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1. 发明授权

US06441378B1 Magnetic energy filter 失效
标题翻译：磁能过滤器
公开(公告)号：US06441378B1
公开(公告)日：2002-08-27
申请号：US09585852
申请日：2000-06-01
申请人： Katsushige Tsuno , Eric Munro , John Rouse
发明人： Katsushige Tsuno , Eric Munro , John Rouse
IPC分类号： G21K108
CPC分类号： H01J49/463 , H01J37/05 , H01J2237/055 , H01J2237/057
摘要： A compact magnetic energy filter having at least four magnetic fields to deflect the trajectory of an electron beam from the entrance window to the exit slit. A rotational symmetry axis is located midway between the second and third magnetic fields. The magnetic fields on the opposite sides of the rotational symmetry axis are opposite in polarity.
摘要翻译：一种具有至少四个磁场以将电子束从入口窗口的轨迹偏转到出口狭缝的紧凑型磁能过滤器。旋转对称轴位于第二和第三磁场之间的中间位置。旋转对称轴的相对侧的磁场极性相反。

2. 发明授权

US06620565B2 Electron beam lithography apparatus focused through spherical aberration introduction 有权
标题翻译：通过球面像差引入聚焦的电子束光刻设备
公开(公告)号：US06620565B2
公开(公告)日：2003-09-16
申请号：US10188030
申请日：2002-07-03
申请人： Victor Katsap , Eric Munro , John Andrew Rouse , Warren K. Waskiewicz , Xieqing Zhu
发明人： Victor Katsap , Eric Munro , John Andrew Rouse , Warren K. Waskiewicz , Xieqing Zhu
IPC分类号： G03F900
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/1534 , Y10S430/143
摘要： An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.
摘要翻译：一种聚焦装置和方法，包括用于产生电子束通过的电子束，掩模和投影柱的源，以及电子束将被聚焦的晶片。晶片位于投影柱的球面像差减小由投影柱中的色像差引起的负散焦效应的平面中。该装置和方法适用于通常的电子图案形成工具，其中掩模的厚度小于电子图案形成工具的电子平均自由程的电子图案形成工具，以及SCALPEL TM电子图案形成工具。

3. 发明授权

US5502306A Electron beam inspection system and method 失效
标题翻译：电子束检查系统及方法
公开(公告)号：US5502306A
公开(公告)日：1996-03-26
申请号：US214377
申请日：1994-03-17
申请人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
发明人： Dan Meisburger , Alan D. Brodie , Curt Chadwick , Anil Desai , Hans Dohse , Dennis Emge , John Greene , Ralph Johnson , Ming-Yie Ling , John McMurtry , Barry Becker , Ray Paul , Mike Robinson , Richard Simmons , David E. A. Smith , John Taylor , Lee Veneklasen , Dean Walters , Paul Wieczorek , Sam Wong , April Dutta , Surendra Lele , Kirkwood Rough , Henry Pearce-Percy , Jack Y. Jau , Chun C. Lin , Hoi T. Nguyen , Yen-Jen Oyang , Timothy L. Hutcheson , David J. Clark , Chung-Shih Pan , Chetana Bhaskar , Chris Kirk , Eric Munro
IPC分类号： G01B15/00 , G01B15/08 , G01N23/04 , G01N23/203 , G01N23/225 , G01R31/307 , G03F1/08 , G03F1/16 , H01J37/147 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/027 , H01L21/66 , H01J37/26
CPC分类号： H01J37/28 , G01R31/307 , H01J2237/063 , H01J2237/184 , H01J2237/204 , H01J2237/24495 , H01J2237/30438
摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.
摘要翻译：公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。衬底也在其表面上经受电场以加速次级颗粒。该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的多个基板。在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。

4. 发明申请

US20060060780A1 Apparatus and method for e-beam dark field imaging 有权
标题翻译：用于电子束暗场成像的装置和方法
公开(公告)号：US20060060780A1
公开(公告)日：2006-03-23
申请号：US10935834
申请日：2004-09-07
申请人： Douglas Masnaghetti , Gabor Toth , Eric Munro , Jeffrey Keister
发明人： Douglas Masnaghetti , Gabor Toth , Eric Munro , Jeffrey Keister
IPC分类号： G21K7/00 , H01J3/14
CPC分类号： H01J37/28 , H01J37/05 , H01J37/244 , H01J37/265 , H01J2237/053 , H01J2237/15 , H01J2237/1536 , H01J2237/2446 , H01J2237/24485
摘要： One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.
摘要翻译：公开的一个实施例涉及包括物镜，扫描偏转器，去扫描偏转器，能量滤波器漂移管和分段检测器的扫描电子束装置。物镜可以是配置有高提取场的浸没透镜，以便保留从样本表面散射的电子的方位角鉴别。去扫描偏转器可以用于补偿入射电子束的扫描。能量滤波器漂移管被配置为根据来自样品表面的极化轨迹角对准散射电子。

5. 发明授权

US06440620B1 Electron beam lithography focusing through spherical aberration introduction 有权
标题翻译：通过球面像差引入聚焦的电子束光刻
公开(公告)号：US06440620B1
公开(公告)日：2002-08-27
申请号：US09679403
申请日：2000-10-04
申请人： Victor Katsap , Eric Munro , John Andrew Rouse , Warren K. Waskiewicz , Xieqing Zhu
发明人： Victor Katsap , Eric Munro , John Andrew Rouse , Warren K. Waskiewicz , Xieqing Zhu
IPC分类号： G03C500
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/1534 , Y10S430/143
摘要： An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.
摘要翻译：一种聚焦装置和方法，包括用于产生电子束通过的电子束，掩模和投影柱的源，以及电子束将被聚焦的晶片。晶片位于投影柱的球面像差减小由投影柱中的色像差引起的负散焦效应的平面中。该装置和方法适用于通常的电子图案形成工具，其中掩模的厚度小于电子图案形成工具的电子平均自由程的电子图案形成工具，以及SCALPEL TM电子图案形成工具。

6. 发明授权

US07217924B1 Holey mirror arrangement for dual-energy e-beam inspector 有权
标题翻译：双能量电子束检查器的多孔镜配置
公开(公告)号：US07217924B1
公开(公告)日：2007-05-15
申请号：US11205367
申请日：2005-08-16
申请人： Marian Mankos , Eric Munro
发明人： Marian Mankos , Eric Munro
IPC分类号： H01J37/26 , G01N23/225
CPC分类号： H01J37/05 , H01J37/147 , H01J37/153 , H01J37/26 , H01J37/29 , H01J2237/0044 , H01J2237/063 , H01J2237/151 , H01J2237/2446 , H01J2237/262
摘要： One embodiment relates to an apparatus for generating a dual-energy electron beam. A first electron beam source is configured to generate a lower-energy electron beam, and a second electron beam source is configured to generate a higher-energy electron beam. A holey mirror is biased to reflect the lower-energy electron beam. The holey mirror also includes an opening therein through which passes the higher-energy electron beam, thereby forming the dual-energy electron beam. A prism array combiner introduces a first dispersion between the lower-energy electron beam and the higher-energy electron beam within the dual-energy electron beam. A prism array separator is configured to separate the dual-energy electron beam traveling to a substrate from a scattered electron beam traveling away from the substrate. The prism array separator introduces a second dispersion which compensates for the dispersion of the prism array combiner. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及一种用于产生双能量电子束的装置。第一电子束源被配置为产生较低能量的电子束，并且第二电子束源被配置为产生较高能量的电子束。有孔镜被偏置以反射较低能量的电子束。多孔镜还包括其中通过高能电子束的开口，从而形成双能电子束。棱镜阵列组合器在双能电子束内引入低能电子束与高能电子束之间的第一色散。棱镜阵列分离器被配置为将从衬底传播的散射电子束分离到衬底行进的双能电子束。棱镜阵列分离器引入补偿棱镜阵列组合器的色散的第二色散。还公开了其他实施例。

7. 发明授权

US07164139B1 Wien filter with reduced chromatic aberration 有权
标题翻译：维恩滤镜具有降低的色差
公开(公告)号：US07164139B1
公开(公告)日：2007-01-16
申请号：US11048378
申请日：2005-02-01
申请人： Gabor D. Toth , Douglas K. Masnaghetti , Jeffrey Keister , Eric Munro
发明人： Gabor D. Toth , Douglas K. Masnaghetti , Jeffrey Keister , Eric Munro
IPC分类号： H01J1/50
CPC分类号： H01J37/05 , H01J2237/057
摘要： One embodiment disclosed relates to a Wien filter for a charged-particle beam apparatus. The charged-particle beam is transmitted through the Wien filter in a first direction. A magnetic field generation mechanism is configured to generate a magnetic field in a second direction which is perpendicular to the first direction, and an electrostatic field generation mechanism is configured to generate an electrostatic field in a third direction which is perpendicular to the first and second directions. The field generation mechanisms are further configured so as to have an offset between the positions of the magnetic and electrostatic fields along the first direction. Another embodiment disclosed relates to a Wien filter type device wherein the magnetic force is approximately twice in strength compared to the electrostatic force. Other embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及一种用于带电粒子束装置的维恩滤波器。带电粒子束在第一方向通过维恩滤波器传输。磁场产生机构被配置为在与第一方向垂直的第二方向上产生磁场，并且静电场产生机构被配置为在与第一和第二方向垂直的第三方向上产生静电场。场产生机构被进一步配置为具有沿着第一方向的磁场和静电场的位置之间的偏移。所公开的另一实施例涉及一种Wien过滤器型装置，其中与静电力相比，磁力的强度大约是两倍。还公开了其他实施例。

8. 发明授权

US07141791B2 Apparatus and method for E-beam dark field imaging 有权
标题翻译：电子束暗场成像的装置和方法
公开(公告)号：US07141791B2
公开(公告)日：2006-11-28
申请号：US10935834
申请日：2004-09-07
申请人： Douglas K. Masnaghetti , Eric Munro , Gabor D. Toth , Jeffrey Keister
发明人： Douglas K. Masnaghetti , Eric Munro , Gabor D. Toth , Jeffrey Keister
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/05 , H01J37/244 , H01J37/265 , H01J2237/053 , H01J2237/15 , H01J2237/1536 , H01J2237/2446 , H01J2237/24485
摘要： One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.
摘要翻译：公开的一个实施例涉及包括物镜，扫描偏转器，去扫描偏转器，能量滤波器漂移管和分段检测器的扫描电子束装置。物镜可以是配置有高提取场的浸没透镜，以便保留从样本表面散射的电子的方位角鉴别。去扫描偏转器可以用于补偿入射电子束的扫描。能量滤波器漂移管被配置为根据来自样品表面的极化轨迹角对准散射电子。

9. 发明授权

US06420714B1 Electron beam imaging apparatus 有权
标题翻译：电子束成像装置
公开(公告)号：US06420714B1
公开(公告)日：2002-07-16
申请号：US09591626
申请日：2000-06-09
申请人： Victor Katsap , Eric Munro , John Andrew Rouse , Warren K Waskiewicz , Xieqing Zhu
发明人： Victor Katsap , Eric Munro , John Andrew Rouse , Warren K Waskiewicz , Xieqing Zhu
IPC分类号： G21K108
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/141 , H01J2237/31791
摘要： An apparatus for projection lithography is disclosed. The apparatus has at least one magnetic doublet lens. An aperture scatter filter is interposed between the two lenses of the magnetic doublet lens. The aperture scatter filter is in the back focal plane of the magnetic doublet lens system, or in an equivalent conjugate plane thereof. The apparatus also has two magnetic clamps interposed between the two lenses in the magnetic doublet lens. The clamps are positioned and configured to prevent substantial overlap of the magnetic lens fields. The magnetic clamps are positioned so that the magnetic fields from the lenses in the magnetic doublet lens do not extend to the aperture scatter filter.
摘要翻译：公开了一种用于投影光刻的装置。该装置具有至少一个磁双峰透镜。孔径散射滤光片插入在磁性双透镜透镜的两个透镜之间。孔径散射滤光器位于磁性双透镜系统的后焦平面中或其等效的共轭平面中。该装置还具有夹在磁性双透镜中的两个透镜之间的两个磁性夹具。夹具被定位和配置以防止磁性透镜场的实质重叠。磁性夹具被定位成使得来自磁性双透镜的透镜的磁场不延伸到孔径散射滤光器。

10. 发明授权

US5578821A Electron beam inspection system and method 失效
标题翻译：电子束检查系统及方法
公开(公告)号：US5578821A
公开(公告)日：1996-11-26
申请号：US371458
申请日：1995-01-11
申请人： Dan Meisberger , Alan D. Brodie , Anil A. Desai , Dennis G. Emge , Zhong-Wei Chen , Richard Simmons , Dave E. A. Smith , April Dutta , J. Kirkwood H. Rough , Leslie A. Honfi , Henry Pearce-Percy , John McMurtry , Eric Munro
发明人： Dan Meisberger , Alan D. Brodie , Anil A. Desai , Dennis G. Emge , Zhong-Wei Chen , Richard Simmons , Dave E. A. Smith , April Dutta , J. Kirkwood H. Rough , Leslie A. Honfi , Henry Pearce-Percy , John McMurtry , Eric Munro
IPC分类号： G01B15/00 , G01B15/08 , G01N23/04 , G01N23/203 , G01N23/225 , G01R31/28 , G01R31/302 , G03F1/08 , G03F1/16 , H01J37/28 , H01J37/30 , H01L21/027 , H01L21/66 , H01J37/00
CPC分类号： H01J37/28 , H01J37/3005 , H01J2237/2817
摘要： A method and apparatus for a charged particle scanning system and an automatic inspection system, including wafers and masks used in microcircuit fabrication. A charged particle beam is directed at the surface of a substrate for scanning that substrate and a selection of detectors are included to detect at least one of the secondary charged particles, back-scattered charged particles and transmitted charged particles from the substrate. The substrate is mounted on an x-y stage to provide at least one degree of freedom while the substrate is being scanned by the charged particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary charged particles. The system facilitates inspection at low beam energies on charge sensitive insulating substrates and has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment system for initially aligning the substrate beneath the charged particle beam. To function most efficiently there is also a vacuum system for evacuating and repressurizing a chamber containing the substrate. The vacuum system can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum system can simultaneously evacuate a plurality of substrates prior to inspection and repressurize the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison system for comparing the pattern on the substrate with a second pattern.
摘要翻译：一种带电粒子扫描系统和自动检查系统的方法和装置，包括微电路制造中使用的晶片和掩模。带电粒子束被引导到用于扫描该衬底的衬底的表面，并且包括选择的检测器以检测来自衬底的次级带电粒子，反向散射带电粒子和透射带电粒子中的至少一个。衬底被安装在x-y平台上以在通过带电粒子束扫描衬底的同时提供至少一个自由度。衬底也在其表面上经受电场以加速次级带电粒子。该系统便于对电荷敏感绝缘基板上的近光束能量进行检查，并且能够准确地测量基板相对于带电粒子束的位置。另外，存在用于使带电粒子束下面的衬底最初对准的光学对准系统。为了最有效地起作用，还有一个真空系统用于对含有基底的腔室进行抽空和再加压。真空系统可用于将一个基板保持在真空状态，而第二个基板正在装载/卸载，抽真空或重新加压。或者，真空系统可以在检查之前同时抽空多个基板，并且在检查之后重新加压相同的多个基板。在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较系统。

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