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    • 6. 发明授权
    • Manufacturing apparatus of magnetoresistance elements
    • 磁阻元件制造装置
    • US07731825B2
    • 2010-06-08
    • US11161981
    • 2005-08-24
    • Toru KitadaNaoki WatanabeShinji TakagiShinji Furukawa
    • Toru KitadaNaoki WatanabeShinji TakagiShinji Furukawa
    • C25B9/00C25B11/00C25B13/00C23C14/00
    • H01L43/12B82Y25/00B82Y40/00C23C14/228C23C14/35H01F41/18H01F41/302
    • A manufacturing method of a magnetoresistance element having a pinned magnetic layer, a non-magnetic intermediate layer, and a free magnetic layer, the method includes forming at least one thin film of the non-magnetic intermediate layer and the free magnetic layer at a pressure of 8.0×10−3 Pa or less in the vicinity of a substrate using a sputtering apparatus. The apparatus includes a vacuum chamber in which a cathode and a substrate holder are arranged, a first exhausting apparatus connected to an exhausting port of the vacuum chamber, a gas introduction mechanism to introduce a gas toward the target, a first pressure regulator to cause a pressure difference between a target space and a center space outside the target space, a second pressure regulator to cause a pressure difference between the center space and a substrate space, and a second exhausting apparatus to exhaust the center space.
    • 一种具有钉扎磁性层,非磁性中间层和自由磁性层的磁阻元件的制造方法,所述方法包括在压力下形成至少一个非磁性中间层和自由磁性层的薄膜 在使用溅射装置的基板附近为8.0×10 -3 Pa以下。 该装置包括:真空室,其中布置有阴极和基板保持器;第一排气装置,连接到真空室的排气口;气体导入机构,用于将气体引向目标;第一压力调节器, 目标空间与目标空间外的中心空间之间的压力差,使中心空间与基板空间之间产生压力差的第二压力调节器,以及排出中心空间的第二排气装置。
    • 7. 发明申请
    • Film forming apparatus
    • 成膜装置
    • US20050115830A1
    • 2005-06-02
    • US10957864
    • 2004-10-04
    • Shinji FurukawaMasahiro Shibamoto
    • Shinji FurukawaMasahiro Shibamoto
    • B65G49/07C23C14/32C23C14/56C23C16/00C23C16/44C23C16/54G11B5/85H01L21/306H01L21/673H01L21/677H01L21/68
    • C23C14/564C23C14/568C23C16/54
    • The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.
    • 本发明提供了一种多层膜形成装置,其包括:基板保持架储存室,用于与多膜成形装置中的路径分开地存储多个基板保持器,从而可以进行生产而不受去除膜的处理 积聚在基板保持器的表面上,更换基板保持器的过程,或者通过除去积聚在基板保持器的表面上的膜或更换基板保持器的过程,因此可以进行高通量生产 。 在多层膜形成装置的路径上设置分支路径,并且设置用于存储多个基板保持件的基板保持架存放室,该基板保持器能够使基板保持器从路径中回收并且将基板保持器馈送到路径 。