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1. 发明授权

US08546059B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08546059B2
公开(公告)日：2013-10-01
申请号：US12953606
申请日：2010-11-24
申请人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
发明人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and Rc6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子，可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和R c6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc4和Rc6键合彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc5和Rc7彼此键合形成烷二基。

2. 发明授权

US08003296B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08003296B2
公开(公告)日：2011-08-23
申请号：US12536386
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.
摘要翻译：本发明提供了一种化学放大阳性组合物，其包含：（A）包含具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液，但通过作用于酸，（B）包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基，Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1〜3的整数，n表示 0〜3的整数，侧链具有氟原子的结构单元和酸发生剂。

3. 发明申请

US20100167199A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 审中-公开
标题翻译：化学放大正电阻组合物
公开(公告)号：US20100167199A1
公开(公告)日：2010-07-01
申请号：US12641914
申请日：2009-12-18
申请人： Takayuki MIYAGAWA , Satoshi Yamamoto , Yusuke Fuji
发明人： Takayuki MIYAGAWA , Satoshi Yamamoto , Yusuke Fuji
IPC分类号： G03F7/004
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0397
摘要： A chemically amplified positive resist composition comprising: a resin comprising a structural unit having an acid-labile group in a side chain and an acid generator wherein the resin contains 40 to 90% by mole of the structural unit having an acid-labile group in a side chain based on all the structural units and the structural unit having an acid-labile group in a side chain contains a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, Z represents a single bond or —(CH2)k—CO—O—, k represents an integer of 1 to 4, R2 is independently in each occurrence a C1-C6 alkyl group, and m represents an integer of 0 to 14.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含：树脂，其包含在侧链中具有酸不稳定基团的结构单元和酸产生剂，其中所述树脂含有40-90％摩尔具有酸不稳定基团的结构单元，基于所有结构单元的侧链和在侧链中具有酸不稳定基团的结构单元含有由式（I）表示的结构单元：其中R 1表示氢原子或甲基，Z表示单键或 - （CH 2）k -CO-O-，k表示1〜4的整数，R 2在每次出现时独立地为C1-C6烷基，m表示0〜14的整数。

4. 发明申请

US20100010129A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20100010129A1
公开(公告)日：2010-01-14
申请号：US12490828
申请日：2009-06-24
申请人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
发明人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
IPC分类号： C08K5/42 , C08L37/00 , C08L55/00
CPC分类号： G03F7/0397 , G03F7/0046
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO— and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II): wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：本身在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱溶液的树脂（A），其包含具有侧链中的酸不稳定基团和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X1表示未取代或取代的具有-COO-和C3的C 3 -C 30环烃基表示1〜4的整数，由式（II）表示的结构单元构成的树脂（B）：其中R2表示氢原子，甲基或三氟甲基，酸产生剂。

5. 发明申请

US20090263742A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20090263742A1
公开(公告)日：2009-10-22
申请号：US12425759
申请日：2009-04-17
申请人： Yusuke FUJI , Junji SHIGEMATSU , Takayuki MIYAGAWA , Nobuo ANDO , Ichiki TAKEMOTO
发明人： Yusuke FUJI , Junji SHIGEMATSU , Takayuki MIYAGAWA , Nobuo ANDO , Ichiki TAKEMOTO
IPC分类号： G03F7/00
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中基于树脂（B）的总单元的结构单元（b1）的含量小于10摩尔％。

6. 发明授权

US07439006B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US07439006B2
公开(公告)日：2008-10-21
申请号：US11889353
申请日：2007-08-10
申请人： Isao Yoshida , Yukako Harada , Takayuki Miyagawa
发明人： Isao Yoshida , Yukako Harada , Takayuki Miyagawa
IPC分类号： G03F7/004 , C07C69/00
CPC分类号： G03F7/0045 , C07C309/17 , C07C381/12 , C07D307/93 , G03F7/0046 , G03F7/0392 , Y10S430/122
摘要： A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).
摘要翻译：由式（I）表示的盐：其中X表示C1-C12二价线性或支链烃基，Y表示可以被至少一个取代基取代的C 1 -C 30烃基，并且至少一个-CH- C1-C30烃基可以被-O-或-CO-取代，Q 1和Q 2各自独立地表示氟原子或C1-C6全氟烷基，A0 +表示有机抗衡离子。本发明还提供一种包含由上述式（I）表示的盐的化学放大抗蚀剂组合物。

7. 发明申请

US20050260525A1 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same 有权
标题翻译：化学扩增的正性抗蚀剂组合物，卤代酯衍生物及其制备方法
公开(公告)号：US20050260525A1
公开(公告)日：2005-11-24
申请号：US11123104
申请日：2005-05-06
申请人： Ichiki Takemoto , Kazuhiko Hashimoto , Takayuki Miyagawa
发明人： Ichiki Takemoto , Kazuhiko Hashimoto , Takayuki Miyagawa
IPC分类号： G03C1/492 , G03F7/004 , G03F7/039
CPC分类号： C08F220/26 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) at least one structural unit selected from the group consisting of structural units of the formulas (no and (V), (ii) a structural unit of the formula (I) and (iii) a structural unit of the formula (II), and (B) an acid generator. The present invention also provides a haloester derivative of the formula (XXI) and a process for producing the same.
摘要翻译：本发明提供了一种化学放大型正性抗蚀剂组合物，其包含（A）树脂，其包含（i）至少一种选自式（Ⅳ和Ⅴ）的结构单元的结构单元，（ii）结构单元式（I）和（iii）式（II）的结构单元和（B）酸产生剂，本发明还提供式（XXI）的卤代酯衍生物及其制备方法。

8. 发明申请

US20110123926A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20110123926A1
公开(公告)日：2011-05-26
申请号：US12953606
申请日：2010-11-24
申请人： Koji ICHIKAWA , Takayuki MIYAGAWA , Mitsuhiro HATA
发明人： Koji ICHIKAWA , Takayuki MIYAGAWA , Mitsuhiro HATA
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and RC6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子，可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和RC 6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或R c4和R c6键合彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc5和Rc7彼此键合形成烷二基。

9. 发明申请

US20090220890A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY 有权
标题翻译：化学放大抗蚀剂组合物和化学放大抗蚀剂组合物
公开(公告)号：US20090220890A1
公开(公告)日：2009-09-03
申请号：US12395963
申请日：2009-03-02
申请人： Mitsuhiro HATA , Yusuke Fuji , Takayuki Miyagawa
发明人： Mitsuhiro HATA , Yusuke Fuji , Takayuki Miyagawa
IPC分类号： G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041 , Y10S430/106 , Y10S430/111 , Y10S430/122
摘要： A chemically amplified resist composition, comprising: a resin which includes a structural unit having an acid-labile group in a side chain, a structural unit represented by the formula (I) and a structural unit having a polycyclic lactone structure, and which is soluble in an organic solvent and insoluble or poorly soluble in an alkali aqueous solution but rendered soluble in an alkali aqueous solution by the action of an acid; and an acid generator represented by the formula (II). wherein X1 represents a hydrogen atom, a C1 to C4 alkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, R1 to R4 independently represent a hydrogen atom, an alkyl group, etc., and A+ represents an organic counterion, E− represents CF3SO3—, C2F5SO3—, C4F9SO3—, etc., Y1 and Y2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group.
摘要翻译：一种化学放大抗蚀剂组合物，其包含：树脂，其包含在侧链中具有酸不稳定基团的结构单元，由式（I）表示的结构单元和具有多环内酯结构的结构单元，并且其是可溶的在有机溶剂中，不溶于或难溶于碱水溶液，但通过酸的作用可溶于碱水溶液; 和由式（II）表示的酸发生剂。其中X 1表示氢原子，C 1〜C 4烷基等，Y各自独立地表示氢原子或烷基，n表示1〜14的整数，R 1〜R 4分别表示氢原子，烷基等，A +表示有机抗衡离子，E表示CF 3 SO 3 - ，C 2 F 5 SO 3 - ，C 4 F 9 SO 3 - 等，Y 1和Y 2分别表示氟原子或C 1〜C 6全氟烷基。

10. 发明授权

US07423102B2 Star polymer 失效
标题翻译：星形聚合物
公开(公告)号：US07423102B2
公开(公告)日：2008-09-09
申请号：US11169790
申请日：2005-06-30
申请人： Youngjoon Lee , Yasuhiro Watanabe , Takayuki Miyagawa
发明人： Youngjoon Lee , Yasuhiro Watanabe , Takayuki Miyagawa
IPC分类号： C08F118/02
CPC分类号： G03F7/0397 , C08F293/005 , C08L53/00 , G03F7/0392 , C08L2666/02
摘要： The present invention provides a star polymer which comprises a central core and three or more branches bonded to the central core, and has a weight average molecular weight of from 1,000 to 100,000, wherein at least one of the branches containing at least one repeating unit selected from the group consisting of the following repeating units (1), (2), (3), (4) and (9); and a process for producing the star polymer. The present invention also provides a chemically amplified positive resist composition comprising the star polymer and an acid generator.
摘要翻译：本发明提供了一种星形聚合物，其包含中心核心和三个或更多个分枝键合至中心核心，并且具有1,000至100,000的重均分子量，其中至少一个分支含有至少一个重复单元选出由下列重复单元（1），（2），（3），（4）和（9）组成的组中; 以及星形聚合物的制造方法。本发明还提供了包含星形聚合物和酸产生剂的化学放大正性抗蚀剂组合物。

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