , H01L29/802
摘要： A method of fabricating a compound semiconductor device includes a step of removing a semiconductor layer by an etching process to expose an upper major surface of an underlying semiconductor layer, followed by a growth of another semiconductor layer of the p-type on the surface thus exposed, wherein the exposed surface is cleaned by a flushing of a gaseous metal organic compound containing a group V element for removing impurities therefrom and further doping the exposed surface to the p-type.

2. 发明申请

US20110284508A1 WELDING SYSTEM AND WELDING METHOD 审中-公开
标题翻译：焊接系统和焊接方法
公开(公告)号：US20110284508A1
公开(公告)日：2011-11-24
申请号：US13111211
申请日：2011-05-19
申请人： Takahiro Miura , Setsu Yamamoto , Takeshi Hoshi , Tsuyoshi Ogawa , Yoshihiro Fujita , Shozo Hirano , Kazumi Watanabe , Satoshi Nagai , Masahiro Yoshida , Jun Semboshi , Satoru Asai , Makoto Ochiai
发明人： Takahiro Miura , Setsu Yamamoto , Takeshi Hoshi , Tsuyoshi Ogawa , Yoshihiro Fujita , Shozo Hirano , Kazumi Watanabe , Satoshi Nagai , Masahiro Yoshida , Jun Semboshi , Satoru Asai , Makoto Ochiai
IPC分类号： B23K26/00
CPC分类号： B23K31/125
摘要： A welding system has: a welding mechanism, a reception laser light source, a reception optical mechanism, an interferometer, a data recording/analysis mechanism and a data recording/analysis mechanism. The reception laser light source generates reception laser light so as to irradiate the object to be welded with the reception laser light for the purpose of detecting a reflected ultrasonic wave obtained as a result of reflection of a transmission ultrasonic wave. The reception optical mechanism transmits, during or after welding operation, the reception laser light generated from the reception laser light source to the surface of the object to be welded for irradiation while moving, together with the welding mechanism, relative to the object to be welded and collects laser light scattered/reflected at the surface of the object to be welded.
摘要翻译：焊接系统具有：焊接机构，接收激光光源，接收光学机构，干涉仪，数据记录/分析机构和数据记录/分析机构。为了检测作为发送超声波的反射而得到的反射超声波，接收激光光源产生接收激光以照射被接收激光的被焊物体。接收光学机构在焊接操作期间或之后将从接收激光光源产生的接收激光与焊接机构相对于被焊接物体一起移动而被发射到被焊接物体的表面并收集在待焊接物体的表面上散射/反射的激光。

3. 发明申请

US20070275331A1 Pattern forming method and method for manufacturing semiconductor device 审中-公开
标题翻译：图案形成方法和半导体器件的制造方法
公开(公告)号：US20070275331A1
公开(公告)日：2007-11-29
申请号：US11529678
申请日：2006-09-29
申请人： Tomohiko Yamamoto , Satoru Asai
发明人： Tomohiko Yamamoto , Satoru Asai
IPC分类号： G03F7/20
CPC分类号： G03F7/70466
摘要： A micropattern is formed with high accuracy with a sufficient manufacture process margin without using a photomask complicated in manufacture process at high manufacture cost like an alternating phase shift mask. Double exposure is performed by using a pair of photomasks such as an ordinary chrome mask, an attenuated phase shift mask or the like which is not an alternating phase shift mask, and a pattern is transferred onto a photoresist. Here, on the occasion of performing exposure with the photomask for forming a finer pattern, double pole illumination is used as an illumination system.
摘要翻译：在具有高制造成本的制造工艺中使用像交替相移掩模那样使用复杂的光掩模的情况下，以高精度形成具有足够的制造工艺余量的微图案。通过使用不是交替相移掩模的普通镀铬掩模，衰减相移掩模等的一对光掩模进行双重曝光，并将图案转印到光致抗蚀剂上。这里，在用用于形成更精细图案的光掩模进行曝光的场合，使用双极照明作为照明系统。

4. 发明授权

US07144303B2 Method of polishing a large part and abrasive for use in the method 有权
公开(公告)号：US07144303B2
公开(公告)日：2006-12-05
申请号：US11312341
申请日：2005-12-21
申请人： Kenji Kamimura , Satoru Asai , Satoru Yanaka , Ryusuke Tsuboi , Tadashi Tanuma , Masataka Kikuchi
发明人： Kenji Kamimura , Satoru Asai , Satoru Yanaka , Ryusuke Tsuboi , Tadashi Tanuma , Masataka Kikuchi
IPC分类号： B24B1/00
CPC分类号： B24C1/08 , B24C1/086 , B24C11/00 , F01D5/286 , Y02T50/673
摘要： A surface to be polished of a large part is polished by projecting and colliding an abrasive comprising abrasive grains and an elastic petrochemical high polymer material having the specific gravity of 0.5 to 1.8 g/cm3 and elasticity of 10 to 200 ckg/cm2 or an elastic natural material, to the surface to be polished of the large part at a speed of 600 m to 3800 m per minute and by a volume of 5 to 300 cc/cm2·sec per unit area, and sliding the abrasive.

5. 发明申请

US20060018529A1 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure 有权
标题翻译：掩模图案校正装置，掩模图案的校正方法，曝光修正装置以及曝光校正方法
公开(公告)号：US20060018529A1
公开(公告)日：2006-01-26
申请号：US10995215
申请日：2004-11-24
申请人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
发明人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
IPC分类号： G03C5/00 , G06K9/00 , G03F1/00
CPC分类号： G03F7/70941 , G03F7/70433 , G03F7/705
摘要： In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every -single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.
摘要翻译：鉴于实现能够以极高的精度估计和校正火炬的平版印刷工艺，并且在整个部分上不仅在单一拍摄区域上，而且在单个区域的整个部分上仅产生非常小的尺寸变化芯片区域，本发明的掩模图案校正装置具有数值孔径计算单元，对于每个单独拍摄区域，基于多个拍摄区域的曝光布局来计算对应于被转印图案的掩模图案的闪光能量或者更具体地，同时考虑来自位于每个单个拍摄区域周围的多个拍摄区域的闪光。

6. 发明授权

US06499946B1 Steam turbine rotor and manufacturing method thereof 有权
标题翻译：蒸汽涡轮转子及其制造方法
公开(公告)号：US06499946B1
公开(公告)日：2002-12-31
申请号：US09692179
申请日：2000-10-20
申请人： Masayuki Yamada , Takao Inukai , Masataka Kikuchi , Joji Kaneko , Satoru Asai , Yoichi Tsuda , Ryuichi Ishii , Yomei Yoshioka
发明人： Masayuki Yamada , Takao Inukai , Masataka Kikuchi , Joji Kaneko , Satoru Asai , Yoichi Tsuda , Ryuichi Ishii , Yomei Yoshioka
IPC分类号： F03B104
CPC分类号： C22C38/22 , C22C38/24 , C22C38/44 , C22C38/46 , F01D5/063 , F01D5/28
摘要： A steam turbine rotor having a combination of at least one of a high pressure rotor, an intermediate pressure rotor and a low pressure rotor, which are each formed from a metal material of different chemical composition and welded together by means of welding.
摘要翻译：一种具有高压转子，中压转子和低压转子中的至少一个的组合的汽轮机转子，它们均由不同化学成分的金属材料形成并通过焊接焊接在一起。

7. 发明授权

US06420094B1 Optical exposure method 失效
标题翻译：光学曝光方法
公开(公告)号：US06420094B1
公开(公告)日：2002-07-16
申请号：US09500527
申请日：2000-02-09
申请人： Tamae Haruki , Kenji Nakagawa , Satoru Asai , Isamu Hanyu
发明人： Tamae Haruki , Kenji Nakagawa , Satoru Asai , Isamu Hanyu
IPC分类号： G03F720
CPC分类号： G03F7/70566 , G03F7/201 , G03F7/70091 , G03F7/701 , G03F7/70125 , G03F7/70241 , G03F7/70283 , G03F7/70583
摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.
摘要翻译：在制造半导体器件时，用于精密加工的光刻中的光学曝光方法。光掩模上的图案被投影并暴露在具有包括变形照明系统，光掩模和投影透镜的曝光装置的基板上的寄存器上。变形照明系统由光源，光阑和聚光透镜组成，隔膜设有直线通孔。光学曝光方法使用用于照明的线性光线或与图案平行的用于照明的两束线性光。两条线性光线相对于光轴对称。当光掩模图案是线和空间图案时，这些光线与图案平行于与曝光装置的光轴分离的位置。

8. 发明授权

US6107708A Brushless motor 有权
标题翻译：无刷电机
公开(公告)号：US6107708A
公开(公告)日：2000-08-22
申请号：US268409
申请日：1999-03-15
申请人： Mineo Yamaguchi , Hideto Matsuzaki , Keisuke Sasaki , Masaaki Shimizu , Shinji Iwama , Satoru Asai
发明人： Mineo Yamaguchi , Hideto Matsuzaki , Keisuke Sasaki , Masaaki Shimizu , Shinji Iwama , Satoru Asai
IPC分类号： H02K29/00 , B60H1/00 , F04D29/00 , F04D29/44 , F04D29/58 , H02K5/20 , H02K7/14 , H02K9/02 , H02K9/06 , H02K9/26 , H02K11/02 , H02K11/04 , H02K21/22 , H02K9/00
CPC分类号： H02K9/06 , B60H1/00457 , H02K11/024 , H02K11/33 , H02K5/20 , H02K9/26 , H02K7/14
摘要： A brushless motor includes a stator attached to a motor case and a rotor. A circuit substrate is attached to the motor case. The substrate includes an electric circuit, which supplies electric current to the stator thereby rotating the rotor. A fan generates and moves air in accordance with rotation of the rotor. A duct guides some of the air moved by the fan to the stator. A flange extends from the stator. The air guided by the duct flows along the flange. This structure reduces the size of the brushless motor while increasing its power.
摘要翻译：无刷电动机包括附接到电动机壳体和转子的定子。电路基板安装在电动机壳体上。基板包括电路，其向定子提供电流，从而使转子旋转。风扇根据转子的旋转产生并移动空气。导管将一些由风扇移动的空气引导到定子。法兰从定子延伸。由导管引导的空气沿着法兰流动。这种结构在增加功率的同时减小了无刷电动机的尺寸。

9. 发明授权

US5607821A Optical exposure method 失效
标题翻译：光学曝光方法
公开(公告)号：US5607821A
公开(公告)日：1997-03-04
申请号：US510128
申请日：1995-08-01
申请人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
发明人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
IPC分类号： G03F7/20 , G03F7/207 , G03C5/04 , G03B27/32 , G03B27/68 , G03B27/72
CPC分类号： G03F7/70566 , G03F7/201 , G03F7/70091 , G03F7/701 , G03F7/70125 , G03F7/70241 , G03F7/70283 , G03F7/70583
摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.
摘要翻译：在制造半导体器件时，用于精密加工的光刻中的光学曝光方法。光掩模上的图案被投影并暴露在具有包括变形照明系统，光掩模和投影透镜的曝光装置的基板上的寄存器上。变形照明系统由光源，光阑和聚光透镜组成，隔膜设有直线通孔。光学曝光方法使用用于照明的线性光线或与图案平行的用于照明的两束线性光。两条线性光线相对于光轴对称。当光掩模图案是线和空间图案时，这些光线与图案平行于与曝光装置的光轴分离的位置。

10. 发明授权

US09309773B2 Steam turbine and steam turbine blade 有权
标题翻译：汽轮机和汽轮机叶片
公开(公告)号：US09309773B2
公开(公告)日：2016-04-12
申请号：US12977548
申请日：2010-12-23
申请人： Akio Sayano , Masashi Takahashi , Masahiro Saito , Kazuyoshi Nakajima , Tadashi Tanuma , Satoru Asai , Kenji Kamimura
发明人： Akio Sayano , Masashi Takahashi , Masahiro Saito , Kazuyoshi Nakajima , Tadashi Tanuma , Satoru Asai , Kenji Kamimura
IPC分类号： F01D5/28 , C23C18/12
CPC分类号： F01D5/286 , C23C18/1208 , F05D2220/31 , F05D2230/90 , F05D2250/60
摘要： A steam turbine 3 includes: a turbine rotor 4; a rotor blade 5 implanted to the turbine rotor 4; a stator blade 6 provided at an upstream side of the rotor blade 5; and a turbine casing 13 supporting the stator blade 6 and including the turbine rotor 4, the rotor blade 5 and the stator blade 6, and have a constitution in which a stage 7 is formed by a pair of the rotor blade 5 and the stator blade 6, and a steam passage 8 is formed by arranging plural stages 7 in an axial direction of the turbine rotor 4. A surface treatment to suppress an increase of a surface roughness caused by oxidation is performed for at least a part of a surface of the stator blade 6 and a surface of the rotor blade 5.
摘要翻译：蒸汽轮机3包括：涡轮机转子4; 植入涡轮机转子4的转子叶片5; 设置在转子叶片5的上游侧的定子叶片6; 以及支撑定子叶片6并且包括涡轮转子4，转子叶片5和定子叶片6的涡轮壳体13，并且具有这样的构造，其中阶段7由一对转子叶片5和定子叶片形成并且通过在涡轮机转子4的轴向上配置多个级7来形成蒸汽通道8.为了抑制由氧化引起的表面粗糙度的增加，进行表面处理以至少部分表面粗糙度定子叶片6和转子叶片5的表面。

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