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    • 4. 发明授权
    • Light modulation device
    • 调光装置
    • US4685763A
    • 1987-08-11
    • US902090
    • 1986-08-27
    • Kunio TadaYoshikazu NishiwakiShunji Matsuoka
    • Kunio TadaYoshikazu NishiwakiShunji Matsuoka
    • G02B6/12G02F1/015G02F1/025G02F1/313
    • G02F1/025G02F1/3133G02F2001/0151G02F2201/063G02F2202/101
    • A light modulation device according to the present invention comprises a substrate, a substrate layer, an optical waveguide layer, and buffer layers, in the order from the bottom upward, all formed of either n-type or p-type compound semiconductor crystal. In this light modulation device, in order to capture the light in the optical waveguide layer, the composition ratio of the compound semiconductor is so determined that refractive index is at least approximately 0.1% higher in the optical waveguide layer than in the substrate layer and in the buffer layers. Further, the carrier density is low in the optical waveguide layer and in the buffer layers so that the applied voltage is applied mainly to the optical waveguide layer. Because of such construction, the light modulation device according to the present invention is free from strict conditions required in an etching process, is small in absorption loss of light, and can be used as a component of monolithic optical integrated circuit.
    • 根据本发明的光调制装置,从底部向上依次包括基板,基板层,光波导层和缓冲层,全部由n型或p型化合物半导体晶体形成。 在这种光调制装置中,为了捕获光波导层中的光,化合物半导体的组成比被确定为在光波导层中的折射率比衬底层中的折射率高至少高0.1% 缓冲层。 此外,光波导层和缓冲层中的载流子密度低,使得施加的电压主要应用于光波导层。 由于这样的结构,本发明的光调制装置没有严格的蚀刻处理条件,光的吸收损耗小,可以作为单片光集成电路的一个部件使用。