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1. 发明授权

US06885430B2 System and method for resetting a reaction mass assembly of a stage assembly 失效
标题翻译：用于复位舞台组件的反作用质量组件的系统和方法
公开(公告)号：US06885430B2
公开(公告)日：2005-04-26
申请号：US10458373
申请日：2003-06-11
申请人： Keiichi Tanaka , Mike Binnard , Andrew J. Hazelton
发明人： Keiichi Tanaka , Mike Binnard , Andrew J. Hazelton
IPC分类号： G03B27/62 , G03F7/20 , G03B27/32 , G03B27/42 , G03B27/58
CPC分类号： G03F7/707 , G03B27/62 , G03F7/70708 , G03F7/70766 , G03F7/709
摘要： A stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. The control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. The timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly.
摘要翻译：舞台组件包括舞台基座，舞台，舞台动子组件，反作用组件，反作用动力组件和控制系统。平台移动器组件相对于舞台底座移动舞台。反应物料组件减少由载物台组件产生的反应力，这些反作用力被传递到载物台底部。反应动子组件调整反应物料组件相对于载物台的位置。控制系统以最小化由反应动子组件产生在舞台组件上的扰动的影响的方式来控制和引导电流到反应动子组件。改变来自引导到反应动子组件的控制系统的时间和/或电流量，以最小化由反应动子组件产生在舞台组件上的干扰的影响。

2. 发明授权

US06958808B2 System and method for resetting a reaction mass assembly of a stage assembly 失效
标题翻译：用于复位舞台组件的反作用质量组件的系统和方法
公开(公告)号：US06958808B2
公开(公告)日：2005-10-25
申请号：US10458384
申请日：2003-06-11
申请人： Keiichi Tanaka , Mike Binnard , Andrew J. Hazelton
发明人： Keiichi Tanaka , Mike Binnard , Andrew J. Hazelton
IPC分类号： G03B27/62 , G03F7/20 , G03B27/42 , G03B27/58
CPC分类号： G03B27/62 , G03F7/707 , G03F7/70708 , G03F7/70766 , G03F7/709
摘要： A stage assembly for moving and positioning a device is provided herein. The stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. Uniquely, the control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. More specifically, the timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly. With this design, the reaction mover assembly has less influence upon the position of the stage base. This allows for more accurate positioning of the device by the stage assembly and better performance of the stage assembly.
摘要翻译：本文提供了用于移动和定位设备的台架组件。舞台组件包括舞台基座，舞台，舞台推动器组件，反作用组件，反作用器组件和控制系统。平台移动器组件相对于舞台底座移动舞台。反应物料组件减少由载物台组件产生的反应力，这些反作用力被传递到载物台底部。反应动子组件调整反应物料组件相对于载物台的位置。独特地，控制系统以最小化由反应动子组件产生在舞台组件上的扰动的影响的方式来控制和引导电流到反应动子组件。更具体地，改变来自引导到反应动子组件的控制系统的时间和/或电流量，以最小化由反应动子组件产生在舞台组件上的干扰的影响。通过这种设计，反作用器组件对舞台底座的位置的影响较小。这允许通过平台组件更好地定位设备并且更好地实现舞台组件的性能。

3. 发明授权

US06882126B2 Holder mover for a stage assembly 失效
标题翻译：用于舞台组装的持有者
公开(公告)号：US06882126B2
公开(公告)日：2005-04-19
申请号：US09997144
申请日：2001-11-29
申请人： Douglas C. Watson , Mike Binnard , Andrew J. Hazelton , Martin E. Lee
发明人： Douglas C. Watson , Mike Binnard , Andrew J. Hazelton , Martin E. Lee
IPC分类号： B64C17/06 , G05B1/06
CPC分类号： B23Q1/623
摘要： A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20). Additionally, the stage assembly (10) can include a fluid connector (94) that connects the device holder (24) in fluid communication with the device table (20).
摘要翻译：用于移动和定位装置（26）的平台组件（10）包括装置台（20），保持装置（26）的装置保持器（24）和平台移动器组件（14）。台架组件（10）包括可以隔离设备保持器24和设备（26）不变形的一个或多个特征。在一些实施例中，台架组件（10）允许装置（26）在第一位置（42）和第二位置（44）之间精确地旋转，而不影响装置（26）的平坦度，并且不会使装置偏转和变形（26）。例如，台架组件（10）可以包括托架（60）和托架连接器组件（62）。载体（60）被支撑在装置台（20）上方并相对于装置台（20）旋转。支架连接器组件（62）将装置支架（24）连接到支架（60）上。此外，台架组件（10）可以包括相对于设备台（20）旋转设备保持器（24）的保持器移动器（120）。另外，台架组件（10）可以包括流体连接器（94），其连接与装置台（20）流体连通的装置保持器（24）。

4. 发明授权

US06593997B1 Stage assembly including a reaction assembly 失效
标题翻译：舞台组合包括反应组件
公开(公告)号：US06593997B1
公开(公告)日：2003-07-15
申请号：US09713911
申请日：2000-11-16
申请人： Doug Watson , Andrew J. Hazelton , Mike Binnard
发明人： Doug Watson , Andrew J. Hazelton , Mike Binnard
IPC分类号： G03B2742
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70716 , G03F7/70766
摘要： A stage assembly (10) for moving and positioning a device (26) is provided herein. The stage assembly (10) includes a stage base (12), a stage (14), a stage mover assembly (16), and a reaction assembly (18). The stage mover assembly (16) moves the stage (14) along an X axis and along a Y axis relative to the stage base (12). The reaction assembly (18) is coupled to the stage mover assembly (16). Uniquely, the reaction assembly (18) counteracts and reduces the reaction forces created by the stage mover assembly (16) in two degrees of freedom that are transferred to a reaction base (102). With this design, stage mover assembly (16) has less influence upon the position of the stage base (12). These features allow for more accurate positioning of the device (26) by the stage assembly (10) and better performance of the stage assembly (10).
摘要翻译：本文提供了用于移动和定位装置（26）的平台组件（10）。舞台组件（10）包括舞台基座（12），舞台（14），舞台推动器组件（16）和反作用组件（18）。台架动子组件（16）使台架（14）沿着X轴线并相对于舞台底座（12）沿着Y轴移动。反应组件（18）联接到载物台移动器组件（16）。独特地，反应组件（18）在转移到反应基体（102）的两个自由度上抵消并减少由载物台移动器组件（16）产生的反作用力。通过这种设计，平台移动器组件（16）对舞台底座（12）的位置的影响较小。这些特征允许通过平台组件（10）更准确地定位设备（26）并且使台架组件（10）具有更好的性能。

5. 发明授权

US06313550B1 Coil mounting and cooling system for an electric motor 失效
标题翻译：电动机的线圈安装和冷却系统
公开(公告)号：US06313550B1
公开(公告)日：2001-11-06
申请号：US09496839
申请日：2000-02-02
申请人： Mike Binnard , Andrew J. Hazelton
发明人： Mike Binnard , Andrew J. Hazelton
IPC分类号： H02K4100
CPC分类号： H02K41/031 , H02K9/197 , H02K2201/18
摘要： A coil assembly (14) used with a magnet assembly (12) for a linear or planar electric motor (10) is provided herein. The coil assembly (14) includes a plurality of coils (18) attached to a coil base (16) with a plurality of coil supports (22). The coil supports (22) secure the coils (18) to the coil base (16) with the coils (18) spaced apart from a first surface (23) of the coil base (16). As a result thereof, both sides (32), (34) of each coil (18) are exposed for cooling. Further, the coil supports (22) allow the coils (18) to expand laterally with minimal stress and thermal deformation. The coil assembly (14) can also include a plurality of spaced apart covers (62). Each cover (62) fits over one of the coils (18) and is secured to the coil base (16). A fluid (24) can be directed into a fluid passageway (58) around each coil (18) to cool each coil (18).
摘要翻译：本发明提供了一种与用于线性或平面电动机（10）的磁体组件（12）一起使用的线圈组件（14）。线圈组件（14）包括多个线圈（18），其连接到具有多个线圈支撑件（22）的线圈座（16）上。线圈支撑件（22）将线圈（18）固定到线圈座（16）上，线圈（18）与线圈座（16）的第一表面（23）间隔开。结果，每个线圈（18）的两侧（32），（34）被暴露以进行冷却。此外，线圈支撑件（22）允许线圈（18）以最小的应力和热变形横向膨胀。线圈组件（14）还可以包括多个间隔开的盖（62）。每个盖（62）装配在一个线圈（18）上并且固定到线圈座（16）上。流体（24）可被引导到围绕每个线圈（18）的流体通道（58）中以冷却每个线圈（18）。

6. 发明授权

US06757053B1 Stage assembly including a reaction mass assembly 失效
标题翻译：舞台组合包括反作用组件
公开(公告)号：US06757053B1
公开(公告)日：2004-06-29
申请号：US09714747
申请日：2000-11-16
申请人： Andrew J. Hazelton , Mike Binnard
发明人： Andrew J. Hazelton , Mike Binnard
IPC分类号： G03B2758
CPC分类号： G03F7/70733 , G03F7/70716 , G03F7/70725 , G03F7/70766
摘要： A stage assembly (10) for moving and positioning a device (26) is provided herein. The stage assembly (10) includes a stage base (12), a stage (14), a stage mover assembly (16), and a reaction mass assembly (18). The stage mover assembly (16) moves the stage (14) along an X axis and along a Y axis relative to the stage base (12). The reaction mass assembly (18) is coupled to the stage mover assembly (16). Uniquely, the reaction mass assembly (18) reduces the reaction forces created by the stage mover assembly (16) in three degrees of freedom that are transferred to the stage base (12). With this design, stage mover assembly (16) has less influence upon the position of the stage base (12). These features allow for more accurate positioning of the device (26) by the stage assembly (10) and better performance of the stage assembly (10).
摘要翻译：本文提供了用于移动和定位装置（26）的平台组件（10）。舞台组件（10）包括舞台底座（12），舞台（14），舞台推动器组件（16）和反作用组件（18）。台架动子组件（16）使台架（14）沿着X轴线并相对于舞台底座（12）沿着Y轴移动。反应质量组件（18）联接到载物台移动器组件（16）。独特地，反应物料组件（18）以三个自由度将由载物台移动器组件（16）产生的反作用力减小到传递到载物台基座（12）上。通过这种设计，平台移动器组件（16）对舞台底座（12）的位置的影响较小。这些特征允许通过平台组件（10）更准确地定位设备（26）并且使台架组件（10）具有更好的性能。

7. 发明授权

US06252234B1 Reaction force isolation system for a planar motor 有权
标题翻译：平面电机的反作用力隔离系统
公开(公告)号：US06252234B1
公开(公告)日：2001-06-26
申请号：US09134278
申请日：1998-08-14
申请人： Andrew J. Hazelton , Keiichi Tanaka , Yutaka Hayashi , Nobukazu Ito
发明人： Andrew J. Hazelton , Keiichi Tanaka , Yutaka Hayashi , Nobukazu Ito
IPC分类号： G01F2300
CPC分类号： G03F7/70358 , F16F15/02 , G03F7/70716 , G03F7/70758 , G03F7/70833 , G03F7/709
摘要： The present invention provides a structure for isolating the reaction forces generated by a planar motor. Specifically, the fixed portion of the reaction motor, which is subject to reaction forces, is structurally isolated from the rest of the system in which the planar motor is deployed. In accordance with one embodiment of the present invention, the fixed portion of the planar motor is separated from the rest of the system and coupled to ground. The rest of the system is isolated from ground by deploying vibration isolation means. Alternatively or in addition, the fixed portion of the planar motor may be structured to move (e.g., on bearings) in the presence of reaction forces, so as to absorb the reaction forces with its inertia. In a further embodiment of the present invention, the fixed portion of the planar motor and the article to be moved are supported by the same frame, with the fixed portion of the planar motor movable on bearings.
摘要翻译：本发明提供了用于隔离由平面电动机产生的反作用力的结构。具体地，反应电动机的受到反作用力的固定部分与其中布置有平面电动机的系统的其余部分结构地隔离。根据本发明的一个实施例，平面电动机的固定部分与系统的其余部分分离并耦合到地面。系统的其余部分通过部署隔振装置与地面隔离。或者或另外，平面电动机的固定部分可以被构造成在反作用力的存在下移动（例如，在轴承上），以便以其惯性吸收反作用力。在本发明的另一实施例中，平面电动机的固定部分和待移动的物品由相同的框架支撑，平面电动机的固定部分可在轴承上移动。

8. 发明授权

US06788385B2 Stage device, exposure apparatus and method 失效
标题翻译：舞台装置，曝光装置和方法
公开(公告)号：US06788385B2
公开(公告)日：2004-09-07
申请号：US10134607
申请日：2002-04-30
申请人： Keiichi Tanaka , Michael Binnard , Robert Martinek , Andrew J. Hazelton
发明人： Keiichi Tanaka , Michael Binnard , Robert Martinek , Andrew J. Hazelton
IPC分类号： G03B2742
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/70766 , G03F7/709
摘要： In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices. The above configuration of the stage device permits and restrains a change in attitude of each stage due to driving of the substrate table.
摘要翻译：在曝光装置的舞台装置中，第一级通过第一X轴电动机沿X轴方向驱动，同时由第一导杆一侧支撑，并且第二级在X轴上被驱动方向由第二X轴电机同时由第二引导杆一侧支撑。第一导杆和第二导杆通过Y轴线性电动机在Y轴方向上独立地驱动。在第一引导杆和第二引导杆彼此最靠近的状态下，与由第一引导杆支撑的一侧相对的第一级的端部设置在第二引导杆的上方，而第二引导杆的端部与由第二导杆支撑的一侧相对的台架放置在第一导杆的上方。第一和第二衬底台分别经由第一和第二微动驱动装置支撑在第一和第二级上方。舞台装置的上述构造允许并且抑制由于衬底台的驱动而引起的每一级的姿态变化。

9. 发明申请

US20120019792A1 Liquid jet and recovery system for immersion lithography 审中-公开
标题翻译：用于浸没光刻的液体喷射和回收系统
公开(公告)号：US20120019792A1
公开(公告)日：2012-01-26
申请号：US13200982
申请日：2011-10-06
申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.
摘要翻译：液浸光刻设备包括其上保持晶片的台。投影系统通过浸没液将图案图像投影到曝光区域，以露出台上的晶片。多个供应开口布置成围绕曝光区域，液体从曝光区域的上方供应。多个恢复开口被布置成围绕曝光区域，通过该曝光区域从曝光区域上方收集液体。选择供给开口的一部分，以便在台架移动的方向上将曝光区域前方的液体供给。

10. 发明授权

US07929111B2 Environmental system including a transport region for an immersion lithography apparatus 有权
标题翻译：环境系统包括浸没式光刻设备的传送区域
公开(公告)号：US07929111B2
公开(公告)日：2011-04-19
申请号：US11819447
申请日：2007-06-27
申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a mesh member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
摘要翻译：布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。该装置还包括液体收集系统，该液体收集系统包括具有网状构件的液体收集构件，通过该网状构件从与液体收集构件相对的物体的表面收集液体。

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