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1. 发明授权

US07141791B2 Apparatus and method for E-beam dark field imaging 有权
标题翻译：电子束暗场成像的装置和方法
公开(公告)号：US07141791B2
公开(公告)日：2006-11-28
申请号：US10935834
申请日：2004-09-07
申请人： Douglas K. Masnaghetti , Eric Munro , Gabor D. Toth , Jeffrey Keister
发明人： Douglas K. Masnaghetti , Eric Munro , Gabor D. Toth , Jeffrey Keister
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/05 , H01J37/244 , H01J37/265 , H01J2237/053 , H01J2237/15 , H01J2237/1536 , H01J2237/2446 , H01J2237/24485
摘要： One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.
摘要翻译：公开的一个实施例涉及包括物镜，扫描偏转器，去扫描偏转器，能量滤波器漂移管和分段检测器的扫描电子束装置。物镜可以是配置有高提取场的浸没透镜，以便保留从样本表面散射的电子的方位角鉴别。去扫描偏转器可以用于补偿入射电子束的扫描。能量滤波器漂移管被配置为根据来自样品表面的极化轨迹角对准散射电子。

2. 发明授权

US07164139B1 Wien filter with reduced chromatic aberration 有权
标题翻译：维恩滤镜具有降低的色差
公开(公告)号：US07164139B1
公开(公告)日：2007-01-16
申请号：US11048378
申请日：2005-02-01
申请人： Gabor D. Toth , Douglas K. Masnaghetti , Jeffrey Keister , Eric Munro
发明人： Gabor D. Toth , Douglas K. Masnaghetti , Jeffrey Keister , Eric Munro
IPC分类号： H01J1/50
CPC分类号： H01J37/05 , H01J2237/057
摘要： One embodiment disclosed relates to a Wien filter for a charged-particle beam apparatus. The charged-particle beam is transmitted through the Wien filter in a first direction. A magnetic field generation mechanism is configured to generate a magnetic field in a second direction which is perpendicular to the first direction, and an electrostatic field generation mechanism is configured to generate an electrostatic field in a third direction which is perpendicular to the first and second directions. The field generation mechanisms are further configured so as to have an offset between the positions of the magnetic and electrostatic fields along the first direction. Another embodiment disclosed relates to a Wien filter type device wherein the magnetic force is approximately twice in strength compared to the electrostatic force. Other embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及一种用于带电粒子束装置的维恩滤波器。带电粒子束在第一方向通过维恩滤波器传输。磁场产生机构被配置为在与第一方向垂直的第二方向上产生磁场，并且静电场产生机构被配置为在与第一和第二方向垂直的第三方向上产生静电场。场产生机构被进一步配置为具有沿着第一方向的磁场和静电场的位置之间的偏移。所公开的另一实施例涉及一种Wien过滤器型装置，其中与静电力相比，磁力的强度大约是两倍。还公开了其他实施例。

3. 发明授权

US07247849B1 Automated focusing of electron image 有权
标题翻译：电子图像自动聚焦
公开(公告)号：US07247849B1
公开(公告)日：2007-07-24
申请号：US11366306
申请日：2006-03-01
申请人： Gabor D. Toth , Varoujan Chakarian , Douglas K. Masnaghetti
发明人： Gabor D. Toth , Varoujan Chakarian , Douglas K. Masnaghetti
IPC分类号： H01J49/00
CPC分类号： H01J37/21 , G01R31/307 , H01J37/05 , H01J37/244 , H01J37/28 , H01J2237/216 , H01J2237/24485 , H01J2237/2487 , H01J2237/2817
摘要： One embodiment disclosed relates to a method for automated focusing of an electron image. An EF cut-off voltage is determined. In compensation for a change in the EF cut-off voltage, a focusing condition is adjusted. Adjusting the focusing condition may comprise, for example, adjusting a wafer bias voltage in correspondence to the change in cut-off voltage. Another embodiment disclosed relates to a method for automated focusing of an electron image in a scanning electron imaging apparatus. A focusing condition of a primary electron beam in a first image plane is varied so as to maximize an intensity of a secondary electron beam through an aperture in a second image plane.
摘要翻译：所公开的一个实施例涉及一种用于电子图像的自动聚焦的方法。确定EF截止电压。为了补偿EF截止电压的变化，调整聚焦条件。调整聚焦条件可以包括例如根据截止电压的变化来调整晶片偏置电压。所公开的另一实施例涉及一种用于扫描电子成像设备中的电子图像的自动聚焦的方法。改变第一图像平面中的一次电子束的聚焦条件，从而使通过第二图像平面中的孔的二次电子束的强度最大化。

4. 发明授权

US07792351B1 Defect review using image segmentation 有权
标题翻译：使用图像分割的缺陷审查
公开(公告)号：US07792351B1
公开(公告)日：2010-09-07
申请号：US12710076
申请日：2010-02-22
申请人： Gabor D. Toth , Douglas K. Masnaghetti
发明人： Gabor D. Toth , Douglas K. Masnaghetti
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01R31/307 , G06T2207/10061 , G06T2207/30148 , H01L21/67288
摘要： One embodiment pertains to a method for reviewing a potential defect on a substrate from one electron image. An image of an area containing the potential defect is obtained using a charged-particle apparatus. At least three image segments within the image are determined. The three segments are transformably identical to each other, and one of said three segments includes the potential defect. Another embodiment pertains to a method for reviewing a potential defect on a substrate by obtaining an electron-beam image of a relatively large field of view containing a first image segment. The first image segment is substantially smaller than the field of view and includes a location of the potential defect. A comparison image segment within the field of view is determined. The comparison image segment is transformably identical to the first image segment. Other embodiments and features are also disclosed.
摘要翻译：一个实施例涉及从一个电子图像检查衬底上的潜在缺陷的方法。使用带电粒子装置获得含有潜在缺陷的区域的图像。确定图像内至少三个图像片段。这三个段可变地彼此相同，并且所述三个段之一包括潜在的缺陷。另一个实施例涉及通过获得包含第一图像片段的相对较大的视场的电子束图像来检查衬底上的潜在缺陷的方法。第一图像段显着小于视场，并且包括潜在缺陷的位置。确定视野内的比较图像段。比较图像段可变地与第一图像段相同。还公开了其它实施例和特征。

5. 发明授权

US07684609B1 Defect review using image segmentation 失效
公开(公告)号：US07684609B1
公开(公告)日：2010-03-23
申请号：US11441962
申请日：2006-05-25
申请人： Gabor D. Toth , Douglas K. Masnaghetti
发明人： Gabor D. Toth , Douglas K. Masnaghetti
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01R31/307 , G06T2207/10061 , G06T2207/30148 , H01L21/67288
摘要： One embodiment pertains to a method for reviewing a potential defect on a substrate from one electron image. An image of an area containing the potential defect is obtained using a charged-particle apparatus. At least three image segments within the image are determined. The three segments are transformably identical to each other, and one of said three segments includes the potential defect. Another embodiment pertains to a method for reviewing a potential defect on a substrate by obtaining an electron-beam image of a relatively large field of view containing a first image segment. The first image segment is substantially smaller than the field of view and includes a location of the potential defect. A comparison image segment within the field of view is determined. The comparison image segment is transformably identical to the first image segment. Other embodiments and features are also disclosed.

6. 发明授权

US07041976B1 Automated focusing of electron image 失效
标题翻译：电子图像自动聚焦
公开(公告)号：US07041976B1
公开(公告)日：2006-05-09
申请号：US10700144
申请日：2003-11-03
申请人： Mark A. Neil , Gian Francesco Lorusso , Gabor D. Toth , Varoujan Chakarian , Douglas K. Masnaghetti
发明人： Mark A. Neil , Gian Francesco Lorusso , Gabor D. Toth , Varoujan Chakarian , Douglas K. Masnaghetti
IPC分类号： G01R31/305
CPC分类号： H01J37/21 , G01R31/307 , H01J37/05 , H01J37/244 , H01J37/28 , H01J2237/216 , H01J2237/24485 , H01J2237/2487 , H01J2237/2817
摘要： One embodiment disclosed relates to a method for automated focusing of an electron image. An EF cut-off voltage is determined. In compensation for a change in the EF cut-off voltage, a focusing condition is adjusted. Adjusting the focusing condition may comprise, for example, adjusting a wafer bias voltage in correspondence to the change in cut-off voltage. Another embodiment disclosed relates to a method for automated focusing of an electron image in a scanning electron imaging apparatus. A focusing condition of a primary electron beam in a first image plane is varied so as to maximize an intensity of a secondary electron beam through an aperture in a second image plane.
摘要翻译：所公开的一个实施例涉及一种用于电子图像的自动聚焦的方法。确定EF截止电压。为了补偿EF截止电压的变化，调整聚焦条件。调整聚焦条件可以包括例如根据截止电压的变化来调整晶片偏置电压。所公开的另一实施例涉及一种用于扫描电子成像设备中的电子图像的自动聚焦的方法。改变第一图像平面中的一次电子束的聚焦条件，从而使通过第二图像平面中的孔的二次电子束的强度最大化。

7. 发明授权

US07550744B1 Chamberless substrate handling 失效
标题翻译：无腔基板处理
公开(公告)号：US07550744B1
公开(公告)日：2009-06-23
申请号：US11690454
申请日：2007-03-23
申请人： George R. Koch , Douglas K. Masnaghetti
发明人： George R. Koch , Douglas K. Masnaghetti
IPC分类号： H02K41/00 , H01J37/18
CPC分类号： H01J37/16 , H01J37/18 , H01J37/28 , H01J2237/162 , H01J2237/2006 , H01J2237/2605
摘要： without substantially touching the surface, having annular rings forming annular orifices, one of the rings forming an air bearing portion and having passages through which a flow of a gas can be established in a first direction, where the flow of the gas is sufficient to create a cushion of air between the puck and the surface, and at least some of the orifices for drawing vacuums through the orifices in a second direction opposite to the first direction against the surface.
摘要翻译：没有基本接触表面，具有形成环形孔的环形环，其中一个环形成空气轴承部分并且具有通道，通过该通道可以沿第一方向建立气体流，其中气体的流动足以产生在圆盘和表面之间的空气缓冲器，以及用于在与第一方向相反的第二方向上抽吸真空通过孔口的至少一些孔抵靠表面。

8. 发明授权

US06815675B1 Method and system for e-beam scanning 失效
标题翻译：电子束扫描的方法和系统
公开(公告)号：US06815675B1
公开(公告)日：2004-11-09
申请号：US10426665
申请日：2003-04-30
申请人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
发明人： Gian Francesco Lorusso , Luca Grella , Douglas K. Masnaghetti , Amir Azordegan
IPC分类号： G01N2300
CPC分类号： G01N23/2251 , H01J2237/004 , H01J2237/28
摘要： The disclosure relates to a method and system of electron beam scanning for measurement, inspection or review. In accordance with one embodiment, the method includes a first scan on a region to collect first image data. The first image data is processed to determine information about a feature in the region. A scanning method is selected for imaging the feature. A second scan using the selected scanning method on the feature is then applied to collect second image data.
摘要翻译：本公开涉及用于测量，检查或审查的电子束扫描的方法和系统。根据一个实施例，该方法包括在收集第一图像数据的区域上的第一扫描。处理第一图像数据以确定关于该区域中的特征的信息。选择扫描方法来成像该特征。然后应用使用所选择的扫描方法对该特征进行的第二次扫描来收集第二图像数据。

9. 发明授权

US06570154B1 Scanning electron beam microscope 有权
标题翻译：扫描电子束显微镜
公开(公告)号：US06570154B1
公开(公告)日：2003-05-27
申请号：US09786137
申请日：2001-06-11
申请人： Douglas K. Masnaghetti , Stefano E. Concina , Stanley S. Sun , Waiman Ng , David L. Adler
发明人： Douglas K. Masnaghetti , Stefano E. Concina , Stanley S. Sun , Waiman Ng , David L. Adler
IPC分类号： H01J37244
CPC分类号： H01J37/28
摘要： A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM (200) has a source unit (202 through 220) for directing an electron beam (203) substantially towards a portion of the specimen (222), a detector (224) for detecting particles (205) that are emitted from the specimen (222), and an image generator (234 through 242) for generating the image of the specimen (222) from the emitted particles (205). The image features are controlled by conditions under which the image is generated. The specimen is scanned under a first set of conditions (252) to generate a first image during a first image phase (302, 402). The specimen is then scanned under a second set conditions (254) during a setup phase (304, 404). The second set of conditions is selected to control charge on the specimen. The specimen is then scanned under the first set of conditions (252) to generate a second image during a second image phase (306, 406). The features of the second image are controlled by the first and second sets of conditions.
摘要翻译：公开了一种用扫描电子显微镜（SEM）产生样本图像的方法和装置。扫描电子显微镜（200）具有源单元（202至220），用于基本上朝向样本（222）的一部分引导电子束（203）;检测器（224），用于检测从样本发射的颗粒（205）（222），以及用于从所发射的颗粒（205）产生样本（222）的图像的图像发生器（234至242）。图像特征由生成图像的条件控制。在第一组条件（252）下扫描样本，以在第一图像相位期间产生第一图像（302,402）。然后在设置阶段（304,404）期间，在第二设定条件（254）下扫描样本。选择第二组条件来控制样品上的电荷。然后在第一组条件（252）下扫描样本，以在第二图像相位期间产生第二图像（306,406）。第二图像的特征由第一和第二组条件控制。

10. 发明授权

US6066849A Scanning electron beam microscope 有权
标题翻译：扫描电子束显微镜
公开(公告)号：US6066849A
公开(公告)日：2000-05-23
申请号：US149767
申请日：1998-09-08
申请人： Douglas K. Masnaghetti , Stefano E. Concina , Stanley S. Sun , Waiman Ng , David L. Adler
发明人： Douglas K. Masnaghetti , Stefano E. Concina , Stanley S. Sun , Waiman Ng , David L. Adler
IPC分类号： H01L21/66 , H01J37/20 , H01J37/22 , H01J37/248 , H01J37/28 , H01J37/244
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2817
摘要： A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM has a source unit for directing an electron beam substantially towards a portion of the specimen, a detector for detecting particles that are emitted from the specimen, and an image generator for generating the image of the specimen from the emitted particles. The image features are controlled by conditions under which the image is generated. The specimen is scanned under a first set of conditions to generate a first image during a first image phase. The specimen is then scanned under a second set of conditions during a setup phase. The second set of conditions are selected to control charge on the specimen. The specimen is then scanned under the first set of conditions to generate a second image during a second image phase. The features of the second image are controlled by the first and second sets of conditions.
摘要翻译：公开了一种用扫描电子显微镜（SEM）产生样本图像的方法和装置。 SEM具有用于将电子束基本上朝向样本的一部分引导的源单元，用于检测从样本发射的颗粒的检测器，以及用于从所发射的颗粒产生样本的图像的图像发生器。图像特征由生成图像的条件控制。在第一组条件下扫描样本以在第一图像阶段期间产生第一图像。然后在设置阶段，在第二组条件下扫描样品。选择第二组条件来控制样品上的电荷。然后在第一组条件下扫描样品，以在第二图像阶段期间产生第二图像。第二图像的特征由第一和第二组条件控制。

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