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1. 发明授权

US07212225B2 Enhanced resolution image recording method and enhanced resolution image recording apparatus 失效
标题翻译：增强分辨率图像记录方法和增强分辨率图像记录装置
公开(公告)号：US07212225B2
公开(公告)日：2007-05-01
申请号：US10244469
申请日：2002-09-17
申请人： Katsuto Sumi , Daisuke Nakaya , Takeshi Fujii , Hiroshi Sunagawa , Koji Wada
发明人： Katsuto Sumi , Daisuke Nakaya , Takeshi Fujii , Hiroshi Sunagawa , Koji Wada
IPC分类号： B41J2/47
CPC分类号： B41J19/16 , B41J2/45 , B41J2/47
摘要： The image recording method and apparatus are used to record an image formed by a group of light source elements disposed in a two-dimensional manner corresponding to recording pixels on a recording medium. In the image recording method and apparatus, an image recording position on the recording medium by the group of light source elements is moved in a direction that contains a component in at least one of two-dimensional disposing directions of the group of light source elements during the recording while modulating, in response to the movement, each recording pixel of the group of light source elements in accordance with an image to be recorded to thereby record the image on the recording medium. The image recording position is moved in accordance with a set magnification for changing the resolution par recording pixel of the group of light source elements. Further, the image recording position is moved by giving a relative speed difference between the relative movement of the group of light source elements and the recording medium and the tracking of the relative movement made by the image recording position by the group of light source elements.
摘要翻译：图像记录方法和装置用于记录由对应于记录介质上的记录像素的二维方式设置的一组光源元件形成的图像。在图像记录方法和装置中，通过该光源元件组的记录介质上的图像记录位置在包含该组光源元件的二维布置方向中的至少一个中的分量的方向上移动记录，同时响应于移动，根据要记录的图像调制光源元件组的每个记录像素，从而将图像记录在记录介质上。根据用于改变光源元件组的分辨率参数记录像素的设定倍率移动图像记录位置。此外，通过在光源元件组和记录介质的相对移动之间相对速度差以及光源元件组对图像记录位置的相对运动的跟踪来移动图像记录位置。

2. 发明授权

US07126624B2 Image recording method and image recording apparatus 失效
公开(公告)号：US07126624B2
公开(公告)日：2006-10-24
申请号：US10188365
申请日：2002-07-03
申请人： Daisuke Nakaya , Koji Wada , Katsuto Sumi , Hiroshi Sunagawa
发明人： Daisuke Nakaya , Koji Wada , Katsuto Sumi , Hiroshi Sunagawa
IPC分类号： B41J2/47
CPC分类号： H04N1/047 , G06K15/1238 , H04N1/06 , H04N1/195 , H04N2201/02416 , H04N2201/0426 , H04N2201/0471 , H04N2201/0472 , H04N2201/04729 , H04N2201/04732 , H04N2201/04755 , H04N2201/04762 , H04N2201/04789 , H04N2201/04791
摘要： The image recording method and image recording apparatus synchronize phase of a light deflector with rotation of a drum in response to the drum start point detection signal generated each time the drum rotates once, expose the two-dimensional image of one frame formed by a group of light sources disposed two-dimensionally onto the recording medium while causing the image at rest on the recording medium relatively thereto, thereafter move the optical system in the auxiliary scanning direction by an integral multiple of a pixel pitch forming one frame as well as deflect an angle of the light deflector in the main scanning direction by one frame so as to expose the next frame and on for one rotation of the drum. When the position is dislocated in the auxiliary scanning direction at the time the recording medium is to be exposed in a subsequent one rotation of the drum, the method and apparatus correct the dislocation of the position in the auxiliary scanning direction by changing an auxiliary scanning movement speed in a non-exposure time zone between the previous and subsequent rotations of the drum.Accordingly, the method and apparatus can prevent the occurrence of streaked unevenness in the surface exposure and spiral exposure.

3. 发明授权

US06423964B1 Method and apparatus for adjusting amount of light in image exposure recording system 有权
公开(公告)号：US06423964B1
公开(公告)日：2002-07-23
申请号：US09802894
申请日：2001-03-12
申请人： Daisuke Nakaya , Akinori Hamana , Katsuto Sumi
发明人： Daisuke Nakaya , Akinori Hamana , Katsuto Sumi
IPC分类号： G01N2300
摘要： The amount of exposure to a light beam is coarsely adjusted by a coarse adjusting unit which has a wider adjustment range, and finely adjusted by a fine adjusting unit which has a narrower adjustment range but a higher adjustment accuracy. With the coarse and fine adjusting units, the amount of light of the light beam for recording an image can be adjusted to a nicety by a relatively inexpensive arrangement.

4. 发明授权

US07206013B2 Image recording apparatus, image forming method, and image forming apparatus 失效
标题翻译：图像记录装置，图像形成方法和图像形成装置
公开(公告)号：US07206013B2
公开(公告)日：2007-04-17
申请号：US10685649
申请日：2003-10-16
申请人： Katsuto Sumi , Akiko Ohno , Daisuke Nakaya , Yoshinori Katoh , Atsuko Shimizu , Hiroshi Matsuoka , Takayuki Uemura
发明人： Katsuto Sumi , Akiko Ohno , Daisuke Nakaya , Yoshinori Katoh , Atsuko Shimizu , Hiroshi Matsuoka , Takayuki Uemura
IPC分类号： B41J2/435
CPC分类号： H04N1/40037
摘要： The image recording apparatus scans a heat mode recording material with a light beam modulated in accordance with image information, to thereby record an image on the heat mode recording material. The apparatus includes an unit for generating a modulated signal, an unit for generating an additional signal at a timing of at least one of rising and falling of the modulated signal and a unit for generating a drive signal by adding the additional signal to the modulated. The image forming method and apparatus scan a photosensitive material with the light beam to record an image, and a power of the light beam is set to a power of a level at which a recording line width or a recording dot size, which is determined depending upon a threshold value for the photosensitive material to blacken, is substantially fixed even if defocus occurs.
摘要翻译：图像记录装置用根据图像信息调制的光束扫描加热模式记录材料，从而将图像记录在加热模式记录材料上。该装置包括用于产生调制信号的单元，用于在调制信号的上升和下降中的至少一个的定时产生附加信号的单元和用于通过将附加信号加到调制信号来产生驱动信号的单元。图像形成方法和装置用光束扫描感光材料以记录图像，并且将光束的功率设置为等于记录线宽度或记录点尺寸的电平，该记录线宽度或记录点尺寸取决于当感光材料变黑的阈值即使发生散焦也基本固定。

5. 发明申请

US20050206866A1 Exposure method and exposure system 失效
标题翻译：曝光方法和曝光系统
公开(公告)号：US20050206866A1
公开(公告)日：2005-09-22
申请号：US11020574
申请日：2004-12-27
申请人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
发明人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
IPC分类号： G02F1/13 , G02F1/136 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70283 , G03F7/70291 , G03F7/70791
摘要： Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.
摘要翻译：由空间光调制器调制的光被投影到感光材料上，感光材料以预定图案曝光。控制空间光调制器的作用，使得投射到感光材料上的光的量根据感光材料的一部分至少改变两个阶段。

6. 发明授权

US07253882B2 Exposure method and exposure system 失效
标题翻译：曝光方法和曝光系统
公开(公告)号：US07253882B2
公开(公告)日：2007-08-07
申请号：US11020574
申请日：2004-12-27
申请人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
发明人： Takao Ozaki , Takayuki Uemura , Yoji Okazaki , Norihisa Takada , Yuji Shimoyama , Daisuke Nakaya , Katsuto Sumi , Morimasa Sato , Mitsutoshi Tanaka
IPC分类号： G03B27/54
CPC分类号： G03F7/70283 , G03F7/70291 , G03F7/70791
摘要： Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.
摘要翻译：由空间光调制器调制的光被投影到感光材料上，感光材料以预定图案曝光。控制空间光调制器的作用，使得投射到感光材料上的光的量根据感光材料的一部分至少改变两个阶段。

7. 发明申请

US20050052980A1 Optical power adjusting method and apparatus 审中-公开
标题翻译：光功率调节方法及装置
公开(公告)号：US20050052980A1
公开(公告)日：2005-03-10
申请号：US10935088
申请日：2004-09-08
申请人： Atsuko Shimizu , Katsuto Sumi , Daisuke Nakaya
发明人： Atsuko Shimizu , Katsuto Sumi , Daisuke Nakaya
IPC分类号： G03F7/20 , G03B27/00 , G03B27/22 , G06K15/12 , G11B7/00
CPC分类号： G06K15/1214
摘要： An optical power adjusting method and apparatus for preventing unevenness of exposure of a photosensitive material arising from the difference in wavelength of the light beams. The relationship between the output value and wavelength of the light receiving section is stored in a storage section for a light beam that satisfies the relationship with respect to the optical power and wavelength required for exposing the photosensitive material at a predetermined exposure level. The correspondence between the laser beam emitting section and its wavelength is stored in another storage section. Each laser beam is received separately by the light receiving section, and the optical power of each laser beam is adjusted by the optical power adjusting section such that the output value of the light receiving section for each laser beam received separately satisfies the relationship between the output value and wavelength.
摘要翻译：一种光功率调节方法和装置，用于防止由于光束的波长差引起的感光材料的曝光不均匀。光接收部分的输出值和波长之间的关系被存储在用于光束的存储部分中，该光束满足关于以预定曝光水平曝光感光材料所需的光学功率和波长的关系。激光束发射部分与其波长之间的对应关系被存储在另一个存储部分中。每个激光束由光接收部分别接收，并且每个激光束的光功率由光功率调节部分调节，使得分别接收的每个激光束的光接收部分的输出值满足输出价值和波长。

8. 发明授权

US07050716B2 Exposure device 有权
标题翻译：曝光装置
公开(公告)号：US07050716B2
公开(公告)日：2006-05-23
申请号：US11009028
申请日：2004-12-13
申请人： Daisuke Nakaya , Takeshi Fujii , Yoshimitsu Kudoh
发明人： Daisuke Nakaya , Takeshi Fujii , Yoshimitsu Kudoh
IPC分类号： G03B41/00
CPC分类号： G03F9/7065 , G03F7/70275 , G03F7/70291 , G03F9/7084 , H05K1/0269 , H05K3/0008 , H05K3/0082 , H05K3/4644 , H05K3/4679 , H05K2201/09918 , H05K2203/166
摘要： In order to provide an exposure device by which aligning of an exposure pattern is realized when manufacturing a build up wiring board or the like, an exposure device which exposes a photosensitive material with a light beam modulated in accordance with image information comprising a reading section which reads a radioscopic image of a specific pattern provided on an inner layer of a laminated structure, and an aligning section which aligns an exposure position of the photosensitive material laminated on a surface of an outer layer of the laminated structure on the basis of the position information of the read radioscopic image of the specific pattern, is provided.
摘要翻译：为了提供一种曝光装置，通过该曝光装置可以在制造积层布线板等时实现曝光图案的对准;曝光装置，其用根据图像信息调制的光束曝光感光材料，该图像信息包括读取部分读取设置在层叠结构的内层上的特定图案的放射线图像，以及对准部，其基于位置信息对准层叠在层叠结构的外层的表面上的感光材料的曝光位置的特定图案的读取的放射线图像。

9. 发明授权

US07197201B2 Optical wiring substrate fabrication process and optical wiring substrate device 有权
标题翻译：光布线基板制造工艺和光布线基板装置
公开(公告)号：US07197201B2
公开(公告)日：2007-03-27
申请号：US10456965
申请日：2003-06-09
申请人： Daisuke Nakaya , Takeshi Fujii , Yoji Okazaki , Kazuhiko Nagano , Hiromi Ishikawa
发明人： Daisuke Nakaya , Takeshi Fujii , Yoji Okazaki , Kazuhiko Nagano , Hiromi Ishikawa
IPC分类号： G02B6/12
CPC分类号： G03F7/7005 , G02B6/136 , G02B6/138 , G02B2006/12104 , G03F7/70291 , G03F7/70391
摘要： An optical wiring substrate fabrication method capable of simple formation, by maskless exposure, of an inclined face shape at an end portion of a core layer structuring an optical waveguide. Using an exposure apparatus, image exposure is carried out with a light beam which is modulated by a spatial modulation element in accordance with image information. A predetermined area of a photosensitive material (a photoresist), which is coated on the core layer which is a material of the optical wiring substrate, is exposed by a light beam (UV) and patterned to form an etching mask. A region corresponding to the inclined face, which is to be formed at the end portion of the core layer, is exposed and patterned by the light beam, exposure amounts of which are controlled in accordance with the inclined form of the inclined face, such that an end portion of the etching mask has an inclined face structure. When the core layer is worked by etching using this etching mask, working of the core layer at the end portion of the core layer progresses in proportion to film thickness of the etching mask, and the inclined face is formed.
摘要翻译：一种光学布线基板的制造方法，其能够通过无掩模地曝光在构成光波导的芯层的端部处形成倾斜的表面形状。使用曝光装置，利用由空间调制元件根据图像信息调制的光束进行图像曝光。通过光束（UV）对作为光布线基板的材料的芯层上涂布的感光材料（光致抗蚀剂）的预定区域进行曝光并图案化以形成蚀刻掩模。对应于要形成在芯层的端部的倾斜面的区域被光束曝光和图案化，其曝光量根据倾斜面的倾斜形式被控制，使得蚀刻掩模的端部具有倾斜面结构。当通过使用该蚀刻掩模的蚀刻加工芯层时，芯层的端部的芯层的加工与蚀刻掩模的膜厚度成比例地进行，并且形成倾斜面。

10. 发明申请

US20050129397A1 Exposure device 审中-公开
标题翻译：曝光装置
公开(公告)号：US20050129397A1
公开(公告)日：2005-06-16
申请号：US11008129
申请日：2004-12-10
申请人： Daisuke Nakaya , Takeshi Fujii , Yoshimitsu Kudoh
发明人： Daisuke Nakaya , Takeshi Fujii , Yoshimitsu Kudoh
IPC分类号： G03F7/20 , G03F9/00 , H05K1/02 , H05K3/00 , H05K3/46 , G03B41/00
CPC分类号： H05K3/4679 , G03F7/70275 , G03F7/70291 , G03F9/7065 , G03F9/7084 , H05K1/0269 , H05K3/0008 , H05K3/0082 , H05K3/4644 , H05K2201/09918 , H05K2203/166
摘要： In order to provide an exposure device by which aligning of an exposure pattern is realized when manufacturing a build up wiring board or the like, an exposure device which exposes a photosensitive material with a light beam modulated in accordance with image information comprising a reading section which reads a radioscopic image of a specific pattern provided on an inner layer of a laminated structure, and an aligning section which aligns an exposure position of the photosensitive material laminated on a surface of an outer layer of the laminated structure on the basis of the position information of the read radioscopic image of the specific pattern, is provided.
摘要翻译：为了提供一种曝光装置，通过该曝光装置可以在制造积层布线板等时实现曝光图案的对准;曝光装置，其用根据图像信息调制的光束曝光感光材料，该图像信息包括读取部分读取设置在层叠结构的内层上的特定图案的放射线图像，以及对准部，其基于位置信息对准层叠在层叠结构的外层的表面上的感光材料的曝光位置的特定图案的读取的放射线图像。

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