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1. 发明申请

US20100279226A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20100279226A1
公开(公告)日：2010-11-04
申请号：US12810793
申请日：2008-12-22
申请人： Mitsuhiro Hata , Yoshiyuki Takata , Satoshi Yamaguchi , Ichiki Takemoto , Takayuki Miyagawa , Yusuke Fuji
发明人： Mitsuhiro Hata , Yoshiyuki Takata , Satoshi Yamaguchi , Ichiki Takemoto , Takayuki Miyagawa , Yusuke Fuji
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： H01L21/0275 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.
摘要翻译：本发明的目的是提供一种制造抗蚀剂图案的方法，其中可以形成极细和高精度的抗蚀剂图案，该抗蚀剂图案是使用多图案化方法中形成第一抗蚀剂图案的抗蚀剂组合物获得的，双重图案化方法抗蚀剂处理方法包括：通过将第一抗蚀剂组合物施加到基材上并干燥来形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含树脂（A），光酸产生剂（B）和交联剂（C），树脂（A）具有酸不稳定基团，在碱性水溶液中不溶或难溶，但通过酸的作用使其溶于碱水溶液中; 预烘烤曝光处理; 曝光后烘烤; 发展; 硬烘烤第一抗蚀剂图案; 得到第二抗蚀膜; 预烘烤; 曝光处理; 曝光后烘烤; 显影以获得第二抗蚀剂图案。

2. 发明授权

US08057983B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08057983B2
公开(公告)日：2011-11-15
申请号：US12425942
申请日：2009-04-17
申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
发明人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

3. 发明授权

US08062830B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08062830B2
公开(公告)日：2011-11-22
申请号：US12425759
申请日：2009-04-17
申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
发明人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中基于树脂（B）的总单元的结构单元（b1）的含量小于10摩尔％。

4. 发明申请

US20090269695A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20090269695A1
公开(公告)日：2009-10-29
申请号：US12425942
申请日：2009-04-17
申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
发明人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

5. 发明申请

US20090220890A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY 有权
标题翻译：化学放大抗蚀剂组合物和化学放大抗蚀剂组合物
公开(公告)号：US20090220890A1
公开(公告)日：2009-09-03
申请号：US12395963
申请日：2009-03-02
申请人： Mitsuhiro HATA , Yusuke Fuji , Takayuki Miyagawa
发明人： Mitsuhiro HATA , Yusuke Fuji , Takayuki Miyagawa
IPC分类号： G03F7/039 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041 , Y10S430/106 , Y10S430/111 , Y10S430/122
摘要： A chemically amplified resist composition, comprising: a resin which includes a structural unit having an acid-labile group in a side chain, a structural unit represented by the formula (I) and a structural unit having a polycyclic lactone structure, and which is soluble in an organic solvent and insoluble or poorly soluble in an alkali aqueous solution but rendered soluble in an alkali aqueous solution by the action of an acid; and an acid generator represented by the formula (II). wherein X1 represents a hydrogen atom, a C1 to C4 alkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, R1 to R4 independently represent a hydrogen atom, an alkyl group, etc., and A+ represents an organic counterion, E− represents CF3SO3—, C2F5SO3—, C4F9SO3—, etc., Y1 and Y2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group.
摘要翻译：一种化学放大抗蚀剂组合物，其包含：树脂，其包含在侧链中具有酸不稳定基团的结构单元，由式（I）表示的结构单元和具有多环内酯结构的结构单元，并且其是可溶的在有机溶剂中，不溶于或难溶于碱水溶液，但通过酸的作用可溶于碱水溶液; 和由式（II）表示的酸发生剂。其中X 1表示氢原子，C 1〜C 4烷基等，Y各自独立地表示氢原子或烷基，n表示1〜14的整数，R 1〜R 4分别表示氢原子，烷基等，A +表示有机抗衡离子，E表示CF 3 SO 3 - ，C 2 F 5 SO 3 - ，C 4 F 9 SO 3 - 等，Y 1和Y 2分别表示氟原子或C 1〜C 6全氟烷基。

6. 发明授权

US08062829B2 Chemically amplified resist composition and chemically amplified resist composition for immersion lithography 有权
标题翻译：用于浸没光刻的化学放大抗蚀剂组合物和化学放大抗蚀剂组合物
公开(公告)号：US08062829B2
公开(公告)日：2011-11-22
申请号：US12395963
申请日：2009-03-02
申请人： Mitsuhiro Hata , Yusuke Fuji , Takayuki Miyagawa
发明人： Mitsuhiro Hata , Yusuke Fuji , Takayuki Miyagawa
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2041 , Y10S430/106 , Y10S430/111 , Y10S430/122
摘要： A chemically amplified resist composition, comprising: a resin which includes a structural unit having an acid-labile group in a side chain, a structural unit represented by the formula (I) and a structural unit having a polycyclic lactone structure, and which is soluble in an organic solvent and insoluble or poorly soluble in an alkali aqueous solution but rendered soluble in an alkali aqueous solution by the action of an acid; and an acid generator represented by the formula (II). wherein X1 represents a hydrogen atom, a C1 to C4 alkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, R1 to R4 independently represent a hydrogen atom, an alkyl group, etc., and A+ represents an organic counterion, E− represents CF3SO3—, C2F5SO3—, C4F9SO3—, etc., Y1 and Y2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group.
摘要翻译：一种化学放大抗蚀剂组合物，其包含：树脂，其包含在侧链中具有酸不稳定基团的结构单元，由式（I）表示的结构单元和具有多环内酯结构的结构单元，并且其是可溶的在有机溶剂中，不溶于或难溶于碱水溶液，但通过酸的作用可溶于碱水溶液; 和由式（II）表示的酸发生剂。其中X 1表示氢原子，C 1〜C 4烷基等，Y各自独立地表示氢原子或烷基，n表示1〜14的整数，R 1〜R 4分别表示氢原子，烷基等，A +表示有机抗衡离子，E表示CF 3 SO 3 - ，C 2 F 5 SO 3 - ，C 4 F 9 SO 3 - 等，Y 1和Y 2分别表示氟原子或C 1〜C 6全氟烷基。

7. 发明授权

US07232642B2 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same 有权
标题翻译：化学扩增的正性抗蚀剂组合物，卤代酯衍生物及其制备方法
公开(公告)号：US07232642B2
公开(公告)日：2007-06-19
申请号：US11123104
申请日：2005-05-06
申请人： Ichiki Takemoto , Kazuhiko Hashimoto , Takayuki Miyagawa
发明人： Ichiki Takemoto , Kazuhiko Hashimoto , Takayuki Miyagawa
IPC分类号： G03F7/004
CPC分类号： C08F220/26 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) at least one structural unit selected from the group consisting of structural units of the formulas (no and (V), (ii) a structural unit of the formula (I) and (iii) a structural unit of the formula (II), and (B) an acid generator. The present invention also provides a haloester derivative of the formula (XXI) and a process for producing the same
摘要翻译：本发明提供了一种化学放大型正性抗蚀剂组合物，其包含（A）树脂，其包含（i）至少一种选自式（Ⅳ和Ⅴ）的结构单元的结构单元，（ii）结构单元式（I）和（iii）式（II）的结构单元和（B）酸产生剂，本发明还提供式（XXI）的卤代酯衍生物及其制备方法

8. 发明申请

US20050260525A1 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same 有权
标题翻译：化学扩增的正性抗蚀剂组合物，卤代酯衍生物及其制备方法
公开(公告)号：US20050260525A1
公开(公告)日：2005-11-24
申请号：US11123104
申请日：2005-05-06
申请人： Ichiki Takemoto , Kazuhiko Hashimoto , Takayuki Miyagawa
发明人： Ichiki Takemoto , Kazuhiko Hashimoto , Takayuki Miyagawa
IPC分类号： G03C1/492 , G03F7/004 , G03F7/039
CPC分类号： C08F220/26 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) at least one structural unit selected from the group consisting of structural units of the formulas (no and (V), (ii) a structural unit of the formula (I) and (iii) a structural unit of the formula (II), and (B) an acid generator. The present invention also provides a haloester derivative of the formula (XXI) and a process for producing the same.
摘要翻译：本发明提供了一种化学放大型正性抗蚀剂组合物，其包含（A）树脂，其包含（i）至少一种选自式（Ⅳ和Ⅴ）的结构单元的结构单元，（ii）结构单元式（I）和（iii）式（II）的结构单元和（B）酸产生剂，本发明还提供式（XXI）的卤代酯衍生物及其制备方法。

9. 发明授权

US07556908B2 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same 有权
标题翻译：化学扩增正性抗蚀剂组合物，（甲基）丙烯酸酯衍生物及其制备方法
公开(公告)号：US07556908B2
公开(公告)日：2009-07-07
申请号：US11110763
申请日：2005-04-21
申请人： Ichiki Takemoto , Isao Yoshida , Takayuki Miyagawa
发明人： Ichiki Takemoto , Isao Yoshida , Takayuki Miyagawa
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027 , C23F1/00
CPC分类号： C08F220/18 , C07C69/73 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/33 , C08F220/28 , G03F7/0046 , G03F7/0397 , Y10S430/115 , Y10S430/122
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) a structural unit of the formula (I) and (ii) at least one structural unit selected from the group consisting of structural units of the formulas (II), (O/II), (IV) and (V) and (B) an acid generator. The present invention further provides a novel monomers useful for the resist composition, and process for the monomers and the compositions.
摘要翻译：本发明提供了一种化学放大正性抗蚀剂组合物，其包含（A）树脂，其包含（i）式（I）的结构单元和（ii）至少一种选自下列结构单元的结构单元：式（II），（O / II），（IV）和（V）和（B）酸产生剂。本发明还提供了可用于抗蚀剂组合物的新单体，以及单体和组合物的方法。

10. 发明申请

US20050266351A1 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same 有权
标题翻译：化学扩增正性抗蚀剂组合物，（甲基）丙烯酸酯衍生物及其制备方法
公开(公告)号：US20050266351A1
公开(公告)日：2005-12-01
申请号：US11110763
申请日：2005-04-21
申请人： Ichiki Takemoto , Isao Yoshida , Takayuki Miyagawa
发明人： Ichiki Takemoto , Isao Yoshida , Takayuki Miyagawa
IPC分类号： G03F7/039 , C07C69/00 , C07C69/67 , C07D307/33 , C08F20/10 , C08F220/18 , C08F220/28 , G03C5/00 , G03F7/004 , H01L21/027
CPC分类号： C08F220/18 , C07C69/73 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/33 , C08F220/28 , G03F7/0046 , G03F7/0397 , Y10S430/115 , Y10S430/122
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) a structural unit of the formula (I) and (ii) at least one structural unit selected from the group consisting of structural units of the formulas (II), (III), (IV) and (V) and (B) an acid generator. The present invention further provides a novel monomers useful for the resist composition, and process for the monomers and the compositions.
摘要翻译：本发明提供了一种化学放大正性抗蚀剂组合物，其包含（A）树脂，其包含（i）式（I）的结构单元和（ii）至少一种选自下列结构单元的结构单元：式（II），（III），（IV）和（V）和（B）酸产生剂。本发明还提供了可用于抗蚀剂组合物的新型单体，以及单体和组合物的方法。

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