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1. 发明申请

US20080076063A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
公开(公告)号：US20080076063A1
公开(公告)日：2008-03-27
申请号：US11889353
申请日：2007-08-10
申请人： Isao Yoshida , Yukako Harada , Takayuki Miyagawa
发明人： Isao Yoshida , Yukako Harada , Takayuki Miyagawa
IPC分类号： C07D307/77 , C07C61/15 , G03C1/00
CPC分类号： G03F7/0045 , C07C309/17 , C07C381/12 , C07D307/93 , G03F7/0046 , G03F7/0392 , Y10S430/122
摘要： A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

2. 发明授权

US07439006B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US07439006B2
公开(公告)日：2008-10-21
申请号：US11889353
申请日：2007-08-10
申请人： Isao Yoshida , Yukako Harada , Takayuki Miyagawa
发明人： Isao Yoshida , Yukako Harada , Takayuki Miyagawa
IPC分类号： G03F7/004 , C07C69/00
CPC分类号： G03F7/0045 , C07C309/17 , C07C381/12 , C07D307/93 , G03F7/0046 , G03F7/0392 , Y10S430/122
摘要： A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).
摘要翻译：由式（I）表示的盐：其中X表示C1-C12二价线性或支链烃基，Y表示可以被至少一个取代基取代的C 1 -C 30烃基，并且至少一个-CH- C1-C30烃基可以被-O-或-CO-取代，Q 1和Q 2各自独立地表示氟原子或C1-C6全氟烷基，A0 +表示有机抗衡离子。本发明还提供一种包含由上述式（I）表示的盐的化学放大抗蚀剂组合物。

3. 发明授权

US07862980B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US07862980B2
公开(公告)日：2011-01-04
申请号：US11882084
申请日：2007-07-30
申请人： Yukako Harada , Isao Yoshida , Yoshiyuki Takata
发明人： Yukako Harada , Isao Yoshida , Yoshiyuki Takata
IPC分类号： G03F7/004 , C07C309/12 , C07D307/30
CPC分类号： C07C381/12 , C07C309/17 , C07C2603/74 , C07D307/77 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a salt represented by the formula (I): wherein P1, P2, P3, Q1, Q2 and R are defined in the specification and the present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).
摘要翻译：本发明提供由式（I）表示的盐：其中P1，P2，P3，Q1，Q2和R在说明书中定义，本发明还提供了一种化学放大抗蚀剂组合物，其包含由上述（I）。

4. 发明授权

US07301047B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US07301047B2
公开(公告)日：2007-11-27
申请号：US11586640
申请日：2006-10-26
申请人： Isao Yoshida , Yukako Harada , Satoshi Yamaguchi
发明人： Isao Yoshida , Yukako Harada , Satoshi Yamaguchi
IPC分类号： C07C69/00
CPC分类号： C07C381/12 , C07C25/18 , C07C309/17 , C07C2601/14 , C07C2602/42 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or bicyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkenyl group having 2 to 6 carbon atoms, alkoxy group having 2 to 6 carbon atoms or perfluoroalkyl group having 1 to 4 carbon atoms; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 1 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
摘要翻译：本发明提供式（I）的盐：其中环X表示具有3-30个碳原子的单环或双环烃基，并且环X中的一个或多个氢原子任选被具有1至6个碳原子的烷基取代碳原子数2〜6的烯基，碳原子数2〜6的烷氧基或碳原子数1〜4的全氟烷基; Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A ^{+ 代表有机抗衡离子; 并且n表示1至12的整数。本发明还提供包含式（I）的盐的化学放大抗蚀剂组合物。}

5. 发明申请

US20070149702A1 Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的树脂和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US20070149702A1
公开(公告)日：2007-06-28
申请号：US11642628
申请日：2006-12-21
申请人： Nobuo Ando , Ichiki Takemoto , Isao Yoshida , Yukako Harada
发明人： Nobuo Ando , Ichiki Takemoto , Isao Yoshida , Yukako Harada
IPC分类号： C09D5/02
CPC分类号： C08F220/38 , C08F220/18 , C08F220/28 , C08J3/075
摘要： The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
摘要翻译：本发明提供一种通过照射产生酸的树脂，并且是阴离子聚合物不具有碳 - 碳不饱和键的有机阳离子和阴离子聚合物的盐。本发明还提供一种包含其的化学放大抗蚀剂组合物。

6. 发明授权

US07667050B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US07667050B2
公开(公告)日：2010-02-23
申请号：US11889596
申请日：2007-08-15
申请人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
发明人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
IPC分类号： C07C309/19 , C07D333/46
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D313/06 , C07D333/46 , C07D335/00 , G03F7/0045 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH2— in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH2— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中X表示含有至少一个二价脂环族烃基的C 3 -C 30二价基团，并且C 3 -C 30二价基团中的至少一个-CH 2可以被 -O-或-CO-，Y表示可以被至少一个选自C 1 -C 6烷氧基，C 1 -C 4全氟烷基，C 1 -C 6羟基烷基，C 1 -C 6烷氧基，羟基和氰基，C3-C30环状烃基中的至少一个-CH2-可以被-O-或-CO-取代，Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，A +表示有机抗衡离子。

7. 发明申请

US20070122750A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20070122750A1
公开(公告)日：2007-05-31
申请号：US11600884
申请日：2006-11-17
申请人： Satoshi Yamaguchi , Yukako Harada , Isao Yoshida
发明人： Satoshi Yamaguchi , Yukako Harada , Isao Yoshida
IPC分类号： G03C5/00 , C07C309/12
CPC分类号： G03F7/0045 , C07C309/17 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2603/74 , G03F7/0397
摘要： The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
摘要翻译：本发明提供式（I）的盐：其中环X表示碳原子数为3〜30的单环或多环烃基，单环或多环烃基中的一个或多个氢原子任选被具有1个 10个碳原子，碳原子数1〜10的烷氧基，碳原子数1〜4的全氟烷基，碳原子数1〜10的羟基烷基或氰基。 Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。本发明还提供了包含式（I）的盐的化学放大抗蚀剂组合物。

8. 发明申请

US20070100096A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20070100096A1
公开(公告)日：2007-05-03
申请号：US11516644
申请日：2006-09-07
申请人： Yukako Harada , Isao Yoshida , Yoshiyuki Takata
发明人： Yukako Harada , Isao Yoshida , Yoshiyuki Takata
IPC分类号： C08F4/06 , C07C309/12
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14
摘要： The present invention provides a salt of the formula (I): wherein X represents divalent or trivalent residue of acyclic hydrocarbon having 1 to 30 carbon atoms or divalent or trivalent residue of hydrocarbon having 3 to 30 carbon atoms which contains monocyclic or bicyclic ring, wherein —CH2— in the hydrocarbon may be substituted with —O— and one or more hydrogen atom in X is optionally substituted with alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; Y represents hydroxyl group, cyano group or methoxy group; and n shows 1 or 2. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
摘要翻译：本发明提供式（I）的盐：其中X表示碳原子数1〜30的无环烃的二价或三价残基或含有单环或双环的碳原子数3〜30的二价或三价残基，其中，在烃中的-CH 2 - 2可以被-O-取代，X中的一个或多个氢原子任选被具有1至6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基取代，具有1-6个碳原子的羟基烷基，羟基或氰基; Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A ^{+ 代表有机抗衡离子; Y表示羟基，氰基或甲氧基; 并且n表示1或2.本发明还提供包含式（I）的盐的化学放大抗蚀剂组合物。}

9. 发明申请

US20070027336A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20070027336A1
公开(公告)日：2007-02-01
申请号：US11390319
申请日：2006-03-28
申请人： Isao Yoshida , Yukako Harada , Satoshi Yamaguchi , Nobuo Ando
发明人： Isao Yoshida , Yukako Harada , Satoshi Yamaguchi , Nobuo Ando
IPC分类号： C07C309/51
CPC分类号： C07C309/17 , C07C2603/74
摘要： The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).
摘要翻译：本发明提供式（L）的盐式（L）的盐：其中Q表示-CO-基或-C（OH） - 基; 环X表示当Q为-C（OH） - 基团或其中两个氢原子被≡O基团取代时，其中氢原子被Q位羟基取代的具有3-30个碳原子的单环或多环烃基在Q为-CO-基的Q位置，单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基，具有1至6个碳原子的烷氧基，具有1至6个碳原子的烷氧基， 1至4个碳原子，具有1至6个碳原子的羟基烷基，羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。本发明还提供了包含式（L）的盐的化学放大抗蚀剂组合物。

10. 发明授权

US08124803B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
公开(公告)号：US08124803B2
公开(公告)日：2012-02-28
申请号：US11390319
申请日：2006-03-28
申请人： Isao Yoshida , Yukako Harada , Satoshi Yamaguchi , Nobuo Ando
发明人： Isao Yoshida , Yukako Harada , Satoshi Yamaguchi , Nobuo Ando
IPC分类号： C07C309/19
CPC分类号： C07C309/17 , C07C2603/74
摘要： The present invention provides a salt of the formula (L)A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ═O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).
摘要翻译：本发明提供式（L）的盐式（L）的盐：其中Q表示-CO-基或-C（OH） - 基; 环X表示具有3〜30个碳原子的单环或多环烃基，其中当Q为-C（OH） - 基时，其中氢原子被Q位上的羟基取代，或其中两个氢原子被取代为= 在Q为-CO-基的Q位置，单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基，具有1至6个碳原子的烷氧基，具有1至6个碳原子的烷氧基， 1至4个碳原子，具有1至6个碳原子的羟基烷基，羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1〜6个碳原子的全氟烷基; 而A +代表有机抗衡离子。本发明还提供了包含式（L）的盐的化学放大抗蚀剂组合物。

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