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1. 发明授权

US12130554B2 Method and apparatus for direct writing photoetching by parallel interpenetrating super-resolution high-speed laser 有权
公开(公告)号：US12130554B2
公开(公告)日：2024-10-29
申请号：US18404934
申请日：2024-01-05
申请人： ZHEJIANG LAB , ZHEJIANG UNIVERSITY
发明人： Cuifang Kuang , Hongqing Wang , Ziang Wang , Zhenyao Yang , Mengbo Tang , Lanxin Zhan , Xiaoyi Zhang , Jisen Wen , Xu Liu
IPC分类号： G03F7/20 , G03F7/00
CPC分类号： G03F7/2053 , G03F7/70391 , G03F7/704
摘要： A method and an apparatus for direct writing photoetching by parallel interpenetrating super-resolution high-speed laser. The method of the present application uses a parallel interpenetrating algorithm. Firstly, a multi-beam solid light spot for writing is generated based on a writing light spatial light modulator; a multi-beam hollow light spot for inhibition is generated based on an inhibition optical spatial light modulator; the multi-beam solid light spot is combined with the multi-beam hollow light spot to generate a modulated multi-beam light spot; a writing waveform is output based on a multichannel acousto-optic modulator, a displacement stage moves at a constant speed until writing of a whole column of areas is completed, an optical switch is turned off, and the displacement stage conducts one-time stepping movement; the process is not stopped until all patterns are written.

2. 发明公开

US20240176244A1 METHOD AND APPARATUS FOR DIRECT WRITING PHOTOETCHING BY PARALLEL INTERPENETRATING SUPER-RESOLUTION HIGH-SPEED LASER 审中-公开
公开(公告)号：US20240176244A1
公开(公告)日：2024-05-30
申请号：US18404934
申请日：2024-01-05
申请人： ZHEJIANG LAB , ZHEJIANG UNIVERSITY
发明人： Cuifang KUANG , Hongqing WANG , Ziang WANG , Zhenyao YANG , Mengbo TANG , Lanxin ZHAN , Xiaoyi ZHANG , Jisen WEN , Xu LIU
IPC分类号： G03F7/20 , G03F7/00
CPC分类号： G03F7/2053 , G03F7/70391 , G03F7/704
摘要： A method and an apparatus for direct writing photoetching by parallel interpenetrating super-resolution high-speed laser. The method of the present application uses a parallel interpenetrating algorithm. Firstly, a multi-beam solid light spot for writing is generated based on a writing light spatial light modulator; a multi-beam hollow light spot for inhibition is generated based on an inhibition optical spatial light modulator; the multi-beam solid light spot is combined with the multi-beam hollow light spot to generate a modulated multi-beam light spot; a writing waveform is output based on a multichannel acousto-optic modulator, a displacement stage moves at a constant speed until writing of a whole column of areas is completed, an optical switch is turned off, and the displacement stage conducts one-time stepping movement; the process is not stopped until all patterns are written.

3. 发明申请

US20170038690A1 EXPOSURE HEAD, EXPOSURE APPARATUS AND METHOD OF OPERATING AN EXPOSURE HEAD 审中-公开
标题翻译：曝光头，曝光装置和操作曝光头的方法
公开(公告)号：US20170038690A1
公开(公告)日：2017-02-09
申请号：US15304300
申请日：2015-04-14
申请人： Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
发明人： Jacobus Hubertus Theodoor Jamar , Herman Hendrikus Maalderink , Erwin Rinaldo Meinders , Peter Theodorus Maria Giesen , Erwin John van Zwet , Henri Jacques Antoine Jean Starmans
IPC分类号： G03F7/20
CPC分类号： G03F7/2051 , G02B26/0875 , G02B26/12 , G03F7/70391 , G03F7/704
摘要： The invention is directed at an exposure head for use in an exposure apparatus for illuminating a surface, the exposure head comprising one or more radiative sources for providing one or more beams, an optical scanning unit arranged for receiving the one or more beams and for directing the beams towards the surface for impinging each of the beams on an impingement spot, a rotation actuating unit connected to the optical scanning unit for at least partially rotating the optical scanning unit, wherein the impingement spots of the one or more beams are scanned across the surface by said at least partial rotation of the optical scanning unit, wherein the optical scanning unit comprises a transmissive element including one or more facets for receiving the one or more beams and for outputting the beams after conveying thereof through the transmissive element, for displacing the beams upon said rotation of the transmissive element for enabling the scanning of the impingement spots.
摘要翻译：本发明涉及一种在用于照射表面的曝光装置中使用的曝光头，该曝光头包括一个或多个用于提供一个或多个光束的辐射源，光学扫描单元被布置为接收一个或多个光束并用于引导所述光束朝向所述表面用于将每个光束撞击在冲击点上;旋转致动单元，连接到所述光学扫描单元，用于至少部分地旋转所述光学扫描单元，其中所述一个或多个光束的所述撞击点跨过通过所述光学扫描单元的所述至少部分旋转，所述光学扫描单元包括透射元件，所述透射元件包括用于接收所述一个或多个光束的一个或多个刻面，并且用于在将所述光束传送通过所述透射元件之后输出所述光束，在所述透射元件旋转时，能够对冲击点进行扫描。

4. 发明申请

US20170017163A1 BEAM EXPOSURE DEVICE 有权
标题翻译：光束曝光装置
公开(公告)号：US20170017163A1
公开(公告)日：2017-01-19
申请号：US15124701
申请日：2015-02-26
申请人： V TECHNOLOGY CO., LTD.
发明人： Koichi Kajiyama , Shin Ishikawa , Takayuki Sato , Kazushige Hashimoto
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , B41J2/447 , B41J2/47 , G03F7/2057 , G03F7/70391 , G03F7/704 , G03G15/04054
摘要： A beam exposure device includes a light-emitting unit for emitting light beams from a plurality of light-emitting positions, a scan unit, an optical condensing system for condensing a spot of the light beams onto a surface to be exposed, and a micro-deflection unit for micro-deflecting the plurality of light beams to expose the space between the beams in the plurality of light beams. The optical condensing system includes a first microlens array arranged between the light-emitting unit and the micro-deflection unit and provided with a plurality of microlenses corresponding to the light-emitting positions; and a second microlens array arranged between the micro-deflection unit and the surface to be exposed and provided with a plurality of microlenses each microlens corresponding to the light-emitting unit.
摘要翻译：光束曝光装置包括用于发射来自多个发光位置的光束的发光单元，扫描单元，用于将光束的点聚光到待曝光的表面上的光学聚光系统，偏转单元，用于微量偏转所述多个光束以暴露所述多个光束中的所述光束之间的空间。光聚光系统包括布置在发光单元和微偏转单元之间的第一微透镜阵列，并且具有对应于发光位置的多个微透镜; 以及第二微透镜阵列，布置在所述微偏转单元和要暴露的表面之间，并且设置有与所述发光单元对应的每个微透镜的多个微透镜。

5. 发明申请

US20160195822A1 LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD 审中-公开
标题翻译：光栅设备，可编程格式设备和光刻方法
公开(公告)号：US20160195822A1
公开(公告)日：2016-07-07
申请号：US14911929
申请日：2014-07-11
申请人： ASML NETHERLANDS B.V.
发明人： Franciscus Johannes VAN DE KERKHOF
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70275 , G03F7/70391 , G03F7/704
摘要： A lithographic apparatus and programmable patterning device is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a plurality of VECSELs or VCSELs. The projection system may include a zone plate array that is oscillated in a Lissajous pattern. The zone plate array may include lenses arranged in a two-dimensional array where the lenses are arranged in a triangular layout. A lithographic system may include a plurality of the lithographic apparatuses, at least one lithographic apparatus being arranged above another lithographic apparatus.
摘要翻译：公开了一种光刻设备和可编程图案形成装置，其包括：调制器，被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，其配置成将经调制的光束投影到基板上。调制器包括多个VECSEL或VCSEL。投影系统可以包括以李萨如图案振荡的区域板阵列。区域板阵列可以包括以二维阵列布置的透镜，其中透镜以三角形布局布置。光刻系统可以包括多个光刻设备，至少一个光刻设备布置在另一个光刻设备的上方。

6. 发明申请

US20160048081A1 MASKLESS EXPOSURE METHOD AND A MASKLESS EXPOSURE DEVICE FOR PERFORMING THE EXPOSURE METHOD 有权
标题翻译：无接触曝光方法和用于实施曝光方法的遮蔽曝光装置
公开(公告)号：US20160048081A1
公开(公告)日：2016-02-18
申请号：US14612648
申请日：2015-02-03
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： JUN-HO SIM , JUNG-IN PARK , KI-BEOM LEE , HI-KUK LEE , HYUN-SEOK KIM , KAB-JONG SEO , SANG-HYUN YUN , SANG-HYUN LEE , JUNG-CHUL HEO , JONG-JOO KIM , CHANG-HOON KIM
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70641 , G02B26/0833 , G03F7/2053 , G03F7/70291 , G03F7/70383 , G03F7/70391
摘要： A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
摘要翻译：无掩模曝光装置包括其上设置有基板的台，光学头和光源部。光头将光照射到基板上。光源部分为光头提供光。光头根据平均焦距将光照射到基板上。平均焦点距离分别通过对基板的多个区域的最佳聚焦距离进行平均来确定。

7. 发明申请

US20150168840A1 METHOD FOR OPTICAL TRANSMISSION OF A STRUCTURE INTO A RECORDING MEDIUM 有权
标题翻译：将结构光学传输到记录介质的方法
公开(公告)号：US20150168840A1
公开(公告)日：2015-06-18
申请号：US14415022
申请日：2013-07-12
申请人： FORSCHUNGSZENTRUM JUELICH GMBH
发明人： Hilde Hardtdegen , Martin Mikulicz
IPC分类号： G03F7/20
CPC分类号： G03F7/201 , G03F7/20 , G03F7/70383 , G03F7/70391
摘要： A method for optical transmission of a structure into a recording medium which can be transformed locally from a first undefined state into a second defined state by irradiating with photons from a photon source. The two states of the recording medium are manifested in different physical and/or chemical properties of the recording medium. At least one photon source having a photon flux of less than 104 photons per second is selected for the irradiation with the photons. It was recognized that with such a low photon flux especially fine structures can advantageously be transmitted into the recording medium without the irradiation having to be partially blocked by a mask. In this manner, for a given wavelength (energy) of the photons, structures can be transmitted that are considerably smaller than the width, defined by the diffraction limit, of the probability distribution for the locations at which the emitted photons are incident.
摘要翻译：一种用于将结构光学传输到记录介质中的方法，其可以通过从光子源照射光子而从第一未定义状态局部变换到第二限定状态。记录介质的两种状态表现在记录介质的不同物理和/或化学性质上。选择具有小于104光子/秒的光子通量的至少一个光子源用于用光子照射。已经认识到，通过这种低光子通量，特别是精细的结构可以有利地被传输到记录介质中，而不需要被掩模部分阻挡。以这种方式，对于光子的给定波长（能量），可以传输比发射的光子入射的位置的概率分布的衍射极限宽度明显更小的结构。

8. 发明申请

US20140285786A1 LITHOGRAPHY APPARATUS, AN APPARATUS FOR PROVIDING SETPOINT DATA, A DEVICE MANUFACTURING METHOD, A METHOD OF CALCULATING SETPOINT DATA AND A COMPUTER PROGRAM 有权
标题翻译：提取设备数据的设备，设备制造方法，计算设置点数据的方法和计算机程序
公开(公告)号：US20140285786A1
公开(公告)日：2014-09-25
申请号：US14356357
申请日：2012-11-15
申请人： ASML Netherlands B.V.
发明人： Patricius Aloysius Jacobus Tinnemans , Wouter Frans Willem Mulckhuyse
IPC分类号： G03F7/20
CPC分类号： G03F7/70508 , G03F7/70291 , G03F7/70391 , G03F7/70558
摘要： An exposure apparatus configured to project each of a plurality of radiation beams onto a respective location on a target, the plurality of radiation beams forming a desired dose pattern via a plurality of spot exposures, the nominal position of a characteristic point in the dose distribution of each of the spot exposures lying at points defining a first grid. The apparatus has, or is provided data from, a controller configured to: calculate a target intensity value for each of the plurality of radiation beams to expose the target to the desired dose pattern, the calculation using as input a rasterized representation of the desired dose pattern, the rasterized representation including a dose value defined at each of a plurality of points on a second grid, the first and second grids having the same geometry, and control the exposure apparatus to emit beams with the target intensity values.
摘要翻译：一种曝光装置，被配置为将多个辐射束中的每一个投射到目标上的相应位置上，所述多个辐射束经由多个斑点曝光形成期望的剂量图案，剂量分布中特征点的标称位置每个点曝光位于定义第一格栅的点上。该装置具有或提供来自控制器的数据，该控制器被配置为：计算多个辐射束中的每一个的目标强度值以将目标暴露于期望的剂量模式，该计算使用所需剂量的光栅化表示图案，光栅化表示包括在第二格栅上的多个点中的每一个处限定的剂量值，第一和第二栅格具有相同的几何形状，并且控制曝光装置发射具有目标强度值的光束。

9. 发明申请

US20140076105A1 GANTRY APPARATUS 审中-公开
公开(公告)号：US20140076105A1
公开(公告)日：2014-03-20
申请号：US14087371
申请日：2013-11-22
申请人： Samsung Electronics Co., Ltd.
发明人： Sang Joon HONG , Oui Serg KIM , Sang Hyun PARK , Roger Francisus Mattheus M HAMELINCK
IPC分类号： F16H21/44
CPC分类号： F16H21/44 , G03F7/70391 , Y10T74/18888
摘要： A gantry apparatus includes a structure to couple and support an optical system has enhanced rigidity, which minimizes deformation of the structure even if a plurality of optical systems is coupled to the structure. The gantry apparatus includes an optical system, a drive device to drive the optical system, and a structure to couple and support the drive device. The structure includes a plurality of first plates arranged parallel to one another, and a plurality of second plates intersecting the plurality of first plates to define receptive corridors, each of which receives the drive device.
摘要翻译：台架装置包括用于联接和支撑光学系统的结构，其具有增强的刚性，即使多个光学系统耦合到该结构，也能最小化结构的变形。龙门装置包括光学系统，用于驱动光学系统的驱动装置和用于联接和支撑驱动装置的结构。该结构包括彼此平行布置的多个第一板，以及与多个第一板相交的多个第二板，以限定可接收的走廊，每个都容纳驱动装置。

10. 发明申请

US20140055764A1 LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD 有权
标题翻译：光栅设备，可编程格式设备和光刻方法
公开(公告)号：US20140055764A1
公开(公告)日：2014-02-27
申请号：US13973703
申请日：2013-08-22
申请人： Pieter Willem Herman DE JAGER , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
发明人： Pieter Willem Herman DE JAGER , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
IPC分类号： G03F7/20
CPC分类号： G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
摘要翻译：在一个实施例中，公开了一种光刻设备，其包括调制器，该调制器被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。

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