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1. 发明授权

US07731825B2 Manufacturing apparatus of magnetoresistance elements 有权
标题翻译：磁阻元件制造装置
公开(公告)号：US07731825B2
公开(公告)日：2010-06-08
申请号：US11161981
申请日：2005-08-24
申请人： Toru Kitada , Naoki Watanabe , Shinji Takagi , Shinji Furukawa
发明人： Toru Kitada , Naoki Watanabe , Shinji Takagi , Shinji Furukawa
IPC分类号： C25B9/00 , C25B11/00 , C25B13/00 , C23C14/00
CPC分类号： H01L43/12 , B82Y25/00 , B82Y40/00 , C23C14/228 , C23C14/35 , H01F41/18 , H01F41/302
摘要： A manufacturing method of a magnetoresistance element having a pinned magnetic layer, a non-magnetic intermediate layer, and a free magnetic layer, the method includes forming at least one thin film of the non-magnetic intermediate layer and the free magnetic layer at a pressure of 8.0×10−3 Pa or less in the vicinity of a substrate using a sputtering apparatus. The apparatus includes a vacuum chamber in which a cathode and a substrate holder are arranged, a first exhausting apparatus connected to an exhausting port of the vacuum chamber, a gas introduction mechanism to introduce a gas toward the target, a first pressure regulator to cause a pressure difference between a target space and a center space outside the target space, a second pressure regulator to cause a pressure difference between the center space and a substrate space, and a second exhausting apparatus to exhaust the center space.
摘要翻译：一种具有钉扎磁性层，非磁性中间层和自由磁性层的磁阻元件的制造方法，所述方法包括在压力下形成至少一个非磁性中间层和自由磁性层的薄膜在使用溅射装置的基板附近为8.0×10 -3 Pa以下。该装置包括：真空室，其中布置有阴极和基板保持器;第一排气装置，连接到真空室的排气口;气体导入机构，用于将气体引向目标;第一压力调节器，目标空间与目标空间外的中心空间之间的压力差，使中心空间与基板空间之间产生压力差的第二压力调节器，以及排出中心空间的第二排气装置。

2. 发明申请

US20090139855A1 MANUFACTURING METHOD AND MANUFACTURING APPARATUS OF MAGNETORESISTANCE ELEMENTS 审中-公开
标题翻译：磁性元件的制造方法和制造装置
公开(公告)号：US20090139855A1
公开(公告)日：2009-06-04
申请号：US12273891
申请日：2008-11-19
申请人： Toru Kitada , Naoki Watanabe , Shinji Takagi , Shinji Furukawa
发明人： Toru Kitada , Naoki Watanabe , Shinji Takagi , Shinji Furukawa
IPC分类号： C23C14/34
CPC分类号： H01L43/12 , B82Y25/00 , B82Y40/00 , C23C14/228 , C23C14/35 , H01F41/18 , H01F41/302
摘要： A manufacturing method of a magnetoresistance element having a pinned magnetic layer, a non-magnetic intermediate layer, and a free magnetic layer, the method includes forming at least one thin film of the non-magnetic intermediate layer and the free magnetic layer at a pressure of 8.0×10−3 Pa or less in the vicinity of a substrate using a sputtering apparatus. The apparatus includes a vacuum chamber in which a cathode and a substrate holder are arranged, a first exhausting apparatus connected to an exhausting port of the vacuum chamber, a gas introduction mechanism to introduce a gas toward the target, a first pressure regulator to cause a pressure difference between a target space and a center space outside the target space, a second pressure regulator to cause a pressure difference between the center space and a substrate space, and a second exhausting apparatus to exhaust the center space.
摘要翻译：一种具有钉扎磁性层，非磁性中间层和自由磁性层的磁阻元件的制造方法，所述方法包括在压力下形成至少一个非磁性中间层和自由磁性层的薄膜在使用溅射装置的基板附近为8.0×10 -3 Pa以下。该装置包括：真空室，其中布置有阴极和基板保持器;第一排气装置，连接到真空室的排气口;气体导入机构，用于将气体引向目标;第一压力调节器，目标空间与目标空间外的中心空间之间的压力差，使中心空间与基板空间之间产生压力差的第二压力调节器，以及排出中心空间的第二排气装置。

3. 发明申请

US20060060466A1 Manufacturing Method And Manufacturing Apparatus Of Magnetoresistance Elements 有权
标题翻译：磁阻元件的制造方法和制造装置
公开(公告)号：US20060060466A1
公开(公告)日：2006-03-23
申请号：US11161981
申请日：2005-08-24
申请人： Toru Kitada , Naoki Watanabe , Shinji Takagi , Shinji Furukawa
发明人： Toru Kitada , Naoki Watanabe , Shinji Takagi , Shinji Furukawa
IPC分类号： C23C14/00 , C23C14/32
CPC分类号： H01L43/12 , B82Y25/00 , B82Y40/00 , C23C14/228 , C23C14/35 , H01F41/18 , H01F41/302
摘要： A manufacturing method of a magnetoresistance element having a pinned magnetic layer, a non-magnetic intermediate layer, and a free magnetic layer, the method includes forming at least one thin film of the non-magnetic intermediate layer and the free magnetic layer at a pressure of 8.0×10−3 Pa or less in the vicinity of a substrate using a sputtering apparatus. The apparatus includes a vacuum chamber in which a cathode and a substrate holder are arranged, a first exhausting apparatus connected to an exhausting port of the vacuum chamber, a gas introduction mechanism to introduce a gas toward the target, a first pressure regulator to cause a pressure difference between a target space and a center space outside the target space, a second pressure regulator to cause a pressure difference between the center space and a substrate space, and a second exhausting apparatus to exhaust the center space.
摘要翻译：一种具有钉扎磁性层，非磁性中间层和自由磁性层的磁阻元件的制造方法，所述方法包括在压力下形成至少一个非磁性中间层和自由磁性层的薄膜使用溅射装置在基板附近的8.0×10 -3 Pa以下。该装置包括：真空室，其中布置有阴极和基板保持器;第一排气装置，连接到真空室的排气口;气体导入机构，用于将气体引向目标;第一压力调节器，目标空间与目标空间外的中心空间之间的压力差，使中心空间与基板空间之间产生压力差的第二压力调节器，以及排出中心空间的第二排气装置。

4. 发明授权

US07824497B2 Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus 有权
标题翻译：用于制造磁记录盘的设备和在线型衬底处理设备
公开(公告)号：US07824497B2
公开(公告)日：2010-11-02
申请号：US12037021
申请日：2008-02-25
申请人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
发明人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
IPC分类号： C23C16/00 , C23C14/00
CPC分类号： C23C14/352 , C23C14/50 , C23C14/568 , C23C16/26 , G11B5/84 , G11B5/8408 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/14 , Y10S414/141
摘要： An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.
摘要翻译：一种用于制造磁记录盘的设备包括：磁性沉积室，其中用于记录层的磁性膜沉积在基底上; 在真空中在基板上制备润滑剂层的润滑剂层制备室; 以及清洁室，其中在磁膜沉积后在真空中清洁基板，并且在润滑剂层室中的润滑剂层制备之前。该设备还可以包括将基板从清洁室转移到润滑剂层制备室而不将基板暴露于大气的转移系统。

5. 发明授权

US06572934B2 Method for manufacturing a magnetic recording disk 有权
标题翻译：磁记录盘的制造方法
公开(公告)号：US06572934B2
公开(公告)日：2003-06-03
申请号：US09774887
申请日：2001-02-01
申请人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
发明人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
IPC分类号： C23C1402
CPC分类号： C23C14/352 , C23C14/50 , C23C14/568 , C23C16/26 , G11B5/84 , G11B5/8408 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/14 , Y10S414/141
摘要： In manufacturing a magnetic recording disk, a magnetic film for a recording layer is deposited on a substrate of the magnetic recording disk in a magnetic-film deposition chamber, and the substrate is transferred from the magnetic-film deposition chamber to a lubricant-layer preparation chamber without exposing the substrate to the atmosphere. Then, a lubricant layer is prepared on the substrate in the lubricant-layer preparation chamber.
摘要翻译：在制造磁记录盘时，在磁性成膜室中将用于记录层的磁性膜沉积在磁记录盘的基板上，并且将基板从磁膜沉积室转移到润滑剂层制备不将基板暴露在大气中。然后，在润滑层制备室中的基板上制备润滑剂层。

6. 发明授权

US06740209B2 Multilayer film deposition apparatus, and method and apparatus for manufacturing perpendicular-magnetic-recording media 有权
标题翻译：多层成膜装置以及用于制造垂直磁记录介质的方法和装置
公开(公告)号：US06740209B2
公开(公告)日：2004-05-25
申请号：US10205604
申请日：2002-07-26
申请人： Masahiro Shibamoto , Shinji Furukawa , Tetsuya Endoh , Miho Sakai , Naoki Watanabe
发明人： Masahiro Shibamoto , Shinji Furukawa , Tetsuya Endoh , Miho Sakai , Naoki Watanabe
IPC分类号： C23C1434
CPC分类号： H01J37/3429 , C23C14/352 , C23C14/505 , H01J37/3408
摘要： This application discloses a multi-layer film deposition apparatus comprising; plural cathodes comprising targets respectively, a main rotation mechanism for rotating each cathode together, and a substrate holder to hold a substrate onto which a multi-layer film is deposited by sputtering. The targets are arranged at positions where their center axes are on a circumference. The main rotation mechanism rotates the cathodes around the axis in common to the circumference. The substrate is located at a position within an area in view to the direction of the axis. The area is formed of two loci of points on the rotated targets. One of the locus is drawn by the point nearest to the axis, and the other locus is drawn by the point furthest from the axis.
摘要翻译：本申请公开了一种多层成膜装置，包括：分别包括靶的多个阴极，用于将每个阴极一起旋转的主旋转机构和用于保持通过溅射沉积多层膜的基板的基板保持器。目标被布置在其中心轴在圆周上的位置。主旋转机构将阴极围绕轴线共同旋转到圆周。基板位于与轴线方向相对的区域内的位置。该区域由旋转目标上的两个点组成。其中一个轨迹由最靠近轴的点绘制，另一个轨迹由距离轴最远的点绘制。

7. 发明申请

US20090011140A1 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus 有权
公开(公告)号：US20090011140A1
公开(公告)日：2009-01-08
申请号：US12202813
申请日：2008-09-02
申请人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
发明人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
IPC分类号： B05D3/06 , B05D5/00
CPC分类号： C23C14/352 , C23C14/50 , C23C14/568 , C23C16/26 , G11B5/84 , G11B5/8408 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/14 , Y10S414/141
摘要： An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.

8. 发明授权

US08932438B2 Method of manufacturing magnetoresistive element, sputter deposition chamber, apparatus for manufacturing magnetoresistive element having sputter deposition chamber, program and storage medium 有权
标题翻译：制造磁阻元件的方法，溅射沉积室，用于制造具有溅射沉积室的磁阻元件的装置，程序和存储介质
公开(公告)号：US08932438B2
公开(公告)日：2015-01-13
申请号：US12972823
申请日：2010-12-20
申请人： Koji Tsunekawa , Hiroyuki Hosoya , Yoshinori Nagamine , Shinji Furukawa , Naoki Watanabe
发明人： Koji Tsunekawa , Hiroyuki Hosoya , Yoshinori Nagamine , Shinji Furukawa , Naoki Watanabe
IPC分类号： C23C14/34 , G11B5/39 , B82Y10/00 , B82Y25/00 , B82Y40/00 , C23C14/14 , C23C14/22 , G01R33/09 , H01F10/32 , H01F41/18 , H01F41/30 , H01L43/12 , G11B5/31
CPC分类号： G11B5/3909 , B82Y10/00 , B82Y25/00 , B82Y40/00 , C23C14/14 , C23C14/225 , C23C14/3464 , G01R33/093 , G01R33/098 , G11B5/3163 , G11B5/3903 , G11B2005/3996 , H01F10/325 , H01F10/3254 , H01F10/3272 , H01F41/18 , H01F41/302 , H01L43/12
摘要： The magnetic anisotropy of a magnetic layer in a spin valve tunnel magnetoresistive element or giant magnetoresistive element is enhanced. Deposition of the magnetic layer is performed by making sputtering particles obliquely incident on a substrate from a certain incident direction at a certain incident angle.
摘要翻译：自旋阀隧道磁阻元件或巨磁阻元件中的磁性层的磁各向异性增强。通过使溅射粒子以一定的入射角从特定的入射方向倾斜入射到基板上来进行磁性层的沉积。

9. 发明授权

US08147924B2 Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus 有权
标题翻译：磁记录盘的制造方法
公开(公告)号：US08147924B2
公开(公告)日：2012-04-03
申请号：US12202813
申请日：2008-09-02
申请人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
发明人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
IPC分类号： B05D3/00 , G11B5/74 , C25B13/00
CPC分类号： C23C14/352 , C23C14/50 , C23C14/568 , C23C16/26 , G11B5/84 , G11B5/8408 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/14 , Y10S414/141
摘要： An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.
摘要翻译：一种用于制造磁记录盘的设备包括：磁性沉积室，其中用于记录层的磁性膜沉积在基底上; 在真空中在基板上制备润滑剂层的润滑剂层制备室; 以及清洁室，其中在磁膜沉积后在真空中清洁基板，并且在润滑剂层室中的润滑剂层制备之前。该设备还可以包括将基板从清洁室转移到润滑剂层制备室而不将基板暴露于大气的转移系统。

10. 发明申请

US20110139606A1 METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT, SPUTTER DEPOSITION CHAMBER, APPARATUS FOR MANUFACTURING MAGNETORESISTIVE ELEMENT HAVING SPUTTER DEPOSITION CHAMBER, PROGRAM AND STORAGE MEDIUM 有权
标题翻译：制造磁性元件，溅射沉积室的方法，用于制造具有溅射沉积室的磁性元件的装置，程序和存储介质
公开(公告)号：US20110139606A1
公开(公告)日：2011-06-16
申请号：US12972823
申请日：2010-12-20
申请人： Koji TSUNEKAWA , Hiroyuki Hosoya , Yoshinori Nagamine , Shinji Furukawa , Naoki Watanabe
发明人： Koji TSUNEKAWA , Hiroyuki Hosoya , Yoshinori Nagamine , Shinji Furukawa , Naoki Watanabe
IPC分类号： C23C14/34 , C23C14/06
CPC分类号： G11B5/3909 , B82Y10/00 , B82Y25/00 , B82Y40/00 , C23C14/14 , C23C14/225 , C23C14/3464 , G01R33/093 , G01R33/098 , G11B5/3163 , G11B5/3903 , G11B2005/3996 , H01F10/325 , H01F10/3254 , H01F10/3272 , H01F41/18 , H01F41/302 , H01L43/12
摘要： The magnetic anisotropy of a magnetic layer in a spin valve tunnel magnetoresistive element or giant magnetoresistive element is enhanced. Deposition of the magnetic layer is performed by making sputtering particles obliquely incident on a substrate from a certain incident direction at a certain incident angle.
摘要翻译：自旋阀隧道磁阻元件或巨磁阻元件中的磁性层的磁各向异性增强。通过使溅射粒子以一定的入射角从特定的入射方向倾斜入射到基板上来进行磁性层的沉积。

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