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    • 1. 发明授权
    • Reaction force isolation system for a planar motor
    • 平面电机的反作用力隔离系统
    • US06252234B1
    • 2001-06-26
    • US09134278
    • 1998-08-14
    • Andrew J. HazeltonKeiichi TanakaYutaka HayashiNobukazu Ito
    • Andrew J. HazeltonKeiichi TanakaYutaka HayashiNobukazu Ito
    • G01F2300
    • G03F7/70358F16F15/02G03F7/70716G03F7/70758G03F7/70833G03F7/709
    • The present invention provides a structure for isolating the reaction forces generated by a planar motor. Specifically, the fixed portion of the reaction motor, which is subject to reaction forces, is structurally isolated from the rest of the system in which the planar motor is deployed. In accordance with one embodiment of the present invention, the fixed portion of the planar motor is separated from the rest of the system and coupled to ground. The rest of the system is isolated from ground by deploying vibration isolation means. Alternatively or in addition, the fixed portion of the planar motor may be structured to move (e.g., on bearings) in the presence of reaction forces, so as to absorb the reaction forces with its inertia. In a further embodiment of the present invention, the fixed portion of the planar motor and the article to be moved are supported by the same frame, with the fixed portion of the planar motor movable on bearings.
    • 本发明提供了用于隔离由平面电动机产生的反作用力的结构。 具体地,反应电动机的受到反作用力的固定部分与其中布置有平面电动机的系统的其余部分结构地隔离。 根据本发明的一个实施例,平面电动机的固定部分与系统的其余部分分离并耦合到地面。 系统的其余部分通过部署隔振装置与地面隔离。 或者或另外,平面电动机的固定部分可以被构造成在反作用力的存在下移动(例如,在轴承上),以便以其惯性吸收反作用力。 在本发明的另一实施例中,平面电动机的固定部分和待移动的物品由相同的框架支撑,平面电动机的固定部分可在轴承上移动。
    • 5. 发明授权
    • Memory cell array
    • 存储单元阵列
    • US08094484B2
    • 2012-01-10
    • US12644851
    • 2009-12-22
    • Tsuyoshi TakahashiYutaka HayashiYuichiro MasudaShigeo FurutaMasatoshi Ono
    • Tsuyoshi TakahashiYutaka HayashiYuichiro MasudaShigeo FurutaMasatoshi Ono
    • G11C11/00
    • H01L27/24G11C13/00G11C13/0069G11C13/02G11C2013/0071G11C2013/009G11C2213/79
    • Disclosed is a memory cell array including word and first bit lines and second bit lines respectively connected to memory cells, wherein each memory cell includes a MOS transistor and switching element having first and second conductive layers and a gap in which a resistance value changes by applying a predetermined voltage, and data is written by specifying the first bit line to connect it to a ground, specifying the word line and supplying a write voltage to the second bit lines, and read by specifying the first bit line to connect it to the sense amplifier, specifying the word line and supplying a read voltage lower than the write voltage to the second bit lines, and the word line is specified when the word line voltage becomes a gate threshold value voltage or more and a sum of a drive voltage and the gate threshold value voltage or less.
    • 公开了一种存储单元阵列,包括分别连接到存储单元的单词和第一位线和第二位线,其中每个存储单元包括MOS晶体管和具有第一和第二导电层的开关元件以及通过施加电阻值而改变电阻值的间隙 通过指定第一位线将其连接到地,写入数据,指定字线并向第二位线提供写入电压,并通过指定第一位线将其连接到感测来读取 放大器,指定字线并将低于写入电压的读取电压提供给第二位线,并且当字线电压变为栅极阈值电压或更高时指定字线,并且驱动电压和 门极阈值电压以下。
    • 10. 发明授权
    • Field effect transistor formed on an insulating substrate and integrated circuit thereof
    • 形成在绝缘基板上的场效应晶体管及其集成电路
    • US07282763B2
    • 2007-10-16
    • US10228847
    • 2002-08-27
    • Yutaka HayashiHisashi HasegawaHiroaki TakasuJun Osanai
    • Yutaka HayashiHisashi HasegawaHiroaki TakasuJun Osanai
    • H01L29/94
    • H01L29/78615H01L29/42384H01L29/78645
    • A field effect transistor has an insulating substrate, a semiconductor thin film formed on the insulating substrate, and a gate insulating film formed on the semiconductor thin film. A first gate electrode is formed on the gate insulating film. A first region and a second region having a first conductivity type are formed on or in a surface of the semiconductor thin film on opposite sides of the first gate electrode in a length direction thereof. A third region having a second conductivity type opposite the first conductivity type is arranged on or in the semiconductor film side by side with the second region in a width direction of the first gate electrode. A conductive thin film is connected with the second region and the third region. A second gate electrode is formed on the gate insulating film along the second region. A fourth region having the first conductivity type is formed on or in the semiconductor film on an opposite side of the second region with respect to the second gate electrode. One of the first and the fourth regions is used as an output region according to a circuit operation and without application of a fixed bias potential to the third region.
    • 场效应晶体管具有绝缘基板,形成在绝缘基板上的半导体薄膜和形成在半导体薄膜上的栅极绝缘膜。 在栅极绝缘膜上形成第一栅电极。 在第一栅电极的长度方向的相对侧的半导体薄膜的表面上或表面上形成具有第一导电类型的第一区域和第二区域。 具有与第一导电类型相反的第二导电类型的第三区域与第一栅电极的宽度方向上的第二区域并排设置在半导体膜上或半导体膜中。 导电薄膜与第二区域和第三区域连接。 第二栅电极沿着第二区形成在栅极绝缘膜上。 具有第一导电类型的第四区域形成在第二区域的相对于第二栅电极的相反侧上或半导体膜中。 根据电路操作将第一和第四区域中的一个用作输出区域,并且不向第三区域施加固定的偏置电位。