专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060025257A1 Pulley rotatingly supporting device 失效
标题翻译：皮带轮旋转支撑装置
公开(公告)号：US20060025257A1
公开(公告)日：2006-02-02
申请号：US10489669
申请日：2002-09-10
申请人： Kouichi Tanabe , Takayuki Miyagawa , Masato Taniguchi
发明人： Kouichi Tanabe , Takayuki Miyagawa , Masato Taniguchi
IPC分类号： F16H55/36 , F16H63/00
CPC分类号： B32B7/12 , B32B15/08 , B32B27/28 , F16C19/166 , F16C33/7853 , F16C2361/63 , H05K1/0346 , H05K3/389
摘要： The object of the invention is to provide a structure which not only can be reduced in size but also can secure the durability of an endless belt (11) to be provided on a driven pulley (4b) and a pulley rotation support apparatus for supporting the driven pulley (4b). In the invention, as the above pulley rotation support apparatus, there is used a three-point-contact-type or four-point-contact-type radial ball bearing (14b). An offset quantity δ, which is an axial-direction distance between the center α of a radial load applied from the endless belt (11) to the driven pulley (4b) and the center position β of the radial ball bearing (14b), is set 40% or less of the pitch circle diameter of the radial ball bearing (14b). The radial clearance of this radial ball bearing (14b) is set 0.2% or less of the above pitch circle diameter.
摘要翻译：本发明的目的是提供一种结构，其不仅可以减小尺寸，而且可以确保设置在从动带轮（4b）上的环形带（11）的耐久性和用于支撑的带轮旋转支撑装置从动带轮（4b）。在本发明中，作为上述带轮旋转支撑装置，使用三点接触型或四点接触型径向球轴承（14b）。偏移量delta，其是从环形带（11）施加到从动带轮（4b）的径向载荷的中心α与径向球轴承（14b）的中心位置β之间的轴向距离，设定为径向球轴承（14b）的节圆直径的40％以下。该径向球轴承（14b）的径向间隙设定为上述节圆直径的0.2％以下。

2. 发明授权

US07325974B2 Pulley rotation support apparatus 失效
标题翻译：皮带轮旋转支撑装置
公开(公告)号：US07325974B2
公开(公告)日：2008-02-05
申请号：US10489669
申请日：2002-09-10
申请人： Kouichi Tanabe , Takayuki Miyagawa , Masato Taniguchi
发明人： Kouichi Tanabe , Takayuki Miyagawa , Masato Taniguchi
IPC分类号： F16C33/76 , F16H55/36
CPC分类号： B32B7/12 , B32B15/08 , B32B27/28 , F16C19/166 , F16C33/7853 , F16C2361/63 , H05K1/0346 , H05K3/389
摘要： An endless belt (11) to be provided on a driven pulley (4b) and a pulley rotation support apparatus for supporting the driven pulley (4b). In the pulley rotation support apparatus, there is used a three-point-contact-type or four-point-contact-type radial ball bearing (14b). An offset quantity δ, which is an axial-direction distance between the center α of a radial load applied from the endless belt (11) to the driven pulley (4b) and the center position β of the radial ball bearing (14b), is set 40% or less of the pitch circle diameter of the radial ball bearing (14b). The radial clearance of this radial ball bearing (14b) is set 0.2% or less of the above pitch circle diameter.
摘要翻译：设置在从动带轮（4b）上的环形带（11）和用于支撑从动带轮（4b）的皮带轮旋转支撑装置。在带轮旋转支撑装置中，使用三点接触型或四点接触型径向球轴承（14b）。偏移量delta，其是从环形带（11）施加到从动带轮（4b）的径向载荷的中心α与径向球轴承（14b）的中心位置β之间的轴向距离，设定为径向球轴承（14b）的节圆直径的40％以下。该径向球轴承（14b）的径向间隙设定为上述节圆直径的0.2％以下。

3. 发明授权

US08546059B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08546059B2
公开(公告)日：2013-10-01
申请号：US12953606
申请日：2010-11-24
申请人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
发明人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and Rc6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子，可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和R c6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc4和Rc6键合彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc5和Rc7彼此键合形成烷二基。

4. 发明授权

US08003296B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08003296B2
公开(公告)日：2011-08-23
申请号：US12536386
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.
摘要翻译：本发明提供了一种化学放大阳性组合物，其包含：（A）包含具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液，但通过作用于酸，（B）包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基，Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1〜3的整数，n表示 0〜3的整数，侧链具有氟原子的结构单元和酸发生剂。

5. 发明申请

US20100010129A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20100010129A1
公开(公告)日：2010-01-14
申请号：US12490828
申请日：2009-06-24
申请人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
发明人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
IPC分类号： C08K5/42 , C08L37/00 , C08L55/00
CPC分类号： G03F7/0397 , G03F7/0046
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO— and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II): wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：本身在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱溶液的树脂（A），其包含具有侧链中的酸不稳定基团和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X1表示未取代或取代的具有-COO-和C3的C 3 -C 30环烃基表示1〜4的整数，由式（II）表示的结构单元构成的树脂（B）：其中R2表示氢原子，甲基或三氟甲基，酸产生剂。

6. 发明授权

US07439006B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US07439006B2
公开(公告)日：2008-10-21
申请号：US11889353
申请日：2007-08-10
申请人： Isao Yoshida , Yukako Harada , Takayuki Miyagawa
发明人： Isao Yoshida , Yukako Harada , Takayuki Miyagawa
IPC分类号： G03F7/004 , C07C69/00
CPC分类号： G03F7/0045 , C07C309/17 , C07C381/12 , C07D307/93 , G03F7/0046 , G03F7/0392 , Y10S430/122
摘要： A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).
摘要翻译：由式（I）表示的盐：其中X表示C1-C12二价线性或支链烃基，Y表示可以被至少一个取代基取代的C 1 -C 30烃基，并且至少一个-CH- C1-C30烃基可以被-O-或-CO-取代，Q 1和Q 2各自独立地表示氟原子或C1-C6全氟烷基，A0 +表示有机抗衡离子。本发明还提供一种包含由上述式（I）表示的盐的化学放大抗蚀剂组合物。

7. 发明申请

US20050260525A1 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same 有权
标题翻译：化学扩增的正性抗蚀剂组合物，卤代酯衍生物及其制备方法
公开(公告)号：US20050260525A1
公开(公告)日：2005-11-24
申请号：US11123104
申请日：2005-05-06
申请人： Ichiki Takemoto , Kazuhiko Hashimoto , Takayuki Miyagawa
发明人： Ichiki Takemoto , Kazuhiko Hashimoto , Takayuki Miyagawa
IPC分类号： G03C1/492 , G03F7/004 , G03F7/039
CPC分类号： C08F220/26 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) at least one structural unit selected from the group consisting of structural units of the formulas (no and (V), (ii) a structural unit of the formula (I) and (iii) a structural unit of the formula (II), and (B) an acid generator. The present invention also provides a haloester derivative of the formula (XXI) and a process for producing the same.
摘要翻译：本发明提供了一种化学放大型正性抗蚀剂组合物，其包含（A）树脂，其包含（i）至少一种选自式（Ⅳ和Ⅴ）的结构单元的结构单元，（ii）结构单元式（I）和（iii）式（II）的结构单元和（B）酸产生剂，本发明还提供式（XXI）的卤代酯衍生物及其制备方法。

8. 发明申请

US20140199009A1 GREASE COMPOSITION AND ROLLING DEVICE 审中-公开
标题翻译：润滑脂组合物和滚压装置
公开(公告)号：US20140199009A1
公开(公告)日：2014-07-17
申请号：US14240952
申请日：2012-08-24
申请人： Noriyuki Inami , Atsushi Yokouchi , Michita Hokao , Shinya Nakatani , Haruka Kanda , Kazuhiro Soga , Takayuki Miyagawa
发明人： Noriyuki Inami , Atsushi Yokouchi , Michita Hokao , Shinya Nakatani , Haruka Kanda , Kazuhiro Soga , Takayuki Miyagawa
IPC分类号： C10M169/02 , F16C33/66
CPC分类号： C10M169/02 , C10M171/02 , C10M2203/1006 , C10M2205/0285 , C10M2207/0406 , C10M2207/12 , C10M2207/125 , C10M2207/127 , C10M2207/16 , C10M2207/2805 , C10M2207/288 , C10M2209/1033 , C10M2215/02 , C10M2215/04 , C10M2215/064 , C10M2215/1026 , C10M2219/044 , C10M2223/047 , C10N2220/022 , C10N2220/026 , C10N2230/02 , C10N2230/06 , C10N2230/08 , C10N2230/26 , C10N2230/76 , C10N2240/02 , C10N2250/10 , F16C19/186 , F16C33/6633 , F16C2326/02 , C10N2210/02
摘要： The present invention relates to: a grease composition that includes a base oil which has a pressure-viscosity coefficient as measured at 40° C. of 33 GPa−1 or less and a thickener which is contained in a projected-area proportion of 10% by area or higher; and a rolling device packed with the grease composition.
摘要翻译：本发明涉及一种润滑脂组合物，其包含在40℃下测定的压力粘度系数为33GPa -1以下的基础油和以10％的投影面积比例包含的增稠剂，以上; 以及填充有润滑脂组合物的滚动装置。

9. 发明申请

US20110171586A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20110171586A1
公开(公告)日：2011-07-14
申请号：US13003178
申请日：2009-07-07
申请人： Mitsuhiro Hata , Satoshi Yamamoto , Takayuki Miyagawa
发明人： Mitsuhiro Hata , Satoshi Yamamoto , Takayuki Miyagawa
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2022 , G03F7/38 , G03F7/40
摘要： A resist processing method having the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B) and a cross-linking agent (C) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to a whole surface of the first resist film, and then exposing the first resist film through a mask; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and then drying; (8) pre baking the second resist film; (9) exposing the second resist film through a mask; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.
摘要翻译：一种抗蚀剂处理方法，具有以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：具有酸不稳定基团的树脂（A），其在碱性水溶液中不溶或难溶，并且呈现通过酸，光酸产生剂（B）和交联剂（C）的作用将其溶解在碱性水溶液中并干燥; （2）预烘第一抗蚀膜; （3）暴露于第一抗蚀剂膜的整个表面，然后通过掩模曝光第一抗蚀剂膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）对第一抗蚀剂图案进行硬烘烤，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上，然后干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）通过掩模使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。

10. 发明申请

US20100279226A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20100279226A1
公开(公告)日：2010-11-04
申请号：US12810793
申请日：2008-12-22
申请人： Mitsuhiro Hata , Yoshiyuki Takata , Satoshi Yamaguchi , Ichiki Takemoto , Takayuki Miyagawa , Yusuke Fuji
发明人： Mitsuhiro Hata , Yoshiyuki Takata , Satoshi Yamaguchi , Ichiki Takemoto , Takayuki Miyagawa , Yusuke Fuji
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： H01L21/0275 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.
摘要翻译：本发明的目的是提供一种制造抗蚀剂图案的方法，其中可以形成极细和高精度的抗蚀剂图案，该抗蚀剂图案是使用多图案化方法中形成第一抗蚀剂图案的抗蚀剂组合物获得的，双重图案化方法抗蚀剂处理方法包括：通过将第一抗蚀剂组合物施加到基材上并干燥来形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含树脂（A），光酸产生剂（B）和交联剂（C），树脂（A）具有酸不稳定基团，在碱性水溶液中不溶或难溶，但通过酸的作用使其溶于碱水溶液中; 预烘烤曝光处理; 曝光后烘烤; 发展; 硬烘烤第一抗蚀剂图案; 得到第二抗蚀膜; 预烘烤; 曝光处理; 曝光后烘烤; 显影以获得第二抗蚀剂图案。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式